| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/14/2004 | EP1380044A1 Scanning electron microscope |
| 01/14/2004 | EP1379710A1 Variable efficiency faraday shield |
| 01/14/2004 | CN1468444A 真空处理装置 Vacuum processing apparatus |
| 01/14/2004 | CN1468440A System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 01/14/2004 | CN1135061C Electron current speeding up method and equipment |
| 01/14/2004 | CN1134819C Method and equipment for ion implantation |
| 01/13/2004 | US6678081 Light scanning system |
| 01/13/2004 | US6677828 Method of hot switching a plasma tuner |
| 01/13/2004 | US6677712 Gas distribution plate electrode for a plasma receptor |
| 01/13/2004 | US6677711 Plasma processor method and apparatus |
| 01/13/2004 | US6677629 Electric or electronic component and application as non volatile memory and device with surface acoustic waves |
| 01/13/2004 | US6677599 System and method for uniformly implanting a wafer with an ion beam |
| 01/13/2004 | US6677598 Beam uniformity and angular distribution measurement system |
| 01/13/2004 | US6677595 Specimen holder and spacer used in the same |
| 01/13/2004 | US6677594 Scanning wheel for ion implantation process chamber |
| 01/13/2004 | US6677592 Deflection lens device for electron beam lithography |
| 01/13/2004 | US6677587 Electron beam apparatus, and inspection instrument and inspection process thereof |
| 01/13/2004 | US6677585 Scanning charged particle microscope, and focal distance adjusting method and astigmatism correction method thereof |
| 01/13/2004 | US6677581 High energy electron diffraction apparatus |
| 01/13/2004 | US6677567 Scanning probe microscope with improved scan accuracy, scan speed, and optical vision |
| 01/13/2004 | US6677549 Plasma processing apparatus having permeable window covered with light shielding film |
| 01/13/2004 | US6677214 Semiconductor device and method of fabricating the same |
| 01/13/2004 | US6677089 Charged particle beam exposure method with performing proximity effect correction by adjusting widths of patterns included in block pattern formed on a mask |
| 01/13/2004 | US6677001 Electron cyclotron resonance chemical vapor deposition (ecr cvd) has attracted the interests of researchers as a new method of manufacturing thin films, particularly amorphous thin films |
| 01/13/2004 | US6676812 Alignment mark shielding ring without arcing defect and method for using |
| 01/13/2004 | US6676803 Semiconductor device fabricating equipment using radio frequency energy |
| 01/13/2004 | US6676802 Remote exposure of workpieces using a plasma |
| 01/13/2004 | US6676800 Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation |
| 01/13/2004 | US6675816 Parallel flat plate |
| 01/13/2004 | US6675737 Plasma processing apparatus |
| 01/08/2004 | WO2004003990A1 Method of manufacturing cmos devices by the implantation of n- and p-type cluster ions and negative ions |
| 01/08/2004 | WO2004003983A1 Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas |
| 01/08/2004 | WO2004003973A2 Ion implantation device and method |
| 01/08/2004 | WO2004003968A2 Method and system for arc suppression in a plasma processing system |
| 01/08/2004 | WO2004003963A2 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 01/08/2004 | WO2004003962A2 Thermal sprayed yttria-containing coating for plasma reactor |
| 01/08/2004 | WO2004003252A1 Multi-component substances and processes for preparation thereof |
| 01/08/2004 | WO2003088299A3 A method of implanting a substrate and an ion implanter for performing the method |
| 01/08/2004 | WO2003075299A3 Device for detecting charged particles and photons |
| 01/08/2004 | WO2003071578A3 Material treating system, material treating method and corresponding gas supply |
| 01/08/2004 | WO2003070998A8 Method and apparatus for ion beam coating |
| 01/08/2004 | US20040005745 Doping method, doping apparatus, and control system for doping apparatus |
| 01/08/2004 | US20040005726 Plasma chamber equipped with temperature-controlled focus ring and method of operating |
| 01/08/2004 | US20040004773 Reducing chromatic aberration in images formed by emmission electrons |
| 01/08/2004 | US20040004708 Method and system for data handling, storage and manipulation |
| 01/08/2004 | US20040004426 Colour picture tube and deflection system with improved imaging properties |
| 01/08/2004 | US20040004195 Mask inspecting apparatus |
| 01/08/2004 | US20040004192 Aberration-corrected charged-particle optical apparatus |
| 01/08/2004 | US20040004062 Plasma-assisted joining |
| 01/08/2004 | US20040003898 Apparatus for manufacturing semiconductor device |
| 01/08/2004 | US20040003897 Plasma stabilization method and plasma apparatus |
| 01/08/2004 | US20040003896 Controller for plasma processing apparatus performing good etching process |
