| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/22/2004 | US20040074604 Neutral particle beam processing apparatus |
| 04/22/2004 | US20040074602 Plasma etching apparatus |
| 04/22/2004 | DE10340751A1 Etching apparatus for solar cell, has lattice-shaped protrusion wall provided at peripheral portion of plate formed on surface of silicon substrate |
| 04/22/2004 | DE10247888A1 Einrichtung zur Erzeugung von Plasmen durch Hochfrequenzentladungen Means for generating plasma by high frequency discharge |
| 04/22/2004 | CA2501211A1 Method of forming a metal oxide film and microwave power source device used in the above method |
| 04/21/2004 | EP1411540A2 Fluorine generation |
| 04/21/2004 | EP1411539A2 High frequency discharge plasma generating device |
| 04/21/2004 | EP1411538A1 Method and device for focussed electron beam induced etching |
| 04/21/2004 | EP1410698A1 High-frequency matching network |
| 04/21/2004 | EP1410418A2 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
| 04/21/2004 | EP1410417A2 Shallow-angle interference process and apparatus for determining real-time etching rate |
| 04/21/2004 | EP1410416A2 Slit lens arrangement for particle beams |
| 04/21/2004 | EP1409762A1 A process and apparatus for plasma activated deposition in a vacuum |
| 04/21/2004 | EP1259975B1 An atmospheric pressure plasma system |
| 04/21/2004 | EP0956580B1 Automatic control of glow discharges with pulsed electrical supply |
| 04/21/2004 | CN1491527A Apparatus for generating low temperature plasma at atmospheric pressure |
| 04/21/2004 | CN1491430A Plasma apparatus and production method thereof |
| 04/21/2004 | CN1491295A Cylindrical magnetron target and apparatus for affixing target to rotatable spindle assembly |
| 04/21/2004 | CN1491293A Spatter device and spatter film forming method |
| 04/21/2004 | CN1490851A Thin-film shaper and shaping method thereof |
| 04/20/2004 | US6724148 Mechanism for minimizing ion bombardment energy in a plasma chamber |
| 04/20/2004 | US6724005 Substrate defect inspection method and substrate defect inspection system |
| 04/20/2004 | US6724002 Multiple electron beam lithography system with multiple beam modulated laser illumination |
| 04/20/2004 | US6724001 Electron beam lithography apparatus with self actuated vacuum bypass valve |
| 04/20/2004 | US6724000 Reaction frame apparatus and method |
| 04/20/2004 | US6723998 Faraday system for ion implanters |
| 04/20/2004 | US6723650 TEM sample preparation using transparent defect protective coating |
| 04/20/2004 | US6723215 Sputtering apparatus for forming a metal film using a magnetic field |
| 04/20/2004 | US6723214 Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system |
| 04/20/2004 | US6723210 Method for improving performance of sputtering target |
| 04/20/2004 | US6723209 System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals |
| 04/20/2004 | US6723202 Worktable device and plasma processing apparatus for semiconductor process |
| 04/20/2004 | US6723172 Method and system for processing semiconductor wafers |
| 04/20/2004 | US6722022 Apparatus for calibrating the position of a wafer platform in an ion implanter |
| 04/15/2004 | WO2004032219A1 Plasma processing system |
| 04/15/2004 | WO2004032214A1 Plasma film forming system |
| 04/15/2004 | WO2004032213A1 High frequency plasma generator and high frequency plasma generating method |
| 04/15/2004 | WO2004032200A2 Systems and methods for improved gas delivery |
| 04/15/2004 | WO2004032194A2 Method and system for analyzing data from a plasma process |
| 04/15/2004 | WO2004032178A2 Plasma processing system and method |
| 04/15/2004 | WO2004032177A2 Apparatus and method for use of optical system with plasma proc essing system |
| 04/15/2004 | WO2004032176A1 Nanoporous dielectrics for plasma generator |
| 04/15/2004 | WO2004032175A1 Device for the treatment of a web-type material in a plasma-assisted process |
| 04/15/2004 | WO2004032174A2 Method of measuring incidence angles of an ion beam on a wafer |
| 04/15/2004 | WO2004031442A1 Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process |
| 04/15/2004 | WO2004031441A1 Device for carrying out a plasma-assisted process |
| 04/15/2004 | WO2004031435A2 High-power pulsed magnetron sputtering |
| 04/15/2004 | WO2004031072A2 Electrostatically driven lithography |
| 04/15/2004 | WO2004006280A3 Method and apparatus for reducing cross contamination of species during ion impl antation |
| 04/15/2004 | WO2003107066B1 Modular manipulation system for manipulating a sample under study with a microscope |
| 04/15/2004 | WO2003104847A3 Low-pressure chamber for scanning electron microscopy in a wet environment |
| 04/15/2004 | WO2003104846A3 A sample enclosure for a scanning electron microscope and methods of use thereof |
| 04/15/2004 | WO2003103002A3 Ion implantation system having an energy probe |
