| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/14/2004 | WO2004087991A1 Thin film forming apparatus and method for forming thin film |
| 10/14/2004 | WO2004087990A1 Plasma cvd method using ultrashort wave and plasma cvd apparatus |
| 10/14/2004 | WO2004087987A1 Electric arc evaporation source |
| 10/14/2004 | WO2004087986A1 Method and apparatus for depositing material on a substrate |
| 10/14/2004 | WO2004061902A3 Method and apparatus for monitoring a material processing system |
| 10/14/2004 | WO2004051696A3 One dimensional beam blanker array |
| 10/14/2004 | WO2004030021A3 Sputter-coating interior surfaces |
| 10/14/2004 | WO2004015736A3 Low loss rf bias electrode for a plasma reactor with enhanced wafer edge rf coupling and highly efficient wafer cooling |
| 10/14/2004 | US20040205686 Fracturing polygons used in a lithography process for fabricating an integrated circuit |
| 10/14/2004 | US20040203249 Dummy copper deprocessing |
| 10/14/2004 | US20040203177 Method and system for monitoring an etch process |
| 10/14/2004 | US20040201834 Stage apparatus and its driving method, exposure apparatus and device manufacturing method |
| 10/14/2004 | US20040200718 Plasma processing method and apparatus |
| 10/14/2004 | US20040200419 Explosion welded design for cooling components |
| 10/14/2004 | US20040200417 Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer |
| 10/14/2004 | DE10310518A1 Dreidimensionale Abbildung der chemischen Oberflächenzusammensetzung von Objekten Three-dimensional imaging of the surface chemical composition of objects |
| 10/14/2004 | DE10296931T5 Plasmabehandlungseinrichtung, Plasmabehandlungsverfahren, und Verfahren zur Herstellung eines Halbleiterbauelements Plasma processing apparatus, plasma processing method, and process for producing a semiconductor device |
| 10/13/2004 | EP1466999A1 Method for connecting magnetic substance target to backing plate and magnetic substance target |
| 10/13/2004 | CN1537406A 等离子体装置及等离子体生成方法 Plasma apparatus and method for generating plasma |
| 10/13/2004 | CN1537405A Antenna structure for inductively coupled plasma generator |
| 10/13/2004 | CN1537318A Sputtering magnetron arrangements with adjustable magnetic field strength |
| 10/13/2004 | CN1536626A Clamping chuck equipment |
| 10/13/2004 | CN1536625A Plasma etching method and equipment for making semiconductor device |
| 10/13/2004 | CN1536345A Scanning electronic microscope standard substance and its making method |
| 10/13/2004 | CN1171275C Method for structured energy transmission using electron beams |
| 10/13/2004 | CN1170957C Processing chamber for atomic layer deposition processes |
| 10/12/2004 | US6804572 Enhanced process and profile simulator algorithms |
| 10/12/2004 | US6804288 Electron beam exposure apparatus and electron beam deflection apparatus |
| 10/12/2004 | US6803590 Ion beam mass separation filter, mass separation method thereof and ion source using the same |
| 10/12/2004 | US6803589 Apparatus and method applied to exposure by charged beam |
| 10/12/2004 | US6803584 Electron beam control device |
| 10/12/2004 | US6803583 Scintillator for electron microscope and method of making |
| 10/12/2004 | US6803582 One dimensional beam blanker array |
| 10/12/2004 | US6803573 Scanning electron microscope |
| 10/12/2004 | US6803572 Apparatus and methods for secondary electron emission microscope with dual beam |
| 10/12/2004 | US6803571 Method and apparatus for dual-energy e-beam inspector |
| 10/12/2004 | US6803570 Electron transmissive window usable with high pressure electron spectrometry |
| 10/12/2004 | US6802986 Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors |
| 10/12/2004 | US6802949 Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same |
| 10/12/2004 | CA2370337C Device for treating a container with microwave plasma |
| 10/07/2004 | WO2004086483A1 Plasma film-forming method and plasma film-forming apparatus |
| 10/07/2004 | WO2004086480A1 Method for cleaning plasma processing apparatus and plasma processing apparatus |
| 10/07/2004 | WO2004086452A2 Charged particle beam device |
| 10/07/2004 | WO2004086451A2 Plasma generation using multi-step ionization |
| 10/07/2004 | WO2004085959A1 Sample observing apparatus, edge position calculating device, and program |
| 10/07/2004 | WO2004085902A1 Universal vacuum coupling for cylindrical target |
| 10/07/2004 | WO2004085704A1 Processor |
| 10/07/2004 | WO2004085693A2 Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction |
| 10/07/2004 | WO2004042772A3 Methods and apparatus for ion beam neutralization in magnets |
| 10/07/2004 | WO2004030013A8 Baffle plate in a plasma processing system |
| 10/07/2004 | US20040197938 Monitoring method of processing state and processing unit |
| 10/07/2004 | US20040196127 Variable field magnet apparatus |
