Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2014
08/26/2014US8816281 Ion energy analyzer and methods of manufacturing the same
08/26/2014US8816278 Imaging methods
08/26/2014US8816276 Electron beam writing apparatus and electron beam writing method
08/26/2014US8815329 Delivered energy compensation during plasma processing
08/26/2014US8815106 Method of supplying etching gas and etching apparatus
08/26/2014US8815047 Plasma chemical reactor
08/21/2014WO2014127230A1 Particle functionalization
08/21/2014WO2014126551A1 Multi-step ion implantation
08/21/2014WO2014126227A1 Two rotating electric fields mass analyzer
08/21/2014WO2014125098A1 High - resolution amplitude contrast imaging
08/21/2014US20140235063 Hybrid edge ring for plasma wafer processing
08/21/2014US20140235042 Ion implantation method and ion implantation apparatus
08/21/2014US20140232274 Calibrated energy transfer
08/21/2014US20140232266 Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages
08/21/2014US20140232263 Symmetrical inductively coupled plasma source with side rf feeds and spiral coil antenna
08/21/2014US20140231670 Testing assembly including a multiple degree of freedom stage
08/21/2014US20140231668 Electron beam lithography device and lithographic method
08/21/2014US20140231667 Plasma generator
08/21/2014US20140231666 Charged particle beam device
08/21/2014US20140231389 Plasma processing apparatus and plasma processing method
08/21/2014US20140231251 Gas supply member, plasma processing apparatus and method of fabricating gas supply member
08/21/2014US20140231243 Charge removal from electrodes in unipolar sputtering system
08/21/2014US20140231019 Susceptor
08/21/2014US20140231016 Plasma processing apparatus
08/21/2014US20140231015 Plasma processing apparatus
08/21/2014US20140230730 Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
08/21/2014US20140230729 Microwave plasma reactor for manufacturing synthetic diamond material
08/21/2014DE112010003657B4 Ätzanlage Etching system
08/21/2014DE102014001653A1 Laserionenquelle und Schwerteilchenstrahl-Therapiegerät Laser ion source and Schwerteilchenstrahl therapy unit
08/20/2014EP2767611A1 Vapor deposition apparatus, deposition method, and method of manufacturing organic light-emitting display apparatus by using the same
08/20/2014EP2766917A1 Mass spectrometer
08/19/2014US8809806 Portable sterilization assembly
08/19/2014US8809803 Inductively coupled plasma ion source with multiple antennas for wide ion beam
08/19/2014US8809800 Ion source and a method for in-situ cleaning thereof
08/19/2014US8809799 Charged particles beam apparatus and charged particles beam apparatus design method
08/19/2014US8809782 Scanning electron microscope
08/19/2014US8809781 Method of electron beam imaging of a specimen by combining images of an image sequence
08/19/2014US8809780 Electron beam layer manufacturing using scanning electron monitored closed loop control
08/19/2014US8809778 Pattern inspection apparatus and method
08/19/2014US8809199 Method of etching features in silicon nitride films
08/19/2014US8808812 Oriented carbon nanotube manufacturing method
08/19/2014US8808563 Selective etch of silicon by way of metastable hydrogen termination
08/19/2014US8808562 Dry metal etching method
08/19/2014US8808559 Etch rate detection for reflective multi-material layers etching
08/19/2014US8808496 Plasma tuning rods in microwave processing systems
08/19/2014US8807078 Plasma microwave resonant cavity
08/14/2014WO2014122250A1 Method of hipims sputtering and hipims sputter system
08/14/2014WO2014094738A3 Arc extinguishing method and power supply system having a power converter
08/14/2014US20140227557 Sputtering target for forming protective film and laminated wiring film
08/14/2014US20140226003 Microscopy imaging method and system
08/14/2014US20140225504 Plasma processing apparatus, plasma processing method and high frequency generator
08/14/2014US20140225503 Method for controlling plasma processing apparatus
08/14/2014US20140225502 Remote plasma generation apparatus
08/14/2014US20140225498 Plasma catalyst chemical reaction apparatus
08/14/2014US20140225495 System and method for treatment of biofilms
08/14/2014US20140225008 Multi charged particle beam writing apparatus and multi charged particle beam writing method
08/14/2014US20140224999 Electrostatic lens and charged particle beam apparatus using the same
08/14/2014US20140224988 Phase plate and electron microscope
08/14/2014US20140224987 Methods of fabricating microelectronic substrate inspection equipment
08/14/2014US20140224986 Pattern measurement device and pattern measurement method
08/14/2014US20140224985 Focusing a charged particle imaging system
08/14/2014US20140224776 Laser-induced gas plasma machining
08/14/2014US20140224768 Method for removing hard carbon layers
08/14/2014US20140224644 Deposition apparatus and method of manufacturing organic light emitting display apparatus using the same
08/14/2014US20140224427 Dry etching apparatus and clamp therefor
08/14/2014DE112012004821T5 Rasterionenmikroskop und Sekundärteilchen-Steuerungsverfahren Scanning ion microscope and secondary control method
08/13/2014EP2765596A1 Ion implantation at high temperature surface equilibrium conditions
08/13/2014EP2765593A2 Plasma catalyst chemical reaction apparatus
08/13/2014EP2765592A2 Homogenous plasma chemical reaction device
08/13/2014EP2765591A1 Sample preparation stage
08/13/2014EP2765217A1 Remote plasma generation apparatus
08/13/2014EP2764531A1 Method of controlling an ion implanter in plasma immersion mode
08/13/2014EP2764530A1 Control module for an ion implanter in the plasma immersion mode
08/13/2014CN203774246U 用于制备低介电常数材料的等离子增强化学气相沉积装置 For the preparation of low dielectric constant material of plasma enhanced chemical vapor deposition apparatus
08/13/2014CN203774245U 扫描电子显微镜 Scanning electron microscope
08/13/2014CN203774244U 电阻触发式真空弧离子源装置 Resistance triggered vacuum arc ion source device
08/13/2014CN103985659A 一种mocvd半导体处理装置及制作方法 A semiconductor processing apparatus and method of making mocvd
08/13/2014CN103985624A 电感耦合等离子体处理装置 Inductively coupled plasma processing apparatus
08/13/2014CN103985623A 等离子体处理系统中的射频（rf）接地返回及其方法 RF plasma processing system (rf) and the ground return method
08/13/2014CN102339714B 等离子体处理系统中确定清洁或调节处理终点的装置 The plasma processing system determines the end of cleaning or adjustment processing means
08/12/2014US8803411 Charged particle beam radiation apparatus
08/12/2014US8803112 Silicon-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during silicon ion implantation
08/12/2014US8803111 Sample preparation apparatus and sample preparation method
08/12/2014US8803110 Methods for beam current modulation by ion source parameter modulation
08/12/2014US8803108 Method for acquiring settling time
08/12/2014US8803103 Inspection system by charged particle beam and method of manufacturing devices using the system
08/12/2014US8803102 Retarding field analyzer integral with particle beam column
08/12/2014US8800484 Plasma processing apparatus
08/07/2014WO2014121122A1 Nanoparticle sources
08/07/2014WO2014120234A1 Methods of forming layers
08/07/2014WO2014120233A1 Methods of forming layers
08/07/2014WO2014120232A1 System for low energy ion implantation and layer formation
08/07/2014WO2014118513A1 Apparatus and methods for defining a plasma
08/07/2014WO2014118177A1 Deposition source with adjustable electrode
08/07/2014WO2014118063A1 Gas separation by adjustable separation wall
08/07/2014WO2014118062A1 Common deposition platform, processing station and method of operation thereof
08/07/2014US20140220261 Microwave plasma reactors
08/07/2014US20140218710 Exposure apparatus for forming a reticle
08/07/2014US20140218076 Synchronization of RF Pulsing With RF Metrology, Processing, and Control
08/07/2014US20140217895 Temperature controlled window of a plasma processing chamber component
1 ... 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 ... 469