| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/25/2004 | US20040056193 Applications operating with beams of charged particles |
| 03/25/2004 | US20040056070 Method of manufacturing sputter targets with internal cooling channels |
| 03/25/2004 | US20040055883 Magnetron sputtering target for non-magnetic materials |
| 03/25/2004 | US20040055881 High peak power plasma pulsed supply with arc handling |
| 03/25/2004 | US20040055880 Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith |
| 03/25/2004 | US20040055871 Deflection of particle defects using ion beams ; lithography; cleaning integrated circuits |
| 03/25/2004 | US20040055870 Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces |
| 03/25/2004 | US20040055869 High voltage, alternating current; pulsed direct current; fluid flow of dielectric over electrode |
| 03/25/2004 | US20040055868 Method for fault detection in a plasma process |
| 03/25/2004 | US20040055538 Rectangular cathodic arc source and method of steering an arc spot |
| 03/25/2004 | DE4418906B4 Verfahren zum Beschichten eines Substrates und Beschichtungsanlage zu seiner Durchführung A method for coating a substrate and coating plant for its implementation |
| 03/25/2004 | DE19616187B4 Anregen elektrischer Gas-Entladungen mit Spannungspulsen Stimulate electrical gas discharge with voltage pulses |
| 03/25/2004 | DE10243827A1 Direct-write lithography method for forming sub-micrometer structure, e.g. photonic crystals, by interpolating layout data in-situ and selecting dose modulation to give exposure of circular areas by proximity effect |
| 03/25/2004 | DE10242538A1 Electron beam energy regulation method for electron source using at least 2 independent setting elements for regulation of different electron source operating parameters |
| 03/24/2004 | EP1401249A2 Plasma source |
| 03/24/2004 | EP1401014A1 Plasma processing device, and method of cleaning the same |
| 03/24/2004 | EP1401013A1 Plasma processing device |
| 03/24/2004 | EP1401008A1 Element for coupling electrical energy into a processing chamber and processing system comprising such an element |
| 03/24/2004 | EP1401007A1 An electron diffraction system for use in production environment and for high pressure deposition techniques |
| 03/24/2004 | EP1399945A1 Magnetron atomisation source |
| 03/24/2004 | EP1399944A1 Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor |
| 03/24/2004 | EP1399887A1 Three-dimensional imaging of single particles |
| 03/24/2004 | CN1484849A Inductively coupled plasma etching apparatus |
| 03/24/2004 | CN1484848A In-process wafer charge monitor and control system for ion implanter |
| 03/24/2004 | CN1484712A Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| 03/24/2004 | CN1484098A Electvonic beam based pattern scanning method and scanning device |
| 03/24/2004 | CN1143376C Charging measuring device |
| 03/23/2004 | US6710524 Plasma source |
| 03/23/2004 | US6710361 Multi-beam hybrid solenoid lens electron beam system |
| 03/23/2004 | US6710360 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 03/23/2004 | US6710359 Methods and apparatus for scanned beam uniformity adjustment in ion implanters |
| 03/23/2004 | US6710358 Apparatus and method for reducing energy contamination of low energy ion beams |
| 03/23/2004 | US6710354 Scanning electron microscope architecture and related material handling system |
| 03/23/2004 | US6710353 Actuator and transducer |
| 03/23/2004 | US6710352 Charged particle measuring apparatus |
| 03/23/2004 | US6710341 Electron microscope equipped with X-ray spectrometer |
| 03/23/2004 | US6710340 Scanning electron microscope and method of detecting electrons therein |
| 03/23/2004 | US6710338 Focused ion beam system |
| 03/23/2004 | US6710333 Process for structural modification of surfaces by treatment with an atomic or molecular gaseous medium excited to metastable level |
| 03/23/2004 | US6709880 Semiconductor device and a manufacturing method of the same |
| 03/23/2004 | US6709556 Plasma processing apparatus |
| 03/23/2004 | US6709554 Method and apparatus for repairing lithography masks using a charged particle beam system |
| 03/23/2004 | US6709553 Multiple-step sputter deposition |
| 03/23/2004 | US6709546 Device and method for etching a substrate by using an inductively coupled plasma |
| 03/23/2004 | US6708645 Arc resistant high voltage feedthru fitting for a vacuum deposition chamber |
| 03/23/2004 | CA2241886C Device for the production of plasmas by microwaves |
| 03/18/2004 | WO2004023534A1 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 03/18/2004 | WO2004023515A1 Sputtering cathode, production method and corresponding cathode |
| 03/18/2004 | WO2004023514A1 Specimen holder for an electron microscope, and method for reducing thermal drift in a microscope |
| 03/18/2004 | WO2004023510A2 Capacitively coupled plasma reactor with uniform radial distribution of plasma |
| 03/18/2004 | WO2004022238A2 Apparatus for manipulating magnetic fields |
| 03/18/2004 | WO2003102564A3 Element-specific x-ray fluorescence microscope using multiple imaging systems comprising a zone plate |
| 03/18/2004 | WO2003095997A3 Method and apparatus for separating primary and secondary charged particle beams |
| 03/18/2004 | US20040053479 Method and device for plasma cvd |
| 03/18/2004 | US20040053428 Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 03/18/2004 | US20040052028 Atmospheric pressure plasma assembly |
| 03/18/2004 | US20040051985 Electrostatic corrector |
| 03/18/2004 | US20040051465 Devices for controlling electron emission in plasma flood system |
| 03/18/2004 | US20040051464 Plasma device and plasma generating method |
| 03/18/2004 | US20040051463 Plasma generator using microwave |
| 03/18/2004 | US20040051053 Universal pattern generator with multiplex addressing |
| 03/18/2004 | US20040051049 Rotational stage for high speed, large area scanning in focused beam systems |
| 03/18/2004 | US20040051041 Scanning electron microscope |
| 03/18/2004 | US20040051040 Method for measuring dimensions of sample and scanning electron microscope |
| 03/18/2004 | US20040050690 Magnetron sputtering apparatus |
| 03/18/2004 | US20040050689 Method for high frequency sputtering dielectric target in a vacuum chamber with high frequency gas discharge; for coating optical storage disks |
| 03/18/2004 | US20040050686 Arc electrodes for synthesis of carbon nanostructures |
| 03/18/2004 | US20040050685 Having gas atmosphere control mechanism whereby used gas is exhausted from vicinity of treatment section and vicinity of treatment section is maintained under specified gas atmosphere; forming silicon, silicon nitride films |
| 03/18/2004 | US20040050496 Plasma processing apparatus and plasma processing method |
| 03/18/2004 | US20040050495 Plasma processing apparatus and plasma processing method |
| 03/18/2004 | US20040050494 Plasma processing device |
| 03/18/2004 | US20040050493 Method and an apparatus for excitation of a plasma |
| 03/18/2004 | US20040050329 Contacting surface with an etching composition comprising a compound selected from halogenides and nitrate salts of metals elected from iron, copper, titanium, chromium, zinc, magnesium, manganese, and a coordinative fluoride |
| 03/18/2004 | US20040050328 Film-forming system and film-forming method |
| 03/18/2004 | US20040050327 Vertically translatable chuck assembly and method for a plasma reactor system |
| 03/18/2004 | DE10337509A1 Semiconductor manufacturing apparatus using network, provides communication between storage device and drawing unit storing drawing information, using storage area network |
| 03/18/2004 | DE10241590A1 Coating and etching process for semiconductors uses plasma cleaning with the end point determined by monitoring DC bias voltage |
| 03/18/2004 | DE10213813B4 Verfahren zum Bewerten der Stabilität eines Ionenimplantierers Method for evaluating the stability of an ion implanter |
| 03/18/2004 | DE10015699B4 Schaltungsanordnung zur Impedanzkompensation Circuit arrangement for impedance compensation |
| 03/17/2004 | EP1398826A1 Microwave plasma processing device, plasma processing method, and microwave radiating member |
| 03/17/2004 | EP1398820A2 Plasma treatment apparatus |
| 03/17/2004 | EP1398819A2 Matching box, vacuum apparatus using the same, and vacuum processing method |
| 03/17/2004 | EP1398818A2 Charged particle beam apparatus and irradiation method |
| 03/17/2004 | EP1398817A2 Particle optics and method for operating such |
| 03/17/2004 | EP1398109A2 Stage apparatus and its driving method, exposure apparatus and device manufacturing method |
| 03/17/2004 | EP1397820A1 Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device |
| 03/17/2004 | EP1397525A1 Device for vacuum metallising large surfaces by plasma activation |
| 03/17/2004 | CN1142579C 电子束曝光方法 Electron beam exposure method |
| 03/17/2004 | CN1142577C Dual-face shower head electrode for magnetron plasma generating apparatus |
| 03/16/2004 | US6708123 Voltage current sensor with high matching directivity |
| 03/16/2004 | US6707255 Multirate processing for metrology of plasma RF source |
| 03/16/2004 | US6707253 Matching circuit and plasma processing apparatus |
| 03/16/2004 | US6707240 Electron gun and electron beam exposure device |
| 03/16/2004 | US6707051 RF loaded line type capacitive plasma source for broad range of operating gas pressure |
| 03/16/2004 | US6707041 Detector for a scanning electron microscope with variable pressure and scanning electron microscope with such detector |
| 03/16/2004 | US6707017 High-power microwave window |
| 03/16/2004 | US6706609 Method of forming an alignment feature in or on a multi-layered semiconductor structure |
| 03/16/2004 | US6706541 Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
| 03/16/2004 | US6706334 Degenerating with plasma gas containing nitrogen, hydrogen and nitrogen trifluoride and sublimating |
| 03/16/2004 | US6706155 Sputtering apparatus and film manufacturing method |