| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/03/2004 | US6770889 Method of controlling electrostatic lens and ion implantation apparatus |
| 08/03/2004 | US6770888 High mass resolution magnet for ribbon beam ion implanters |
| 08/03/2004 | US6770887 Aberration-corrected charged-particle optical apparatus |
| 08/03/2004 | US6770879 Motion picture output from electron microscope |
| 08/03/2004 | US6770878 Electron/ion gun for electron or ion beams with high monochromasy or high current density |
| 08/03/2004 | US6770874 Gas cluster ion beam size diagnostics and workpiece processing |
| 08/03/2004 | US6770867 Method and apparatus for scanned instrument calibration |
| 08/03/2004 | US6770852 Etching system having device measuring critical dimension test features along profile of wafer at preset locations, etching chamber with chuck supporting wafer, heating elements adjacent locations, controller adjusting temperature, reduces variation |
| 08/03/2004 | US6770836 Impedance matching circuit for inductively coupled plasma source |
| 08/03/2004 | US6770402 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 08/03/2004 | US6770178 Cathodic arc disposable sting shielding |
| 08/03/2004 | US6770166 Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor |
| 08/03/2004 | US6770165 Apparatus for plasma treatment |
| 08/03/2004 | US6769439 Used in semiconductor manufacturing, a plate-shaped protector made of dielectric and having similar electrical properties as the deposited film; removing thin film deposited on inner face of vacuum vessel |
| 07/29/2004 | WO2004064460A1 High frequency power supply device and plasma generator |
| 07/29/2004 | WO2004064407A2 Tunable gas distribution plate assembly |
| 07/29/2004 | WO2004064126A1 Charge particle exposure method, complementarily divided mask used for it, and semiconductor device produced by using the method |
| 07/29/2004 | WO2004064113A2 Cooled deposition baffle in high density plasma semiconductor processing |
| 07/29/2004 | WO2004064100A2 Mounting mechanism for plasma extraction aperture |
| 07/29/2004 | WO2004064098A2 Detector for environmental scanning electron microscope |
| 07/29/2004 | WO2004064097A2 Charged particle beam device for inspecting or structuring a specimen |
| 07/29/2004 | WO2004063814A2 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 07/29/2004 | WO2004063421A2 Deposition chamber surface enhancement and resulting deposition chambers |
| 07/29/2004 | WO2004063418A1 Member of apparatus for plasma treatment, member of treating apparatus, apparatus for plasma treatment, treating apparatus and method of plasma treatment |
| 07/29/2004 | WO2004062824A1 Method and apparatus for cleaning an analytical instrument while operating the analytical instrument |
| 07/29/2004 | WO2004062341A2 Method and apparatus for layer by layer deposition of thin films |
| 07/29/2004 | WO2004044653A3 Method and device for rastering source redundancy |
| 07/29/2004 | WO2004042773A3 Resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
| 07/29/2004 | WO2004032177A3 Apparatus and method for use of optical system with plasma proc essing system |
| 07/29/2004 | WO2004030016A3 Method for toolmatching and troubleshooting a plasma processing system |
| 07/29/2004 | WO2004027809A3 Charged particle beam system |
| 07/29/2004 | WO2003097891A3 High-power microwave window |
| 07/29/2004 | US20040147131 Plasma processing apparatus and plasma processing method |
| 07/29/2004 | US20040146196 Three-dimensional imaging of single particles |
| 07/29/2004 | US20040144932 Ion sources for ion implantation apparatus |
| 07/29/2004 | US20040144931 Cooling of a device for influencing an electron beam |
| 07/29/2004 | US20040144928 Inspection device using scanning electron microscope |
| 07/29/2004 | US20040144924 Method for the manufacture and transmissive irradiation of a sample, and particle-optical system |
| 07/29/2004 | US20040144923 Transmission electron microscope and three-dimensional observing method |
| 07/29/2004 | US20040144922 Electron microscope |
| 07/29/2004 | US20040144920 Energy filter and electron microscope |
| 07/29/2004 | US20040144643 Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles |
| 07/29/2004 | US20040144492 Plasma processing device |
| 07/29/2004 | US20040144491 Plasma processing apparatus and plasma processing method |
| 07/29/2004 | US20040144490 Method and apparatus for cleaning a CVD chamber |
| 07/29/2004 | US20040144489 Semiconductor processing device provided with a remote plasma source for self-cleaning |
| 07/29/2004 | US20040144400 Semiconductor processing with a remote plasma source for self-cleaning |
| 07/29/2004 | US20040144319 Plasma treatment container internal member, and plasma treatment device having the plasma treatment container internal member |
| 07/29/2004 | US20040144314 Plasma reactor including helical electrodes |
