| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/22/2004 | WO2004003963A3 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 07/22/2004 | WO2003096383A3 Cavity shapes for plasma-assisted processing |
| 07/22/2004 | WO2003049141A3 Device for applying an electromagnetic microwave to a plasma container |
| 07/22/2004 | US20040143356 Multi-electron beam exposure method and apparatus |
| 07/22/2004 | US20040141278 Device and method for charge removal from dielectric surfaces |
| 07/22/2004 | US20040141169 Electron beam exposure system |
| 07/22/2004 | US20040140778 Plasma generation system |
| 07/22/2004 | US20040140516 Electromagnetic-wave shielding and light transmitting plate, manufacturing method thereof and display panel |
| 07/22/2004 | US20040140438 Angular aperture shaped beam system and method |
| 07/22/2004 | US20040140437 Electron beam array write head system and method |
| 07/22/2004 | US20040140436 Transfer method and apparatus, exposure method and apparatus, method of manufacturing exposure apparatus, and device manufacturing method |
| 07/22/2004 | US20040140432 Generating electrons with an activated photocathode |
| 07/22/2004 | US20040140426 Scanning probe microscope with improved probe head mount |
| 07/22/2004 | US20040140424 Scanning probe microscope with improved probe tip mount |
| 07/22/2004 | US20040140208 Alternating current rotatable sputter cathode |
| 07/22/2004 | US20040140205 Rotational and reciprocal radial movement of a sputtering magnetron |
| 07/22/2004 | US20040140204 Magnetron cathode and magnetron sputtering apparatus comprising the same |
| 07/22/2004 | US20040140054 Variable aspect ratio plasma source |
| 07/22/2004 | US20040140053 Method and apparatus for micro-jet enabled, low-energy ion generation and transport in plasma processing |
| 07/22/2004 | US20040140036 Plasma processing method and apparatus |
| 07/22/2004 | US20040139916 Applying the particles to be separated on a substrate supported membrane, such that the particles are mobile across the surface of the substrate supported membrane; providing an electrical field; temporarily modifying the electrical field and/or adding a substrate supported membrane |
| 07/22/2004 | US20040139915 Plasma CVD apparatus and dry cleaning method of the same |
| 07/22/2004 | DE19955671B4 Vorrichtung zur Erzeugung von Plasma A device for generating plasma |
| 07/22/2004 | DE19830404B4 Vorrichtung zur Sputterbeschichtung mit variierbarem Plasmapotential Apparatus for sputter coating with variierbarem plasma potential |
| 07/22/2004 | DE10300734A1 Plasma treatment of workpieces involves positioning plasma chamber along closed path with carrying device that can be driven with rotary motion about essentially horizontal axis of rotation |
| 07/22/2004 | DE10300439A1 Assembly to treat material surface, e.g. degrease metal foil, has electrodes tightly against surface to give homogenous surface discharge |
| 07/22/2004 | DE102004001316A1 Elektronenstrahlschweißverfahren und damit gefertigte geschweißte Komponenten Electron beam welding process and thus made welded components |
| 07/22/2004 | CA2509643A1 Magnetron sputtering systems including anodic gas distribution systems |
| 07/21/2004 | EP1439571A1 DEVICE AND METHOD FOR MICROWAVE PLASMA PROCESSING, AND MICROWAVE POWER SUPPLY DEVICE |
| 07/21/2004 | EP1439566A1 Charged particle beam apparatus and method for operating the same |
| 07/21/2004 | EP1439565A2 Electron beam apparatus and detector arrangement |
| 07/21/2004 | EP1439564A1 Charged particle beam device for inspecting or structuring a specimen |
| 07/21/2004 | EP1438735A2 Methods and apparatus for plasma doping by anode pulsing |
| 07/21/2004 | EP1438734A2 Methods and apparatus for plasma doping and ion implantation in an integrated processing system |
| 07/21/2004 | EP1438733A2 Wafer pedestal tilt mechanism and cooling system |
| 07/21/2004 | EP1438732A1 Methods and apparatus for defect localization |
| 07/21/2004 | EP1438636A2 Real-time prediction of and correction of proyimity resist heating in raster scan particle beam lithography |
| 07/21/2004 | EP1438443A1 Method and apparatus for sputter deposition of epilayers with high deposition rate |
| 07/21/2004 | EP1438442A1 Dual-source, single-chamber method and apparatus for sputter deposition |
| 07/21/2004 | EP1145269B1 Method for generating a pulsed electron beam and a trigger plasma source for carrying out said method |
| 07/21/2004 | EP0885455B1 Device for generating powerful microwave plasmas |
| 07/21/2004 | CN1515019A Gas distribution plate electrode for plasma reactor |
| 07/21/2004 | CN1515018A Plasma processor |
| 07/21/2004 | CN1158405C Device for treating container with microwave plasma |
| 07/21/2004 | CN1158404C Plasma processing system and method |
| 07/20/2004 | US6765466 Magnetic field generator for magnetron plasma |
| 07/20/2004 | US6765219 Hybrid scanning system and methods for ion implantation |
| 07/20/2004 | US6765217 Charged-particle-beam mapping projection-optical systems and methods for adjusting same |
| 07/20/2004 | US6765205 Electron microscope including apparatus for X-ray analysis and method of analyzing specimens using same |
| 07/20/2004 | US6765202 Microscope having an electron beam for illumination |
| 07/20/2004 | US6764925 Semiconductor device manufacturing system and electron beam exposure apparatus |
| 07/20/2004 | US6764743 Honeycomb structure; automobile exhaust system; air pollution control |
| 07/20/2004 | US6764658 Electrocconductive, monolithic electrode overcoated with dielectric; positioning within gas passageways |
| 07/20/2004 | US6764606 Method and apparatus for plasma processing |
| 07/20/2004 | US6764575 Magnetron plasma processing apparatus |
| 07/20/2004 | US6764550 Apparatus for evaluating plasma polymerized polymer layer using UV spectrometer |
| 07/20/2004 | US6764383 Methods and apparatuses for processing microfeature workpiece samples |
| 07/15/2004 | WO2004059716A1 A system and method for controlling plasma with an adjustable coupling to ground circuit |
| 07/15/2004 | WO2004059712A1 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
| 07/15/2004 | WO2004059702A2 Method and apparatus for monitoring a material processing system |
| 07/15/2004 | WO2004059691A1 Secondary electron detector, especially in a scanning electron microscope |
| 07/15/2004 | WO2004059690A1 An extractor for an microcoloum, an alignment method for an extractor aperture to an electon emitter, and a measuring method and an alignment method using thereof |
| 07/15/2004 | WO2004059689A2 Method and apparatus for monitoring a plasma in a material processing system |
| 07/15/2004 | WO2004059405A2 Method and apparatus for monitoring parts in a material processing system |
| 07/15/2004 | WO2004059033A2 Blocker plate bypass arrangement to improve clean rate at the edge of a processing chamber |
| 07/15/2004 | WO2004042788A3 Method and apparatus for determining an etch property using an endpoint signal |
| 07/15/2004 | WO2004042770A3 Energy filter image generator for electrically charged particles and the use thereof |
| 07/15/2004 | WO2004032194A3 Method and system for analyzing data from a plasma process |
| 07/15/2004 | WO2003096382A3 Methods and apparatus for plasma processing control |
| 07/15/2004 | WO2003073448A3 Control of semiconductor fabrication process using scanning electron microscopy and a focused ion beam device |
| 07/15/2004 | WO1999041766A9 Reactor for chemical vapor deposition of titanium |
| 07/15/2004 | US20040137760 Thin film processing method and system |
| 07/15/2004 | US20040137746 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge |
| 07/15/2004 | US20040137647 Electronic device, production method thereof, and plasma process apparatus |
| 07/15/2004 | US20040137519 Method for localizing and identifying epitopes |
| 07/15/2004 | US20040137147 improved corrosion resistance within plasma chambers; chemical vapor deposition |
| 07/15/2004 | US20040135983 Lithography system |
| 07/15/2004 | US20040135590 Impedance monitoring system and method |
| 07/15/2004 | US20040135526 Device and method for controlling focussed electron beams |
| 07/15/2004 | US20040135519 Electronic device with wide lens for small emission spot size |
| 07/15/2004 | US20040135518 Hot electron emission array for e-beam photolitography and display screens |
| 07/15/2004 | US20040135515 Electron beam apparatus and device manufacturing method using same |
| 07/15/2004 | US20040135102 Charged-particle-beam exposure apparatus and method of controlling same |
| 07/15/2004 | US20040135101 Pattern drawing method by scanning beam and pattern drawing apparatus |
| 07/15/2004 | US20040135096 Microfabrication apparatus and microfabrication method |
| 07/15/2004 | US20040135083 Bio electron microscope and observation method of specimen |
| 07/15/2004 | US20040135082 Electron beam apparatus and method for production of its specimen chamber |
| 07/15/2004 | US20040134776 Assemblies comprising molybdenum and aluminum; and methods of utilizing interlayers in forming target/backing plate assemblies |
| 07/15/2004 | US20040134771 Vacuum arc deposition apparatus |
| 07/15/2004 | US20040134770 for applying one or more thin film materials into or onto a substrate by selectively controlling the depositing plasma constituents that will reach a substrate from a cathode using cathodic arc deposition |
| 07/15/2004 | US20040134618 Plasma processing apparatus and focus ring |
| 07/15/2004 | US20040134616 High-frequency plasma processing apparatus |
| 07/15/2004 | US20040134614 Apparatus and method of improving impedance matching between an rf signal and a multi- segmented electrode |
| 07/15/2004 | US20040134613 Device and method for plasma processing, and slow-wave plate |
| 07/15/2004 | US20040134612 processed seed fiber suitable for other uses in papermaking or as a food additive for human consumption; corn, oats, soybeans; slurrying fiber in a dilute acid solution and washing; modifying agent step preferably includes an acid chlorite solution or a peroxide solution for improved brightness |
| 07/15/2004 | US20040134611 Plasma process system and plasma process method |
| 07/15/2004 | US20040134610 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge |
| 07/15/2004 | US20040134609 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge |
| 07/15/2004 | US20040134431 Diamond film depositing apparatus using microwaves and plasma |
| 07/15/2004 | US20040134427 Deposition chamber surface enhancement and resulting deposition chambers |