| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/13/2004 | WO2004040631A1 Plasma chemical vapor deposition method and plasma chemical vapor deposition device |
| 05/13/2004 | WO2004040629A1 Method and system for making uniform high frequency plasma over larger area in plasma-activated cvd system |
| 05/13/2004 | WO2004040615A2 High-power pulsed magnetically enhanced plasma processing |
| 05/13/2004 | WO2004040614A2 Electron beam exposure system |
| 05/13/2004 | WO2004027814A3 Method for regulating electron beam output of electron sources |
| 05/13/2004 | WO2004022238A3 Apparatus for manipulating magnetic fields |
| 05/13/2004 | WO2004019381A3 Barrier coatings produced by atmospheric glow discharge |
| 05/13/2004 | WO2004019368A3 Reduced volume plasma reactor |
| 05/13/2004 | WO2004006298A3 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 05/13/2004 | WO2003103004A3 A cathode pedestal for a plasma etch reactor |
| 05/13/2004 | WO2003100816A3 Energetic neutral particle lithographic apparatus and process |
| 05/13/2004 | WO2002091422A3 Raster shaped beam, electron beam exposure strategy using a two dimensional multiplexel flash field |
| 05/13/2004 | US20040092120 Semiconductor processing equipment having improved process drift control |
| 05/13/2004 | US20040092119 Method and apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same |
| 05/13/2004 | US20040092118 Sidewall smoothing in high aspect ratio/deep etching using a discrete gas switching method |
| 05/13/2004 | US20040092045 Methods and systems for determining a presence of macro and micro defects on a specimen |
| 05/13/2004 | US20040092044 Ion current density measuring method and instrument, and semiconductor device manufacturing method |
| 05/13/2004 | US20040091817 Electron beam lithography method |
| 05/13/2004 | US20040090194 Retarding electron beams in multiple electron beam pattern generation |
| 05/13/2004 | US20040090185 Waveguide and microwave ion source equipped with the waveguide |
| 05/13/2004 | US20040090167 Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating |
| 05/13/2004 | US20040090129 Positioning apparatus and charged-particle-beam exposure apparatus |
| 05/13/2004 | US20040089822 Charged-particle beam writer |
| 05/13/2004 | US20040089805 Scanning electron microscope |
| 05/13/2004 | US20040089801 Device for collecting ions in a mass spectrometer |
| 05/13/2004 | US20040089631 Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semiconductor substrate deposition apparatus, and microwave plasma generating antenna assembly |
| 05/13/2004 | US20040089541 Sputtering device |
| 05/13/2004 | US20040089535 Low pressure, optics; prevention of target poisoning |
| 05/13/2004 | US20040089534 Method for sputtering and a device for sputtering |
| 05/13/2004 | US20040089420 Bypass set up for integration of remote optical endpoint for CVD chamber |
| 05/13/2004 | US20040089233 Deposition methods utilizing microwave excitation |
| 05/13/2004 | DE10340750A1 Trockenätzvorrichtung und Trockenätzverfahren sowie in Trockenätzvorrichtung verwendetes Reinigungsverfahren Dry etching and dry etching and cleaning method used in dry etching |
| 05/12/2004 | EP1418576A2 Electron beam lithography method |
| 05/12/2004 | EP1418157A2 Manufacturing apparatus and method for carbon nanotube |
| 05/12/2004 | EP1418017A2 Positioning apparatus, charged particle beam exposure apparatus, and semiconductor device manufacturing method |
| 05/12/2004 | EP1417697A1 Plasma reactor with adjustable dual frequency voltage division |
| 05/12/2004 | CN1495858A Ion mixing device and porous electrode for ion mixing device |
| 05/12/2004 | CN1495283A Matching box, vacuum device using the same and vacuum processing method |
| 05/12/2004 | CN1495282A 真空电弧沉积设备 Vacuum arc deposition equipment |
| 05/12/2004 | CN1149643C Pattern drawing method using charged particle beams and apparatus therefor |
| 05/12/2004 | CN1149637C Electronic beam exposure system |
| 05/12/2004 | CN1149623C Accelerator-decelerator electrostatic lens for variably focusing and mass resolving ion beam in ion implanter |
| 05/11/2004 | US6734687 Apparatus for detecting defect in device and method of detecting defect |
| 05/11/2004 | US6734635 Process of crystallizing semiconductor thin film and laser irradiation system |
| 05/11/2004 | US6734447 Electron filter for current implanter |
| 05/11/2004 | US6734446 Apparatus and method for doping |
| 05/11/2004 | US6734439 Wafer pedestal tilt mechanism and cooling system |
| 05/11/2004 | US6734437 System and method for electron beam irradiation |
