| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/29/2004 | US20040016402 Methods and apparatus for monitoring plasma parameters in plasma doping systems |
| 01/29/2004 | DE10230929A1 Verfahren zum elektronenmikroskopischen Beobachten einer Halbleiteranordnung und Vorrichtung hierfür A method for electron microscopic observation of a semiconductor device and apparatus therefor |
| 01/29/2004 | CA2493279A1 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases |
| 01/28/2004 | EP1385193A2 Objective lens for an electron microscopy system, and electron microscopy system |
| 01/28/2004 | EP1385192A2 Device working with beams of charged particles |
| 01/28/2004 | EP1384395A1 Production of nanocrystal beams |
| 01/28/2004 | EP1384257A2 Ionized pvd with sequential deposition and etching |
| 01/28/2004 | EP1114201B1 Device and method for the vacuum plasma processing of objects |
| 01/28/2004 | CN1471727A Etching of high aspect ratio features in a substrate |
| 01/28/2004 | CN1470947A Proximity effect correction method of electronic beam exposure and use thereof |
| 01/28/2004 | CN1136011C Method and apparatus for inactivating contaminants inbiological fluid |
| 01/27/2004 | US6683425 Null-field magnetron apparatus with essentially flat target |
| 01/27/2004 | US6683320 Through-the-lens neutralization for charged particle beam system |
| 01/27/2004 | US6683317 Electrically insulating vacuum coupling |
| 01/27/2004 | US6683316 Apparatus for correlating an optical image and a SEM image and method of use thereof |
| 01/27/2004 | US6683311 Deployable particle collector for space particle instruments |
| 01/27/2004 | US6683307 Scanning type charged particle beam microscope |
| 01/27/2004 | US6682637 Magnetron sputter source |
| 01/27/2004 | US6682634 Apparatus for sputter deposition |
| 01/27/2004 | US6682630 Uniform gas distribution in large area plasma source |
| 01/27/2004 | US6682627 Process chamber having a corrosion-resistant wall and method |
| 01/22/2004 | WO2004008816A2 Method and device for substrate etching with very high power inductively coupled plasma |
| 01/22/2004 | WO2004008508A1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 01/22/2004 | WO2004008502A2 Multirate processing for metrology of plasma rf source |
| 01/22/2004 | WO2004008479A2 Vacuum sputtering cathode |
| 01/22/2004 | WO2004008478A2 Cathode for vacuum sputtering treatment machine |
| 01/22/2004 | WO2004008477A2 Heating jacket for plasma etching reactor, and etching method using same |
| 01/22/2004 | WO2004008476A1 Controlling the characteristics of ribbon-shaped implanter ion-beams |
| 01/22/2004 | WO2004008475A1 Ion beam device and ion beam processing method, and holder member |
| 01/22/2004 | WO2004008255A2 Method and apparatus for measuring critical dimensions with a particle beam |
| 01/22/2004 | WO2004007791A1 Target support assembly |
| 01/22/2004 | WO2003058671A3 Target end station for the combinatory ion implantation and method of ion implantation |
| 01/22/2004 | US20040014325 Plasma etching equipment |
| 01/22/2004 | US20040013949 Electron beam exposure-use mask and electron beam exposure method |
| 01/22/2004 | US20040013820 Method for making films utilizing a pulsed laser for ion injection and deposition |
| 01/22/2004 | US20040012765 Electron beam exposure apparatus and semiconductor device manufacturing method |
| 01/22/2004 | US20040012320 Process for structural modification of surfaces by treatment with an atomic or molecular gaseous medium excited to metastable level |
| 01/22/2004 | US20040012319 Rf loaded line type capacitive plasma source for broad range of operating gas pressure |
| 01/22/2004 | US20040011966 Energy beam exposure method and exposure apparatus |
| 01/22/2004 | US20040011964 Focused ion beam apparatus |
| 01/22/2004 | US20040011959 Scanning electron microscope |
| 01/22/2004 | US20040011770 Method of and structure for controlling electrode temperature |
| 01/22/2004 | US20040011641 For forming a high density thin film; efficiency |
| 01/22/2004 | US20040011640 Using electric field for partially ionizing process gas; accelerating ionized gas toward target region, ejecting target constituents and partially depositing ejected target constituents on substrate region; generating magnetic field |
| 01/22/2004 | US20040011467 Materials and gas chemistries for processing systems |
| 01/22/2004 | US20040011466 Plasma processing apparatus |
| 01/22/2004 | US20040011465 Plasma Processing apparatus |
| 01/22/2004 | US20040011464 Promotion of independence between degree of dissociation of reactive gas and the amount of ionization of dilutant gas via diverse gas injection |
| 01/22/2004 | US20040011291 Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained |
