Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2014
08/07/2014US20140217894 Linear plasma source
08/07/2014US20140217891 Electrode for plasma processing apparatus, method for manufacturing the same, and plasma processing apparatus
08/07/2014US20140217881 Plasma generator, manufacturing method of rotating electrode for plasma generator, method for performing plasma treatment of substrate, and method for forming thin film having mixed structure by using plasma
08/07/2014US20140217303 Particle beam system and method for operating the same
08/07/2014US20140217283 TEM Sample Preparation
08/07/2014US20140217274 Charged particle beam device
08/07/2014US20140216928 Thin-film formation sputtering device
08/07/2014US20140216924 Method and system for manufacturing a transparent body for use in a touch panel
08/07/2014US20140216346 Plasma processing apparatus
08/07/2014US20140216345 Plasma processing apparatus
08/07/2014US20140216343 Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
08/07/2014DE112012004534T5 Ladungsteilchen-Strahlungsvorrichtung Charged particle radiation device
08/07/2014DE112012003090T5 Emitter, Gasfeldionenquelle und Ionenstrahlvorrichtung Emitter gas field ion source and ion beam apparatus
08/06/2014EP2762609A1 Common deposition platform, processing station and method of operation thereof
08/06/2014EP2762608A1 Gas separation by adjustable separation wall
08/06/2014EP2762607A1 Deposition source with adjustable electrode
08/06/2014EP2761643A1 Method and apparatus for producing a reflection reducing layer on a substrate
08/06/2014EP2761642A2 Inorganic materials, methods and apparatus for making same, and uses thereof
08/06/2014EP2761357A1 Testing assembly including a multiple degree of freedom stage
08/06/2014EP2761049A1 Process of coating a substrate with a thin film of metal or semiconductor compound
08/06/2014CN203760420U 一种离子注入装置 An ion implantation apparatus
08/06/2014CN103975413A 用于等离子体施加器的气体喷射器设备 Device for the plasma gas injector applicator
08/06/2014CN103975234A 借助微探针分析辐照材料的分析装置 With microprobe analysis analyzer irradiated materials
08/06/2014CN103975092A 在工件处理期间的电荷中和化的装置及其方法 In the charge neutralization of the workpiece during processing of the apparatus and method
08/06/2014CN103972016A 磁控管组件及磁控溅射设备 Magnetron sputtering equipment and components
08/06/2014CN103972015A 链式条件下的双频等离子发生器 Dual frequency plasma generator chained conditions
08/06/2014CN103972014A 离子体反应腔室电极间隙调整装置及离子体反应腔室 Plasma reaction chamber electrode gap adjusting device and the plasma reaction chamber
08/06/2014CN103972013A 一种真空设备 A vacuum device
08/06/2014CN103972012A 反应腔室及具有它的等离子体设备 The reaction chamber and the plasma apparatus having its
08/06/2014CN103972011A 离子注入设备及离子注入方法 Ion implantation apparatus and an ion implantation method
08/06/2014CN103972010A 用于衬底处理腔室的气体供应系统及其方法 The method for a gas supply system and the substrate processing chamber
08/06/2014CN101563750B 改善离子束传送的技术 Ion beam technology to improve transmission
08/05/2014US8796654 Scan device for microscope measurement instrument
08/05/2014US8796650 Charged particle beam drawing method and apparatus
08/05/2014US8796649 Ion implanter
08/05/2014US8796646 Beam-induced deposition at cryogenic temperatures
08/05/2014US8796644 Charged particle beam lithography system and target positioning device
08/05/2014US8796154 Method and apparatus for plasma dicing a semi-conductor wafer
08/05/2014US8795793 Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
08/05/2014US8795770 Preparation of mist, process and apparatus for forming new materials by mist gas discharge
08/05/2014US8795478 Method for manufacturing perpendicular magnetic recording medium
08/05/2014US8795467 Plasma processing apparatus and method
08/05/2014US8794582 Carbon nanotube film supporting structure and method for using same
07/2014
07/31/2014US20140212913 Embedding resin composition for electron microscope, and method for observing sample on electron microscope using said composition
07/31/2014US20140212601 Methods for plasma processing
07/31/2014US20140212116 High temperature electrolysis glow discharge device
07/31/2014US20140210345 Capacitively coupled remote plasma source
07/31/2014US20140210344 Water/wastewater recycle and reuse with plasma, activated carbon and energy system
07/31/2014US20140210337 Antenna for plasma processing device, and plasma processing device using the same
07/31/2014US20140209453 Method for predicting plasma micro-arcing, and method for controlling plasma process of production equipment using the same
07/31/2014US20140209245 Mounting table and plasma processing apparatus
