| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/13/2004 | US6720565 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography |
| 04/13/2004 | US6720563 Ion implantation apparatus and ion implantation method |
| 04/13/2004 | US6720558 Transmission electron microscope equipped with energy filter |
| 04/13/2004 | US6720557 Particle beam apparatus |
| 04/13/2004 | US6720273 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma out put or adjusting the same upwards |
| 04/13/2004 | US6720037 Plasma processing method and apparatus |
| 04/13/2004 | US6719886 Method and apparatus for ionized physical vapor deposition |
| 04/13/2004 | US6719883 Plasma deposition; sputtering; semiconductors |
| 04/13/2004 | US6719876 Internal electrode type plasma processing apparatus and plasma processing method |
| 04/13/2004 | US6719875 Plasma process apparatus |
| 04/13/2004 | US6719873 Method and apparatus for preventing plasma formation |
| 04/13/2004 | US6719849 Single-substrate-processing apparatus for semiconductor process |
| 04/08/2004 | WO2004030426A2 Improved deposition shield in a plasma processing system,and methods of manufacture of such shield |
| 04/08/2004 | WO2004030056A1 Method for correcting astigmatism, method for determining astigmatic sensitivity and method for exposure in charged particle beam aligner |
| 04/08/2004 | WO2004030021A2 Sputter-coating interior surfaces |
| 04/08/2004 | WO2004030020A2 Upper electrode plate with deposition shield in a plasma processing system |
| 04/08/2004 | WO2004030019A1 Method and arrangement for generating an atmospheric pressure glow discharge plasma (apg) |
| 04/08/2004 | WO2004030018A1 A scanning electron microscope |
| 04/08/2004 | WO2004030017A1 Load lock vacuum conductance limiting aperture |
| 04/08/2004 | WO2004030016A2 Method for toolmatching and troubleshooting a plasma processing system |
| 04/08/2004 | WO2004030015A2 Method and apparatus for an improved baffle plate in a plasma processing system |
| 04/08/2004 | WO2004030014A2 Optical window deposition shield in a plasma processing system |
| 04/08/2004 | WO2004030013A2 Baffle plate in a plasma processing system |
| 04/08/2004 | WO2004030012A2 Improved bellows shield in a plasma processing system,and method of manufacture of such bellows shield |
| 04/08/2004 | WO2004030011A2 Improved upper electrode plate in a plasma processing system and manufacturing method for the electrode |
| 04/08/2004 | WO2004029325A1 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and a plasma reactor for carrying out said method |
| 04/08/2004 | WO2004029324A1 A method for depositing multilayer coatings |
| 04/08/2004 | WO2004029322A1 High peak power plasma pulsed supply with arc handling |
| 04/08/2004 | WO2004013373A3 Apparatus and method to control bias during sputtering |
| 04/08/2004 | WO2004012229A3 Reduced volume, high conductance process chamber |
| 04/08/2004 | WO2004008477A3 Heating jacket for plasma etching reactor, and etching method using same |
| 04/08/2004 | WO2003107385A3 Device for coating substrates by physical vapour deposition, using a hollow cathode discharge method |
| 04/08/2004 | WO2003087431A3 Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 04/08/2004 | WO2003085454A3 Technique for writing with a raster scanned beam |
| 04/08/2004 | WO2003063947A3 Method and apparatus for substrate processing |
| 04/08/2004 | WO2003008656B1 Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles |
| 04/08/2004 | US20040067259 Rapidly reducing the pressure on a supercritical or near critical fluid containing an active material to form droplets; and passing said droplets through a flow of heated gas; does not require any organic solvent. |
| 04/08/2004 | US20040066601 Electrode configuration for retaining cooling gas on electrostatic wafer clamp |
| 04/08/2004 | US20040066128 Ion source, ion implanting device, and manufacturing method of semiconductor devices |
| 04/08/2004 | US20040065849 Mehtod of measuring ion beam angles |
| 04/08/2004 | US20040065848 Electron beam lithography system and method therefor |
| 04/08/2004 | US20040065844 Electron diffraction system for use in production environment and for high pressure deposition techniques |
| 04/08/2004 | US20040065843 Emitter device with focusing columns |
| 04/08/2004 | US20040065827 Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor |
| 04/08/2004 | US20040065826 System for imaging a cross-section of a substrate |
| 04/08/2004 | US20040065825 Pattern width measuring apparatus, pattern width measuring method, and electron beam exposure apparatus |
| 04/08/2004 | US20040065645 Temperature controlled dome-coil system for high power inductively coupled plasma systems |
| 04/08/2004 | US20040065539 Supplying radio frequency to gas plasma; monitoring, controlling energy levels |
