Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2004
08/11/2004EP1444874A2 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within the processing chamber of said system
08/11/2004EP1444727A1 Process and apparatus for etching of thin, damage sensitive layers using high frequency pulsed plasma
08/11/2004EP1444726A1 Method and apparatus for the etching of photomask substrates using pulsed plasma
08/11/2004EP1444717A2 Tunable multi-zone gas injection system
08/11/2004EP1444716A2 A method for molding a polymer surface that reduces particle generation and surface adhesion forces while maintaining a high heat transfer coefficient
08/11/2004EP1079735A4 Laser soft docking system for medical treatment system
08/11/2004EP1042783B1 Focus rings
08/11/2004CN1520680A TDI detecting device, feed-through equipment and electrctron beam appts. using these devices
08/11/2004CN1520609A High pressure wafer-less auto clean for etch applications
08/11/2004CN1520606A Pedestal with integral shield
08/11/2004CN1520604A Electrode member for plasma treating appts., plasma treating appts. and plasma treating method
08/11/2004CN1520466A Assembles comprising molybdenum and aluminum and methods of utilizing interlayers in forming target/backing plate assemblies
08/11/2004CN1520245A Plasma processor appts. and method, and antenna
08/11/2004CN1161824C PLasma etch reactor and method
08/11/2004CN1161821C Plasma polymerizing apparatus having electrode with lot of uniform edges
08/10/2004US6775452 Phosphor coated waveguide for efficient collection of electron-generated photons
08/10/2004US6774570 Applying radio frequency wave of first frequency to discharge space to ignite radio frequency discharge of process gas, applying another radio frequency wave of different frequency to discharge space with time lag after igniting discharge
08/10/2004US6774569 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
08/10/2004US6774381 Electron beam system for treating filamentary workpiece, and method of fabricating optical fibers
08/10/2004US6774380 Variably shaped beam EB writing system
08/10/2004US6774379 Electron beam exposure apparatus and deflection amount correction method
08/10/2004US6774377 Electrostatic parallelizing lens for ion beams
08/10/2004US6774375 Method and apparatus for forming a curved polyline on a radiation-sensitive resist
08/10/2004US6774373 Adjustable implantation angle workpiece support structure for an ion beam implanter
08/10/2004US6774372 Electron-optical lens arrangement with an axis that can be largely displaced
08/10/2004US6774364 Electron microscope, method for operating the same, and computer-readable medium
08/10/2004US6774363 Method of preventing charging, and apparatus for charged particle beam using the same
08/10/2004US6774362 Analytical method for electron microscopy
08/10/2004US6774018 Barrier coatings produced by atmospheric glow discharge
08/10/2004US6773751 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
08/10/2004US6773562 Shadow frame for substrate processing
08/10/2004US6773558 Fluorine generator
08/10/2004US6773544 Magnetic barrier for plasma in chamber exhaust
08/10/2004US6772827 Suspended gas distribution manifold for plasma chamber
08/05/2004WO2004066360A2 Apparatus and methods for ionized deposition of a film or thin layer
08/05/2004WO2004066333A2 Method and device for producing corpuscular radiation systems
08/05/2004WO2004066331A2 Charged particle beam apparatus and method for operating the same
08/05/2004WO2004065940A1 Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method
08/05/2004WO2004044039A3 Process and apparatus for depositing plasma coating onto a container
08/05/2004WO2004038509A3 Lithography system
08/05/2004WO2004030011A3 Improved upper electrode plate in a plasma processing system and manufacturing method for the electrode
08/05/2004US20040153989 Pattern writing method capable of preventing or reducing an error between design dimensions and finished dimensions of a pattern
08/05/2004US20040151991 Photolithography mask repair
08/05/2004US20040151841 Forming mixed oxide interface; heating spraying
08/05/2004US20040151595 Closed-drift hall effect plasma vacuum pump for process reactors
08/05/2004US20040150938 Low voltage modular room ionization system
08/05/2004US20040150386 Power measurement mechanism for a transformer coupled plasma source
