| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/01/2004 | US20040001295 Plasma generation and processing with multiple radiation sources |
| 01/01/2004 | US20040000875 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 01/01/2004 | US20040000651 Ion source having replaceable and sputterable solid source material |
| 01/01/2004 | US20040000649 Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method |
| 01/01/2004 | US20040000646 Array for achromatic imaging of a pulsed particle ensemble |
| 01/01/2004 | US20040000642 Apparatus and methods for secondary electron emission microscope with dual beam |
| 01/01/2004 | US20040000641 Method and apparatus for observing element distribution |
| 01/01/2004 | US20040000638 Undercut measurement using sem |
| 01/01/2004 | US20040000478 Rotating hollow cathode magnetron |
| 01/01/2004 | US20040000375 Plasma etch chamber equipped with multi-layer insert ring |
| 12/31/2003 | WO2004001831A1 Magnetron plasma processing apparatus |
| 12/31/2003 | WO2004001822A1 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method |
| 12/31/2003 | WO2004001790A1 Dielectric barrier discharge apparatus and process for treating a substrate |
| 12/31/2003 | WO2004001789A2 Multi directional mechanical scanning in an ion implanter |
| 12/31/2003 | WO2004001094A1 Sputter target monitoring system |
| 12/31/2003 | WO2004000003A2 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process |
| 12/31/2003 | WO2003065410A3 Method and apparatus for monitoring and verifying equipment status |
| 12/31/2003 | WO2002070401A3 Method for fabrication of silicon octopole deflectors and electron column employing same |
| 12/31/2003 | CN1464294A Process of transmission electron microscope specimen preparation for easy damp-affecting denaturization crystal thin film |
| 12/31/2003 | CN1132962C Deposited film forming system and method thereof |
| 12/30/2003 | US6670766 Plasma treatment apparatus and plasma treatment method |
| 12/30/2003 | US6670741 Plasma processing apparatus with annular waveguide |
| 12/30/2003 | US6670624 Ion implanter in-situ mass spectrometer |
| 12/30/2003 | US6670623 Thermal regulation of an ion implantation system |
| 12/30/2003 | US6670622 Electron exposure device and method and electronic characteristics evaluation device using scanning probe |
| 12/30/2003 | US6670620 Electron gun, illumination apparatus using the electron gun, and electron beam exposure apparatus using the illumination apparatus |
| 12/30/2003 | US6670615 Electron detection device |
| 12/30/2003 | US6670612 Undercut measurement using SEM |
| 12/30/2003 | US6670611 Electron microscope |
| 12/30/2003 | US6670610 System and method for directing a miller |
| 12/30/2003 | US6670602 Scanning device and scanning method |
| 12/30/2003 | US6669812 Apparatus and method for fabricating semiconductor device |
| 12/30/2003 | US6669811 Linear drive system for use in a plasma processing system |
| 12/30/2003 | US6669810 Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof |
| 12/30/2003 | US6669121 Holder support device |
| 12/25/2003 | US20030235694 Method for the excitation of a plasma and a use of the method |
| 12/25/2003 | US20030234616 Slow-wave induction plasma transport |
| 12/25/2003 | US20030234372 Ion source of an ion implantation apparatus |
| 12/25/2003 | US20030234367 Electron beam control device |
| 12/25/2003 | US20030234238 Etching processing method |
| 12/25/2003 | US20030234175 Pre-sputtering method for improving utilization rate of sputter target |
| 12/25/2003 | US20030234165 Electrical switches and methods of establishing an electrical connection |
| 12/25/2003 | US20030234079 Plasma ashing/etching using solid sapphire disk |
| 12/25/2003 | US20030233981 Film deposition apparatus and film deposition method |
| 12/25/2003 | US20030233746 Collar removing clamp for HDP chamber |
| 12/24/2003 | WO2003107385A2 Device for coating substrates by physical vapour deposition, using a hollow cathode discharge method |
| 12/24/2003 | WO2003107384A1 Stabilization of electronegative plasmas with feedback control of rf generator systems |
| 12/24/2003 | WO2003107383A1 Electronic optical lens barrel and production method therefor |
| 12/24/2003 | WO2003107381A2 Electrode design for stable micro-scale plasma discharges |
| 12/24/2003 | WO2003107375A2 A particle beam generator |
| 12/24/2003 | WO2003107066A1 Modular manipulation system for manipulating a sample under study with a microscope |
| 12/24/2003 | WO2003107065A1 Manipulation system for manipulating a sample under study with a microscope |
