| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/28/2004 | US20040211925 Charged particle beam apparatus, charged particle beam irradiation method, and method of manufacturing semiconductor device |
| 10/28/2004 | US20040211924 Substrate processing apparatus and maintenance method therefor |
| 10/28/2004 | US20040211919 Convergent charged particle beam apparatus and inspection method using same |
| 10/28/2004 | US20040211914 Particle-optical apparatus with a permanent-magnetic lens and an electrostatic lens |
| 10/28/2004 | US20040211913 Objective lens arrangement for use in a charged particle beam column |
| 10/28/2004 | US20040211899 Sample electrification measurement method and charged particle beam apparatus |
| 10/28/2004 | US20040211759 Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
| 10/28/2004 | US20040211675 Removal of surface oxides by electron attachment for wafer bumping applications |
| 10/28/2004 | US20040211660 Controlling temperature of a plurality of segments of the wall or other surfaces exposed to the plasma with a plurality of temperature control systems of a first type; controlling the temperature of a plurality of segments of the wall or the other surfaces with a plurality of temperature control system |
| 10/28/2004 | US20040211519 Plasma reactor |
| 10/28/2004 | US20040211518 Plasma processing apparatus |
| 10/28/2004 | US20040211364 Gas port sealing for CVD/CVI furnace hearth plates |
| 10/28/2004 | US20040211363 Electron beam physical vapor deposition process |
| 10/28/2004 | DE19848070B4 Niedrigenergie-Elektronenstrahllithographie Low-energy electron beam lithography |
| 10/28/2004 | DE10316730A1 Vakuum-Drehdurchführung Vacuum rotary feedthrough |
| 10/28/2004 | DE10256718B4 Vorrichtung zur Probenuntersuchung mittels eines atmosphärischen oder druckvariablen Rasterelektronenmikroskops Apparatus for sample analysis using an atmospheric pressure or variable scanning electron microscope |
| 10/28/2004 | DE10233567B4 Vorrichtung zur Erzeugung eines gepulsten Plasmas innerhalb einer Vakuumkammer mit mindestens einer Debris-Blende An apparatus for generating a pulsed plasma within a vacuum chamber having at least one debris aperture |
| 10/28/2004 | DE10047688B4 Ionenquelle Ion source |
| 10/28/2004 | CA2519874A1 Sputtering chamber comprising a liner |
| 10/27/2004 | EP1471562A2 Particle-optical apparatus with a permanent-magnetic lens and an electrostatic lens |
| 10/27/2004 | EP1471561A2 Electron gun |
| 10/27/2004 | EP1470738A2 Heating in a vacuum atmosphere in the presence of a plasma |
| 10/27/2004 | EP1470567A1 Integrated ion focusing and gating optics for ion trap mass spectrometer |
| 10/27/2004 | EP1088329B1 Method and apparatus for stabilising a plasma |
| 10/27/2004 | CN1541401A Decaborane vaporizer having improved vapor flow |
| 10/27/2004 | CN1540707A 电子枪 Electron gun |
| 10/27/2004 | CN1540323A Plasma Monitoring method, plasma monitor and plasma treatment appts. |
| 10/27/2004 | CN1173608C End cap for indirectly heated cathode of ion source |
| 10/27/2004 | CN1173071C Sheet-form magnetron sputtering device |
| 10/26/2004 | US6809534 Semiconductor device test method and semiconductor device tester |
| 10/26/2004 | US6809322 Environmental scanning electron microscope |
| 10/26/2004 | US6809319 Electron beam writing equipment and electron beam writing method |
| 10/26/2004 | US6808759 Plasma processing method and apparatus |
| 10/26/2004 | US6808747 Anodizing surface of aluminum-based substrate to form anodization layer, removing from first portion of substrate, depositing boron carbide layer on anodization layer, extending over first portion of substrate across edge to second portion |
| 10/26/2004 | US6808647 Methodologies to reduce process sensitivity to the chamber condition |
| 10/26/2004 | US6808607 High peak power plasma pulsed supply with arc handling |
| 10/21/2004 | WO2004091264A2 High frequency plasma jet source and method for irradiating a surface |
| 10/21/2004 | WO2004090947A2 Ion beam incident angle detector for ion implant systems |
| 10/21/2004 | WO2004090943A2 Plasma uniformity |
| 10/21/2004 | WO2004090932A1 Rotary motion feedthrough for a vacuum |