| 05/11/2004 | US6734429 Electron microscope charge-up prevention method and electron microscope |
| 05/11/2004 | US6734428 Multi-beam multi-column electron beam inspection system |
| 05/11/2004 | US6734427 Polishing chip segment attached to holder to generate polished cross-section; detaching; joining carrier; scanning and transmission electron microscopy |
| 05/11/2004 | US6734388 Dry surface cleaning apparatus |
| 05/11/2004 | US6733932 Mask lithography data generation method |
| 05/11/2004 | US6733678 Removal metal ions from plasma separator; using silica substrate |
| 05/11/2004 | US6733642 System for unbalanced magnetron sputtering with AC power |
| 05/11/2004 | US6733641 Mechanically joined sputtering target and adapter therefor |
| 05/11/2004 | US6733621 Venting apparatus and method for vacuum system |
| 05/11/2004 | US6733620 Process apparatus |
| 05/11/2004 | US6733618 Disturbance-free, recipe-controlled plasma processing system and method |
| 05/11/2004 | US6733617 Direct detection of dielectric etch system magnet driver and coil malfunctions |
| 05/11/2004 | US6732610 Slide apparatus and its stage mechanism for use in vacuum |
| 05/06/2004 | WO2004039132A2 Method for surface processing by means of a microwave vacuum-plasma associated with electron-cyclotron resonance |
| 05/06/2004 | WO2004038756A2 Method for magnetron sputtering |
| 05/06/2004 | WO2004038509A2 Lithography system |
| 05/06/2004 | WO2004038508A1 Electron beam exposure method and electron beam exposure system |
| 05/06/2004 | WO2004017356A3 Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes |
| 05/06/2004 | WO2004010458A3 Plasma implantation system and method with target movement |
| 05/06/2004 | WO2003102545A3 Fragmentation methods for mass spectrometry |
| 05/06/2004 | US20040087170 Method for determining the end point for a cleaning etching process |
| 05/06/2004 | US20040087153 Method of etching a silicon-containing dielectric material |
| 05/06/2004 | US20040087152 Interferometric endpoint determination in a substrate etching process |
| 05/06/2004 | US20040087040 Method and apparatus for etch processing with end point detection thereof |
| 05/06/2004 | US20040086786 Radiation correction method for electron beam lithography |
| 05/06/2004 | US20040086434 Down-stream radical generation by employing a source of electromagnetic excitation such as plasma source (RF or microwave) that can be pulsed to generate radicals from plasma |
| 05/06/2004 | US20040086172 Alignment mark for e-beam inspection of a semiconductor wafer |
| 05/06/2004 | US20040086170 Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereof |
| 05/06/2004 | US20040085246 Method and apparatus for producing uniform processing rates |
| 05/06/2004 | US20040085024 Method and device for rastering source redundancy |
| 05/06/2004 | US20040085023 Methods and apparatus for generating high-density plasma |
| 05/06/2004 | US20040085018 Organic light-emitting display |
| 05/06/2004 | US20040084996 Translation and rotation positioning motor |
| 05/06/2004 | US20040084637 Electron projection lithography apparatus using secondary electrons |
| 05/06/2004 | US20040084636 System and method for implanting a wafer with an ion beam |
| 05/06/2004 | US20040084635 Methods and apparatus for ion beam neutralization in magnets |
| 05/06/2004 | US20040084629 Objective lens for an electron microscopy system and electron microscopy system |
| 05/06/2004 | US20040084628 Electron beam apparatus and method of controlling same |
| 05/06/2004 | US20040084621 Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system |
| 05/06/2004 | US20040084620 Lens for a scanning electron microscope |
| 05/06/2004 | US20040084422 Plasma source |
| 05/06/2004 | US20040084410 Methods for etching dielectric materials |
| 05/06/2004 | US20040084409 Controlled polymerization on plasma reactor wall |
| 05/06/2004 | US20040084297 Using plurality of magnets to generate discharge plasma; cooling; purity |
| 05/06/2004 | US20040084153 Plasma source assembly and method of manufacture |
| 05/06/2004 | US20040084152 Apparatus for large-scale diamond polishing |
| 05/06/2004 | US20040084151 Magnetron plasma etching apparatus |
| 05/06/2004 | US20040084148 Low pressure plasma processing apparatus and method |
| 05/06/2004 | US20040084146 Plasma treatment apparatus, upper electrode cover, and upper electrode cover window member |
| 05/06/2004 | US20040083978 Double slit-valve doors for plasma processing |
| 05/06/2004 | US20040083977 Lower pedestal shield |
| 05/06/2004 | US20040083976 Modified deposition ring to eliminate backside and wafer edge coating |