| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/30/2004 | US20040191028 Vacuum processing system being able to carry process object into and out of vacuum chamber |
| 09/30/2004 | US20040190006 Optical system adjusting method for energy beam apparatus |
| 09/30/2004 | US20040189329 Charging voltage measuring device for substrate and ion beam irradiating device |
| 09/30/2004 | US20040189325 Method and apparatus for electron density measurement |
| 09/30/2004 | US20040188636 Exposure apparatus |
| 09/30/2004 | US20040188635 Electron beam apparatus with aberration corrector |
| 09/30/2004 | US20040188631 Ion implantation ion source, system and method |
| 09/30/2004 | US20040188630 Deflection system for a particle beam device |
| 09/30/2004 | US20040188613 Electron microscope |
| 09/30/2004 | US20040188612 Scanning electron microscope |
| 09/30/2004 | US20040188611 Scanning electron microscope and sample observing method using it |
| 09/30/2004 | US20040188609 Inspection method and apparatus using an electron beam |
| 09/30/2004 | US20040188608 Electron beam apparatus having electron analyzer and method of controlling lenses |
| 09/30/2004 | US20040188607 Monochromator and scanning electron microscope using the same |
| 09/30/2004 | US20040188606 Mass analyzer allowing parallel processing one or more analytes |
| 09/30/2004 | US20040188243 Apparatus for enhancing the lifetime of stencil masks |
| 09/30/2004 | US20040188239 Ionized PVD with sequential deposition and etching |
| 09/30/2004 | US20040188019 Device for treating a surface of a substrate, and a plasma source |
| 09/30/2004 | US20040187783 Thin film forming apparatus and thin film forming method |
| 09/30/2004 | DE19703048B4 Fuzzy-gesteuertes Linsensystem einer teilchenoptischen Kolonne und Verfahren zu seinem Betrieb Fuzzy-controlled lens system of a particle column and method for its operation |
| 09/29/2004 | EP1463089A2 Electron microscope with an energy filter |
| 09/29/2004 | EP1463088A2 Material characterization system using an electron beam |
| 09/29/2004 | EP1463087A1 Charged particle beam device |
| 09/29/2004 | EP1463086A2 Method of fabricating a multipole lens, multipole lens, and charged-particle beam instrument equipped therewith |
| 09/29/2004 | EP1461820A2 Device for applying an electromagnetic microwave to a plasma container |
| 09/29/2004 | EP0895651B1 Raster shaped beam writing method for pattern generation |
| 09/29/2004 | CN1533596A Plasma treatment device |
| 09/29/2004 | CN1533445A Method and device for treating substrate |
| 09/29/2004 | CN1532886A Vacuum processing system capable of carrying processed object in and out from vacuum room |
| 09/29/2004 | CN1532848A Energy ray radiator |
| 09/29/2004 | CN1169234C Method for improving performance of high temperature superconducting thin film wafers |
| 09/29/2004 | CN1169191C Method for implanting negative hydrogen ion and implanting apparatus |
| 09/29/2004 | CN1168981C High-resolution eectroacoustic imaging detecting system |
| 09/28/2004 | US6799312 Dark line CD and XY-CD improvement method of the variable shaped beam lithography in mask or wafer making |
| 09/28/2004 | US6798553 Optical filter elements and methods of making and using same |
| 09/28/2004 | US6798519 Method and apparatus for an improved optical window deposition shield in a plasma processing system |
| 09/28/2004 | US6798141 Plasma accelarator arrangement |
| 09/28/2004 | US6798126 High angular intensity Schottky electron point source |
| 09/28/2004 | US6797969 Multi-column FIB for nanofabrication applications |
| 09/28/2004 | US6797968 Ion beam processing method and apparatus therefor |
| 09/28/2004 | US6797967 Method and system for dose control during an ion implantation process |
| 09/28/2004 | US6797965 Charged particle beam apparatus, pattern measuring method, and pattern drawing method |
| 09/28/2004 | US6797964 Ion source and operation method thereof |
| 09/28/2004 | US6797963 Deflector of a micro-column electron beam apparatus and method for fabricating the same |
| 09/28/2004 | US6797962 Electrostatic corrector for eliminating the chromatic aberration of particle lenses |
| 09/28/2004 | US6797956 Electron microscope with annular illuminating aperture |
| 09/28/2004 | US6797955 Filtered e-beam inspection and review |
| 09/28/2004 | US6797954 Patterned wafer inspection method and apparatus therefor |
| 09/28/2004 | US6797953 Electron beam system using multiple electron beams |
| 09/28/2004 | US6797951 Laminated electrostatic analyzer |
| 09/28/2004 | US6797639 Dielectric etch chamber with expanded process window |
| 09/28/2004 | US6797634 Method of conditioning an etching chamber and method of processing semiconductor substrate using the etching chamber |
