| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/23/2004 | CN1507502A Duo-step plasma cleaning of chamber residues |
| 06/22/2004 | US6754552 Apparatus with connected first, second and third communication links; plasma state, member state and utility detecting sections connected to first link; controllers connected to second link; energy and utility controllers connected to third |
| 06/22/2004 | US6753689 First electrode coupled to provide radio frequency signal in process chamber, second electrode coupled to electronic module, band stop filter coupled to second electrode so that signal is substantially prevented from reaching module |
| 06/22/2004 | US6753652 Ion implanter |
| 06/22/2004 | US6753540 Lithographic method using variable-area electron-beam lithography machine |
| 06/22/2004 | US6753539 Ion implantation apparatus equipped with plasma shower and ion implantation method |
| 06/22/2004 | US6753538 Electron beam processing |
| 06/22/2004 | US6753533 Electron beam apparatus and method of controlling same |
| 06/22/2004 | US6753525 Materials analysis using backscatter electron emissions |
| 06/22/2004 | US6753524 Inspection system and inspection process for wafer with circuit using charged-particle beam |
| 06/22/2004 | US6753518 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus |
| 06/22/2004 | US6753499 Method and apparatus for detecting anomalous discharge in plasma processing equipment using weakly-ionized thermal non-equilibrium plasma |
| 06/22/2004 | US6753498 Automated electrode replacement apparatus for a plasma processing system |
| 06/22/2004 | US6753268 Reduced particulate etching |
| 06/22/2004 | US6753253 Method of making wiring and logic corrections on a semiconductor device by use of focused ion beams |
| 06/22/2004 | US6752008 Method and apparatus for scanning in scanning probe microscopy and presenting results |
| 06/17/2004 | WO2004052060A1 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface |
| 06/17/2004 | WO2004051710A2 Method and apparatus for reducing substrate charging damage |
| 06/17/2004 | WO2004051702A2 Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
| 06/17/2004 | WO2004051696A2 One dimensional beam blanker array |
| 06/17/2004 | WO2004051695A2 Arc evaporation device |
| 06/17/2004 | WO2004050943A2 Method for the treatment of surfaces with plasma in a vacuum and unit for the same |
| 06/17/2004 | WO2004050939A2 Plasma-assisted melting |
| 06/17/2004 | WO2004017389A3 Method for performing real time arcing detection |
| 06/17/2004 | WO2004015735A3 Ion source and coaxial inductive coupler for ion implantation system |
| 06/17/2004 | US20040117757 Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program |
| 06/17/2004 | US20040115365 Plasma vapor deposition using high density plasma generated in presence of magnetic field |
| 06/17/2004 | US20040114788 Sample observation method and transmission electron microscope |
| 06/17/2004 | US20040114399 Class E amplifier with inductive clamp |
| 06/17/2004 | US20040114132 Test pattern, inspection method, and device manufacturing method |
| 06/17/2004 | US20040113364 Low temperature sputter target/backing plate joining technique and assemblies made thereby |
| 06/17/2004 | US20040113287 Anode, cathode of electrolytic cells; thickness distribution in grained pattern ; heat resistance, electroconductivity |
| 06/17/2004 | US20040113101 Charged-particle-beam microlithography systems that detect and offset beam-perturbing displacements of optical-column components |
| 06/17/2004 | US20040113100 Polarity exchanger and ion implanter having the same |
| 06/17/2004 | US20040113097 Apparatus and techniques for scanning electron beam based chip repair |
| 06/17/2004 | US20040113093 System for and method of gas cluster ion beam processing |
| 06/17/2004 | US20040113092 Particle-optical apparatus and method for operating the same |
| 06/17/2004 | US20040113075 Transmission electron microscope |
| 06/17/2004 | US20040113074 Scanning electron microscope |
| 06/17/2004 | US20040113073 Electron beam apparatus |
| 06/17/2004 | US20040113069 Method and device for separating ion mass, and ion doping device |
| 06/17/2004 | US20040113066 Sample support for mass spectrometers |
| 06/17/2004 | US20040112864 Plasma treatment method and plasma treatment apparatus |
| 06/17/2004 | US20040112860 Method for detecting the end point by using matrix |
| 06/17/2004 | US20040112736 Arc evaporator with a poweful magnetic guide for targets having a large surface area |
| 06/17/2004 | US20040112735 Pulsed magnetron for sputter deposition |
| 06/17/2004 | US20040112544 Magnetic mirror for preventing wafer edge damage during dry etching |