| 12/24/2003 | WO2003106733A1 Target and method of diffusion bonding target to backing plate |
| 12/24/2003 | WO2003106094A1 Radial pulsed arc discharge gun for synthesizing nanopowders |
| 12/24/2003 | WO2003096765A3 Apparatus and methods for minimizing arcing in a plasma processing chamber |
| 12/24/2003 | WO2003079404A3 An improved substrate holder for plasma processing |
| 12/24/2003 | WO2003071577A3 Channel spark source for generating a stable, focussed electron beam |
| 12/24/2003 | WO2003012821A3 Method and apparatus for producing uniform process rates |
| 12/24/2003 | WO2002095381A8 Tandem microchannel plate and solid state electron detector |
| 12/24/2003 | WO2002033764A3 Apparatus and method for charged particle filtering and apparatus and method for ion implantation |
| 12/24/2003 | CN1463468A Microwave plasma processing device, plasma processing method, and microwave radiating member |
| 12/24/2003 | CN1132233C Plasma processing method and appts. |
| 12/24/2003 | CN1132227C Ion beam neutralizing method and appts. |
| 12/24/2003 | CN1132219C Cathode arc source and graphite target |
| 12/24/2003 | CN1132218C Ion filling appts. ion source appts. and method for positioning ion source appts. |
| 12/24/2003 | CN1131892C 静电屏蔽的射频室冷却系统和方法 RF chamber cooling system and method for electrostatic shielding |
| 12/24/2003 | CA2492835A1 Charged particle beam generator |
| 12/23/2003 | USRE38358 Cold cathode ion beam deposition apparatus with segregated gas flow |
| 12/23/2003 | US6667577 Plasma reactor with spoke antenna having a VHF mode with the spokes in phase |
| 12/23/2003 | US6667486 Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same |
| 12/23/2003 | US6667485 Ion implanting apparatus and sample processing apparatus |
| 12/23/2003 | US6667483 Apparatus using charged particle beam |
| 12/23/2003 | US6667478 Particle beam apparatus |
| 12/23/2003 | US6667477 Emission electron microscope |
| 12/23/2003 | US6667476 Scanning electron microscope |
| 12/23/2003 | US6667475 Method and apparatus for cleaning an analytical instrument while operating the analytical instrument |
| 12/23/2003 | US6667242 Brim and gas escape for non-contact wafer holder |
| 12/23/2003 | US6666982 Protection of dielectric window in inductively coupled plasma generation |
| 12/23/2003 | US6666957 Magnetron sputtering system and photomask blank production method based on the same |
| 12/23/2003 | US6666923 Plasma polymerizing apparatus having an electrode with a lot of uniform edges |
| 12/23/2003 | US6666611 Three degree of freedom joint |
| 12/18/2003 | WO2003105544A1 Plasma processing device |
| 12/18/2003 | WO2003105543A2 Method and device for reduction of the ignition voltage of plasmas |
| 12/18/2003 | WO2003105215A1 Integrated stepwise statistical process control in a plasma processing system |
| 12/18/2003 | WO2003105210A1 Processing device multivariate analysis model creation method, processing device multivariate analysis method, processing device control device, processing device control system |
| 12/18/2003 | WO2003105182A2 Externally excited torroidal plasma source with magnetic control of ion distribution |
| 12/18/2003 | WO2003104848A2 Methods for sem inspection of fluid containing samples |
| 12/18/2003 | WO2003104847A2 Low-pressure chamber for scanning electron microscopy in a wet environment |
| 12/18/2003 | WO2003104846A2 A sample enclosure for a scanning electron microscope and methods of use thereof |
| 12/18/2003 | WO2003104829A1 Sensor and method for measuring a current of charged particles |
| 12/18/2003 | WO2003008656A3 Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles |
| 12/18/2003 | US20030232500 Photo-assisted method for semiconductor fabrication |
| 12/18/2003 | US20030232258 Using a charged particle beam to eliminate attached particles from the result of splashing, correcting defects; semiconductor wafer |
| 12/18/2003 | US20030232151 Supplying high density gases in semiconductor wafer apparatus while maintaining low intensity magnetism at substrates; power sources |
| 12/18/2003 | US20030230986 Ion implantation ion source, system and method |
| 12/18/2003 | US20030230985 Discharge plasma processing system |
| 12/18/2003 | US20030230984 Plasma generating method, plasma apparatus, phase difference detecting method, impedance detecting method, measuring device, and coaxial type impedance matching device |
| 12/18/2003 | US20030230983 Electrode design for stable micro-scale plasma discharges |
| 12/18/2003 | US20030230732 Ion irradiation system |
| 12/18/2003 | US20030230727 Device for influencing an electron beam |