| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/10/2004 | WO2004076343A1 Method for fabricating three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstructure |
| 09/10/2004 | WO2004057638A9 Method and apparatus for aerodynamic ion focusing |
| 09/10/2004 | WO2004053922A3 Apparatus and method for shielding a wafer from charged particles during plasma etching |
| 09/10/2004 | WO2004008502A3 Multirate processing for metrology of plasma rf source |
| 09/10/2004 | WO2004003968A3 Method and system for arc suppression in a plasma processing system |
| 09/09/2004 | US20040175953 Apparatus for generating planar plasma using concentric coils and ferromagnetic cores |
| 09/09/2004 | US20040175946 Method and system for processing semiconductor wafers |
| 09/09/2004 | US20040175913 End point detection in time division multiplexed etch processes |
| 09/09/2004 | US20040175849 Method and apparatus for processing semiconductor |
| 09/09/2004 | US20040174588 Electron microscope and method for controlling focus position thereof |
| 09/09/2004 | US20040174530 Semiconductor fabricating apparatus with function of determining etching processing state |
| 09/09/2004 | US20040173762 Tdi detecting device, a feed-through equipment and electron beam apparatus using these devices |
| 09/09/2004 | US20040173759 Device, set and method for carrying a gas or a liquid to a surface through a tube |
| 09/09/2004 | US20040173758 Ion source and ion beam device |
| 09/09/2004 | US20040173757 Halation-prevention filter, image analysis device equipped with said halation-prevention filter, and diffraction pattern intensity analysis method and diffraction pattern intensity correction program that use said halation-prevention filter |
| 09/09/2004 | US20040173756 Halation-prevention filter, image analysis device equipped with said halation-prevention filter, and diffraction pattern intensity analysis method and diffraction pattern intensity correction program that use said halation-prevention filter |
| 09/09/2004 | US20040173755 Electron-beam focusing apparatus and electron-beam projection lithography system employing the same |
| 09/09/2004 | US20040173749 Method and device for observing a specimen in a field of view of an electron microscope |
| 09/09/2004 | US20040173748 Method of measuring the performance of a scanning electron microscope |
| 09/09/2004 | US20040173747 Scanning electron microscope |
| 09/09/2004 | US20040173746 Method and system for use in the monitoring of samples with a charged particles beam |
| 09/09/2004 | US20040173745 Defect evaluation apparatus utilizing positrons |
| 09/09/2004 | US20040173581 Plasma processing method and plasma processing apparatus |
| 09/09/2004 | US20040173573 etching gas contains C4F6 gas and O2 gas, and the ratio C4F6/O2 of the C4F6 gas to the O2 gas falls within a range of 0.7 and 1.5 |
| 09/09/2004 | US20040173571 Method for etching structures in an etching body by means of a plasma |
| 09/09/2004 | US20040173455 Cylindrically vaulted sputtering target with sidewall and roof magnetrons |
| 09/09/2004 | US20040173319 Quartz component for plasma processing apparatus and restoring method thereof |
| 09/09/2004 | US20040173317 Resist stripper system |
| 09/09/2004 | US20040173314 Plasma processing apparatus and method |
| 09/09/2004 | US20040173313 Fire polished showerhead electrode |
| 09/09/2004 | US20040173310 Arrangement and method for detecting sidewall flaking in a plasma chamber |
| 09/09/2004 | US20040173309 Plasma processing apparatus and plasma processing method |
| 09/09/2004 | US20040173162 Motorized chamber lid |
| 09/09/2004 | US20040173159 Semiconductor process chamber electrode |
| 09/09/2004 | US20040173157 Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same |
| 09/09/2004 | US20040173156 Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system |
| 09/09/2004 | US20040173155 Method and apparatus for an improved optical window deposition shield in a plasma processing system |
| 09/09/2004 | DE4325041B4 Aetz- oder Plasma-CVD-Anlage Caustic or plasma CVD system |
| 09/09/2004 | DE4104845C5 Elektronenstrahlerzeuger, insbesondere für eine Elektronenstrahlkanone Electron beam generator, particularly for an electron gun |
| 09/09/2004 | DE10243827B4 Direktschreibendes Elektronenstrahl - Lithographieverfahren zur Herstellung einer zweidimensionalen Struktur im Submikrometerbereich Direct-writing electron beam - lithographic process for producing a two-dimensional structure in the submicron range |
| 09/08/2004 | EP1455380A1 Charged particle beam device with cleaning unit and method of operation thereof |
| 09/08/2004 | EP1455379A2 Apparatus and method for examining specimen with a charged particle beam |
| 09/08/2004 | EP1455378A1 Sample imaging method and charged particle beam system |
| 09/08/2004 | EP1454385A1 Restricted getter |
| 09/08/2004 | EP1454336A2 Raster shaped beam, electron beam exposure strategy using a two dimensional multiplexel flash field |
| 09/08/2004 | EP1454335A1 Measurement device for electron microscope |
| 09/08/2004 | EP1454334A2 Lens array with a laterally movable optical axis for corpuscular rays |
| 09/08/2004 | EP1261755B1 Device and method for carrying out plasma enhanced surface treatment of substrates in a vacuum |
