| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/12/2004 | DE10233567A1 Device for generating pulsed plasma in vacuum chamber with solid state target has at least one debris stop that rotates about axis between optical element or substrate and plasma in vacuum chamber |
| 02/12/2004 | DE10233002A1 Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem Objective lens for an electron system and electron microscopy system |
| 02/11/2004 | EP1388885A2 Cathodic arc shielding |
| 02/11/2004 | EP1388884A2 Electron beam proximity exposure apparatus |
| 02/11/2004 | EP1388883A2 Coaxial FIB-SEM column |
| 02/11/2004 | EP1388882A2 Particle-optical systems |
| 02/11/2004 | EP1388836A1 Electromagnetic wave shielding light-transmitting window member, its manufacturing method, and display panel |
| 02/11/2004 | EP1388161A2 Device and method for coating and/or treating the surfaces of substrates using low-pressure plasma |
| 02/11/2004 | EP1388159A1 Magnetic mirror plasma source |
| 02/11/2004 | EP1387897A1 Electrode arrangement for the plasma-supported magnetically-guided deposition of thin layers in vacuo |
| 02/11/2004 | CN1474882A Method and device for atmospheric plasma processing |
| 02/11/2004 | CN1474433A Correcting method for astigmatism of scanning electronic microscope |
| 02/11/2004 | CN1474236A Cross mark keeping method, cross mark keeping device and exposure device |
| 02/10/2004 | US6690022 Ion beam incidence angle and beam divergence monitor |
| 02/10/2004 | US6690010 Chemical analysis of defects using electron appearance spectroscopy |
| 02/10/2004 | US6690009 Method of determining the charge carrier concentration in materials, notably semiconductors |
| 02/10/2004 | US6689984 Susceptor with built-in electrode and manufacturing method therefor |
| 02/10/2004 | US6689699 Wherein gas is introduced into a vacuum chamber for treating a substrate to be processed |
| 02/10/2004 | US6689520 Exposure method for correcting dimension variation in electron beam lithography |
| 02/10/2004 | US6689254 Replaceable sputtering target with annular projecting rim having forward facing front edge forming vacuum tight seal with sputtering chamber, rearward facing rear edge having fluid sealing surface surrounding cooling fluid cavity |
| 02/10/2004 | US6689253 Facing target assembly and sputter deposition apparatus |
| 02/10/2004 | US6689249 Shield or ring surrounding semiconductor workpiece in plasma chamber |
| 02/10/2004 | US6688604 Sealing mechanism for sealing a vacuum chamber |
| 02/10/2004 | US6688017 Method and apparatus for aligning an extraction electrode to an arc chamber |
| 02/05/2004 | WO2004012483A1 Inductively coupled plasma generator having lower aspect ratio |
| 02/05/2004 | WO2004012251A1 Plasma processing apparatus and plasma processing method |
| 02/05/2004 | WO2004012235A2 Atmospheric pressure plasma processing reactor |
| 02/05/2004 | WO2004012229A2 Reduced volume, high conductance process chamber |
| 02/05/2004 | WO2004012221A2 Method for adjusting voltage on a powered faraday shield |
| 02/05/2004 | WO2004012220A2 Methods and apparatus for monitoring plasma parameters in plasma doping systems |
| 02/05/2004 | WO2004012219A1 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 02/05/2004 | WO2003068399A3 Phase plate for electron microscopy and electron microscopic imaging |
| 02/05/2004 | US20040023513 Method for manufacturing semiconductor device, substrate treater, and substrate treatment system |
| 02/05/2004 | US20040023047 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof |
| 02/05/2004 | US20040022429 Scanning microscope and inspection method employing the scanning microscope |
| 02/05/2004 | US20040021095 Electron beam writing equipment |
| 02/05/2004 | US20040021094 Measuring plasma uniformity in-situ at wafer level |
| 02/05/2004 | US20040021092 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 02/05/2004 | US20040021076 Contact opening metrology |
| 02/05/2004 | US20040021074 Scanning charged particle microscope |
| 02/05/2004 | US20040020770 Auxiliary electromagnets in a magnetron sputter reactor |
| 02/05/2004 | US20040020769 High purity sputter targets with target end-of-life indication and method of manufacture |
| 02/05/2004 | US20040020768 Asymmetric rotating sidewall magnet ring for magnetron sputtering |
| 02/05/2004 | US20040020760 Pulsed highly ionized magnetron sputtering |
| 02/05/2004 | US20040020759 Sputtering cathode adapter assembly and method |
| 02/05/2004 | US20040020439 Process chamber window assembly |
| 02/05/2004 | US20040020433 Multi-inlet PFS arc chamber for hi-current implanter |
| 02/05/2004 | US20040020432 Plasma cvd apparatus and method |
| 02/05/2004 | US20040020431 Plasma treatment apparatus |
| 02/05/2004 | DE10232689A1 Mit Strahlen geladener Teilchen arbeitende Anwendungen With charged particle beams working applications |
