| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/15/2004 | US20040134426 Observation window of plasma processing apparatus and plasma processing apparatus using the same |
| 07/15/2004 | DE10260726A1 Modular current supply unit especially for plasma systems has different module combinations with a control for each unit and data communication |
| 07/14/2004 | EP1437759A2 Electron beam device |
| 07/14/2004 | EP1437758A2 Electron microscope and observation method of biological specimen |
| 07/14/2004 | EP1437754A2 Electronic device |
| 07/14/2004 | EP1437035A1 Antenna structure for inductively coupled plasma generator |
| 07/14/2004 | CN1513199A Conduction assembly for cathode of arc evaporation device |
| 07/14/2004 | CN1513198A Plasma processing method and apparatus with control of plasma excitation power |
| 07/14/2004 | CN1513197A Apparatus and method for improving plasma distribution and performance in inductively coupled plasma |
| 07/14/2004 | CN1512551A Method for etching medium material |
| 07/14/2004 | CN1512549A Drawing device with charged particle beam and its detecting method and control method for minification and rack phase position |
| 07/14/2004 | CN1512548A Film processing method and film processing system |
| 07/14/2004 | CN1511972A Plasma treating device with protective tube |
| 07/14/2004 | CN1157756C Plasma generator for ion beam radiator |
| 07/13/2004 | US6762423 Methods and apparatus for ion beam neutralization in magnets |
| 07/13/2004 | US6762422 Analyzer/observer |
| 07/13/2004 | US6762421 Charged particle beam exposure apparatus and exposure method |
| 07/13/2004 | US6762417 System in which a rotating body is connected to a rotary shaft in an ion implanter |
| 07/13/2004 | US6762416 Sample mount for a scanning electron microscope |
| 07/13/2004 | US6762415 Vacuum chamber with recessed viewing tube and imaging device situated therein |
| 07/13/2004 | US6762412 Optical apparatus, exposure apparatus using the same, and gas introduction method |
| 07/13/2004 | US6762408 Electrically-charged particle energy analyzers |
| 07/13/2004 | US6762393 Inductively coupled plasma source with conductive layer and process of plasma generation |
| 07/13/2004 | US6761805 Cathode arc source with magnetic field generating means positioned above and below the cathode |
| 07/13/2004 | US6761804 Inverted magnetron |
| 07/13/2004 | US6761796 Method and apparatus for micro-jet enabled, low-energy ion generation transport in plasma processing |
| 07/13/2004 | US6761128 Plasma treatment apparatus |
| 07/13/2004 | CA2332319C Dissolution stage for an environmental scanning electron microscope |
| 07/08/2004 | WO2004057935A1 Microwave plasma generating device |
| 07/08/2004 | WO2004057642A2 Vacuum arc source comprising a device for generating a magnetic field |
| 07/08/2004 | WO2004057638A2 Method and apparatus for aerodynamic ion focusing |
| 07/08/2004 | WO2004042772A9 Methods and apparatus for ion beam neutralization in magnets |
| 07/08/2004 | WO2004027808A3 Particle-optical device and detection means |
| 07/08/2004 | WO2004026096A3 Viewing window cleaning apparatus |
| 07/08/2004 | WO2004010455A3 Ion beam source with coated electrode |
| 07/08/2004 | WO2003096381A3 Plasma-assisted processing in a manufacturing line |
| 07/08/2004 | WO2003096380A3 Plasma-assisted nitrogen surface-treatment |
| 07/08/2004 | US20040132287 Dry etch process for copper |
| 07/08/2004 | US20040131977 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 07/08/2004 | US20040131953 Photomask correction method using composite charged particle beam, and device used in the correction method |
| 07/08/2004 | US20040131513 Plasma treatment of processing gases |
| 07/08/2004 | US20040131351 Film-processing method and film-processing apparatus |
| 07/08/2004 | US20040129898 Electron beam writing equipment and electron beam writing method |
| 07/08/2004 | US20040129897 Sample manufacturing apparatus |
| 07/08/2004 | US20040129891 Illuminant, and, electron beam detector, scanning electron microscope and mass spectroscope each including the same |
| 07/08/2004 | US20040129879 Charged particle beam apparatus |
| 07/08/2004 | US20040129878 Apparatus for specimen fabrication and method for specimen fabrication |
| 07/08/2004 | US20040129877 High contrast inspection and review of magnetic media and heads |
| 07/08/2004 | US20040129686 Electron beam welding method and welded components formed thereby |
| 07/08/2004 | US20040129675 Method and device for treating a substrate |
| 07/08/2004 | US20040129561 Cylindrical magnetron magnetic array mid span support |
| 07/08/2004 | US20040129556 Moving magnetic/cathode arrangement and method |
| 07/08/2004 | US20040129385 Pre-loaded plasma reactor apparatus and application thereof |