| 04/15/2004 | WO2003100815A3 Charged particle beam column and method for directing a charged particle beam |
| 04/15/2004 | WO2003036678A3 Ion implantation systems and methods utilizing a downstream gas source |
| 04/15/2004 | US20040073398 Methods and systems for determining a critical dimension and a thin film characteristic of a specimen |
| 04/15/2004 | US20040072497 Apparatus for fabricating plasma display panel and method of fabricating the same |
| 04/15/2004 | US20040072449 Method of manufacturing semiconductor device using flexible tube |
| 04/15/2004 | US20040072426 Process chamber for manufacturing a smiconductor device |
| 04/15/2004 | US20040072086 Exposure method and exposure apparatus using complementary division mask, and semiconductor device and method for making the same |
| 04/15/2004 | US20040071613 Plasma processing apparatus |
| 04/15/2004 | US20040071336 Exposure method and device manufacturing method using this exposure method |
| 04/15/2004 | US20040070348 Neutral particle beam processing apparatus |
| 04/15/2004 | US20040070347 Plasma generating apparatus using microwave |
| 04/15/2004 | US20040070346 Remote plasma generator |
| 04/15/2004 | US20040069960 Electron beam pattern generator with photocathode comprising low work function cesium halide |
| 04/15/2004 | US20040069956 Charged particle beam apparatus |
| 04/15/2004 | US20040069952 Beam adjusting sample, beam adjusting method and beam adjusting device |
| 04/15/2004 | US20040069946 Three-dimensional structure verification supporting apparatus, three-dimensional structure verification method, recording medium, and program therefor |
| 04/15/2004 | US20040069747 Apparatus and method for detecting an endpoint in a vapor phase etch |
| 04/15/2004 | US20040069614 Timing apparatus and method to selectively bias during sputtering |
| 04/15/2004 | US20040069613 Creating a plasma by subliming a potassium fluoride source using a radio frequency antenna; crossed electric and magnetic fields drive the heavier potassium ions toward a collector while confining the lighter fluorine for evacuation |
| 04/15/2004 | US20040069412 Dry etching apparatus, dry etching method, and cleaning method adopted in dry etching apparatus |
| 04/15/2004 | US20040069408 Dual-port end point window for plasma etcher |
| 04/15/2004 | US20040069233 Apparatus for evaporation of materials for coating of objects |
| 04/15/2004 | US20040069232 Microwave plasma processing apparatus |
| 04/15/2004 | US20040069230 Thin film formation apparatus and thin film formation method employing the apparatus |
| 04/15/2004 | US20040069229 Plasma processing system |
| 04/15/2004 | US20040069223 Wall liner and slot liner for process chamber |
| 04/15/2004 | US20040068997 Electrode cooler of processing device |
| 04/15/2004 | DE4306611B4 Vorrichtung zur Oberflächenbehandlung von Substraten durch Plasmaeinwirkung Device for the surface treatment of substrates by plasma action |
| 04/15/2004 | DE10340147A1 Verfahren und Vorrichtung zum Verarbeiten eines Substrats und darin verwendete Platte Method and apparatus for processing a substrate used therein and plate |
| 04/15/2004 | DE10246548A1 Electron acceleration method, by supplying energy for generation, control and shaping of electron emission, via isolating transformer coils |
| 04/14/2004 | EP1408532A2 Sample, method and device for beam adjusting |
| 04/14/2004 | EP1407058A2 Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles |
| 04/14/2004 | EP1284008B1 Sample support for mass spectrometers |
| 04/14/2004 | CN1489782A Method and device for plasma CVD |
| 04/14/2004 | CN1489779A Zirconia toughtened ceramic components and coatings in semiconductor processing equipment and method of manufacturing thereof |
| 04/14/2004 | CN1489778A Wafer area pressure control |
| 04/14/2004 | CN1489704A Electron beam detector, scaning type elctronic microscope, mass spectrometer and ion detector |
| 04/14/2004 | CN1489641A Low Contamination plasma chamber components and method for making same |
| 04/14/2004 | CN1489640A Fullerene coated component of semiconductor processing equipment |
| 04/14/2004 | CN1146022C Electron-beam cell projection aperture formation method |
| 04/14/2004 | CN1146018C Methods for performing planarization and recess etches and apparatus therefor |
| 04/14/2004 | CN1146005C Ion source having wide output current operating range |
| 04/14/2004 | CN1146001C Cathode structure and electron gun for cathode ray tubes |
| 04/14/2004 | CN1145715C Target assembly, target thereof and device for processing lining |
| 04/13/2004 | US6721939 Electron beam shot linearity monitoring |
| 04/13/2004 | US6721650 Method of presuming traffic conditions by using floating car data and system for presuming and presenting traffic conditions by using floating data |
| 04/13/2004 | US6720717 Field emission-type electron source |