| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/27/2004 | US20040099214 Production device for dlc film-coated plastic container and production method therefor |
| 05/27/2004 | DE10352910A1 Oil-free electron source for electron beam tomography scanner, has cathode-focus electrode assembly which is suspended entirely within vacuum chamber by receptacle outer end |
| 05/27/2004 | DE10352606A1 Device for producing a semiconductor component comprises a chamber containing an inner structure, a reaction gas feed unit for introducing reaction gas into the inner chamber, a cathode and anode for plasma discharge and a heater |
| 05/27/2004 | DE10252129A1 Image generating energy filter for electrically charged particles has transfer lens device between first/second energy analyzer output and input planes with negative lateral, angular magnification |
| 05/27/2004 | CA2505267A1 Method and apparatus for stabilizing of the glow plasma discharges |
| 05/26/2004 | EP1422740A2 Device for generating secondary electrons, secondary electrode and accelerating electrode |
| 05/26/2004 | EP1422314A1 Dispositive and process to clean process chambers and vacuum lines |
| 05/26/2004 | EP1422310A2 Anode cleaning tool |
| 05/26/2004 | EP1421608A1 Method and system for single ion implantation |
| 05/26/2004 | EP1421606A1 Plasma enhanced atomic layer deposition (peald) equipment and method of forming a conducting thin film using the same thereof |
| 05/26/2004 | EP1421599A2 Suspended gas distribution manifold for plasma chamber |
| 05/26/2004 | EP1421598A1 Method and apparatus for tuning ion implanters |
| 05/26/2004 | EP1421227A2 Device for reactive plasma treatment of substrates and method for the use thereof |
| 05/26/2004 | EP1420876A2 Method of producing powder with composite grains and the device for carrying out said method |
| 05/26/2004 | EP1277221B1 Electron/ion gun for electron or ion beams with high monochromasy or high current density |
| 05/26/2004 | EP0988407B1 Method for producing coated workpieces, which are coated with an epitactic layer |
| 05/26/2004 | CN1500370A Device and control method for micro wave plasma processing |
| 05/26/2004 | CN1500284A Hybrid scanning system and methods for ion implantation |
| 05/26/2004 | CN1500204A Method and appts. for endpoint detection using partial least squares |
| 05/26/2004 | CN1499584A Method and appts. for generating gas plasma and method of mfg. semiconductor |
| 05/26/2004 | CN1499292A Checking method and element mfg. method |
| 05/25/2004 | US6741944 Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma |
| 05/25/2004 | US6741733 Drawing pattern verifying method |
| 05/25/2004 | US6741732 Exposure method and device manufacturing method using this exposure method |
| 05/25/2004 | US6741446 Vacuum plasma processor and method of operating same |
| 05/25/2004 | US6740895 Method and apparatus for emission lithography using patterned emitter |
| 05/25/2004 | US6740894 Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor |
| 05/25/2004 | US6740889 Charged particle beam microscope with minicolumn |
| 05/25/2004 | US6740888 Electron beam apparatus |
| 05/25/2004 | US6740877 Scanning electron microscope and sample observation method using the same |
| 05/25/2004 | US6740842 Radio frequency power source for generating an inductively coupled plasma |
| 05/25/2004 | US6740393 DLC coating system and process and apparatus for making coating system |
| 05/25/2004 | US6740384 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production |
| 05/25/2004 | US6740367 Plasma CVD film-forming device |
| 05/25/2004 | US6740209 Multilayer film deposition apparatus, and method and apparatus for manufacturing perpendicular-magnetic-recording media |
| 05/25/2004 | US6740207 Plasma discharge is at least conjointly supplied by means of high frequency (hf) energy, wherein the hf supply of the plasma discharge is briefly deactivated. |
| 05/25/2004 | US6739360 Liner for use in processing chamber |
| 05/21/2004 | WO2004042798A2 Apparatus and method for treating objects with radicals generated from plasma |
| 05/21/2004 | WO2004042788A2 Method and apparatus for determining an etch property using an endpoint signal |
| 05/21/2004 | WO2004042774A1 Methods and apparatus for generating high-density plasma |
| 05/21/2004 | WO2004042773A2 Resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
| 05/21/2004 | WO2004042772A2 Methods and apparatus for ion beam neutralization in magnets |
| 05/21/2004 | WO2004042771A2 Method of etching a silicon-containing dielectric material |
| 05/21/2004 | WO2004042770A2 Energy filter image generator for electrically charged particles and the use thereof |
| 05/20/2004 | US20040097090 Silicon etching method |
| 05/20/2004 | US20040097089 Device and control method for micro wave plasma processing |
| 05/20/2004 | US20040097087 Chamber structure in inductive coupling plasma etching apparatus |
| 05/20/2004 | US20040097079 High speed silicon etching method |
| 05/20/2004 | US20040097058 Controlling the characteristics of implanter ion-beams |