| 10/07/2004 | US20040195972 Plasma generator useful for ion beam generation |
| 10/07/2004 | US20040195528 Ion beam incident angle detector for ion implant systems |
| 10/07/2004 | US20040195526 Energy beam irradiating apparatus |
| 10/07/2004 | US20040195525 Apparatus and method for reducing the electron-beam-induced deposition of contamination products |
| 10/07/2004 | US20040195524 Ion doping apparatus, and multi-apertured electrode for the same |
| 10/07/2004 | US20040195523 Device for reducing the impact of distortions in a microscope |
| 10/07/2004 | US20040195522 Charged particle beam microscope with minicolumn |
| 10/07/2004 | US20040195520 Ion detector |
| 10/07/2004 | US20040195506 Electron holography method |
| 10/07/2004 | US20040195216 Apparatus and method for plasma processing |
| 10/07/2004 | US20040195208 Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal |
| 10/07/2004 | US20040194890 Hybrid plasma processing apparatus |
| 10/07/2004 | US20040194709 Plasma treatment apparatus |
| 10/07/2004 | DE4418930B4 Verfahren zum Erzeugen von Mustern auf Substraten mittels Korpuskularstrahl-Lithographie The method for generating patterns on substrates by means of corpuscular beam lithography |
| 10/07/2004 | DE10313644A1 Vorrichtung und Verfahren zum Reduzieren der elektronenstrahlinduzierten Abscheidung von Kontaminationsprodukten Apparatus and method for reducing the electron beam induced deposition of contamination products |
| 10/07/2004 | DE10312632A1 Magnetron for coating flat glass by sputtering comprises a longitudinal hollow target construction which rotates in a vacuum chamber, a magnet construction arranged within the target construction, and a coolant cycle |
| 10/07/2004 | DE10312631A1 Magnetron mit Kühlmittelschutz Magnetron with coolant protection |
| 10/07/2004 | DE10156615B4 Einrichtung zur Erzeugung eines örtlich variierbaren Elektron-Zyklotron-Resonanz-Mikrowellen-Niederdruckplasmas Means for generating a locally variable electron cyclotron resonance microwave plasma low pressure |
| 10/06/2004 | EP1465243A2 Dummy copper deprocessing |
| 10/06/2004 | EP1465229A1 Apparatus and method for controlling the beam current of a charged particle beam |
| 10/06/2004 | EP1464067A1 Uniformity control for plasma doping systems |
| 10/06/2004 | EP1280192B1 Device for forming nanostructures on the surface of a semiconductor wafer by means of ion beams |
| 10/06/2004 | EP0938634A4 Gas panel |
| 10/06/2004 | CN1535470A Adjustable conductance limiting aperture for ion implanters |
| 10/06/2004 | CN1535327A Sputtering device |
| 10/06/2004 | CN1534737A 干式蚀刻装置及干式蚀刻方法 The dry etching apparatus and a dry etching method |
| 10/06/2004 | CN1169998C Magnet device with high target utilization ratio used for sputtering target with conical butt |
| 10/05/2004 | US6800989 Method of forming filament for electron beam emitter |
| 10/05/2004 | US6800864 Method and structure for reducing effects of noise and resonance associated with an e-beam lithography tool |
| 10/05/2004 | US6800863 Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same |
| 10/05/2004 | US6800862 Ion implanting apparatus and ion implanting method |
| 10/05/2004 | US6800853 Electron microscope and method of photographing TEM images |
| 10/05/2004 | US6800256 Scaleable inter-digitized tine non-thermal plasma reactor |
| 10/05/2004 | US6800183 Sputtering device |
| 10/05/2004 | US6800177 Apparatus and method for fabricating carbon thin film |
| 10/05/2004 | US6800173 Variable gas conductance control for a process chamber |
| 10/05/2004 | US6799531 Method for making films utilizing a pulsed laser for ion injection and deposition |
| 09/30/2004 | WO2004084588A1 Magnetron comprising a coolant shield |
| 09/30/2004 | WO2004084394A1 Power supply unit for a gas discharge process |
| 09/30/2004 | WO2004084254A1 Wien-type monochromator with aberration correction |
| 09/30/2004 | WO2004083486A1 Method and apparatus for plasma cdv by use of ultrashort wave |
| 09/30/2004 | WO2004082830A2 Sample manipulation system |
| 09/30/2004 | WO2004053921A3 Current-stabilizing illumination of photocathode electron beam source |
| 09/30/2004 | WO2004031435A3 High-power pulsed magnetron sputtering |
| 09/30/2004 | WO2004027448A3 Methods and apparatus for precise measurement of time delay between two signals |
| 09/30/2004 | US20040191936 Real-time in-line testing of semiconductor wafers |
| 09/30/2004 | US20040191931 Method of implanting a substrate and an ion implanter for performing the method |
| 09/30/2004 | US20040191545 Electroplating a layer of yttrium onto the surface, then electroplating a second layer of aluminum or zirconium onto the first layer, and annealing the first and second layers to form mixed oxide; corrosion resistance |