| 01/08/2004 | US20040003771 Deposition methods and apparatus |
| 01/08/2004 | US20040003666 Specimen holding apparatus |
| 01/08/2004 | DE20316631U1 Plasma generation arrangement has hollow conductor into which microwaves are supplied and has tube with ring groove provided in conductor through which gas for plasma generation is conducted |
| 01/08/2004 | DE10245392B3 Rohrförmige Hohlkathode für hohe elektrische Leistungen A tubular hollow cathode for high electrical power |
| 01/08/2004 | DE10227048A1 Vorrichtung zur Beschichtung von Substraten mittels physikalischer Dampfabscheidung über den Hohlkathodeneffekt A device for coating substrates by means of physical vapor deposition over the hollow cathode effect |
| 01/08/2004 | DE10224991A1 Verfahren und Einrichtung zur Reduzierung der Zündspannung von Plasmen Method and apparatus for reducing the ignition voltage of plasmas |
| 01/07/2004 | EP1378929A1 Cooling for plasma reactor |
| 01/07/2004 | EP1378927A1 Color display tube and deflection system with improved imaging properties |
| 01/07/2004 | EP1378000A2 Conductive collar surrounding semiconductor workpiece in plasma chamber |
| 01/07/2004 | EP1377999A1 Inductively coupled plasma source with controllable power distribution |
| 01/07/2004 | EP1377794A1 Improved scanning probe microscope |
| 01/07/2004 | CN1466771A An atmospheric pressure plasma assembly |
| 01/07/2004 | CN1466770A An apparatus for the backside gas cooling of a wafer in a batch ion implantation system |
| 01/06/2004 | US6675368 Apparatus for and method of preparing pattern data of electronic part |
| 01/06/2004 | US6675137 Method of data compression using principal components analysis |
| 01/06/2004 | US6674241 Plasma processing apparatus and method of controlling chemistry |
| 01/06/2004 | US6674086 Electron beam lithography system, electron beam lithography apparatus, and method of lithography |
| 01/06/2004 | US6674085 Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems |
| 01/06/2004 | US6674078 Differential contrast transmission electron microscope and method of processing data about electron microscope images |
| 01/06/2004 | US6674077 Microelectromechanical system assembly and testing device |
| 01/06/2004 | US6674075 Charged particle beam apparatus and method for inspecting samples |
| 01/06/2004 | US6674073 Scattering target-holding mechanism and an electron spin analyzer |
| 01/06/2004 | US6674063 Photosensor with a photocathode in reflective mode |
| 01/06/2004 | US6673724 Pulsed-mode RF bias for side-wall coverage improvement |
| 01/06/2004 | US6673722 Microwave enhanced CVD system under magnetic field |
| 01/06/2004 | US6673636 Method of real-time plasma charging voltage measurement on powered electrode with electrostatic chuck in plasma process chambers |
| 01/06/2004 | US6673221 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
| 01/06/2004 | US6673200 Method of reducing process plasma damage using optical spectroscopy |
| 01/06/2004 | US6673199 Shaping a plasma with a magnetic field to control etch rate uniformity |
| 01/06/2004 | US6673198 Semiconductor processing equipment having improved process drift control |
| 01/06/2004 | US6673196 Plasma processing apparatus |
| 01/02/2004 | EP1377138A1 Device and control method for micro wave plasma processing |
| 01/02/2004 | EP1376670A1 Plasma processing device |
| 01/02/2004 | EP1376669A1 Plasma processing device |
| 01/02/2004 | EP1376668A1 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 01/02/2004 | EP1376650A1 Scanning atom probe and analysis method using scanning atom probe |
| 01/02/2004 | EP1376649A1 Magnetic field applying sample observing system |
| 01/02/2004 | EP1375698A1 Sputter device |
| 01/02/2004 | EP1374294A2 Fabrication of high resistivity structures using focused ion beams |
| 01/02/2004 | EP1374277A1 Inductive plasma processor including current sensor for plasma excitation coil |
| 01/02/2004 | EP1374276A2 Plasma surface treatment method and device for carrying out said method |
| 01/02/2004 | EP1374275A2 Ion source filament |
| 01/02/2004 | EP1374270A2 Device for generating an ion beam |
| 01/02/2004 | EP1373594A1 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
| 01/02/2004 | EP1372897A2 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
| 01/01/2004 | US20040002221 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 01/01/2004 | US20040002202 Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions |
| 01/01/2004 | US20040002173 Apparatus and method for interlocking a power supply to ion implantation equipment, method and apparatus for generating an interlocking signal, method and apparatus for interrupting an ion implantation process, and an interlocking system |