| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/03/2004 | EP1166324B1 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 03/03/2004 | EP0966752B1 Correction device for correcting the lens defects in particle-optical apparatus |
| 03/03/2004 | CN1479937A Arc electrodes for synthesis of carbon nanostructures |
| 03/03/2004 | CN1479936A Wafer area pressure control for plasma confinement |
| 03/03/2004 | CN1479805A Thin film forming method and film forming device |
| 03/03/2004 | CN1479683A Production device for DLC film-coated plastic container and production method therefor |
| 03/03/2004 | CN1479175A Method for etching surface material with induced chemical reaction by focused electron beam on surface |
| 03/03/2004 | CN1141009C Plasma processing device and plasma processing mehtod using said device |
| 03/03/2004 | CN1140913C Workpiece vibration damper |
| 03/03/2004 | CN1140816C System and method for detecting neutral particles in ion beam |
| 03/03/2004 | CN1140767C Probe scanning device for probe microscope |
| 03/03/2004 | CN1140367C Process for preparing nm-material by dual-glow discharge of hollow cathodes |
| 03/02/2004 | US6701202 Performance evaluation method for plasma processing apparatus |
| 03/02/2004 | US6700458 Device and method for coupling two circuit components which have different impedances |
| 03/02/2004 | US6700127 Point source for producing electrons beams |
| 03/02/2004 | US6700122 Wafer inspection system and wafer inspection process using charged particle beam |
| 03/02/2004 | US6700092 Pulsing intelligent RF modulation controller |
| 03/02/2004 | US6700090 Plasma processing method and plasma processing apparatus |
| 03/02/2004 | US6700089 Plasma processing device, its maintenance method, and its installation method |
| 03/02/2004 | US6699639 Projection-exposure methods and apparatus exhibiting increased throughput |
| 03/02/2004 | US6699530 Method for constructing a film on a semiconductor wafer |
| 03/02/2004 | US6699375 Method of extending process kit consumable recycling life |
| 03/02/2004 | US6699374 Low temperature cathodic magnetron sputtering |
| 03/02/2004 | CA2323255C Gas shower unit for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus |
| 02/26/2004 | WO2004017684A1 Plasma processing device |
| 02/26/2004 | WO2004017389A2 Method for performing real time arcing detection |
| 02/26/2004 | WO2004017368A2 Sidewall smoothing in high aspect ratio/deep etching using a discreet gas switching method |
| 02/26/2004 | WO2004017356A2 Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes |
| 02/26/2004 | WO2004017355A1 Multi-column multi-beam inspection system |
| 02/26/2004 | WO2003104848A3 Methods for sem inspection of fluid containing samples |
| 02/26/2004 | WO2003064059A3 Integration of titanium and titanium nitride layers |
| 02/26/2004 | WO2003040828A3 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography |
| 02/26/2004 | WO2003036679A3 Wafer pedestal tilt mechanism and cooling system |
| 02/26/2004 | WO2002043103A8 Extraction and deceleration of low energy beam with low beam divergence |
| 02/26/2004 | US20040038551 Method for controlling the temperature of a gas distribution plate in a process reactor |
| 02/26/2004 | US20040038548 System for, and method of, etching a surface on a wafer |
| 02/26/2004 | US20040038539 Reticle for creating resist-filled vias in a dual damascene process |
| 02/26/2004 | US20040038505 Ion implantation method, SOI wafer manufacturing method and ion implantation system |
| 02/26/2004 | US20040038504 Ion implantation method and method for manufacturing SOI wafer |
| 02/26/2004 | US20040038033 Dlc layer system and method for producing said layer system |
| 02/26/2004 | US20040037973 Deposition and chamber treatment methods |
| 02/26/2004 | US20040037971 Supplies plasma processing gas into chamber, sets pressure to preset value, generates plasma by capacitatively coupled discharge, emission of electromagnetic wave by radio frequency displacement current and forming magnetic field |
| 02/26/2004 | US20040036489 Electron microscopic inspection apparatus |
| 02/26/2004 | US20040036398 MEMS-based two-dimensional e-beam nano lithography device and method for making the same |
| 02/26/2004 | US20040036397 Capillary discharge plasma apparatus and method for surface treatment using the same |
| 02/26/2004 | US20040036040 Writing methodology to reduce write time, and system for performing same |
| 02/26/2004 | US20040036038 Method and apparatus for plasma doping |
| 02/26/2004 | US20040036032 Focused electron and ion beam systems |
| 02/26/2004 | US20040036031 Particle beam system having a mirror corrector |
| 02/26/2004 | US20040036030 Charged-particle beam apparatus equipped with aberration corrector |
| 02/26/2004 | US20040036021 Scanning electron microscope |
| 02/26/2004 | US20040035837 Addition of power at selected harmonics of plasma processor drive frequency |
| 02/26/2004 | US20040035698 Friction fit target assembly for high power sputtering operation |
| 02/26/2004 | US20040035697 Cathodic sputtering metal backing plate |
