| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/10/2004 | US20040108066 Temperature measuring method and plasma processing apparatus |
| 06/10/2004 | US20040107910 Plasma processing apparatus and plasma processing method |
| 06/10/2004 | US20040107909 Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage |
| 06/10/2004 | US20040107908 Plasma immersion ion implantation apparatus including an inductively coupled plasma source having low dissociation and low minimum plasma voltage |
| 06/10/2004 | US20040107907 Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage |
| 06/10/2004 | US20040107906 Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage |
| 06/10/2004 | US20040107896 Plasma-assisted decrystallization |
| 06/10/2004 | US20040107796 Plasma-assisted melting |
| 06/10/2004 | US20040107561 Electrostatically shielded radio frequency plasma apparatus and method of manufacturing |
| 06/09/2004 | EP1426998A2 Transmission electron microscope and three-dimensional observing method |
| 06/09/2004 | EP1426997A1 Field emitter beam source and method for controlling a beam current |
| 06/09/2004 | EP1425777A2 Plasma processor coil |
| 06/09/2004 | EP1425776A1 Suppression of emission noise for microcolumn applications in electron beam inspection |
| 06/09/2004 | DE10256417A1 Lichtbogenverdampfungsvorrichtung Arc evaporation apparatus |
| 06/09/2004 | DE10254416A1 Vorrichtung zum Erzeugen von Sekundärelektronen, insbesondere Sekundärelektrode und Beschleunigungselektrode An apparatus for generating secondary electrons in particular secondary electrode and accelerating electrode |
| 06/09/2004 | DE10248167A1 Electron beam melting of metal, ceramic materials involves deflecting electrically charged particles produce by degassing with a transverse magnetic field closely arranged above melting bath surface |
| 06/09/2004 | DE10014956B4 Einrichtung zum Be- und Entladen von Elektronenstrahlanlagen Means for loading and unloading of electron beam systems |
| 06/09/2004 | CN1503856A Variable efficiency faraday shield |
| 06/09/2004 | CN1503331A Surface modification method |
| 06/09/2004 | CN1503321A Device and method for treating plasma |
| 06/09/2004 | CN1503309A Predicting the lifetime of a filament in an ion source device |
| 06/09/2004 | CN1152978C Arc control and switching element protection for pulsed DC power supply |
| 06/09/2004 | CN1152977C Sputter method and sputter equipment |
| 06/08/2004 | US6748345 Method of analyzing crystalline texture |
| 06/08/2004 | US6747279 Objective lens for a charged particle beam device |
| 06/08/2004 | US6747239 Plasma processing apparatus and method |
| 06/08/2004 | US6746884 Method of manufacturing field-emission electron emitters and method of manufacturing substrates having a matrix electron emitter array formed thereon |
| 06/08/2004 | US6746881 Method and device for controlling the thickness of a layer of an integrated circuit in real time |
| 06/08/2004 | US6746566 Transverse magnetic field voltage isolator |
| 06/03/2004 | WO2004047160A1 Method of fabricating semiconductor device |
| 06/03/2004 | WO2004047158A1 Plasma processing apparatus and plasma processing method |
| 06/03/2004 | WO2004032174A3 Method of measuring incidence angles of an ion beam on a wafer |
| 06/03/2004 | WO2004030015A3 Method and apparatus for an improved baffle plate in a plasma processing system |
| 06/03/2004 | WO2003073481A3 Feedforward and feedback control of semiconductor fabrication process using secondary electron microscopy and a focused ion beam system |
| 06/03/2004 | US20040106862 Electron beam apparatus, and inspection instrument and inspection process thereof |
| 06/03/2004 | US20040106243 Method for controlling electrical conductivity |
| 06/03/2004 | US20040105160 Particle-optical apparatus, electron microscopy system and electron lithography system |
| 06/03/2004 | US20040104734 Method for toolmatching and troubleshooting a plasma processing system |
| 06/03/2004 | US20040104682 Ion implantation system and control method |
| 06/03/2004 | US20040104657 Apparatus for producing secondary electrons, a secondary electrode, and an acceleration electrode |
| 06/03/2004 | US20040104358 Method and apparatus for reducing substrate charging damage |
| 06/03/2004 | US20040104357 Electron beam exposure apparatus, electron beam exposing method, semiconductor element manufacturing method, and pattern error detection method |
| 06/03/2004 | US20040104354 Device and method for adapting the size of an ion beam spot in the domain of tumor irradiation |
| 06/03/2004 | US20040104353 One dimensional beam blanker array |
| 06/03/2004 | US20040103845 Filtered cathodic arc deposition method and apparatus |
| 06/03/2004 | US20040103844 [gas distributing system for delivering plasma gas to a wafer reaction chamber] |
| 06/03/2004 | DE10305602A1 Verfahren und Vorrichtung zum Erzeugen eines Gasplasmas, Gaszusammensetzung zum Erzeugen von Plasma und Verfahren zum Erzeugen einer Halbleitervorrichtung, das dieses verwendet Method and device for generating a gas plasma, the gas composition for generating plasma and methods for producing a semiconductor device that uses this |