07/31/2014US20140209244 Skew elimination and control in a plasma enhanced substrate processing chamber
07/31/2014US20140209243 Plasma Equipment and Method of Dry-Cleaning the Same
07/31/2014US20140209193 Charged Particle Beam Instrument
07/31/2014DE102013100974A1 Sputtermagnetron mit Magnetfeldbeeinflussung Sputtering magnetron with magnetic influence
07/31/2014DE102010003056B9 Verfahren zur Erzeugung von Bildern einer Probe A method of generating images of a specimen
07/30/2014EP2760042A2 Charged particle beam instrument with a specimen pre-evacuation chamber
07/30/2014EP2759619A1 Plant and process for the production of a semiconductor film
07/30/2014EP2758981A1 Method and apparatus for predicting a growth rate of deposited contaminants
07/30/2014EP2758980A1 Method and alignment of a phase plate in an electron microscope
07/30/2014CN1925322B 用于对称和/或同心的射频匹配网络的方法和设备 Methods and apparatus for symmetrical and / or concentric RF matching network
07/30/2014CN103959425A 用于在基底上制造减反射层的方法和设备 Method and apparatus for producing on a substrate an antireflective layer
07/30/2014CN103958723A 闭环控制 Closed-loop control
07/30/2014CN103956315A 一种电极间距可调的离子反应腔室及电极间距调整装置 An electrode spacing adjustable plasma reaction chamber and electrode spacing adjustment device
07/30/2014CN103956314A 一种微波驱动无铯负氢离子源 A microwave driving without cesium negative hydrogen ion source
07/30/2014CN103954636A 一种原位高分辨观察相变材料电致相变过程的透射电镜薄膜窗口 An in-situ high-resolution observation of phase change material electrically induced phase change process TEM film window
07/30/2014CN102610478B 一种带电粒子束测量装置 A charged particle beam measuring device
07/30/2014CN102592930B 离子源 Ion source
07/30/2014CN102486985B 离子源装置 Ion source means
07/30/2014CN102420091B 一种复合式磁控溅射阴极 A composite cathode magnetron sputtering
07/30/2014CN102418073B 溅射腔室、预清洗腔室以及等离子体加工设备 Sputtering chamber, pre-wash chamber and a plasma processing equipment
07/30/2014CN102315064B 一种磁控管及应用该磁控管的薄膜沉积处理设备 A magnetron, and application of the thin film deposition processing apparatus magnetron
07/30/2014CN102243978B 用于多靶溅射系统的电源装置 The power supply device for a multi-target sputtering system
07/29/2014USRE45049 Electron beam exposure system
07/29/2014US8791438 Ion beam sample preparation apparatus and methods
07/29/2014US8791436 Circuit tracing using a focused ion beam
07/29/2014US8791432 Charged particle beam writing apparatus and charged particle beam writing method
07/29/2014US8791431 Drawing apparatus, and method of manufacturing article
07/29/2014US8791426 Electron beam diagnostic system using computed tomography and an annular sensor
07/29/2014US8791423 Aberration correction device and charged particle beam device employing same
07/29/2014US8791422 Charged particle beam writing apparatus and charged particle beam writing method
07/29/2014US8791416 On-chip thin film Zernike phase plate and applications thereof
07/29/2014US8790498 Method and device for ion beam processing of surfaces
07/29/2014US8790489 Substrate processing apparatus and substrate processing method
07/29/2014US8789826 Method for ex-situ lift-out specimen preparation
07/24/2014WO2014112877A1 Optical and integrated inspection apparatus and method
07/24/2014WO2014072834A3 Encapsulation of inkjet heater chip for ion beam cross-section polishing and method of preparing chip cross-section sample
07/24/2014WO2014063970A3 Laminated materials, methods and apparatus for making same, and uses thereof
07/24/2014WO2014043061A3 Internal rf antenna with dielectric insulation
07/24/2014US20140203702 Plasma processing apparatus
07/24/2014US20140203187 Charged Particle Beam Lithography System and Target Positioning Device
07/24/2014US20140203185 Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
07/24/2014US20140202995 Plasma heat treatment apparatus
07/24/2014US20140202635 Mounting table and plasma processing apparatus
07/24/2014US20140202634 Radial transmission line based plasma source
07/24/2014US20140202633 Method and system for ion-assisted processing
07/24/2014US20140202490 Automated plasma cleaning system
07/24/2014DE112012003176T5 Elektronenkanone und Ladungsteilchenstrahlvorrichtung Electron gun and charged particle beam
07/24/2014DE102013105617A1 Planarmagnetronanordnung und Verfahren zum Betreiben einer Planarmagnetronanordnung Planarmagnetronanordnung and method for operating a Planarmagnetronanordnung
07/24/2014DE102011015263B4 Vorrichtung und Verfahren zum Behandeln von Substraten Apparatus and method for processing substrates
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