| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/16/2004 | US6706142 Systems and methods for enhancing plasma processing of a semiconductor substrate |
| 03/16/2004 | US6706141 Device to generate excited/ionized particles in a plasma |
| 03/16/2004 | US6706138 Adjustable dual frequency voltage dividing plasma reactor |
| 03/16/2004 | US6705246 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 03/16/2004 | CA2294197C Device for the production of homogenous microwave plasma |
| 03/11/2004 | WO2004021748A1 Plasma processing system |
| 03/11/2004 | WO2004021427A1 Plasma processing method and plasma processing device |
| 03/11/2004 | WO2004021422A1 Processing device, mounting table, processing method |
| 03/11/2004 | WO2004021392A1 Gas tube end cap for a microwave plasma generator |
| 03/11/2004 | WO2004021391A1 Device with foil corrector for electron optical aberrations at low energy |
| 03/11/2004 | WO2003065424A3 Apparatus for cyclical deposition of thin films |
| 03/11/2004 | WO2003054911A8 Plasma process apparatus |
| 03/11/2004 | WO2003037386A3 Sterilization of articles using capillary discharge plasma |
| 03/11/2004 | WO2003015137A3 Pedestal with integral shield |
| 03/11/2004 | US20040048398 Mask repair with electron beam-induced chemical etching |
| 03/11/2004 | US20040048169 For use in irradiating a wafer with an electron beam for cell projection |
| 03/11/2004 | US20040046132 Anti-electron reflector arrangement |
| 03/11/2004 | US20040046125 Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method |
| 03/11/2004 | US20040046120 Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope |
| 03/11/2004 | US20040045934 System and method for determining endpoint in etch processes using partial least squares discriminant analysis in the time domain of optical emission spectra |
| 03/11/2004 | US20040045933 Plasma processing method using spectroscopic processing unit |
| 03/11/2004 | US20040045812 Magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil |
| 03/11/2004 | US20040045811 A metal vapor deposition reactor includes a primary reactor chamber having a primary chamber enclosure comprising a ceiling chamber having a primary chamber enclosure comprising a ceiling and side wall. A wafer support pedestal within the |
| 03/11/2004 | US20040045810 Forming a thin film from negatively charged sputtered ions. More specifically, a sputter deposition apparatus for forming a thin film on a substrate includes at least one sputter target comprised of a material for the thin film, an ion gun |
| 03/11/2004 | US20040045809 Sputtering target and method for making composite soft magnetic films with a sintered target |
| 03/11/2004 | US20040045675 Plasma etching apparatus |
| 03/11/2004 | US20040045674 Radial antenna and plasma device using it |
| 03/11/2004 | US20040045673 first removing a portion of polymer protective coating overlying the dielectric using a polymer selective chemical; and then removing a portion of the dielectric overlying the portion of the copper metal trace using a gas-assisted system activated with a dielectric selective non-copper reactive chemical |
| 03/11/2004 | US20040045672 Plasma device and plasma generating method |
| 03/11/2004 | US20040045670 Cooling system for magnetron sputtering apparatus |
| 03/11/2004 | US20040045669 Plasma processing method and apparatus |
| 03/11/2004 | US20040045508 Plasma cvd system |
| 03/11/2004 | US20040045507 Apparatus for plasma doping |
| 03/11/2004 | US20040045506 Inductive plasma processor method |
| 03/11/2004 | US20040045504 One of the layers is formed from a material produced by a redox reaction occurring in a deposited solution. |
| 03/11/2004 | DE4126216B4 Vorrichtung für Dünnschichtverfahren zur Behandlung großflächiger Substrate Apparatus for thin-film processes for the treatment of large area substrates |
| 03/11/2004 | DE10237297A1 Optical apparatus e.g. scanning electron microscope has controller which applies different excitation patterns to row of field source elements of lens assemblies |
| 03/10/2004 | EP1396873A1 Electron beam writing equipment |
| 03/10/2004 | EP1396872A1 Electron microscope and its focal point control method |
| 03/10/2004 | EP1396554A1 Plasma cvd apparatus |
| 03/10/2004 | EP0883892B1 Vacuum compatible linear motion device |
| 03/10/2004 | CN1481449A Injector and method for prolonged introduction of reagents into plasma |
| 03/10/2004 | CN1481207A Induction coupling plasma generater combined with two-layer coil antenna |
| 03/09/2004 | US6703784 Electrode design for stable micro-scale plasma discharges |
| 03/09/2004 | US6703630 Exposure method, electron beam exposure apparatus and fabrication method of electronic device |