| 06/02/2004 | EP1424723A2 Ion beam for target recovery |
| 06/02/2004 | EP1424721A2 Sample observation method and transmission electron microscope |
| 06/02/2004 | EP1424537A1 DISPLACEMENT DETECTING METHOD, DISPLACEMENT DETECTING DEVICE AND CALIBRATING METHOD THEREOF, AND RECORDING DEVICE OF INFORMATION RECORDING MEDIUM ORIGINAL DISK |
| 06/02/2004 | EP1424405A2 Method and apparatus for fabricating coated substrates |
| 06/02/2004 | EP1352410B1 Electrostatic corrector |
| 06/02/2004 | CN1502121A Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 06/02/2004 | CN1501844A Contaminant collector trap for ion implanter |
| 06/02/2004 | CN1501763A Plasma processing apparatus |
| 06/02/2004 | CN1501762A Plasma processing apparatus |
| 06/02/2004 | CN1501452A Plasma machining apparatus |
| 06/02/2004 | CN1501445A Semiconductor device manufacturing apparatus employing vacuum system |
| 06/02/2004 | CN1500908A Magnetron sputtering apparatus and magnetron sputtering method using the same |
| 06/02/2004 | CN1152414C Processing chamber for semiconductor manufacturing and chamber liner for semiconductor processing chamber |
| 06/01/2004 | US6745096 Maintenance method and system for plasma processing apparatus etching and apparatus |
| 06/01/2004 | US6744617 Ionizing apparatus and discharge electrode bar for the same |
| 06/01/2004 | US6744268 High resolution analytical probe station |
| 06/01/2004 | US6744249 Method and instrument for measuring a magnetic field, a method for measuring a current waveform, and method for measuring an electric field |
| 06/01/2004 | US6744214 Electron beam ion source with integral low-temperature vaporizer |
| 06/01/2004 | US6744213 Antenna for producing uniform process rates |
| 06/01/2004 | US6744212 Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions |
| 06/01/2004 | US6744211 Plasma density information measuring method, probe used for measuring plasma density information, and plasma density information measuring apparatus |
| 06/01/2004 | US6744058 Geometric compensation method for charged particle beam irradiation |
| 06/01/2004 | US6744057 Convergent charged particle beam apparatus and inspection method using same |
| 06/01/2004 | US6744054 Evacuation use sample chamber and circuit pattern forming apparatus using the same |
| 06/01/2004 | US6744048 Lens system for phase plate for transmission electron microscope and transmission electron microscope |
| 06/01/2004 | US6743342 Sputtering target with a partially enclosed vault |
| 06/01/2004 | US6743341 Apparatus for applying thin layers to a substrate |
| 06/01/2004 | US6743340 Posiitoning in vacuum; magnetron sputtering ferromagnetic material on wafer |
| 06/01/2004 | US6743328 Grounded centering ring for inhibiting polymer build-up on the diaphragm of a manometer |
| 05/27/2004 | WO2004044971A1 Method and device for polishing plasma chamber cathode holes |
| 05/27/2004 | WO2004044968A1 Exposure device, exposure method, and semiconductor device manufacturing method |
| 05/27/2004 | WO2004044943A2 Retarding electron beams in multiple electron beam pattern generation |
| 05/27/2004 | WO2004044941A2 Method and apparatus for stabilizing of the glow plasma discharges |
| 05/27/2004 | WO2004044653A2 Method and device for rastering source redundancy |
| 05/27/2004 | WO2004044261A2 High deposition rate sputtering |
| 05/27/2004 | WO2004044039A2 Process and apparatus for depositing plasma coating onto a container |
| 05/27/2004 | WO2004029325A9 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and a plasma reactor for carrying out said method |
| 05/27/2004 | WO2004008816A8 Method and device for substrate etching with very high power inductively coupled plasma |
| 05/27/2004 | WO2003087431B1 Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 05/27/2004 | WO2003028065A3 Electrostatic manipulating apparatus |
| 05/27/2004 | WO2002101784B1 Plasma processor |
| 05/27/2004 | US20040102053 Surface modification method |
| 05/27/2004 | US20040099819 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus |
| 05/27/2004 | US20040099818 Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same |
| 05/27/2004 | US20040099817 Large area source for uniform electron beam generation |
| 05/27/2004 | US20040099811 Deflector of a micro-column electron beam apparatus and method for fabricating the same |
| 05/27/2004 | US20040099805 Electron microscope including apparatus for x-ray analysis and method of analyzing specimens using same |
| 05/27/2004 | US20040099638 Ion beam for target recovery |
| 05/27/2004 | US20040099636 Fabrication of three dimensional structures |
| 05/27/2004 | US20040099524 Magnetron sputtering |
| 05/27/2004 | US20040099282 Monitoring and decomposition of deposits in enclosures used for chemical vapor deposition of semiconductors, using gas generators, radiation measuring instruments and analysis apparatus |
| 05/27/2004 | US20040099216 Apparatus for modifying surface of material using ion beam |
| 05/27/2004 | US20040099215 Chamber for constructing a film on a semiconductor wafer |