| 02/26/2004 | US20040035692 Sputtering process comprising impressing DC magnetic field of first magnetic polarity parallel to central axis, injecting sputter working gas into chamber, electrically biasing target to excite working gas into plasma for sputtering, RF biasing |
| 02/26/2004 | US20040035532 Etching apparatus for use in manufacturing a semiconductor device and shield ring for upper electrode thereof |
| 02/26/2004 | US20040035531 Apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 02/26/2004 | US20040035530 Sheet-fed treating device |
| 02/26/2004 | US20040035529 Monitoring a process and compensating for radiation source fluctuations |
| 02/26/2004 | US20040035365 Plasma processing apparatus |
| 02/26/2004 | US20040035364 Plasma processing apparatus and method for asssembling the plasma processing apparatus |
| 02/26/2004 | US20040035361 Apparatus and method for forming deposited film |
| 02/26/2004 | DE10329250A1 Verfahren und Vorrichtung zum Extrahieren dreidimensionaler räumlicher Daten eines Objektes unter Verwendung eines Elektronenmikroskops Method and apparatus for extracting three-dimensional spatial data of an object using an electron microscope |
| 02/26/2004 | DE10326136A1 Entladungsplasma-Bearbeitungsanlage mit magnetischer neutraler Linie Discharge plasma processing system with magnetic neutral line |
| 02/26/2004 | DE10326135A1 Entladungsplasma-Bearbeitungsanlage Discharge plasma processing system |
| 02/26/2004 | DE10257147A1 Power supply apparatus for plasma generating device, has power conversion circuit with amplifier circuit including switching units and load impedance conversion circuit to alter load impedance to delayed load |
| 02/26/2004 | DE10237141A1 Strahlführungssystem, Abbildungsverfahren und Elektronenmikroskopiesystem Beam guidance system, imaging techniques and electron microscopy system |
| 02/26/2004 | DE10237135A1 Teilchenoptische Vorrichtung und Verfahren zum Betrieb derselben Particle-optical apparatus and method for operating the same |
| 02/26/2004 | DE10236738A1 Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren Electron system and electron microscopy methods |
| 02/26/2004 | DE10235981A1 Teilchenoptische Vorrichtung und Elektronenmikroskop A particle-optical and electron microscope |
| 02/26/2004 | DE10235456A1 Elektronenmikroskopiesystem Electron system |
| 02/25/2004 | EP1391911A1 Microwave plasma generator |
| 02/25/2004 | EP1390964A1 Dipole ion source |
| 02/25/2004 | EP1390558A1 Penning discharge plasma source |
| 02/25/2004 | CN1478291A Chamber configuration for confining plasma |
| 02/25/2004 | CN1477984A Ion implantation system and control method |
| 02/24/2004 | US6696793 Ion source |
| 02/24/2004 | US6696693 Electron beam irradiation apparatus and method |
| 02/24/2004 | US6696692 Process control methods for use with e-beam fabrication technology |
| 02/24/2004 | US6696689 Method and apparatus for avoiding driver gas contamination in an ion implanter gas supply module |
| 02/24/2004 | US6696688 Apparatus for magnetically scanning and/or switching a charged-particle beam |
| 02/24/2004 | US6696663 Inductively coupled plasma apparatus |
| 02/24/2004 | US6696662 Simple, economical and capable of atmospheric and sub-atmospheric pressure operation |
| 02/24/2004 | US6696362 Method for using an in situ particle sensor for monitoring particle performance in plasma deposition processes |
| 02/24/2004 | US6696108 Placing article to be processed in reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to the same high frequency electrode to generate plasma in reaction container |
| 02/24/2004 | US6695954 If a film consisting of only the sputtered material is to be formed on a substrate, then the gas within the chamber is nonreactive, on the other hand, a nitride or oxide film formed by chemical reaction of target and reactive gas |
| 02/24/2004 | US6695948 Plasma processing apparatus |
| 02/24/2004 | US6695318 Electronic device processing equipment having contact gasket between chamber parts |
| 02/24/2004 | US6694915 Plasma reactor having a symmetrical parallel conductor coil antenna |
| 02/24/2004 | CA2314922C Device for producing excited/ionized particles in a plasma |
| 02/19/2004 | WO2004016052A1 Generation of diffuse non-thermal atmospheric plasmas |
| 02/19/2004 | WO2004015861A1 Fixed matching network with increased match range capabilities |
| 02/19/2004 | WO2004015748A1 Method and device for alternating deposition of two materials by cathodic sputtering |
| 02/19/2004 | WO2004015742A2 High rate deposition in a batch reactor |
| 02/19/2004 | WO2004015738A1 Etch chamber with dual frequency biasing sources and a single frequency plasma generating source |
| 02/19/2004 | WO2004015737A1 Symmetric beamline and methods for generating a mass-analyzed ribbon ion beam |
| 02/19/2004 | WO2004015736A2 Low loss rf bias electrode for a plasma reactor with enhanced wafer edge rf coupling and highly efficient wafer cooling |
| 02/19/2004 | WO2004015735A2 Ion source and coaxial inductive coupler for ion implantation system |
| 02/19/2004 | WO2004015633A1 Method and apparatus for extracting three-dimensional spacial data of object using electron microscope |
| 02/19/2004 | WO2004015165A1 Improvements to showerheads |