| 07/29/2004 | DE10302794A1 Manufacture of corpuscular radiation systems, e.g. electron beam or ion beam systems, producing corpuscular radiation systems on substrates using corpuscular radiation induced deposition |
| 07/29/2004 | DE10301579A1 Elektronenstrahlgerät und Detektoranordnung Electron beam device and detector array |
| 07/28/2004 | EP1441576A1 Method for judging arc of glow discharger and high-frequency arc discharge suppressor |
| 07/28/2004 | EP1441382A2 Electron beam apparatus having electron energy analyzer and method of controlling lenses |
| 07/28/2004 | EP1441381A2 Cooling of a device for influencing an electron beam |
| 07/28/2004 | EP1440457A2 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor |
| 07/28/2004 | EP1440456A1 Merie plasma reactor with showerhead rf electrode tuned to the plasma with arcing suppression |
| 07/28/2004 | EP1058943B1 Sem for transmission operation with a location-sensitive detector |
| 07/28/2004 | EP1018136B1 Imaging and/or raster-mode scanning system provided with a device for compensating the image degradations resulting from environmental factors |
| 07/28/2004 | CN1516888A Magnetron atomisation source |
| 07/28/2004 | CN1516887A Hollow anode plasma reactor and method |
| 07/28/2004 | CN1516750A 等离子cvd装置 Plasma cvd means |
| 07/28/2004 | CN1516536A Inductive coupled antenna and plasma processor using the same |
| 07/28/2004 | CN1516535A Plasma processing container internal parts |
| 07/28/2004 | CN1516233A Preloaded plasma reactor device and its use |
| 07/28/2004 | CN1159749C Method for controlling electrostatic lens and ion implantation device |
| 07/28/2004 | CN1159599C Mehanism for fixing scattering target, and electron self-rotating analyzer |
| 07/27/2004 | US6768836 Phosphor coated waveguide for the efficient collection of electron-generated photons |
| 07/27/2004 | US6768324 Semiconductor device tester which measures information related to a structure of a sample in a depth direction |
| 07/27/2004 | US6768269 Plasma process chamber monitoring method and system used therefor |
| 07/27/2004 | US6768125 Maskless particle-beam system for exposing a pattern on a substrate |
| 07/27/2004 | US6768124 Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same |
| 07/27/2004 | US6768121 Ion source having replaceable and sputterable solid source material |
| 07/27/2004 | US6768120 Focused electron and ion beam systems |
| 07/27/2004 | US6768118 Electron beam monitoring sensor and electron beam monitoring method |
| 07/27/2004 | US6768117 Immersion lens with magnetic shield for charged particle beam system |
| 07/27/2004 | US6768114 Electron microscope, method for operating the same, and computer-readable medium |
| 07/27/2004 | US6768113 Height of samples varies due to warping |
| 07/27/2004 | US6768112 Substrate inspection system and method for controlling same |
| 07/27/2004 | US6768110 Ion beam milling system and method for electron microscopy specimen preparation |
| 07/27/2004 | US6768079 Susceptor with built-in plasma generation electrode and manufacturing method therefor |
| 07/27/2004 | US6767844 Plasma chamber equipped with temperature-controlled focus ring and method of operating |
| 07/27/2004 | US6767829 Plasma deposition method and system |
| 07/27/2004 | US6767771 Formation process of quantum dots or wires |
| 07/27/2004 | US6767691 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 07/27/2004 | US6767593 Reaction chamber capable of being evacuated in which glow discharge is caused by means of a high frequency power supplied by a high frequency power introduction means to form a deposited film on a substrate |
| 07/27/2004 | US6767475 Chemical-organic planarization process for atomically smooth interfaces |
| 07/27/2004 | US6767436 Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces |
| 07/22/2004 | WO2004061995A1 Laser patterning of encapsulated organic light emitting diodes |
| 07/22/2004 | WO2004061928A1 Method and device for plasma-etching organic material film |
| 07/22/2004 | WO2004061902A2 Method and apparatus for monitoring a material processing system |
| 07/22/2004 | WO2004061894A1 Mid span support for a magnetic array of a cylindrical magnetron sputter device |
| 07/22/2004 | WO2004061893A2 Machine for uniform treatment of sample surfaces by multicharged ion projection |
| 07/22/2004 | WO2004061892A1 Sample observing system and sample observing method |
| 07/22/2004 | WO2004061890A2 Electron beam sensor |
| 07/22/2004 | WO2004061888A2 Method and apparatus for determining consumable lifetime |
| 07/22/2004 | WO2004061429A1 Monitoring erosion of system components by optical emission |
| 07/22/2004 | WO2004061153A2 Magnetron sputtering systems including anodic gas distribution systems |
| 07/22/2004 | WO2004061152A1 Pulsed magnetron target for sputter deposition |
| 07/22/2004 | WO2004031072A3 Electrostatically driven lithography |
| 07/22/2004 | WO2004008255A8 Method and apparatus for measuring critical dimensions with a particle beam |