| 03/09/2004 | US6703629 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 03/09/2004 | US6703628 Method and system for ion beam containment in an ion beam guide |
| 03/09/2004 | US6703627 Real time monitor method and system for extraction electrode |
| 03/09/2004 | US6703624 Multi-beam exposure apparatus using a multi-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device |
| 03/09/2004 | US6703623 Electron beam proximity exposure apparatus |
| 03/09/2004 | US6703614 Method for determining the distance of a near-field probe from a specimen surface to be examined, and near-field microscope |
| 03/09/2004 | US6703613 Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method |
| 03/09/2004 | US6703250 Method of controlling plasma etch process |
| 03/09/2004 | US6703092 Resin molded article for chamber liner |
| 03/09/2004 | US6703080 Method and apparatus for providing vhf high power radio frequency energy to plasma processing systems under severe non-linear load mismatch conditions |
| 03/09/2004 | US6702934 Pulsed arc molecular beam deposition apparatus and methodology |
| 03/09/2004 | US6702899 Vacuum processing apparatus |
| 03/09/2004 | US6702898 Deposited film forming apparatus |
| 03/09/2004 | CA2335526C Test slide for microscopes and method for the production of such a slide |
| 03/04/2004 | WO2004019398A1 Magnetron plasma-use magnetic field generation device |
| 03/04/2004 | WO2004019397A1 Plasma processing device |
| 03/04/2004 | WO2004019396A1 Plasma processing method and plasma processing device |
| 03/04/2004 | WO2004019381A2 Barrier coatings produced by atmospheric glow discharge |
| 03/04/2004 | WO2004019368A2 Reduced volume plasma reactor |
| 03/04/2004 | WO2003107375A3 Charged particle beam generator |
| 03/04/2004 | WO2003105182A3 Externally excited torroidal plasma source with magnetic control of ion distribution |
| 03/04/2004 | WO2003100806A9 Indirectly heated cathode ion source |
| 03/04/2004 | WO2003088445A3 Apparatus and method for arc detection |
| 03/04/2004 | WO2003081634A3 Tube magnetron |
| 03/04/2004 | WO2003032022A3 System and method for fast focal length alterations |
| 03/04/2004 | WO2002023583A9 Monitor system and method for semiconductor processes |
| 03/04/2004 | WO2002023582A9 Faraday system for ion implanters |
| 03/04/2004 | US20040044981 Reticle fabrication method |
| 03/04/2004 | US20040041508 Electrode and device using the same |
| 03/04/2004 | US20040041103 Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method |
| 03/04/2004 | US20040041101 Exposure apparatus |
| 03/04/2004 | US20040041094 Method of obtaining a particle-optical image of a sample in a particle-optical device |
| 03/04/2004 | US20040040940 Asymmetrical focus ring |
| 03/04/2004 | US20040040939 Inductively coupled plasma generating apparatus incorporating double-layered coil antenna |
| 03/04/2004 | US20040040932 Method and apparatus for processing substrate and plate used therein |
| 03/04/2004 | US20040040931 Plasma processing method and plasma processor |
| 03/04/2004 | US20040040833 Apparatus and method for plasma treating an article |
| 03/04/2004 | US20040040664 Cathode pedestal for a plasma etch reactor |
| 03/04/2004 | US20040040663 Plasma processing apparatus |
| 03/04/2004 | US20040040662 Plasma processing method and apparatus for etching nonvolatile material |
| 03/04/2004 | US20040040658 Semiconductor fabricating apparatus and method and apparatus for determining state of semiconductor fabricating process |
| 03/04/2004 | US20040040507 Plasma processing apparatus |
| 03/04/2004 | US20040040165 Process for monitoring measuring device performance |
| 03/04/2004 | DE10238347A1 Vorrichtung zum Auffangen von Ionen in einem Massenspektrometer A device for trapping ions in a mass spectrometer |
| 03/03/2004 | EP1394835A1 A method and apparatus for detecting a leak of external air into a plasma reactor |
| 03/03/2004 | EP1394834A2 Method of obtaining an image of a sample in a particle-optical device |
| 03/03/2004 | EP1393601A1 Method and system for improving the effectiveness of medical devices by adhering drugs to the surface thereof |
| 03/03/2004 | EP1393546A1 A tdi detecting device, a feed-through equipment and electron beam apparatus using these devices |
| 03/03/2004 | EP1393344A2 Conduction assembly for a cathode of an arc evaporation device |
| 03/03/2004 | EP1393340A2 Apparatus |
| 03/03/2004 | EP1392885A1 Gas port sealing for cvd/cvi furnace hearth plates |
| 03/03/2004 | EP1392883A1 Assemblies comprising molybdenum and aluminum; and methods of utilizing interlayers in forming target/backing plate assemblies |
| 03/03/2004 | EP1392882A1 Method and device for treating a substrate |
| 03/03/2004 | EP1392879A1 Electric arc evaporator |
| 03/03/2004 | EP1392200A2 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology |