| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/01/2004 | WO2004027814A2 Method for regulating electron beam output of electron sources |
| 04/01/2004 | WO2004027813A1 System for and method of gas cluster ion beam processing |
| 04/01/2004 | WO2004027809A2 Charged particle beam system |
| 04/01/2004 | WO2004027808A2 Particle-optical device and detection means |
| 04/01/2004 | WO2004027684A2 Photolithography mask repair |
| 04/01/2004 | WO2004027448A2 Methods and apparatus for precise measurement of time delay between two signals |
| 04/01/2004 | WO2004027111A1 Electrode, solid element and device using the same |
| 04/01/2004 | WO2004026096A2 Viewing window cleaning apparatus |
| 04/01/2004 | WO2004015157A3 Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission |
| 04/01/2004 | WO2004008478A3 Cathode for vacuum sputtering treatment machine |
| 04/01/2004 | WO2004005574A3 Rotary target and method for onsite mechanical assembly of rotary target |
| 04/01/2004 | WO2004003962A3 Thermal sprayed yttria-containing coating for plasma reactor |
| 04/01/2004 | WO2004001789A3 Multi directional mechanical scanning in an ion implanter |
| 04/01/2004 | WO2003105543A3 Method and device for reduction of the ignition voltage of plasmas |
| 04/01/2004 | WO2003100814A9 Particle beam processing apparatus and materials treatable using the apparatus |
| 04/01/2004 | WO2003087427A3 Laser drilled surfaces for substrate processing chambers |
| 04/01/2004 | US20040064283 Control of instruments |
| 04/01/2004 | US20040063333 Method and apparatus for an improved baffle plate in a plasma processing system |
| 04/01/2004 | US20040062021 Integrated process tube and electrostatic shield, assembly thereof and manufacture thereof |
| 04/01/2004 | US20040061449 Plasma processing apparatus |
| 04/01/2004 | US20040061448 Method for toolmatching and troubleshooting a plasma processing system |
| 04/01/2004 | US20040061447 Method and apparatus for an improved upper electrode plate in a plasma processing system |
| 04/01/2004 | US20040061080 Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method |
| 04/01/2004 | US20040061068 Indirectly heated button cathode for an ion source |
| 04/01/2004 | US20040061067 Particle-optical apparatus and method for operating the same |
| 04/01/2004 | US20040061066 Magnetic field applying sample observing system |
| 04/01/2004 | US20040061065 Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing method |
| 04/01/2004 | US20040061064 Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 04/01/2004 | US20040061054 Electron beam detector, scanning type electron microscope, mass spectrometer, and ion detector |
| 04/01/2004 | US20040061053 Method and apparatus for measuring physical properties of micro region |
| 04/01/2004 | US20040061052 Method of determining degree of charge-up induced by plasma used for manufacturing semiconductor device and apparatus therefor |
| 04/01/2004 | US20040061051 Devices for guiding and manipulating electron beams |
| 04/01/2004 | US20040060904 Tool having a plurality of electrodes and corresponding method of altering a very small surface |
| 04/01/2004 | US20040060817 Cluster tool with a hollow cathode array |
| 04/01/2004 | US20040060813 High-power pulsed magnetron sputtering |
| 04/01/2004 | US20040060662 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing |
| 04/01/2004 | US20040060661 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
| 04/01/2004 | US20040060660 Control of plasma density with broadband RF sensor |
| 04/01/2004 | US20040060659 Etching system and etching method |
| 04/01/2004 | US20040060658 Method and apparatus for an improved baffle plate in a plasma processing system |
| 04/01/2004 | US20040060657 Method and apparatus for an improved deposition shield in a plasma processing system |
| 04/01/2004 | US20040060656 Method and apparatus for an improved bellows shield in a plasma processing system |
| 04/01/2004 | US20040060517 Process apparatus and method for improving plasma production of an inductively coupled plasma |
| 04/01/2004 | US20040060516 Method and apparatus for an improved optical window deposition shield in a plasma processing system |
| 04/01/2004 | DE10243406A1 Plasmaquelle Plasma source |
| 03/31/2004 | EP1403902A1 Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG) |
| 03/31/2004 | EP1403901A2 Control of instruments, in particular of electron microscopes |
| 03/31/2004 | EP1403898A2 Electron beam source, electron-optical apparatus comprising an electron beam source and method of operating an electron beam source |
| 03/31/2004 | EP1402560A1 Configurable plasma volume etch chamber |
| 03/31/2004 | EP1402559A1 Methods and apparatus for ion implantation with variable spatial frequency scan lines |
| 03/31/2004 | EP1402553A2 Filament having variable cross-section, and electron beam emitter comprising such filament |
| 03/31/2004 | EP1402316A2 Mask repair with electron beam-induced chemical etching |
| 03/31/2004 | EP1402242A2 Using scatterometry to develop real time etch image |
| 03/31/2004 | EP1305814B1 Single tilt rotation cryotransfer holder for electron microscopes |
| 03/31/2004 | EP0962025B1 Correction device for correcting chromatic aberration in particle-optical apparatus |
| 03/31/2004 | CN1486502A 离子源 Ion source |
| 03/31/2004 | CN1144267C Electron-beam exposing method |
| 03/30/2004 | US6714833 Performance evaluation method for plasma processing apparatus |
| 03/30/2004 | US6714289 Semiconductor device inspecting apparatus |
| 03/30/2004 | US6714033 Probe for direct wafer potential measurements |
| 03/30/2004 | US6713969 Method and apparatus for determination and control of plasma state |
| 03/30/2004 | US6713968 Plasma processing apparatus |
| 03/30/2004 | US6713900 Linear motors and stages comprising same that produce reduced magnetic fields at an optical axis for charged-particle-beam lithography |
| 03/30/2004 | US6713885 Power supply, a semiconductor making apparatus and a semiconductor wafer fabricating method using the same |
| 03/30/2004 | US6713761 Scanning electron microscope |
| 03/30/2004 | US6713760 Analysis of semiconductor surfaces by secondary ion mass spectrometry and methods |
| 03/30/2004 | US6713759 Apparatus and method for secondary electron emission microscope |
| 03/30/2004 | US6713380 Methods for dry etching at low substrate temperatures using gas chemistry including a fluorocarbon gas and a gas including oxygen |
| 03/30/2004 | US6713233 Forming clear fields on a reticle and to reticles formed by electron-beam processing. |
| 03/30/2004 | US6712929 Deformation reduction at the main chamber |
| 03/30/2004 | US6712928 Method and its apparatus for detecting floating particles in a plasma processing chamber and an apparatus for processing a semiconductor device |
| 03/30/2004 | US6712927 Chamber having process monitoring window |
| 03/30/2004 | US6712020 Toroidal plasma source for plasma processing |
| 03/30/2004 | US6712019 Film forming apparatus having electrically insulated element that introduces power of 20-450MHz |
| 03/25/2004 | WO2004026008A1 Plasma surface treating method and apparatus therefor |
| 03/25/2004 | WO2004025276A1 Device for analysing physical and/or chemical properties of the surface layer of a solid body (variants) |
| 03/25/2004 | WO2004025199A1 Processing device, and processing device maintenance method |
| 03/25/2004 | WO2003101160A3 Method and apparatus for vhf plasma processing |
| 03/25/2004 | WO2003090351A3 Method and apparatus for tuning an rf matching network in a plasma enhanced semiconductor wafer processing system |
| 03/25/2004 | WO2003090248A3 Reducing particle generation during sputter deposition |
| 03/25/2004 | WO2003088303A3 Multi-directional scanning of movable member and ion beam monitoring arrangement therefor |
| 03/25/2004 | WO2003077279A3 Device for activating gases in a vacuum, using a hollow cathode discharge |
| 03/25/2004 | WO2003074754A3 Coating method and apparatus |
| 03/25/2004 | WO2003064721A3 Cesium vapor emitter and method of fabricating the same |
| 03/25/2004 | US20040058536 Electron beam lithography method |
| 03/25/2004 | US20040058513 Method of implanting a substrate and an ion implanter for performing the method |
| 03/25/2004 | US20040058359 Erbin as a negative regulator of Ras-Raf-Erk signaling |
| 03/25/2004 | US20040057055 Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus |
| 03/25/2004 | US20040057030 Reticle-holding pods and methods for holding thin, circular reticles, and reticle-handling systems utilizing same |
| 03/25/2004 | US20040056706 Power supply, a semiconductor making apparatus and a semiconductor wafer fabricating method using the same |
| 03/25/2004 | US20040056672 High resolution analytical probe station |
| 03/25/2004 | US20040056602 Capacitively coupled plasma reactor with uniform radial distribution of plasma |
| 03/25/2004 | US20040056578 Multibeam generating apparatus and electron beam drawing apparatus |
| 03/25/2004 | US20040056249 Chemically enhanced focused ion beam micro-machining of copper |
| 03/25/2004 | US20040056215 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
| 03/25/2004 | US20040056214 Ion implanting apparatus for manufacturing semiconductor devices |
| 03/25/2004 | US20040056213 Load lock vacuum conductance limiting aperture |
| 03/25/2004 | US20040056211 Method of surface texturizing |
| 03/25/2004 | US20040056210 Methods and apparatus for precise measurement of time delay between two signals |
| 03/25/2004 | US20040056207 Deflection method and system for use in a charged particle beam column |