Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/2014
07/15/2014US8776719 Microwave plasma reactor
07/14/2014DE202014102818U1 Magnetron-Endblock und Vakuumdrehdurchführung Magnetron end block and rotary vacuum feedthrough
07/10/2014WO2013190349A9 Rf feed line
07/10/2014US20140193978 Method of plasma processing and apparatuses using the method
07/10/2014US20140193749 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
07/10/2014US20140192467 Ion implant indicia for cover glass or display component
07/10/2014US20140191128 Emitter, gas field ion source, and ion beam device
07/10/2014US20140191127 Contamination reduction electrode for particle detector
07/10/2014US20140191126 Method of Depositing Protective Structures
07/10/2014US20140191125 Sample Block Holder
07/10/2014US20140190822 Wafer processing deposition shielding components
07/10/2014US20140190636 Substrate processing apparatus
07/10/2014US20140190635 Plasma chamber and apparatus for treating substrate
07/10/2014US20140190632 Method and apparatus for photomask plasma etching
07/10/2014DE112012002811T5 Ladungsteilchenstrahlvorrichtung Charged particle
07/10/2014DE102010035593B4 Verfahren und Vorrichtung zum Behandeln eines Substrats mittels eines Plasmas Method and apparatus for treating a substrate by means of a plasma
07/09/2014CN203700501U 具有自动清洁功能的离子注入设备特气传输系统 Ion implantation has an automatic cleaning function device special gas transmission system
07/09/2014CN103918054A Hipims层 Hipims layer
07/09/2014CN103917311A 电子束熔化炉以及使用该炉的电子束熔化炉的运转方法 The method of operating an electron beam melting furnace and the furnace using an electron beam melting furnace
07/09/2014CN103915363A 基板处理设备 The substrate processing apparatus
07/09/2014CN103915310A 等离子体处理容器和等离子体处理装置 Plasma processing vessel and the plasma processing apparatus
07/09/2014CN103915309A 等离子体处理腔室及其静电夹盘以及基片温度控制方法 The plasma processing chamber and the electrostatic chuck and substrate temperature control method
07/09/2014CN103915308A 一种双射频脉冲等离子体的刻蚀方法及其刻蚀装置 A dual RF pulse plasma etching method and an etching apparatus
07/09/2014CN103915307A 等离子体处理室及用于该等离子体处理室的气体注入装置 Plasma processing chamber and the plasma processing chamber for gas injection means
07/09/2014CN103915306A 微电子工艺处理设备和用于其的反应腔室 Process equipment for microelectronics and its reaction chamber
07/09/2014CN103915305A 电阻触发式真空弧离子源装置 Resistance triggered vacuum arc ion source device
07/09/2014CN103915304A 一种等离子体刻蚀装置及干法刻蚀设备 A plasma etching apparatus and a dry etching equipment
07/09/2014CN102376518B 离子注入系统及方法 Ion implantation system and method
07/09/2014CN101853763B 等离子处理装置和等离子处理方法 The plasma processing apparatus and plasma processing method
07/08/2014US8773020 Apparatus for forming a magnetic field and methods of use thereof
07/08/2014US8772741 Ion implantation method and ion implantation apparatus
07/08/2014US8772737 Conductive element for electrically coupling an EUVL mask to a supporting chuck
07/08/2014US8772734 Charged particle beam lithography apparatus and method, and article manufacturing method
07/08/2014US8772732 Scanning charged particle beam device and method for correcting chromatic spherical combination aberration
07/08/2014US8772715 Electron beam device including a first electron biprism to split an electron beam into two beams and a second electron biprism in the image forming lens system to superpose the two beams
07/08/2014US8772714 Transmission electron microscope and method of observing TEM images
07/08/2014US8772713 Flight time based mass microscope system for ultra high-speed multi mode mass analysis
07/08/2014US8771539 Remotely-excited fluorine and water vapor etch
07/08/2014US8771538 Plasma source design
07/08/2014US8770142 Electrode for generating plasma and plasma generator
07/08/2014CA2601729C Method for operating a pulsed arc vaporizer source as well as a vacuum process installation with pulsed arc vaporization source
07/03/2014WO2014106182A1 Fiducial design for tilted or glancing mill operations with a charged particle beam
07/03/2014WO2014104055A1 Pattern shape evaluation method, semiconductor device manufacturing method, and pattern shape evaluation device
07/03/2014WO2014102188A1 Method and device for the formation of a continuous layer on the inner and outer surfaces of a hollow part and part thus produced
07/03/2014WO2014030144A3 Method of operational control of electron beam welding based on the synchronous integration method
07/03/2014WO2013055627A9 Method of creating two dimensional doping patterns in solar cells
07/03/2014US20140187409 Silicon part for plasma etching apparatus and method of producing the same
07/03/2014US20140187056 Multi charged particle beam writing apparatus and multi charged particle beam writing method
07/03/2014US20140186990 Cvd apparatus and method for forming cvd film
07/03/2014US20140184073 Plasma enhanced chemical vapor deposition (pecvd) source