| 06/17/2004 | US20040112543 Plasma reactor with high selectivity and reduced damage |
| 06/17/2004 | US20040112542 Plasma immersion ion implantation apparatus including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage |
| 06/17/2004 | US20040112541 Plasma processor and plasma processing method |
| 06/17/2004 | US20040112540 Uniform etch system |
| 06/17/2004 | US20040112536 Plasma processing apparatus and method |
| 06/17/2004 | US20040112294 Magnetic mirror for protection of consumable parts during plasma processing |
| 06/17/2004 | US20040112292 Plasma apparatus and production method thereof |
| 06/17/2004 | DE10255767A1 Electron-beam-generating method for an electron beam generator emits electrons in a vacuum beam-generating chamber from a heated cathode's emission surface |
| 06/17/2004 | CA2507734A1 One dimensional beam blanker array |
| 06/16/2004 | EP1429368A2 Fabrication of three dimensional structures |
| 06/16/2004 | EP1429363A2 Field emission device |
| 06/16/2004 | EP1428905A1 Sputtering device |
| 06/16/2004 | EP1428006A2 Method and apparatus for scanned instrument calibration |
| 06/16/2004 | EP1057207B1 Rf powered plasma enhanced chemical vapor deposition reactor and methods |
| 06/16/2004 | EP1040292A4 Gas panel |
| 06/16/2004 | CN1505829A Plasma confinement by use of preferred RF return path |
| 06/16/2004 | CN1505695A Cerium oxide containing ceramic components and coatings in semiconductor processing equipment |
| 06/16/2004 | CN1505113A Method and apparatus for treating plasma |
| 06/16/2004 | CN1154157C Plasma etch system |
| 06/16/2004 | CN1154150C Beam generation apparatus |
| 06/15/2004 | US6750615 Plasma apparatus including plasma-measuring device |
| 06/15/2004 | US6750614 Plasma processing apparatus capable of performing uniform plasma treatment by preventing drift in plasma discharge current |
| 06/15/2004 | US6750464 Having pattern elements defined as apertures in stencil reticle, each element split into portions separated by girders formed from membrane of reticle and configured for transfer to substrate using single exposure shot of charged particle beam |
| 06/15/2004 | US6750462 Ion implanting method and apparatus |
| 06/15/2004 | US6750460 System and method for adjusting the properties of a device by GCIB processing |
| 06/15/2004 | US6750455 Method and apparatus for multiple charged particle beams |
| 06/15/2004 | US6750451 Observation apparatus and observation method using an electron beam |
| 06/15/2004 | US6750450 Scanning magnetism detector and probe |
| 06/15/2004 | US6750447 Calibration standard for high resolution electron microscopy |
| 06/15/2004 | US6750156 Method and apparatus for forming an anti-reflective coating on a substrate |
| 06/15/2004 | US6749764 Plasma processing comprising three rotational motions of an article being processed |
| 06/15/2004 | US6749730 Sputter device |
| 06/15/2004 | US6749729 Method and apparatus for workpiece biassing utilizing non-arcing bias rail |
| 06/15/2004 | US6749717 Device for in-situ cleaning of an inductively-coupled plasma chambers |
| 06/10/2004 | WO2004049420A1 Plasma processing apparatus and method |
| 06/10/2004 | WO2004049419A1 Plasma processing method and apparatus |
| 06/10/2004 | WO2004049418A1 Plasma processing system and method and electrode plate of plasma processing system |
| 06/10/2004 | WO2004049383A2 Large area source for uniform electron beam generation |
| 06/10/2004 | WO2004008255A3 Method and apparatus for measuring critical dimensions with a particle beam |
| 06/10/2004 | WO2003102724A3 Method and system for data handling, storage and manipulation |
| 06/10/2004 | WO2003074754A8 Coating method and apparatus |
| 06/10/2004 | US20040110388 Apparatus and method for shielding a wafer from charged particles during plasma etching |
| 06/10/2004 | US20040110384 Detecting method for dry etching machine |
| 06/10/2004 | US20040109152 Reticle Chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure |
| 06/10/2004 | US20040108812 Current-stabilizing illumination of photocathode electron beam source |
| 06/10/2004 | US20040108470 Neutral particle beam processing apparatus |
| 06/10/2004 | US20040108469 Beam processing apparatus |
| 06/10/2004 | US20040108459 Electron microscope, method for operating the same, and computer-readable medium |
| 06/10/2004 | US20040108458 Focused ion beam system with coaxial scanning electron microscope |
| 06/10/2004 | US20040108457 Electron microscopy system |
| 06/10/2004 | US20040108301 Linear drive system for use in a plasma processing system |
| 06/10/2004 | US20040108068 Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism |
| 06/10/2004 | US20040108067 Method and apparatus for preparing specimens for microscopy |