| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/22/2004 | EP1459353A2 Self-ionized and inductively-coupled plasma for sputtering and resputtering |
| 09/22/2004 | EP1459352A1 Device for treating objects by plasma deposition |
| 09/22/2004 | EP1459351A2 Plasma reactor with overhead rf electrode tuned to the plasma with arcing suppression |
| 09/22/2004 | EP1382711B1 Arc evaporator with a powerful magnetic guide for targets having a large surface area |
| 09/22/2004 | EP1305982B1 Ferrogmagnetic resonance excitation and its use for heating substrates that are filled with particles |
| 09/22/2004 | EP1092228B1 Electrode for plasma processes and method for manufacture and use thereof |
| 09/22/2004 | EP0931328B1 Method for structured energy transmission using electron beams |
| 09/22/2004 | EP0880798B1 System and method for cooling workpieces processed by an ion implantation system |
| 09/22/2004 | EP0746869B1 Method and apparatus for electron beam focusing adjustment in a scanning electron beam computed tomography scanner |
| 09/22/2004 | CN1531739A Conductive collar surrounding semiconductor workpiece in plasma chamber |
| 09/22/2004 | CN1531606A Apparatus for exhaust white powder elimination in substrate processing |
| 09/22/2004 | CN1531020A Emitter for electronic beam project micromovie system and manufacture thereof |
| 09/22/2004 | CN1531012A Plasma treating method and treater |
| 09/22/2004 | CN1530996A Electronic beam etching device with pattern emitter and manufacture of emitter |
| 09/22/2004 | CN1168116C DC plasma ion implantation apparatus with grounded conducting net |
| 09/21/2004 | US6795796 Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level |
| 09/21/2004 | US6794666 Electron emission lithography apparatus and method using a selectively grown carbon nanotube |
| 09/21/2004 | US6794665 Electron beam drawing apparatus |
| 09/21/2004 | US6794664 Umbilical cord facilities connection for an ion beam implanter |
| 09/21/2004 | US6794661 Ion implantation apparatus capable of increasing beam current |
| 09/21/2004 | US6794657 Magnetic shunt assembly for an exposure apparatus |
| 09/21/2004 | US6794648 Ultimate analyzer, scanning transmission electron microscope and ultimate analysis method |
| 09/21/2004 | US6794598 Arc electrodes for synthesis of carbon nanostructures |
| 09/21/2004 | US6794310 Method and apparatus for determining temperature of a semiconductor wafer during fabrication thereof |
| 09/21/2004 | US6794301 Pulsed plasma processing of semiconductor substrates |
| 09/21/2004 | US6794296 Aperture in a semiconductor material, and the production and use thereof |
| 09/21/2004 | US6793834 Apparatus for and method of processing an object to be processed |
| 09/21/2004 | US6793833 Etching method of organic insulating film |
| 09/21/2004 | US6793785 Magnetic control oscillating-scanning sputter |
| 09/21/2004 | US6793768 Plasma-assisted processing apparatus |
| 09/21/2004 | US6793765 Situ monitoring of microloading using scatterometry with variable pitch gratings |
| 09/21/2004 | US6792889 Plasma processing apparatus and method capable of performing uniform plasma treatment by control of excitation power |
| 09/16/2004 | WO2004079813A1 Substrate processor and method of manufacturing device |
| 09/16/2004 | WO2004079811A1 Plasma processing apparatus and method |
| 09/16/2004 | WO2004079778A2 Apparatus for attachment of semiconductor hardware |
| 09/16/2004 | WO2004079771A2 Three-dimensional imaging of the chemical surface compositions of objects |
| 09/16/2004 | WO2004079770A1 Charged particle beam device with cleaning unit and method of operation thereof |
| 09/16/2004 | WO2004079764A2 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 09/16/2004 | WO2004079040A1 A method and special apparatus for modifying the internal surface of tubular workpiece |
| 09/16/2004 | WO2004078640A1 Method and apparatus for controlled manufacturing of nanometer-scale apertures |
| 09/16/2004 | WO2004040614A3 Electron beam exposure system |
| 09/16/2004 | WO2004030020A3 Upper electrode plate with deposition shield in a plasma processing system |
| 09/16/2004 | WO2004030013A3 Baffle plate in a plasma processing system |
| 09/16/2004 | US20040180158 Chamber having components with textured surfaces and method of manufacture |
| 09/16/2004 | US20040178811 Apparatus for inspecting defects of devices and method of inspecting defects |
| 09/16/2004 | US20040178405 Emitter for electron-beam projection lithography system and manufacturing method thereof |
| 09/16/2004 | US20040178372 End effector for supporting a microsample |
| 09/16/2004 | US20040178366 Electron-beam drawing apparatus and electron-beam drawing method |
| 09/16/2004 | US20040178364 Electron beam lithography apparatus using a patterned emitter and method of fabricating the patterned emitter |
| 09/16/2004 | US20040178355 Sample manipulation system |
| 09/16/2004 | US20040178354 Particle-optical device for irradiating an object |
| 09/16/2004 | US20040178353 Positron source |
| 09/16/2004 | US20040178180 Plasma processing apparatus |
