| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/06/2004 | US20040083975 Apparatus for reducing polymer deposition on a substrate and substrate support |
| 05/06/2004 | US20040083974 Hermetically-evacuated reaction vessel, substrate holders, gas source supply , and a high-frequency power supply; an end covering provided at an end of each of the substrate holders, the the source gas supply and the power supply; quality |
| 05/06/2004 | US20040083971 Plasma reactor having a symmetric parallel conductor coil antenna |
| 05/06/2004 | US20040083970 Vacuum processing device |
| 05/06/2004 | US20040083967 Plasma CVD apparatus for large area CVD film |
| 05/06/2004 | EP1416513A2 Apparatus and method for image optimization of samples in a scanning electron microscope |
| 05/06/2004 | EP1416247A1 Interferometric endpoint determination in a substrate etching process |
| 05/06/2004 | EP1415595A1 Method and apparatus for correcting spherical aberration of an electron beam |
| 05/06/2004 | EP1415322A2 Dual frequency plasma etch reactor with independent plasma density/chemistry and ion energy control |
| 05/06/2004 | EP1415321A1 Device for the coating of objects |
| 05/06/2004 | EP1415320A1 Method of measuring the performance of a scanning electron microscope |
| 05/06/2004 | EP1415015A1 Method and device for the coating and blow moulding of a body |
| 05/06/2004 | EP1332511B1 Device for treating gas with plasma |
| 05/06/2004 | EP1133652B1 Manifold system of removable components for distribution of fluids |
| 05/06/2004 | EP0906637B1 Gas delivery systems for particle beam processing |
| 05/06/2004 | DE19952316B4 Verfahren zum Herstellen einer Gateisolierung und einer Trennisolierung in einem Dünnfilmtransistor A method for forming a gate insulation and a release isolation in a thin film transistor |
| 05/06/2004 | CA2502667A1 Method for magnetron sputtering |
| 05/05/2004 | CN1494737A Plasma processor and plasma processing method |
| 05/05/2004 | CN1494603A Arc evaporator with powerful magnetic guide for targets having large surface area |
| 05/05/2004 | CN1494601A Physical vapor deposition target/backing plate assemblies, and methods of forming same |
| 05/05/2004 | CN1148789C Method and apparatus for etching semiconductor wafer |
| 05/04/2004 | US6732295 Method and system of frequency modulated end-point detection |
| 05/04/2004 | US6732054 Process for identifying single crystals by electron diffraction |
| 05/04/2004 | US6730922 Anti-electron reflector arrangement |
| 05/04/2004 | US6730921 Ion beam system for irradiating tumor tissues |
| 05/04/2004 | US6730916 Electron beam lithography apparatus |
| 05/04/2004 | US6730907 Charged particle device |
| 05/04/2004 | US6730906 Method and apparatus for testing a substrate |
| 05/04/2004 | US6730443 Patterning methods and systems using reflected interference patterns |
| 05/04/2004 | US6730197 Oblique deposition apparatus |
| 05/04/2004 | US6730196 Auxiliary electromagnets in a magnetron sputter reactor |
| 05/04/2004 | US6730174 Unitary removable shield assembly |
| 05/04/2004 | US6729850 Applied plasma duct system |
| 05/04/2004 | US6729261 Plasma processing apparatus |
| 04/29/2004 | WO2004036639A1 Etching system and method for fabricating semiconductor device using it |
| 04/29/2004 | WO2004036616A1 Method for the production of a substrate with a magnetron sputter coating and unit for the same |
| 04/29/2004 | WO2004036611A2 Neutral particle beam processing apparatus with enhanced conversion performance from plasma ions to neutral particles |
| 04/29/2004 | WO2003095058A3 Plasma-assisted multi-part processing |
| 04/29/2004 | US20040082251 Apparatus for adjustable gas distribution for semiconductor substrate processing |
| 04/29/2004 | US20040082187 High-power pulsed magnetically enhanced plasma processing |
| 04/29/2004 | US20040081916 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 04/29/2004 | US20040081283 Method and apparatus for correcting spherical aberration of an electron beam |
| 04/29/2004 | US20040079901 Method and structure for reducing effects of noise and resonance associated with an e-beam lithography tool |
| 04/29/2004 | US20040079897 Apparatus and method for testing substrate |
| 04/29/2004 | US20040079896 Method and structure for detection of electromechanical problems using variance statistics in an E-beam lithography device |
| 04/29/2004 | US20040079895 Method and structure for detection and measurement of electrical and mechanical resonance associated with an E-beam lithography tool |
| 04/29/2004 | US20040079892 Tip for nanoscanning electron microscope |
| 04/29/2004 | US20040079884 Converting scanning electron microscopes |
| 04/29/2004 | US20040079883 Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection method |
| 04/29/2004 | US20040079733 Plasma processing method |
| 04/29/2004 | US20040079725 Dry etching apparatus, dry etching method, and plate and tray used therein |
