| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/01/2004 | US20040128021 Method and apparatus for monitoring a material processing system |
| 07/01/2004 | US20040128014 Method and apparatus for monitoring parts in a plasma in a material processing system |
| 07/01/2004 | US20040127067 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 07/01/2004 | US20040127033 Plasma processing device and plasma processing method |
| 07/01/2004 | US20040127031 Method and apparatus for monitoring a plasma in a material processing system |
| 07/01/2004 | US20040127030 Method and apparatus for monitoring a material processing system |
| 07/01/2004 | US20040126909 Method and apparatus for analyzing composition of defects |
| 07/01/2004 | US20040126493 a conductive member is between the electrode and the substrate holder to cover the entire space between them, and electrically connected to both |
| 07/01/2004 | US20040125360 Monitoring erosion of system components by optical emission |
| 07/01/2004 | US20040125355 Semiconductor manufacturing apparatus |
| 07/01/2004 | US20040124779 Plasma processor apparatus and method, and antenna |
| 07/01/2004 | US20040124408 Alloy memory |
| 07/01/2004 | US20040124372 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 07/01/2004 | US20040124371 Ion beam irradiation device |
| 07/01/2004 | US20040124365 Electron beam source, electron optical apparatus using such beam source and method of operating an electron beam source |
| 07/01/2004 | US20040124364 Charged particle beam alignment method and charged particle beam apparatus |
| 07/01/2004 | US20040124356 Particle-optical device and detection means |
| 07/01/2004 | US20040124280 Anti-corrosion shower head used in dry etching process and method of manufacturing the same |
| 07/01/2004 | US20040124177 Method of etching structures into an etching body using a plasma |
| 07/01/2004 | US20040124080 Vacuum arc vapor deposition apparatus |
| 07/01/2004 | US20040124077 High peak power plasma pulsed supply with arc handling |
| 07/01/2004 | US20040123803 Shower head gas injection apparatus with secondary high pressure pulsed gas injection |
| 07/01/2004 | US20040123800 Showerheads |
| 07/01/2004 | DE20122149U1 Charged particle detection apparatus has aluminum foil membrane which is connected to variable accelerating voltage source and seals inlet of chamber and which is approximately 7.5 nanometer thick |
| 06/30/2004 | EP1433193A2 Flat magnetron sputter apparatus |
| 06/30/2004 | EP1433192A1 Method and device for producing a plasma |
| 06/30/2004 | EP1145411B1 Power supplies having protection circuits |
| 06/30/2004 | CN1509496A 等离子体处理装置 The plasma processing apparatus |
| 06/30/2004 | CN1509494A Method for surface treatment and device for making semiconductor device |
| 06/30/2004 | CN1509493A Stacked RF excitation coil for inductive plasma processor |
| 06/30/2004 | CN1509343A Cylinder-based plasma processing system |
| 06/30/2004 | CN1508849A Device for preventing chip edge from damaging in dry-etching period |
| 06/30/2004 | CN1508842A Method for monitoring plasma manufacture process |
| 06/29/2004 | US6757629 Calibration plate having accurately defined calibration pattern |
| 06/29/2004 | US6756737 Plasma processing apparatus and method |
| 06/29/2004 | US6756706 Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines |
| 06/29/2004 | US6756600 Ion implantation with improved ion source life expectancy |
| 06/29/2004 | US6756599 Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same |
| 06/29/2004 | US6756596 Filtered ion source |
| 06/29/2004 | US6756590 Shape measurement method and apparatus |
| 06/29/2004 | US6756589 Method for observing specimen and device therefor |
| 06/29/2004 | US6756559 Plasma etching apparatus |
| 06/29/2004 | US6756182 Charged-particle-beam microlithography methods exhibiting reduced coulomb effects |
| 06/29/2004 | US6756159 Method of preparing exposure data and method of preparing aperture mask data |
| 06/29/2004 | US6756081 Annular cross-section; detachable target holder with screw fitting |
| 06/29/2004 | US6755945 Sealing substrate within an enclosure; applying voltage; process control |
| 06/29/2004 | US6755935 Plasma processing apparatus |
| 06/29/2004 | US6755933 Semiconductor process recording apparatus |
| 06/29/2004 | US6755932 Plasma processing system and apparatus and a sample processing method |
| 06/29/2004 | US6755150 Using toroidal cores; forms plasma with high-density of ions along center axis of torus; for ion milling, cutting |
| 06/24/2004 | WO2004053945A2 Re-crystallization of semiconductor surface film and doping of semiconductor by energetic cluster irradiation |
| 06/24/2004 | WO2004053943A2 Emittance measuring device for ion beams |
| 06/24/2004 | WO2004053922A2 Apparatus and method for shielding a wafer from charged particles during plasma etching |