08/05/2004US20040149935 High throughput, low cost; exposing arbitrary pattern with constant and periodical arrangement of wirings and standard cells of semiconductor
08/05/2004US20040149933 Method and devices for adjusting an electron-beam used in an electron beam proximity exposure apparatus
08/05/2004US20040149927 Method of predicting a lifetime of filament in ion source and ion source device
08/05/2004US20040149926 Emittance measuring device for ion beams
08/05/2004US20040149925 Slit lens arrangement for particles beams
08/05/2004US20040149906 Method and apparatus for reducing substrate edge effects in electron lenses
08/05/2004US20040149741 Plasma processing apparatus
08/05/2004US20040149701 Reaction enhancing gas feed for injecting gas into a plasma chamber
08/05/2004US20040149699 Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
08/05/2004US20040149698 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge
08/05/2004US20040149697 Vacuum seal protection in a dielectric break
08/05/2004US20040149576 High-power ion sputtering magnetron
08/05/2004US20040149574 Penning discharge plasma source
08/05/2004US20040149565 Method for manufacturing a workpiece using a magnetron sputter source
08/05/2004US20040149394 Apparatus for uniformly etching a dielectric layer
08/05/2004US20040149389 Plasma processing device
08/05/2004US20040149388 Device and method for etching a substrate by using an inductively coupled plasma
08/05/2004US20040149387 Inductively coupled antenna and plasma processing apparatus using the same
08/05/2004US20040149386 Plasma processing device and method of cleaning the same
08/05/2004US20040149385 Plasma processing apparatus
08/05/2004US20040149384 Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe
08/05/2004US20040149225 Process and apparatus for depositing plasma coating onto a container
08/05/2004US20040149224 Gas tube end cap for a microwave plasma generator
08/05/2004US20040149223 Inductively coupled plasma downstream strip module
08/05/2004US20040149221 Plasma processor
08/05/2004US20040149219 Plasma doping method and plasma doping apparatus
08/05/2004US20040149218 Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage
08/05/2004US20040149217 Plasma immersion ion implantation system including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage
08/05/2004US20040149216 Plasma processing apparatus
08/05/2004US20040149214 Vacuum processing apparatus
08/05/2004US20040149210 Cylinder-based plasma processing system
08/05/2004US20040149208 Particle control device and particle control method for vacuum processing apparatus
08/05/2004DE10154229B4 Einrichtung für die Regelung einer Plasmaimpedanz Means for controlling a plasma impedance
08/04/2004EP1443541A2 Method for the manufacture and transmissive irradiation of a sample, and particle-optical system
08/04/2004EP1442471A2 System and method for fast focal length alterations
08/04/2004EP1442153A1 Gcib processing to improve interconnection vias and improved interconnection via
08/04/2004EP1336188B1 Extraction and deceleration of low energy beam with low beam divergence
08/04/2004CN1518401A Plasma generation system
08/04/2004CN1518073A 等离子体处理装置及聚焦环 The plasma processing apparatus and the focus ring
08/04/2004CN1518049A Electronic microscope
08/04/2004CN1518033A Electronic device with wide lens and for small firing point size
08/04/2004CN1517170A Electron beam wselding method and its welded structural unit
08/04/2004CN1160762C Electronic beam exposure mask, exposure method and equipment and method for making semiconductor device
08/04/2004CN1160483C Method for manufacturing thin film, and deposition apparatus
08/04/2004CN1160480C Apparatus for simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
08/04/2004CN1160479C Plasma enhanced chemical processing reactor and method
08/04/2004CN1160478C Vacuum film growth apparatus
08/03/2004US6771481 Plasma processing apparatus for processing semiconductor wafer using plasma
08/03/2004US6771418 Method and apparatus for extracting three-dimensional spacial data of object using electron microscope
08/03/2004US6771026 Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron wave
08/03/2004US6771013 Low power schottky emitter
08/03/2004US6771012 Apparatus for producing a flux of charge carriers
08/03/2004US6770890 Stage devices including linear motors that produce reduced beam-perturbing stray magnetic fields, and charged-particle-beam microlithography systems comprising same