| 04/29/2004 | US20040079485 Inductively coupled plasma generating apparatus incorporating serpentine coil antenna |
| 04/29/2004 | US20040079484 Method and apparatus for gas injection system with minimum particulate contamination |
| 04/29/2004 | US20040079288 Apparatus and process for forming a deposited film |
| 04/29/2004 | US20040079287 Toroidal low-field reactive gas source |
| 04/29/2004 | DE19509284B4 Vorrichtung zur Erzeugung eines ebenen Plasmas unter Verwendung variierender Magnetpole A device for generating a planar plasma using varying magnetic poles |
| 04/29/2004 | DE10295954T5 Belichtungsverfahren unter Verwendung einer komplementär unterteilten Maske, Belichtungsvorrichtung, Halbleiterbauteil und Verfahren zum Herstellen desselben Of the same exposure method using a complementarily divided mask, exposure apparatus, semiconductor device and methods for making |
| 04/28/2004 | EP1412964A1 Sputtering magnetron arrangements with adjustable magnetic field strength |
| 04/28/2004 | EP1412963A2 Method and apparatus for producing uniform process rates |
| 04/28/2004 | EP1412962A2 Pattern generation method and apparatus using cached cells of hierarchical data |
| 04/28/2004 | EP1412796A1 Electron microscope and spectroscopy system |
| 04/28/2004 | EP1412061A2 Field ionizing elements and applications thereof |
| 04/28/2004 | EP1038306B1 Method and device for improving surfaces |
| 04/28/2004 | EP0995342A4 Method for improved cleaning of substrate processing systems |
| 04/28/2004 | EP0914669B1 Detector devices |
| 04/28/2004 | CN1492236A Charging voltage detector for substrate and ion beam radiator |
| 04/28/2004 | CN1147919C Resin molder article for chamber liner |
| 04/28/2004 | CN1147619C Spattring filming device and spattering filming method |
| 04/28/2004 | CN1147618C Thin-film deposition apparatus using cathodic arc discharge |
| 04/27/2004 | US6727911 Method and apparatus for observing specimen image on scanning charged-particle beam instrument |
| 04/27/2004 | US6727658 Electron beam generating apparatus and electron beam exposure apparatus |
| 04/27/2004 | US6727655 Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber |
| 04/27/2004 | US6727654 Plasma processing apparatus |
| 04/27/2004 | US6727509 Wafer pedestal tilt mechanism |
| 04/27/2004 | US6727507 Electron beam proximity exposure apparatus and method |
| 04/27/2004 | US6727500 System for imaging a cross-section of a substrate |
| 04/27/2004 | US6726805 Pedestal with integral shield |
| 04/27/2004 | US6726804 RF power delivery for plasma processing using modulated power signal |
| 04/27/2004 | US6726803 Multi-sectional plasma generator with discharge gaps between multiple elements forming a plasma discharge cavity |
| 04/27/2004 | US6726802 Plasma processing apparatus |
| 04/27/2004 | US6726801 Dry etching apparatus for manufacturing semiconductor devices |
| 04/27/2004 | US6726799 Plasma etching apparatus with focus ring and plasma etching method |
| 04/27/2004 | CA2145570C Magnetron atomization source and method of use thereof |
| 04/22/2004 | WO2004034471A1 Image pickup device and manufacturing method thereof |
| 04/22/2004 | WO2004034461A1 Electrode configuration for retaining cooling gas on electrostatic wafer clamp |
| 04/22/2004 | WO2004034455A1 Plasma processing apparatus, processing vessel used in plasma processing apparatus, dielectric plate used in plasma processing apparatus |
| 04/22/2004 | WO2004033753A1 Method of forming metal oxide film and microwave power source unit for use in the method |
| 04/22/2004 | WO2004033750A1 Plasma-assisted micro-scale material deposition |
| 04/22/2004 | WO2004010454A3 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases |
| 04/22/2004 | US20040076763 Apparatus capable of forming a thin film of high quality having a uniform thickness at a high deposition rate at an increased plasma density without increase of plasma potential |
| 04/22/2004 | US20040076762 Plasma processor and plasma processing method |
| 04/22/2004 | US20040076529 Particle beam device with a particle source to be operated in high vacuum and cascade-type pump arrangement for such a particle beam device |
| 04/22/2004 | US20040075064 Method for correcting a proximity effect, an exposure method, a manufacturing method of a semiconductor device and a proximity correction module |
| 04/22/2004 | US20040075054 Electron microscopy system and electron microscopy method |
| 04/22/2004 | US20040075053 Particle-optical arrangements and particle-optical systems |
| 04/22/2004 | US20040075051 Apparatus and method for image optimization of samples in a scanning electron microscope |
| 04/22/2004 | US20040074770 Rotary target |
| 04/22/2004 | US20040074609 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode |
| 04/22/2004 | US20040074606 Electrode-built-in susceptor and a manufacturing method therefor |
| 04/22/2004 | US20040074605 Focus ring for semiconductor treatment and plasma treatment device |