| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/02/2004 | DE10214272B4 Halterung für einen Wafer Holder for a wafer |
| 09/01/2004 | EP1453077A2 Scanning electron microscope and sample observing method |
| 09/01/2004 | EP1453076A2 Deflector, method of its manufacture and its use in a charged particle beam exposure apparatus |
| 09/01/2004 | EP1452486A2 Manufacturing apparatus for carbon nanotube |
| 09/01/2004 | EP1451892A1 Plasma production device and method and rf driver circuit |
| 09/01/2004 | EP1451850A2 Non-thermal plasma slit discharge apparatus |
| 09/01/2004 | EP1451849A1 Information acquisition apparatus, cross section evaluating apparatus, and cross section evaluating method |
| 09/01/2004 | EP1451848A1 Device for reducing the impact of distortions in a microscope |
| 09/01/2004 | EP1451847A1 Optical particle corrector |
| 09/01/2004 | EP1451846A2 Electron source |
| 09/01/2004 | EP1388882A9 Particle-optical systems |
| 09/01/2004 | CN2638237Y Flysecond strong current high brightness electron microscope device |
| 09/01/2004 | CN1526154A Ion source filament and method |
| 09/01/2004 | CN1525519A Magnetron cathode and magnetron sputtering apparatus comprising the same |
| 09/01/2004 | CN1525259A Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector |
| 09/01/2004 | CN1165208C Plasma processing apparatus and method |
| 08/31/2004 | US6785615 Method and structure for detection of electromechanical problems using variance statistics in an E-beam lithography device |
| 08/31/2004 | US6784445 Apparatus for monitoring intentional or unavoidable layer depositions and method |
| 08/31/2004 | US6784442 Exposure apparatus, control method thereof, and device manufacturing method |
| 08/31/2004 | US6784438 Electron projection lithography apparatus using secondary electrons |
| 08/31/2004 | US6784437 Corrector for correcting first-order chromatic aberrations of the first degree |
| 08/31/2004 | US6784426 Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection method |
| 08/31/2004 | US6784425 Energy filter multiplexing |
| 08/31/2004 | US6784085 MIIIN based materials and methods and apparatus for producing same |
| 08/31/2004 | US6784080 Method of manufacturing semiconductor device by sputter doping |
| 08/31/2004 | US6783905 Exposure region is divided into a plurality of grating regions. a pattern density is obtained for one of the plurality of grating regions. a backward scattering coefficient is determined in accordance with the pattern |
| 08/31/2004 | US6783863 Substrate with a surface spray coating of yttrium oxide (Y2O3); resistance to chemical corrosion and plasma erosion by halogen gas |
| 08/31/2004 | US6783641 Vacuum treatment system and process for manufacturing workpieces |
| 08/31/2004 | US6783639 Coils for generating a plasma and for sputtering |
| 08/31/2004 | US6783638 Flat magnetron |
| 08/31/2004 | US6783629 Plasma treatment apparatus with improved uniformity of treatment and method for improving uniformity of plasma treatment |
| 08/31/2004 | US6783628 Plasma processing apparatus |
| 08/31/2004 | US6783626 Treatment and evaluation of a substrate processing chamber |
| 08/31/2004 | US6782843 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
| 08/26/2004 | WO2004073363A1 Plasma generating apparatus, plasma generating method, and remote plasma processing apparatus |
| 08/26/2004 | WO2004073362A1 Plasma generating apparatus and plasma etching apparatus |
| 08/26/2004 | WO2004073010A1 Electron gun |
| 08/26/2004 | WO2004073009A2 Plasma processing installation, influenced by a magnetic field, for processing a continuous material or a workpiece |
| 08/26/2004 | WO2004072754A2 Power supply control unit |
| 08/26/2004 | WO2004072631A2 A method for measuring and reducing angular deviations of a charged particle beam |
| 08/26/2004 | WO2004061893A3 Machine for uniform treatment of sample surfaces by multicharged ion projection |
| 08/26/2004 | WO2004050943A3 Method for the treatment of surfaces with plasma in a vacuum and unit for the same |
| 08/26/2004 | WO2004044943A3 Retarding electron beams in multiple electron beam pattern generation |
| 08/26/2004 | WO2004044261A3 High deposition rate sputtering |
| 08/26/2004 | WO2004015742A3 High rate deposition in a batch reactor |
| 08/26/2004 | US20040167710 Method of presuming traffic conditions by using floating car data and system for presuming and presenting traffic conditions by using floating data |
| 08/26/2004 | US20040166612 Fabrication of silicon-on-insulator structure using plasma immersion ion implantation |
| 08/26/2004 | US20040166598 processing method |
| 08/26/2004 | US20040166597 Directed gas injection apparatus for semiconductor processing |