| 09/28/2004 | US6797336 Multi-component substances and processes for preparation thereof |
| 09/28/2004 | US6797128 Harmonic analysis of electrical discharge parameters; controlling frequency output and/or reactive gas flow |
| 09/28/2004 | US6797112 Plasma treatment apparatus and method of producing semiconductor device using the apparatus |
| 09/28/2004 | US6797111 Plasma processing apparatus |
| 09/28/2004 | US6797110 Glass, plasma resisting component, component for electromagnetic wave-transparent window and plasma processing apparatus |
| 09/28/2004 | US6797109 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
| 09/28/2004 | US6797067 Implanter tool process parameter auto pre-setup system |
| 09/28/2004 | US6796270 Device for producing PCVD coated glass tubes for the drawing of optical fibers |
| 09/28/2004 | US6796269 Apparatus and method for monitoring plasma processing apparatus |
| 09/28/2004 | US6796268 Microwave plasma processing system |
| 09/23/2004 | WO2004082008A1 Cvd apparatus and method for cleaning cvd apparatus |
| 09/23/2004 | WO2004082007A1 Substrate holding structure for semiconductor processing, and plasma processing device |
| 09/23/2004 | WO2004081967A1 Method for etching a sample and etching system |
| 09/23/2004 | WO2004081910A2 Apparatus for generating a plurality of beamlets |
| 09/23/2004 | WO2004081254A1 Microwave plasma processing device and plasma processing gas supply member |
| 09/23/2004 | WO2004063814A3 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 09/23/2004 | WO2004040615A3 High-power pulsed magnetically enhanced plasma processing |
| 09/23/2004 | US20040185644 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask |
| 09/23/2004 | US20040185610 Multi-core transformer plasma source |
| 09/23/2004 | US20040185586 Preparation of sample chip, method of observing wall surface thereof and system therefor |
| 09/23/2004 | US20040185354 capable of getting a smooth sloped portion of the blaze and a sharp rising portion of the blaze edge using a small-diameter beam, and reducing the overall blaze patterning time at the same time |
| 09/23/2004 | US20040185279 Plasma chemical reactors; enlarged head; fitting segment, protective coating; machining, etching |
| 09/23/2004 | US20040184028 Method and apparatus for monitoring the condition of plasma equipment |
| 09/23/2004 | US20040183470 Power supply for a hot-filament cathode |
| 09/23/2004 | US20040183456 Field emitter beam source and method for controlling a beam current |
| 09/23/2004 | US20040183453 Plasma processing apparatus |
| 09/23/2004 | US20040183420 Field emission device |
| 09/23/2004 | US20040183036 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 09/23/2004 | US20040183017 Electron beam device |
| 09/23/2004 | US20040183016 Scanning electron microscope and sample observation method using the same |
| 09/23/2004 | US20040183015 Methods for measuring dimensions of minute structures and apparatus for performing the same |
| 09/23/2004 | US20040183014 Scanning electron microscope |
| 09/23/2004 | US20040183013 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus |
| 09/23/2004 | US20040183012 Material characterization system |
| 09/23/2004 | US20040183011 Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method |
| 09/23/2004 | US20040182834 Helix coupled remote plasma source |
| 09/23/2004 | US20040182702 Plasma generation using multi-step ionization |
| 09/23/2004 | US20040182697 ARC detection approach |
| 09/23/2004 | US20040182517 Multi-core transformer plasma source |
| 09/23/2004 | US20040182516 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 09/23/2004 | US20040182515 warp yarns and weft yarns or shutes; machine rolling; papermaking |
| 09/23/2004 | US20040182514 Using atomic hydrogen by mixing halogen and/or halide to a gas which is used for generating atomic hydrogen in the plasma; surface is prevented from physical damage caused by high energy particle and undesirable reactive species are controlled |
| 09/23/2004 | US20040182320 Method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 09/23/2004 | US20040182319 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes |
| 09/23/2004 | US20040182314 Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction |
| 09/23/2004 | DE10310524A1 Sample etching method for use in a plasma etching installation in which the flow to the reaction chamber is first set and stabilized using an inert reference gas |
| 09/22/2004 | EP1460147A1 Plasma jet chemical vapor deposition system having a plurality of distribution heads |
| 09/22/2004 | EP1460146A1 Plasma jet chemical vapor deposition system having a plurality of distribution heads |