| 09/08/2004 | EP0958401B1 Apparatus and method for high density plasma chemical vapor deposition or etching |
| 09/08/2004 | CN1527358A Electronic beam focusing equipment and electronic beam projection micro shadow system using the same equipment |
| 09/08/2004 | CN1526852A Method and special apparatus for modifying inner surface of tubular workpiece |
| 09/08/2004 | CN1526515A Reaction bombardment method for improving surface finish degree of diamond |
| 09/08/2004 | CN1166263C Ion source for ion implanter and method for ion formation in ion implanter |
| 09/08/2004 | CN1165981C Method and apparatus for monitoring charge neutralization operation |
| 09/08/2004 | CN1165969C Plasma processing device |
| 09/08/2004 | CN1165952C Process detection system for plasma process |
| 09/08/2004 | CN1165951C Method for operation of high-power electron beam |
| 09/08/2004 | CN1165637C Equipment for making semiconductor device using vacuum system |
| 09/08/2004 | CN1165635C Plasma treatment process and treatment apparatus thereof |
| 09/07/2004 | US6787784 Charged-particle beam drawing data creation method, and charged-particle beam drawing apparatus using the same |
| 09/07/2004 | US6787783 Apparatus and techniques for scanning electron beam based chip repair |
| 09/07/2004 | US6787781 Arc chamber filament for ion implanter |
| 09/07/2004 | US6787780 Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device |
| 09/07/2004 | US6787779 Apparatus wherein ionizing radiation is generated |
| 09/07/2004 | US6787773 Film thickness measurement using electron-beam induced x-ray microanalysis |
| 09/07/2004 | US6787772 Scanning electron microscope |
| 09/07/2004 | US6787478 Method of forming deposited film |
| 09/07/2004 | US6787200 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 09/07/2004 | US6787044 Launching electromagnetic wave into cylindrical chamber to create ionization zone; creating radially oriented electric field |
| 09/07/2004 | US6787011 Cylindrical target and its production method |
| 09/07/2004 | US6787010 Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
| 09/07/2004 | US6787006 Operating a magnetron sputter reactor in two modes |
| 09/07/2004 | US6786176 Diamond film depositing apparatus and method thereof |
| 09/07/2004 | US6786175 Showerhead electrode design for semiconductor processing reactor |
| 09/02/2004 | WO2004075269A1 Neutral particle beam lithography |
| 09/02/2004 | WO2004075255A2 End point detection in time division multiplexed etch processes |
| 09/02/2004 | WO2004075240A1 Ion beam processing method |
| 09/02/2004 | WO2004074932A2 Method and apparatus for cleaning of native oxides with hydroge-containing radicals |
| 09/02/2004 | WO2004074771A1 Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same |
| 09/02/2004 | WO2004061995A8 Laser patterning of encapsulated organic light emitting diodes |
| 09/02/2004 | WO2004059033A3 Blocker plate bypass arrangement to improve clean rate at the edge of a processing chamber |
| 09/02/2004 | US20040171273 Specimen surface processing apparatus and surface processing method |
| 09/02/2004 | US20040171235 Regular array of microscopic structures on a substrate and devices incorporating same |
| 09/02/2004 | US20040170928 Patterning methods and systems using reflected interference patterns |
| 09/02/2004 | US20040169832 Vacuum chamber having instrument-mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same |
| 09/02/2004 | US20040169147 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector |
| 09/02/2004 | US20040169143 Ultimate analyzer, scanning transmission electron microscope and ultimate analysis method |
| 09/02/2004 | US20040169142 Method for analyzing organic material per microscopic area, and device for analysis per microscopic area |
| 09/02/2004 | US20040169141 Charged particle beam apparatus and method for operating the same |
| 09/02/2004 | US20040169140 Charged particle beam device for inspecting or structuring a specimen |
| 09/02/2004 | US20040168906 suppresses an influence on a magnetic field due to heat generated from discharge plasma, and can stably manufacture a high-purity carbon nanotube with excellent industrial efficiency |
| 09/02/2004 | US20040168771 Layout of electromagnets positioning on edges of plasma enclosure; impacting particles; controlling distribution of current signals |
| 09/02/2004 | US20040168770 Controlling plasma capacitance; bias electrode support; radio frequency power source; electrodes separated by insulator |
| 09/02/2004 | US20040168769 Plasma processing equipment and plasma processing method |
| 09/02/2004 | US20040168768 Aftertreatment plasma processing; closing valve; ejecting cleaning gas through holes of showder plate; applying microwaves |
| 09/02/2004 | US20040168637 Filtered cathodic arc deposition method and apparatus |
| 09/02/2004 | US20040168635 Device for vacuum metallising large surfaces by plasma activation |
| 09/02/2004 | US20040168631 Plasma processing apparatus having protection members |
| 09/02/2004 | DE4419167B4 Vorrichtung zum Beschichten eines Substrates An apparatus for coating a substrate |
| 09/02/2004 | DE19840833B4 Verfahren zur geometrischen Korrektur von Strukturfehlern A method for geometric correction of structural defects |