| 08/26/2004 | US20040166426 Electron beam recorder and electron beam irradiation position detecting method |
| 08/26/2004 | US20040165324 Modular current supply |
| 08/26/2004 | US20040164831 Constant power and temperature coil |
| 08/26/2004 | US20040164245 Scanning electron microscope with measurement function |
| 08/26/2004 | US20040164244 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 08/26/2004 | US20040164243 Shape measurement method and apparatus |
| 08/26/2004 | US20040164242 Sample preparation for transmission electron microscopy |
| 08/26/2004 | US20040163952 Magnetron with adjustable target positioning |
| 08/26/2004 | US20040163951 Magnetron sputtering apparatus |
| 08/26/2004 | US20040163945 Substrate coating region and electrode cleaning region; rotatable electrode positioned in deposition chamber having interior cavitiy with magnet systems disposed |
| 08/26/2004 | US20040163944 Magnetron with controlled DC power |
| 08/26/2004 | US20040163943 Cylindrical magnetron with self cleaning target |
| 08/26/2004 | US20040163767 Plasma producing device |
| 08/26/2004 | US20040163766 Charged particle source and operation thereof |
| 08/26/2004 | US20040163765 Plasma reactor for manufacturing electronic components |
| 08/26/2004 | US20040163764 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
| 08/26/2004 | US20040163763 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment |
| 08/26/2004 | US20040163762 Plasma treating device and substrate mounting table |
| 08/26/2004 | US20040163761 Directed gas injection apparatus for semiconductor processing |
| 08/26/2004 | US20040163595 Plasma processing apparatus |
| 08/26/2004 | US20040163594 Method and assembly for providing impedance matching network and network assembly |
| 08/26/2004 | US20040163593 Plasma-processing apparatus |
| 08/26/2004 | US20040163450 3-Axis straight-line motion stage and sample test device using the same |
| 08/26/2004 | DE10312549B3 Power supply for direct current gas discharge equipment has three-phase supply with full-wave rectifier followed by inverter, transformer, second rectifier and second voltage reduction stage |
| 08/26/2004 | DE10306347A1 Controlling supply of power from AC supply to two consumers in plasma process, by adjusting supplied power if actual power deviates from set value |
| 08/25/2004 | EP1450391A2 Charged particle beam device |
| 08/25/2004 | EP1450389A2 Multimode ion source with a hollow cathode sputter ion source-like structure with radial ion extracion. |
| 08/25/2004 | EP1449934A2 Vacuum arc vapor deposition apparatus |
| 08/25/2004 | EP1449234A1 Magnetron sputtering device |
| 08/25/2004 | EP1449233A1 Microwave plasma generator |
| 08/25/2004 | EP1448769A1 Soft ionization device and applications thereof |
| 08/25/2004 | EP1350259B1 Sem provided with a secondary electron detector having a central electrode |
| 08/25/2004 | CN1524283A High performance magnetron for DC sputtering systems |
| 08/25/2004 | CN1523642A Method for reducing electronic excitation energy loss during actions between various particle beams and objects by forming dynamic quasi-neutral particle beam mode |
| 08/25/2004 | CN1523323A Process for measuring substance length by means of electron microscope |
| 08/25/2004 | CN1163942C Large workpiece plasma processor |
| 08/25/2004 | CN1163739C Method for detecting single microparticle of sulfate and nitrate |
| 08/25/2004 | CN1163683C Vacuum tight coupling for tube sections |
| 08/24/2004 | US6781680 Optical system adjusting method for energy beam apparatus |
| 08/24/2004 | US6781383 Method for fault detection in a plasma process |
| 08/24/2004 | US6781317 Methods and apparatus for calibration and metrology for an integrated RF generator system |
| 08/24/2004 | US6781296 Method and apparatus for use with an electron gun employing a thermionic source of electrons |
| 08/24/2004 | US6781141 Method and structure for detection and measurement of electrical and mechanical resonance associated with an E-beam lithography tool |
| 08/24/2004 | US6781140 Method of and machine for pattern writing by an electron beam |
| 08/24/2004 | US6781139 Load lock vacuum conductance limiting aperture |
| 08/24/2004 | US6781138 Positioning stage with stationary actuators |
| 08/24/2004 | US6781125 Method and apparatus for processing a micro sample |
| 08/24/2004 | US6781124 Particle detectors |
| 08/24/2004 | US6781123 Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus |
| 08/24/2004 | US6780787 Low contamination components for semiconductor processing apparatus and methods for making components |
| 08/24/2004 | US6780759 Method for multi-frequency bonding |