| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/23/2014 | EP2757572A1 Sample heating holder for electron beam microscopes or analyzers, and sample heating method using the same |
| 07/23/2014 | EP2757571A1 High-voltage insulation device for charged-particle optical apparatus |
| 07/23/2014 | EP2756518A1 Method for correcting the effects of electronic proximity using the deconvolution of the pattern to be exposed by means of a probabilistic method |
| 07/23/2014 | EP2756282A1 Glancing angle mill |
| 07/23/2014 | CN203733757U 扫描电镜测试样品夹持装置 Scanning electron microscopy test sample holding means |
| 07/23/2014 | CN103946889A 用于生成样品的多维图像的双图像方法和系统 Methods and systems for two-dimensional image to generate an image of a sample |
| 07/23/2014 | CN103946684A 用于横截面视图薄层的背侧打薄的高吞吐量tem制备工艺和硬件 For a cross-sectional view of the backside of a thin layer of thin, high-throughput tem fight preparation process and hardware |
| 07/23/2014 | CN103943852A 一种快速包裹和释放锂元素的方法 A rapid method for wrapping and releasing lithium elements |
| 07/23/2014 | CN103943452A 一种等离子体处理的工艺控制方法及装置 Process control method and apparatus for plasma processing |
| 07/23/2014 | CN103943451A 等离子体处理装置和等离子体处理装置的操作方法 A plasma processing apparatus and method of operation of the plasma processing apparatus |
| 07/23/2014 | CN103943450A 一种干刻设备的电极和干刻设备 A dry lithographic apparatus and a dry etching device electrodes |
| 07/23/2014 | CN103943449A 一种射频串扰的测量方法、设备和系统 A method of measuring RF crosstalk, apparatus and system |
| 07/23/2014 | CN103943448A 一种等离子处理装置的等离子处理方法 The plasma processing apparatus of a plasma processing methods such as |
| 07/23/2014 | CN103943447A 一种等离子处理装置及其处理方法 Apparatus and plasma processing method for processing |
| 07/23/2014 | CN103943446A 扫描头及运用此扫描头的扫描臂 Scan head and use this scan head scan arm |
| 07/23/2014 | CN103943445A 一种样品安放辅助支架 Auxiliary placed in a sample holder |
| 07/23/2014 | CN102479654B 离子注入设备及方法 Ion implantation apparatus and method |
| 07/23/2014 | CN102318034B 用于大面积等离子体加工的装置 The plasma processing apparatus of a large area for |
| 07/23/2014 | CN102308356B 多喷嘴气体团簇离子束系统和方法 Multi-nozzle gas cluster ion beam system and method |
| 07/23/2014 | CN102272878B 样本厚度的测量和终点确定 Measuring the thickness of the sample is determined and the end |
| 07/23/2014 | CN102270577B 等离子体处理装置和方法 The plasma processing apparatus and method |
| 07/23/2014 | CN101939029B 用于以富含能量的电子束处理成形件的装置和方法 Is used to energy-rich electron beam treatment apparatus and method for forming member |
| 07/22/2014 | US8788242 Pattern measurement apparatus |
| 07/22/2014 | US8786263 Reducing stored electrical energy in a lead inductance |
| 07/22/2014 | US8785889 Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system |
| 07/22/2014 | US8785883 Transmission electron microscope, and method of observing specimen |
| 07/22/2014 | US8785881 Method and apparatus for a porous electrospray emitter |
| 07/22/2014 | US8785878 Charged particle beam apparatus |
| 07/22/2014 | US8785851 Interference electron microscope |
| 07/22/2014 | US8785850 Charging of a hole-free thin film phase plate |
| 07/22/2014 | US8784948 Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber |
| 07/22/2014 | CA2628589C Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 07/17/2014 | WO2014031208A3 Shock-resistant image intensifier |
| 07/17/2014 | US20140199792 Defect pattern evaluation method, defect pattern evaluation apparatus, and recording media |
| 07/17/2014 | US20140199756 Physical means and methods for inducing regenerative effects on living tissues and fluids |
| 07/17/2014 | US20140197761 Facility for microwave treatment of a load |
| 07/17/2014 | US20140197733 Apparatus and method for multiplexed multiple discharge plasma produced sources |
| 07/17/2014 | US20140197725 Electric field discharge-type electron source |
| 07/17/2014 | US20140197336 Electron gun and charged particle beam device |
| 07/17/2014 | US20140197331 Charged particle device |
| 07/17/2014 | US20140197330 Vibration isolation module and substrate processing system |
| 07/17/2014 | US20140197329 Ion beam device |
| 07/17/2014 | US20140197327 High-voltage insulation device for charged-particle optical apparatus |
| 07/17/2014 | US20140197326 Charged particle beam writing method |
| 07/17/2014 | US20140197325 Charged particle beam lens and exposure apparatus using the same |
| 07/17/2014 | US20140197313 Charged-particle microscope |
| 07/17/2014 | US20140197312 Electron microscope and sample observation method |
| 07/17/2014 | US20140197311 Sample Carrier for an Electron Microscope |
| 07/17/2014 | US20140197310 Method of analyzing a sample and charged particle beam device for analyzing a sample |
| 07/17/2014 | US20140197136 High Efficiency Plasma Source |
| 07/17/2014 | US20140197135 Plasma processing method and plasma processing apparatus |
| 07/17/2014 | US20140197134 Systems and methods for plasma processing of microfeature workpieces |
| 07/17/2014 | US20140197026 Sputtering apparatus and method for forming a transmissive conductive layer of a light emitting device |