| 04/08/2004 | US20040065344 Processing apparatus and cleaning method |
| 04/08/2004 | US20040065257 Self-aligning PVD mark shield |
| 04/08/2004 | US20040065256 Systems and methods for improved gas delivery |
| 04/08/2004 | US20040064938 Electron beam emitter |
| 04/08/2004 | DE3448599B4 Vacuum equipment esp. for IC prodn. |
| 04/08/2004 | DE20319104U1 Anordnung zur Wärmebehandlung von Siliziumscheiben in einer Prozesskammer Arrangement for heat treatment of silicon wafers in a process chamber |
| 04/08/2004 | DE10245052A1 Elektronenstrahlquelle und elektronenoptischer Apparat mit einer solchen Electron beam source and electron-optical apparatus with such a |
| 04/07/2004 | EP1406292A2 Plasma treatment equipment and impedance measurement tool |
| 04/07/2004 | EP1406291A2 Electron beam lithography system and method |
| 04/07/2004 | EP1406290A2 Deflector, method of manufacturing deflector, and charged particle beam explosure apparatus |
| 04/07/2004 | EP1406285A2 Emitter device with focusing columns |
| 04/07/2004 | EP1405330A2 Process chamber components having textured internal surfaces and method of manufacture |
| 04/07/2004 | EP1404889A1 Method and apparatus for plasma generation |
| 04/07/2004 | EP1198610A4 Low-temperature compatible wide-pressure-range plasma flow device |
| 04/07/2004 | EP1046183B1 Ion implantation device arranged to select neutral ions from the ion beam and methode |
| 04/07/2004 | EP0771469B1 Method of and apparatus for microwave-plasma production |
| 04/07/2004 | CN1488164A 等离子体装置及等离子体生成方法 Plasma device and method for generating a plasma |
| 04/07/2004 | CN1488161A Electrode for plasma processes and method for manufacture and use thereof |
| 04/07/2004 | CN1488009A Diamond coatings on reactor wall and method of manufacturing thereof |
| 04/07/2004 | CN1488008A Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
| 04/07/2004 | CN1487858A Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
| 04/07/2004 | CN1144896C Plasma treating apparatus |
| 04/06/2004 | US6718532 Charged particle beam exposure system using aperture mask in semiconductor manufacture |
| 04/06/2004 | US6717368 Plasma generator using microwave |
| 04/06/2004 | US6717165 Device and method for detecting the drive state of a turbo pump in a tandetron accelerator of an ion implantation device |
| 04/06/2004 | US6717161 Apparatus and method providing substantially uniform irradiation of surfaces of elongated objects with a high level of irradiance |
| 04/06/2004 | US6717160 Beam direct-writing apparatus, imaging apparatus and method of obtaining preferable path passing through points |
| 04/06/2004 | US6717157 Mask inspecting apparatus |
| 04/06/2004 | US6717156 Beam as well as method and equipment for specimen fabrication |
| 04/06/2004 | US6717155 Electron impact ion source |
| 04/06/2004 | US6717146 Tandem microchannel plate and solid state electron detector |
| 04/06/2004 | US6717145 Mapping electron microscopes exhibiting improved imaging of specimen having chargeable bodies |
| 04/06/2004 | US6717144 Scanning electron microscope system |
| 04/06/2004 | US6717143 Beam alignment in a lower column of a scanning electron microscope or the like |
| 04/06/2004 | US6717142 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 04/06/2004 | US6717141 Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like |
| 04/06/2004 | US6717079 Electrical switches and methods of establishing an electrical connection |
| 04/06/2004 | US6716762 Plasma confinement by use of preferred RF return path |
| 04/06/2004 | US6716752 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 04/06/2004 | US6716727 Methods and apparatus for plasma doping and ion implantation in an integrated processing system |
| 04/06/2004 | US6716303 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
| 04/06/2004 | US6716302 Dielectric etch chamber with expanded process window |
| 04/06/2004 | US6716301 Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe |
| 04/06/2004 | US6716300 Emission spectroscopic processing apparatus |
| 04/06/2004 | US6715441 PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 04/06/2004 | CA2205817C Treatment method in glow-discharge plasma and apparatus thereof |
| 04/01/2004 | WO2004028220A1 Method and apparatus for generating and maintaining a plasma |
| 04/01/2004 | WO2004027856A1 Method for supporting substrate, substrate supporting apparatus and exposure apparatus |
| 04/01/2004 | WO2004027847A1 Method of introducing impurity, device and element |
| 04/01/2004 | WO2004027825A2 Beam plasma source |
| 04/01/2004 | WO2004027816A2 A method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 04/01/2004 | WO2004027815A1 Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition |