| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/24/2004 | US6780551 Charged particle processing for forming pattern boundaries at a uniform thickness |
| 08/24/2004 | US6780464 Rotation in gas flow; forming polycrystalline silicon |
| 08/24/2004 | US6780294 Shield assembly for substrate processing chamber |
| 08/24/2004 | US6780278 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 08/24/2004 | US6779483 Plasma CVD apparatus for large area CVD film |
| 08/24/2004 | US6779482 Plasma deposition device for forming thin film |
| 08/24/2004 | US6779481 Electrical coupling between chamber parts in electronic device processing equipment |
| 08/24/2004 | US6779410 Sample holder and auxiliary apparatus |
| 08/24/2004 | US6779263 Method for molding a polymer surface that reduces particle generation and surface adhesion forces while maintaining a high heat transfer coefficient |
| 08/19/2004 | WO2004070813A1 Plasma processing apparatus and method |
| 08/19/2004 | WO2004070808A1 Plasma treating device, and plasma treating device electrode plate, and electrode plate producing method |
| 08/19/2004 | WO2004070766A1 Electron source |
| 08/19/2004 | WO2004070765A1 Resistive cantilever spring for probe microscopy |
| 08/19/2004 | WO2004070761A2 Method and apparatus for improved fastening hardware |
| 08/19/2004 | WO2004070744A2 Reaction enhancing gas feed for injecting gas into a plasma chamber |
| 08/19/2004 | WO2004070743A2 Transformer ignition circuit for a transformer coupled plasma source |
| 08/19/2004 | WO2004070742A2 Mechanism for minimizing ion bombardment energy in a plasma chamber |
| 08/19/2004 | WO2004070741A2 Power measurement in a transformer coupled plasma source |
| 08/19/2004 | WO2004070237A2 Vacuum seal protection in a dielectric break |
| 08/19/2004 | WO2004042771A3 Method of etching a silicon-containing dielectric material |
| 08/19/2004 | WO2003087018A3 Specimen holding apparatus |
| 08/19/2004 | WO2003065131A3 Method and apparatus for electron density measurement and verifying process status |
| 08/19/2004 | US20040161943 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers |
| 08/19/2004 | US20040161915 Method of reducing contamination-induced process variations during ion implantation |
| 08/19/2004 | US20040161708 Method of manufacturing nano-gap electrode |
| 08/19/2004 | US20040161579 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production |
| 08/19/2004 | US20040160191 Inter-stage plasma source |
| 08/19/2004 | US20040160190 Transformer ignition circuit for a transformer coupled plasma source |
| 08/19/2004 | US20040159787 Electron beam system |
| 08/19/2004 | US20040159773 Imaging system and methodology |
| 08/19/2004 | US20040159639 Plasma processing method and plasma processing apparatus |
| 08/19/2004 | US20040159539 Cylindrical magnetron target and spindle apparatus |
| 08/19/2004 | US20040159401 Vacuum chamber for plasma treatment; imparting mechanical oscillation to the apparatus and detecting oscillation generated |
| 08/19/2004 | US20040159287 Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent |
| 08/19/2004 | US20040159286 Plasma treatment device |
| 08/19/2004 | DE10303683A1 Verfahren zum Verringern der durch Kontamination hervorgerufenen Prozessfluktuationen während des Ionenimplantierens A method of reducing the contamination caused by process fluctuations during the ion implanting |
| 08/18/2004 | EP1448030A1 Plasma processing system |
| 08/18/2004 | EP1447902A2 Linear motor, stage apparatus, exposure apparatus and device manufacturing method |
| 08/18/2004 | EP1447656A1 Specimens for transmission electron microscope |
| 08/18/2004 | EP1446825A1 Apparatus and method for improving etch rate uniformity |
| 08/18/2004 | EP1446819A1 Device for controlling an apparatus generating a charged particle beam |
| 08/18/2004 | EP1446702A2 Maskless printer using photoelectric conversion of a light beam array |
| 08/18/2004 | EP1446676A2 Spot grid array electron beam imaging system |
| 08/18/2004 | EP1446633A1 Method and apparatus for wall film monitoring |
| 08/18/2004 | CN1522465A Plasma etching of silicon carbide |
| 08/18/2004 | CN1522457A Chamber components having textured surfaces and method of manufacture |
| 08/18/2004 | CN1522390A Electron beam exposure method and system therefor |
| 08/18/2004 | CN1521805A Plasma processing device, annular element and plasma processing method |
| 08/17/2004 | US6778272 Method of processing a semiconductor device |
| 08/17/2004 | US6777882 Ion beam generator |
| 08/17/2004 | US6777881 Dircect current power source configured to supply high-frequency output from conversion circuit; load impedance converts to delayed load |