| 02/05/2004 | DE10232230A1 Verfahren zum Vermessen des Intensitätsprofils eines Elektronenstrahls, insbesondere eines Strahls eines Elektronenstrahlbearbeitungsgeräts, und/oder zum Vermessen einer Optik für einen Elektronenstrahl und/oder zum Justieren einer Optik für einen Elektronenstrahl, Meßstruktur für ein solches Verfahren und Elektronenstrahlbearbeitungsgerät A method of measuring the intensity profile of an electron beam, particularly a beam of an electron beam machining apparatus, and / or for measuring an optical system for an electron beam and / or for adjusting an optical system for an electron beam, measuring structure for such a method and electron beam machining device |
| 02/05/2004 | DE10232179A1 PVD-Verfahren und PVD-Vorrichtung PVD method and PVD device |
| 02/05/2004 | DE10231203A1 Targetträgeranordnung Target support assembly |
| 02/04/2004 | EP1387389A2 Multi-electron beam exposure method and apparatus |
| 02/04/2004 | EP1387388A2 Image compensation device for a scanning electron microscope |
| 02/04/2004 | EP1386522A1 Rf power process apparatus and methods |
| 02/04/2004 | EP1386342A2 Deflection system for a particle beam device |
| 02/04/2004 | EP1386019A1 Apparatus and method for epitaxial sputter deposition of multi-compound magnetic epilayers with high deposition rate |
| 02/04/2004 | EP0958591B1 Environmental sem with a magnetic field for improved secondary electron detection |
| 02/04/2004 | CN1473349A System and method for removing contaminant particles relative to ion beam |
| 02/04/2004 | CN1473348A Bulk gas delivery system for ion implanters |
| 02/04/2004 | CN1473347A System and method for removing particles entrained in ion beam |
| 02/04/2004 | CN1473346A Electrostatic trap for particles entrained in ion beam |
| 02/03/2004 | US6687013 Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus |
| 02/03/2004 | US6686601 Ion sources for ion implantation apparatus |
| 02/03/2004 | US6686600 TEM sample slicing process |
| 02/03/2004 | US6686599 Ion production device for ion beam irradiation apparatus |
| 02/03/2004 | US6686597 Substrate rotating device, and manufacturing method and apparatus of recording medium master |
| 02/03/2004 | US6686596 System and method of irradiating products being conveyed past an electron beam delivery device |
| 02/03/2004 | US6686591 Apparatus for inspecting mask |
| 02/03/2004 | US6686590 Low-vacuum scanning electron microscope |
| 02/03/2004 | US6685847 Method for observing cross-sectional structure of sample |
| 02/03/2004 | US6685803 Plasma treatment of processing gases |
| 02/03/2004 | US6685800 Apparatus for generating inductively coupled plasma |
| 02/03/2004 | US6685799 Variable efficiency faraday shield |
| 02/03/2004 | US6685798 Plasma reactor having a symmetrical parallel conductor coil antenna |
| 02/03/2004 | US6685797 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge |
| 01/29/2004 | WO2004010746A1 Plasma processing device and controlling method therefor |
| 01/29/2004 | WO2004010458A2 Plasma implantation system and method with target movement |
| 01/29/2004 | WO2004010457A1 Method and apparatus for producing uniform processing rates |
| 01/29/2004 | WO2004010456A1 Plasma processing apparatus and plasma processing method |
| 01/29/2004 | WO2004010455A2 Ion beam source with coated electrode |
| 01/29/2004 | WO2004010454A2 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases |
| 01/29/2004 | WO2004010151A2 Method and system for electron density measurement |
| 01/29/2004 | WO2003097892A3 System and apparatus for control of sputter deposition process |
| 01/29/2004 | WO2003077278A3 Ion-implantation device |
| 01/29/2004 | WO2003052801A3 Wafer pad assembly |
| 01/29/2004 | US20040018740 Flat style coil for improved precision etch uniformity |
| 01/29/2004 | US20040018320 Method of manufacturing a device |
| 01/29/2004 | US20040018303 Temperature control by a radiation reflectors that can be moved within the chamber to increase and decrease the amount of reflective heat; depositing a ceramic coatings on gas turbine engine for heat resistance |
| 01/29/2004 | US20040018127 Comprises segmented chuck including segmented electrodes isolated from each other by insulating connections, and radio frequency drivers |
| 01/29/2004 | US20040017157 Method of and apparatus for performing circuit-processing, method of and apparatus for controlling the motion of the circuit-processing performing apparatus, and information storage medium |
| 01/29/2004 | US20040016893 Real time monitor method and system for extraction electrode |
| 01/29/2004 | US20040016888 Semiconductor device inspecting apparatus |
| 01/29/2004 | US20040016882 Scanning electron microscope |
| 01/29/2004 | US20040016881 Image compensation device for a scanning electron microscope |
| 01/29/2004 | US20040016876 Method of etching semiconductor device using neutral beam and apparatus for etching the same |
| 01/29/2004 | US20040016640 Ion beam source with coated electrode(s) |
| 01/29/2004 | US20040016508 Plasma etching apparatus and plasma etching method |
| 01/29/2004 | US20040016406 Plasma processing comprising three rotational motions of an article being processed |