07/03/2014US20140184072 Cold Plasma Annular Array Methods and Apparatus
07/03/2014US20140183358 Phase Plate and Method of Fabricating Same
07/03/2014US20140183133 Graphene nanotube array for gas filtration
07/03/2014US20140183033 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases
07/03/2014US20140182879 Electrode Arrangement for a Dielectrically Limited Gas Discharge
07/03/2014DE112012003682T5 Vorrichtung mit einem Strahl geladener Teilchen A device with a beam of charged particles
07/03/2014DE102013201977B3 Method for preparing samples for transmission electron microscope analysis for various applications, involves applying pressure in region around sample during sputtering to realize maximum pressure difference between anode and cathode sides
07/02/2014EP2750165A1 Electron beam lithography device and lithographic method
07/02/2014EP2750162A2 Radio-frequency sputtering system with rotary target for fabricating solar cells
07/02/2014EP2750161A1 Method for producing a representation of an object by means of a particle beam, as well as a particle beam device for carrying out the method
07/02/2014EP2750160A2 Phase plate and method of fabricating same
07/02/2014EP2748835A1 Methods and apparatus for employing an accelerated neutral beam for improved surface analysis
07/02/2014EP2748793A1 Dual image method and system for generating a multi-dimensional image of a sample
07/02/2014EP2748579A1 Method and device for the preparation of a sample for microstructure diagnostics
07/02/2014EP2748351A1 Sputtering apparatus and method
07/02/2014CN203690266U 一种等离子体刻蚀设备进气装置 One kind of plasma etching equipment intake device
07/02/2014CN203690253U 一种电感耦合等离子体源 An inductor coupled plasma source
07/02/2014CN203690252U 具有温度测试功能的icp 刻蚀机 With a temperature test function icp etcher
07/02/2014CN203690251U 高度调节式扫描电镜样品座 Height adjustable SEM sample holder
07/02/2014CN103907005A 制备用于微观结构诊断的样品的方法和设备 Method and apparatus for preparing samples for diagnosis of microscopic structure
07/02/2014CN103907004A 电子显微法的观察样品、电子显微法、电子显微镜以及观察样品制作装置 The samples were observed electron microscopy, electron microscopy, electron microscopy and observed sample preparation apparatus
07/02/2014CN103906855A 用于使用常压等离子体进行沉积的方法和装置 Methods and apparatus for using atmospheric plasma deposition
07/02/2014CN103904014A 静电卡盘和反应腔室 Electrostatic chuck and the reaction chamber
07/02/2014CN103903997A 离子注入剂量的检测方法 Detection method using an ion implantation dose
07/02/2014CN103903953A 干蚀刻机及干蚀刻机的下电极 The lower electrode dry etching machine and dry etching machine
07/02/2014CN103903952A 等离子蚀刻装置用硅部件及其制造方法 Plasma etching apparatus and method for manufacturing a silicon member
07/02/2014CN103903951A 等离子体系统的回馈控制方法及其系统 Plasma system feedback control method and system
07/02/2014CN103903950A 阻抗匹配系统及阻抗匹配方法 Impedance matching impedance matching system and method
07/02/2014CN103903949A 一种用于等离子体处理腔室的射频能量控制方法 A radio frequency power control method for a plasma processing chamber
07/02/2014CN103903948A 改善晶片边缘蚀刻速率均匀性的聚焦环 To improve the uniformity of the etch rate of the wafer edge focus ring
07/02/2014CN103903947A 一种等离子处理器及其运行方法 A plasma processor and method of operation
07/02/2014CN103903946A 一种用于等离子反应器的气体喷淋头 Gas showerhead for a plasma reactor
07/02/2014CN103903945A 一种稳定脉冲射频的方法 A stable pulsed radiofrequency method
07/02/2014CN103903944A 在多频等离子体处理腔室中实现阻抗匹配的方法和装置 Method and apparatus for impedance matching in a multi-frequency plasma processing chamber
07/02/2014CN103903943A 离子注入系统 Ion implantation system
07/02/2014CN103903942A 一种适用于纳米材料操控的多自由度纳米操作台 One for multi-degree of freedom manipulation of nanomaterials Nano Station
07/01/2014USRE44977 Method for detecting particles and defects and inspection equipment thereof
07/01/2014US8767038 Method and device for synthesizing panorama image using scanning charged-particle microscope
07/01/2014US8766219 Particle beam microscope for generating material data
07/01/2014US8766216 Drawing apparatus, and article manufacturing method
07/01/2014US8766215 Charged particle beam drawing apparatus and method of manufacturing article
07/01/2014US8766214 Method of preparing and imaging a lamella in a particle-optical apparatus
07/01/2014US8766213 Automated method for coincident alignment of a laser beam and a charged particle beam
07/01/2014US8766207 Beam monitoring device, method, and system
07/01/2014US8766185 Charged particle beam device
07/01/2014US8766184 Scanning electron microscope
07/01/2014US8766183 Charged particle beam device
07/01/2014US8766182 Method for detecting information of an electric potential on a sample and charged particle beam apparatus
07/01/2014US8766181 Control imaging methods in advanced ultrafast electron microscopy
07/01/2014US8765496 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
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