| 07/08/2004 | US20040129351 Method and system for fabricating three-diemensional microstructure |
| 07/08/2004 | US20040129226 Method and apparatus for an improved focus ring in a plasma processing system |
| 07/08/2004 | US20040129221 Cooled deposition baffle in high density plasma semiconductor processing |
| 07/08/2004 | US20040129220 Plasma processing method and apparatus |
| 07/08/2004 | US20040129218 Exhaust ring mechanism and plasma processing apparatus using the same |
| 07/08/2004 | US20040129217 Method and apparatus for determining consumable lifetime |
| 07/08/2004 | US20040129211 Tunable gas distribution plate assembly |
| 07/08/2004 | DE10358909A1 Plasma-CVD-Vorrichtung sowie Filmherstellverfahren und Verfahren zur Herstellung eines Halbleiterbauteils unter Verwendung derselben Plasma CVD apparatus and Filmherstellverfahren and method for producing a semiconductor device using the same |
| 07/08/2004 | DE10260614A1 Plasmaparametersteuerung unter Verwendung von Lerndaten Plasma parameter control using the learning data |
| 07/08/2004 | DE10258118A1 Device for measuring and determining charge carrier streams and parameters derived from them used in industrial coating devices comprises a sensor formed as a Faraday collector connected to an evaluation and control device |
| 07/07/2004 | EP1435646A2 Wafer electrical discharge control by wafer lifter system |
| 07/07/2004 | EP1435640A2 Electron beam writing equipment and method |
| 07/07/2004 | EP1435108A1 Plasma reactor for manufacturing electronic components |
| 07/07/2004 | EP1435105A1 High performance magnetron for dc sputtering systems |
| 07/07/2004 | EP1435071A1 System and method for point pushing to render polygons in environments with changing levels of detail |
| 07/07/2004 | CN1511335A Inductive plasma processor including current sensor for plasma excitation coil |
| 07/07/2004 | CN1511334A Apparatus and method for controlling voltage applied to electrostatic shield used in plasma generator |
| 07/07/2004 | CN1511333A Plasma surface treatment method and device for carrying out said method |
| 07/07/2004 | CN1511332A Device and method ofr examination of samples in non-vacuum environment using scanning electron microscope |
| 07/07/2004 | CN1511197A Plasma treatment container internal member, and plasma treatment device having plasma treatment container internal member |
| 07/07/2004 | CN1510720A Membrane process method and processor |
| 07/07/2004 | CN1510719A Mask and producing method, producing method for semiconductor device with this mask |
| 07/07/2004 | CN1510696A Method for controlling electrostatic lens and ion implantation device |
| 07/07/2004 | CN1156603C Large area plasma source |
| 07/06/2004 | US6760214 Electrostatic chuck for ion injector |
| 07/06/2004 | US6759800 Diamond supported photocathodes for electron sources |
| 07/06/2004 | US6759666 Method and apparatus for charged particle beam exposure |
| 07/06/2004 | US6759665 Method and system for ion beam containment in an ion beam guide |
| 07/06/2004 | US6759656 Electron microscope equipped with electron biprism |
| 07/06/2004 | US6759654 High contrast inspection and review of magnetic media and heads |
| 07/06/2004 | US6759624 Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber |
| 07/06/2004 | US6759338 Plasma processing apparatus and method |
| 07/06/2004 | US6759253 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units |
| 07/06/2004 | US6758950 Controlled magnetron shape for uniformly sputtered thin film |
| 07/06/2004 | US6758949 Magnetically confined metal plasma sputter source with magnetic control of ion and neutral densities |
| 07/06/2004 | US6758948 Method and apparatus for depositing films |
| 07/06/2004 | US6758941 Plasma processing unit, window member for plasma processing unit and electrode plate for plasma processing unit |
| 07/06/2004 | US6758909 Gas port sealing for CVD/CVI furnace hearth plates |
| 07/01/2004 | WO2004056159A1 Plasma generation device, plasma control method, and substrate manufacturing method |
| 07/01/2004 | WO2004055873A1 Thin film forming apparatus |
| 07/01/2004 | WO2004055856A2 Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens |
| 07/01/2004 | WO2004055855A2 Gas distribution apparatus and method for uniform etching |
| 07/01/2004 | WO2004055607A2 Apparatus for processing an object with high position accurancy |
| 07/01/2004 | WO2004054352A2 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens |
| 07/01/2004 | WO2004039132A3 Method for surface processing by means of a microwave vacuum-plasma associated with electron-cyclotron resonance |
| 07/01/2004 | WO2004012221A3 Method for adjusting voltage on a powered faraday shield |
| 07/01/2004 | WO2002080265B1 Plasma processor and method for operating same |