| 09/16/2004 | US20040178151 Launching electromagnetic wave into cylindrical chamber to create ionization zone; creating radially oriented electric field |
| 09/16/2004 | US20040178056 Sputtering magnetron arrangements with adjustable magnetic field strength |
| 09/16/2004 | US20040177992 Grounding cable and semiconductor manufacturing apparatus using the same |
| 09/16/2004 | US20040177927 Plasma procesor and plasma processing method |
| 09/16/2004 | US20040177925 Plasma processing system and apparatus and a sample processing method |
| 09/16/2004 | US20040177923 Method of detecting an arc in a glow discharge device and apparatus for controlling a high-frequency arc discharge |
| 09/16/2004 | US20040177922 Method and apparatus for monitoring plasma conditions using a monitoring ring |
| 09/16/2004 | DE19711268B4 Chemisches Dampfabscheidungsverfahren mit induktiv gekoppeltem Plasma, Verwendung des Verfahrens zum Herstellen von Dünnschichttransistoren und durch das Verfahren hergestellte Dünnschichten aus amorphen Silizium Chemical vapor deposition method using inductively coupled plasma, using the method for manufacturing thin film transistors and thin films produced by the process of amorphous silicon |
| 09/16/2004 | DE10309711A1 Verfahren zum Einätzen von Strukturen in einem Ätzkörper mit einem Plasma Method for etching of structures in an etching body with a plasma |
| 09/16/2004 | DE10260645B3 Compensation frame for holding substrate for semiconducting manufacture has polygonal inner profile for holding substrate, area of upper main surface of frame with different widths at different points |
| 09/16/2004 | DE102004002199A1 Dreiachs-Linearbewegungseinheit und Vorrichtung zum Untersuchen einer Probe hiermit Three-axis linear motion unit and apparatus for inspecting a sample hereby |
| 09/16/2004 | CA2519896A1 Method and apparatus for controlled manufacturing of nanometer-scale apertures |
| 09/16/2004 | CA2517133A1 Plasma processing apparatus and method |
| 09/15/2004 | EP1458008A2 High frequency wave heated plasma mass filter |
| 09/15/2004 | EP1458006A1 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages |
| 09/15/2004 | EP1458005A2 Particle-optical device for irradiating an object |
| 09/15/2004 | EP1456432A1 Ionic plasma deposition apparatus |
| 09/15/2004 | EP1057203B1 Particle-optical apparatus involving detection of auger electrons |
| 09/15/2004 | CN2641816Y Electronic beam leading device |
| 09/15/2004 | CN1529898A 射频离子源 RF ion source |
| 09/15/2004 | CN1167103C Elastomer bonded parts for plasma processes and method for manufacture and use thereof |
| 09/14/2004 | US6791443 Actuator and transducer |
| 09/14/2004 | US6791274 RF power control device for RF plasma applications |
| 09/14/2004 | US6791097 Adjustable conductance limiting aperture for ion implanters |
| 09/14/2004 | US6791096 Process conditions change monitoring systems that use electron beams, and related monitoring methods |
| 09/14/2004 | US6791095 Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus |
| 09/14/2004 | US6791094 Method and apparatus for determining beam parallelism and direction |
| 09/14/2004 | US6791084 Method and scanning electron microscope for measuring dimension of material on sample |
| 09/14/2004 | US6791083 Image compensation device for a scanning electron microscope |
| 09/14/2004 | US6791082 Process conditions change monitoring systems that use electron beams, and related monitoring methods |
| 09/14/2004 | US6791077 Mass analyzer allowing parallel processing one or more analytes |
| 09/14/2004 | US6790487 Active control of electron temperature in an electrostatically shielded radio frequency plasma source |
| 09/14/2004 | US6790482 Arrangement for orienting the magnetization direction of magnetic layers |
| 09/14/2004 | US6790326 Magnetron for a vault shaped sputtering target having two opposed sidewall magnets |
| 09/14/2004 | US6790323 Magnetrons; low pressure plasma sputtering |
| 09/14/2004 | US6790311 Plasma reactor having RF power applicator and a dual-purpose window |
| 09/14/2004 | US6790242 Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof |
| 09/14/2004 | US6789498 Elements having erosion resistance |
| 09/10/2004 | WO2004077894A2 Method and system for providing impedance matching network and network assembly |
| 09/10/2004 | WO2004077608A2 Antenna for producing uniform process rates |
| 09/10/2004 | WO2004077540A1 Plasma process device |
| 09/10/2004 | WO2004077505A2 Critical dimension variation compensation across a wafer by means of local wafer temperature control |
| 09/10/2004 | WO2004077502A2 Ecr-plasma source and methods for treatment of semiconductor structures |
| 09/10/2004 | WO2004077480A2 Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor |
| 09/10/2004 | WO2004077479A2 Deflecting acceleration/deceleration gap |
| 09/10/2004 | WO2004077022A2 Methods and apparatus for calibration and metrology for an integrated rf generator system |
| 09/10/2004 | WO2004076716A1 Apparatus and method for depositing large area coatings on planar surfaces |