| 05/20/2004 | US20040096755 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/20/2004 | US20040096581 Electrolytic cells; plate dielectric and electrodes; control discharging of gases |
| 05/20/2004 | US20040095217 Actuator and transducer |
| 05/20/2004 | US20040095074 Plasma device and plasma generating method |
| 05/20/2004 | US20040094847 Multi-layered semiconductor structure |
| 05/20/2004 | US20040094726 Electron beam exposure apparatus and deflection amount correction method |
| 05/20/2004 | US20040094725 Device for generating an ion beam |
| 05/20/2004 | US20040094714 Method of determining lattice constant, method of evaluating material by using the same and electronic microscope suitable for using the same |
| 05/20/2004 | US20040094713 Scanning electron microscope |
| 05/20/2004 | US20040094712 Electron microscope |
| 05/20/2004 | US20040094710 Manipulator for an optical or particle-optical apparatus |
| 05/20/2004 | US20040094509 Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator |
| 05/20/2004 | US20040094412 Magnetron sputtering apparatus and magnetron sputtering method using the same |
| 05/20/2004 | US20040094411 Electrolytic cells; ionization source; supplying electricity; vapor deposition |
| 05/20/2004 | US20040094402 To sputter depositing a liner material such as tantalum or tantalum nitride, by combining long-throw sputtering, self-ionized plasma sputtering and capacitively-coupled plasma resputtering in one chamber |
| 05/20/2004 | US20040094400 Method of processing a surface of a workpiece |
| 05/20/2004 | US20040094327 High-voltage electric apparatus |
| 05/20/2004 | US20040094270 Plasma process chamber and system |
| 05/20/2004 | US20040094094 Plasma processing device |
| 05/19/2004 | EP1420081A2 Thin film formation apparatus and thin film formation method employing the apparatus |
| 05/19/2004 | EP1420079A1 Film-forming system and film-forming method |
| 05/19/2004 | EP1419515A1 Method and apparatus for ion bunching in an ion implantation system |
| 05/19/2004 | EP1419514A1 Split double gap buncher and method for ion bunching in an ion implantation system |
| 05/19/2004 | EP1419418A1 Electron beam processing |
| 05/19/2004 | EP0846191A4 Plasma device and method utilizing azimuthally and axially uniform electric field |
| 05/19/2004 | CN2617031Y Apparatus for injecting self-cleaning ion into system cavity |
| 05/19/2004 | CN1498057A Induction coupling plasma generating equipment containing zigzag coil antenna |
| 05/19/2004 | CN1497678A 等离子体掺杂方法及等离子体掺杂装置 Plasma doping method and plasma doping device |
| 05/19/2004 | CN1497657A Luminous body and electronic beam detector, scanning type electron microscope, quality analysis device containing it |
| 05/19/2004 | CN1497656A Beam regulating sample, beam regulating method and beam regulating device |
| 05/19/2004 | CN1497655A Ion source, ion injection equipment, manufacturing method of semiconductor device |
| 05/19/2004 | CN1497356A Electronic projection photoetching device using secondary electronic |
| 05/19/2004 | CN1150607C System for controlling plasma generator |
| 05/19/2004 | CN1150602C Gas distribution plate |
| 05/19/2004 | CN1150593C Improved stationary uniformity ring design |
| 05/19/2004 | CN1150482C Focused ion beam micromill process and articles therefrom |
| 05/18/2004 | US6737812 Having exhaust opening for exhausting residual gas generated at time of processing positioned close to periphery of gas spray opening, air jet opening generating airflow surrounding exhaust opening to prevent residual gas from flowing out |
| 05/18/2004 | US6737666 Apparatus and method for detecting an end point of a cleaning process |
| 05/18/2004 | US6737660 Electron beam irradiation apparatus and electron beam irradiating method |
| 05/18/2004 | US6737659 Devices and methods for monitoring respective operating temperatures of components in a microlithography apparatus |
| 05/18/2004 | US6737658 Pattern observation apparatus and pattern observation method |
| 05/18/2004 | US6737657 Ion implanting apparatus for manufacturing semiconductor devices |
| 05/18/2004 | US6737647 Array for achromatic imaging of a pulsed particle beam |
| 05/18/2004 | US6736949 Filtered cathode arc source deposition apparatus |
| 05/18/2004 | US6736948 Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation |
| 05/18/2004 | US6736946 Sputtering apparatus that allows the use of a shutter and shutter arm assembly that do not require long down time to transfer a wafer or shutter disk into the pasting or cleaning position |
| 05/18/2004 | US6736944 Apparatus and method for arc detection |
| 05/18/2004 | US6736943 Apparatus and method for vacuum coating deposition |
| 05/18/2004 | US6736931 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
| 05/18/2004 | US6736930 Microwave plasma processing apparatus for controlling a temperature of a wavelength reducing member |
| 05/18/2004 | US6736147 Semiconductor-processing device provided with a remote plasma source for self-cleaning |