| 06/24/2004 | WO2004053921A2 Current-stabilizing illumination of photocathode electron beam source |
| 06/24/2004 | WO2004053592A1 Reticle manipulations |
| 06/24/2004 | WO2004053190A1 Method and apparatus for treating a substrate |
| 06/24/2004 | WO2004036611A3 Neutral particle beam processing apparatus with enhanced conversion performance from plasma ions to neutral particles |
| 06/24/2004 | WO2004012235A3 Atmospheric pressure plasma processing reactor |
| 06/24/2004 | WO2004012220A3 Methods and apparatus for monitoring plasma parameters in plasma doping systems |
| 06/24/2004 | WO2003107381A3 Electrode design for stable micro-scale plasma discharges |
| 06/24/2004 | US20040121610 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
| 06/24/2004 | US20040121603 Advanced control for plasma process |
| 06/24/2004 | US20040121498 Ion-implantation machine, control method thereof, and process for manufacturing integrated devices |
| 06/24/2004 | US20040119240 Sealing mechanism for sealing a vacuum chamber |
| 06/24/2004 | US20040119029 Exposure apparatus and exposure method |
| 06/24/2004 | US20040119028 Laser patterning of encapsulated organic light emitting diodes |
| 06/24/2004 | US20040119026 Electron beam exposure equipment and electron beam exposure method |
| 06/24/2004 | US20040119025 Boron ion delivery system |
| 06/24/2004 | US20040119024 Electron beam sensor |
| 06/24/2004 | US20040119023 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus |
| 06/24/2004 | US20040119022 Charged particle beam apparatus and charged particle beam irradiation method |
| 06/24/2004 | US20040119021 Electron optics for multi-beam electron beam lithography tool |
| 06/24/2004 | US20040119016 Method for automatic alignment of tilt series in an electronic micropscope |
| 06/24/2004 | US20040119006 Neutral particle beam processing apparatus |
| 06/24/2004 | US20040118834 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 06/24/2004 | US20040118816 Plasma catalyst |
| 06/24/2004 | US20040118678 Magnetron sputtering systems including anodic gas distribution systems |
| 06/24/2004 | US20040118521 Coil and coil support for generating a plasma |
| 06/24/2004 | US20040118520 better resistance to water penetration; formed by the lamination of a plurality of rubber layers and reinforcing layer of yarns, which is used in automobiles and the like |
| 06/24/2004 | US20040118519 Blocker plate bypass design to improve clean rate at the edge of the chamber |
| 06/24/2004 | US20040118518 Plasma processing system and apparatus and a sample processing method |
| 06/24/2004 | US20040118517 Plasma processing system and apparatus and a sample processing method |
| 06/24/2004 | US20040118516 Plasma parameter control using learning data |
| 06/24/2004 | US20040118452 Apparatus and method for emitting cesium vapor |
| 06/24/2004 | US20040118436 Method and apparatus for thermal gas purging |
| 06/24/2004 | US20040118347 Process and apparatus for plasma activated depositions in a vacuum |
| 06/24/2004 | US20040118346 Deposited-film formation apparatus, and deposited-film formation process |
| 06/24/2004 | US20040118345 Flexibly suspended gas distribution manifold for plasma chamber |
| 06/24/2004 | US20040118344 System and method for controlling plasma with an adjustable coupling to ground circuit |
| 06/24/2004 | DE10353097A1 Ölfreie Elektronenquelle für einen EBT Scanner Oil-free electron source for an EBT scanner |
| 06/24/2004 | DE10306936B3 Multi-mode metal ion source, e.g. for workpiece treatment, has magnetic mirror field generator, cooled anodes arranged between cathodes, cooled anti-cathode, sputtering and extraction electrodes and a switching device |
| 06/24/2004 | DE10260601A1 Electron beam device for exposing a mask in production of integrated circuits comprises electron source for producing electron beam in closed vacuum chamber, and ion source for preparing positively charged ions |
| 06/24/2004 | DE10256718A1 Appliance for investigation of biological specimens by means of atmospheric or variable pressure scanning electronic beam microscope has specimen accommodated in internal chamber separate from main chamber |
| 06/23/2004 | EP1432009A2 Electron beam exposure equipment and electron beam exposure method |
| 06/23/2004 | EP1432008A1 Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens |
| 06/23/2004 | EP1432007A1 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens |
| 06/23/2004 | EP1432006A2 Energy filter and electron microscope |
| 06/23/2004 | EP1430521A2 Method for etching structures in an etching body by means of a plasma |
| 06/23/2004 | CN2621292Y Special specimen stage for prepared spore-pollen specimen used in scanning electron microscopic |
| 06/23/2004 | CN1507646A Inductive plasma proesson having coil with plural windings and method of controlling plasma density |