| 01/22/2004 | US20040011290 Apparatus and process for forming deposited film |
| 01/22/2004 | US20040011289 Laser CVD device and laser CVD method |
| 01/21/2004 | EP1383359A2 Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG) |
| 01/21/2004 | EP1383158A2 Charged-particle beam lens |
| 01/21/2004 | EP1383157A2 Electron beam exposure apparatus and semiconductor device manufacturing method |
| 01/21/2004 | EP1382711A1 Arc evaporator with a powerful magnetic guide for targets having a large surface area |
| 01/21/2004 | EP1382411A2 Method of measuring the intensity profile of an electron beam, particularly of a beam of an electron beam processing device, and/or measuring of an optics for an electron beam and/or adjusting of an optics for an electron beam, measuring structure for such a method and electron beam processing device |
| 01/21/2004 | EP1123558B1 Schottky emitter having extended life |
| 01/21/2004 | EP0692138B1 Reactive dc sputtering system |
| 01/21/2004 | CN1469200A Electronic photoetching equipment with pattern emitter |
| 01/21/2004 | CN1135910C Method and apparatus for trigger-igniting CVD plasma |
| 01/21/2004 | CN1135603C Charged particle beam photoetching device and photoetching process of charged particle beam |
| 01/21/2004 | CN1135569C Method for measuring distribution of charged particle beam and its relative method |
| 01/20/2004 | US6680481 Mark-detection methods and charged-particle-beam microlithography methods and apparatus comprising same |
| 01/20/2004 | US6680474 Semiconductor calibration wafer with no charge effect |
| 01/20/2004 | US6680455 Plasma resistant quartz glass jig |
| 01/20/2004 | US6679981 Inductive plasma loop enhancing magnetron sputtering |
| 01/20/2004 | US6679976 System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals |
| 01/20/2004 | US6679675 Method and apparatus for processing wafers |
| 01/20/2004 | US6678932 Fixture for assembling parts of a device such as a Wien filter |
| 01/15/2004 | WO2004006320A1 Plasma processing apparatus |
| 01/15/2004 | WO2004006319A1 Plasma processing equipment |
| 01/15/2004 | WO2004006307A1 Electron beam exposure method and system therefor |
| 01/15/2004 | WO2004006298A2 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 01/15/2004 | WO2004006285A1 Method and apparatus for non-invasive measurement and analysis of plasma parameters |
| 01/15/2004 | WO2004006284A1 Method and apparatus for non-invasive measurement and analys of semiconductor plasma parameters |
| 01/15/2004 | WO2004006283A1 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 01/15/2004 | WO2004006280A2 Method and apparatus for reducing cross contamination of species during ion impl antation |
| 01/15/2004 | WO2004006189A1 Imaging apparatus and method |
| 01/15/2004 | WO2004005574A2 Rotary target and method for onsite mechanical assembly of rotary target |
| 01/15/2004 | WO2003065766A3 Heating in a vacuum atmosphere in the presence of a plasma |
| 01/15/2004 | WO2003062862A3 Phase transition thermometer for use in microcalorimeter for detecting x-rays |
| 01/15/2004 | WO2003056601A3 Apparatus and method for treating a workpiece using plasma generated from microwave radiation |
| 01/15/2004 | WO2003026364A8 Plasma processor coil |
| 01/15/2004 | US20040009617 Plasma etching apparatus and plasma etching method |
| 01/15/2004 | US20040008336 Method and system of determining chamber seasoning condition by optical emission |
| 01/15/2004 | US20040008330 Electrostatically driven lithography |
| 01/15/2004 | US20040007985 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| 01/15/2004 | US20040007984 Multirate processing for metrology of plasma rf source |
| 01/15/2004 | US20040007680 Electron beam lithography apparatus using a patterned emitter |
| 01/15/2004 | US20040007679 Rotating beam ion implanter |
| 01/15/2004 | US20040007678 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 01/15/2004 | US20040007560 Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor |
| 01/15/2004 | US20040007455 Arc-coating process with rotating cathodes |
| 01/15/2004 | US20040007326 Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments |
| 01/15/2004 | US20040007247 Plasma film-forming apparatus and cleaning method for the same |
| 01/15/2004 | US20040007182 Plasma processing apparatus |
| 01/15/2004 | DE10043748B4 Zylinderförmiges Sputtertarget, Verfahren zu seiner Herstellung und Verwendung Cylindrical sputtering target, process for its preparation and use |
| 01/14/2004 | EP1381257A2 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| 01/14/2004 | EP1381074A2 Method and apparatus for observing a semiconductor device using an electron microscope |
| 01/14/2004 | EP1381073A1 Aberration-corrected charged-particle optical apparatus |