| 08/17/2004 | US6777880 Particles are exposed in location-selective manner to external adjustment forces and/or plasma conditions are subjected to location-selective change to apply particles onto a substrate surface mask-free and/ or subject it to plasma treatment |
| 08/17/2004 | US6777698 Electron beam exposure apparatus exposing method using an electron beam |
| 08/17/2004 | US6777697 Charged-particle beam exposure apparatus and device manufacturing method using the same |
| 08/17/2004 | US6777696 Deflecting acceleration/deceleration gap |
| 08/17/2004 | US6777695 Rotating beam ion implanter |
| 08/17/2004 | US6777694 Electron beam exposure system and electron lens |
| 08/17/2004 | US6777688 Rotational stage for high speed, large area scanning in focused beam systems |
| 08/17/2004 | US6777687 Substrate positioning system |
| 08/17/2004 | US6777686 Control system for indirectly heated cathode ion source |
| 08/17/2004 | US6777679 Method of observing a sample by a transmission electron microscope |
| 08/17/2004 | US6777678 Sample-stage for scanning electron microscope |
| 08/17/2004 | US6777675 Detector optics for electron beam inspection system |
| 08/17/2004 | US6777670 Mass analyzer capable of parallel processing one or more analytes |
| 08/17/2004 | US6777639 Radial pulsed arc discharge gun for synthesizing nanopowders |
| 08/17/2004 | US6777166 Aberrations compensation such as image field curvature |
| 08/17/2004 | US6777045 Chamber components having textured surfaces and method of manufacture |
| 08/17/2004 | US6777037 Plasma processing method and apparatus |
| 08/17/2004 | US6776881 A target body with a mirror-symmetrical, concavely constructed atomization surface and a magnetic circuit arrangement operable to generate a magnetic field over the surface; stable plasma discharge |
| 08/17/2004 | US6776879 For forming a thin film having uniform thickness on substrate |
| 08/17/2004 | US6776874 Processing method and apparatus for removing oxide film |
| 08/17/2004 | US6776848 Motorized chamber lid |
| 08/17/2004 | US6776846 Integrated processing system having multiple reactors connected to a central chamber |
| 08/12/2004 | WO2004068917A1 Plasma processor and plasma processing method |
| 08/12/2004 | WO2004068559A2 Helix coupled remote plasma source |
| 08/12/2004 | WO2004068538A2 Object-moving method, object-moving apparatus and production process using the method |
| 08/12/2004 | WO2004068530A1 Plasma reactor including helical electrodes |
| 08/12/2004 | WO2004068529A2 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample |
| 08/12/2004 | WO2004068148A2 Method of and apparatus for measurement and control of a gas cluster ion beam |
| 08/12/2004 | WO2004067800A1 Method and apparatus for cleaning a cvd chamber |
| 08/12/2004 | WO2004055856A3 Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens |
| 08/12/2004 | WO2004053592A8 Reticle manipulations |
| 08/12/2004 | WO2004044941A3 Method and apparatus for stabilizing of the glow plasma discharges |
| 08/12/2004 | WO2004032178A3 Plasma processing system and method |
| 08/12/2004 | US20040157447 Plasma processing method |
| 08/12/2004 | US20040157445 Method of and apparatus for tailoring an etch profile |
| 08/12/2004 | US20040157284 comprising an environmental chamber, a holder for a sample or a carrier, and at least one blotting element to which a medium for absorbing liquid is or can be attached, both disposed in the environmental chamber, and a cooling medium |
| 08/12/2004 | US20040157005 Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions |
| 08/12/2004 | US20040156223 System and method for evaluating a semiconductor device pattern, method for controlling process of forming a semiconductor device pattern and method for monitoring a semiconductor device manufacturing process |
| 08/12/2004 | US20040155592 Magnetic mirror plasma source |
| 08/12/2004 | US20040155204 Mask and method for producing thereof and a semiconductor device using the same |
| 08/12/2004 | US20040155200 Optical particle corrector |
| 08/12/2004 | US20040155185 Method of preventing charging, and apparatus for charged particle beam using the same |
| 08/12/2004 | US20040155015 Plasma ignition method and apparatus |
| 08/12/2004 | US20040154919 Electric arc evaporator |
| 08/12/2004 | US20040154747 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
| 08/12/2004 | US20040154744 Method and system for surface or cross-sectional processing and observation |
| 08/12/2004 | US20040154541 Method and apparatus for sequential plasma treatment |
| 08/12/2004 | US20040154540 Plasma processing unit and high-frequency electric power supplying unit |
| 08/12/2004 | DE10032607B4 Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät Particle beam with a to be operated in an ultrahigh vacuum and particle cascade pumping arrangement for such a particle beam |