| 07/17/2014 | DE112008000104B4 Verfahren zum Schutz von Hochfrequenzverstärkern einer Plasmaversorgungseinrichtung und Plasmaversorgungseinrichtung A method for protecting high-frequency amplifiers of a plasma power supply and plasma power supply |
| 07/17/2014 | DE112008000095B4 Verfahren zum Schutz von Hochfrequenzverstärkern einer Plasmaversorgungseinrichtung und Plasmaversorgungseinrichtung A method for protecting high-frequency amplifiers of a plasma power supply and plasma power supply |
| 07/17/2014 | DE102013112861A1 Magnetronanordnung und Target für eine Magnetronanordnung Magnetron and target for a magnetron |
| 07/17/2014 | DE102010040267B4 Sputtereinrichtung mit rohrförmigem Target Sputtering with a tubular target |
| 07/17/2014 | DE102009033546B4 Versorgungsendblock für ein rotierendes Magnetron Supply terminal block for a rotating magnetron |
| 07/16/2014 | EP2755226A1 Sample carrier for an electron microscope |
| 07/16/2014 | EP2755225A1 Electron-microscopic examination method for examining biosample while keeping said biosample unchanged, and composition for evaporation inhibition under vacuum, scanning electron microscope, and transmission electron microscope for use in said method |
| 07/16/2014 | EP2754729A2 Coating source and method for its preparation |
| 07/16/2014 | EP2754167A1 Plasma source |
| 07/16/2014 | EP2753418A2 Surface polymer coatings |
| 07/16/2014 | CN203721675U 用于加速染污硅橡胶材料表面憎水性迁移速率的放电装置 Silicone rubber material used to accelerate the soiled surface hydrophobicity migration rate of the discharge device |
| 07/16/2014 | CN203721674U 工艺腔室 Process chamber |
| 07/16/2014 | CN103930967A 用于等离子体浸没式离子注入机的控制模块 For plasma immersion ion implanter control module |
| 07/16/2014 | CN103930192A 表面聚合物涂层 Surface of the polymer coating |
| 07/16/2014 | CN103928286A 一种实现多个空心阴极稳定并联的工作电路及该工作电路的工作方法 Working method for implementing a plurality of hollow cathode stable parallel operation of the circuit and the operation of the circuit |
| 07/16/2014 | CN103928285A 等离子体处理方法和等离子体处理装置 The plasma processing method and a plasma processing apparatus |
| 07/16/2014 | CN103928284A 气体传输装置及其气体分流装置的测试方法 Test method means gas transmission apparatus and gas diversion |
| 07/16/2014 | CN103928283A 一种用于真空处理腔室的射频脉冲功率匹配的方法及其装置 A vacuum processing chamber RF pulse power matching method and apparatus for |
| 07/16/2014 | CN103928282A 一种离子注入样品台 An ion implantation sample stage |
| 07/16/2014 | CN103928281A 高压加速器的高压舱结构 High-pressure hyperbaric chamber structure accelerator |
| 07/16/2014 | CN103928280A 离子注入装置和离子注入装置的运转方法 Method of operating an ion implantation apparatus and an ion implantation apparatus |
| 07/16/2014 | CN103928279A 用于电子显微镜的样品载体 A sample carrier for the electron microscope |
| 07/16/2014 | CN103928278A 一种高能量电子枪 A high-energy electron gun |
| 07/16/2014 | CN103926260A 一种进行离子辐照实验的ecr-pecvd装置 Ecr-pecvd apparatus for ion irradiation experiments |
| 07/16/2014 | CN103925380A 一种优化等离子体均匀性的压力控制阀门及方法 An optimized plasma uniformity and method of pressure control valves |
| 07/16/2014 | CN103107056B 宽带离子束分析器 Broadband ion beam analyzer |
| 07/16/2014 | CN102762764B 具有减少的工具痕迹的用于均匀薄膜沉积的平行板反应器 Traces with reduced tool for uniform film deposition parallel plate reactor |
| 07/16/2014 | CN102479656B 真空管道式束流调节器 Evacuated Tube-type beam regulator |
| 07/16/2014 | CN102324365B 离子源、系统和方法 Ion source, the system and method |
| 07/15/2014 | US8781219 High accuracy beam placement for local area navigation |
| 07/15/2014 | US8780322 Object with an improved suitability for a plasma cleaning treatment |
| 07/15/2014 | US8780193 Physical properties measuring method and apparatus |
| 07/15/2014 | US8779399 Electrostatic deflector, lithography apparatus, and method of manufacturing device |
| 07/15/2014 | US8779397 Substrate cover and charged particle beam writing method using same |
| 07/15/2014 | US8779395 Automatic control system for selection and optimization of co-gas flow levels |
| 07/15/2014 | US8779392 Charged particle beam lithography system and target positioning device |
| 07/15/2014 | US8779379 Acquisition method of charged particle beam deflection shape error and charged particle beam writing method |
| 07/15/2014 | US8779378 Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector |
| 07/15/2014 | US8779376 Determination of emission parameters from field emission sources |
| 07/15/2014 | US8779360 Charged particle beam device, defect observation device, and management server |
| 07/15/2014 | US8779359 Defect review apparatus and defect review method |
| 07/15/2014 | US8779357 Multiple image metrology |
| 07/15/2014 | US8779351 Ion source employing secondary electron generation |
| 07/15/2014 | US8778813 Confined process volume PECVD chamber |
| 07/15/2014 | US8778806 Method and apparatus for plasma dicing a semi-conductor wafer |
| 07/15/2014 | US8778465 Ion-assisted direct growth of porous materials |
| 07/15/2014 | US8776720 Linear-type microwave-excited plasma source using a slotted rectangular waveguide as the plasma exciter |