| 10/21/2004 | WO2004090931A2 Method and apparatus for treating a surface using a plasma discharge |
| 10/21/2004 | WO2004090192A1 Facility and method for depositing a functional coating on loose parts |
| 10/21/2004 | WO2004074932A3 Method and apparatus for cleaning of native oxides with hydroge-containing radicals |
| 10/21/2004 | WO2004068538A3 Object-moving method, object-moving apparatus and production process using the method |
| 10/21/2004 | WO2004064100A3 Mounting mechanism for plasma extraction aperture |
| 10/21/2004 | WO2004064098A3 Detector for environmental scanning electron microscope |
| 10/21/2004 | WO2004061888A3 Method and apparatus for determining consumable lifetime |
| 10/21/2004 | WO2004013371A3 Method and apparatus for plasma implantation without deposition of a layer of byproduct |
| 10/21/2004 | US20040210407 Non-linear test load and method of calibrating a plasma system |
| 10/21/2004 | US20040209415 Semiconductor device employing a method for forming a pattern using a crystal structure of a crystalline material |
| 10/21/2004 | US20040208280 X-ray microscopic inspection apparatus |
| 10/21/2004 | US20040207424 High resolution analytical probe station |
| 10/21/2004 | US20040207415 Semiconductor device tester |
| 10/21/2004 | US20040207308 Method and apparatus for simultaneously depositing and observing materials on a target |
| 10/21/2004 | US20040207271 Linear motor, moving stage system, exposure apparatus, and device manufacturing method |
| 10/21/2004 | US20040206919 Electron gun |
| 10/21/2004 | US20040206918 Calculating positional shift amount between first mark and second mark from detected electron signal, correcting position of first mark, aligning and exposing desired pattern based on corrected position of first mark |
| 10/21/2004 | US20040206912 Method of reducing heat-induced distortion of photomasks during lithography |
| 10/21/2004 | US20040206910 Method and apparatus for aerodynamic ion focusing |
| 10/21/2004 | US20040206730 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 10/21/2004 | US20040206729 Plasma Processing Apparatus |
| 10/21/2004 | US20040206620 Segmented sputtering target and method/apparatus for using same |
| 10/21/2004 | US20040206309 Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor |
| 10/21/2004 | DE10024634B4 Elektronenstrahl-Belichtungsvorrichtung und -verfahren Electron beam exposure apparatus and method |
| 10/21/2004 | CA2522058A1 High-frequency plasma beam source and method for the irradiation of a surface |
| 10/20/2004 | EP1469504A1 Magnetron comprising a two-fold seal |
| 10/20/2004 | EP1469503A2 Electron microscopy system and method and focusing system for charged particles |
| 10/20/2004 | EP1469306A1 Inspection device using scanning electron microscope |
| 10/20/2004 | EP1468437A2 Electrostatic manipulating apparatus |
| 10/20/2004 | EP1274875A4 Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes |
| 10/20/2004 | CN1539156A Dual frequency plasma etch reactor with independent plasma density/chemistry and ion energy control |
| 10/20/2004 | CN1539155A Device for coating of objects |
| 10/20/2004 | CN1539154A Electric arc avaporator |
| 10/20/2004 | CN1539074A Displacement detecting method, displacement detecting device and calibrating method thereof, and recording device of information recording medium original disk |
| 10/20/2004 | CN1538503A Apparatus and method to confine plasma and reduce flow resistance in plasma reactor |
| 10/20/2004 | CN1538501A Plasma treatment device and high-frequency power supply device |
| 10/20/2004 | CN1172351C Method and equipment for radiating ion beam, related method and its equipment |
| 10/20/2004 | CN1172021C Sputtering equipment |
| 10/19/2004 | US6806951 Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen |
| 10/19/2004 | US6806653 Method and structure to segment RF coupling to silicon electrode |
| 10/19/2004 | US6806652 High-density plasma source using excited atoms |
| 10/19/2004 | US6806651 Second electric field super-ionizing the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma. |
| 10/19/2004 | US6806479 Apparatus and method for reducing implant angle variations across a large wafer for a batch disk |
| 10/19/2004 | US6806438 Plasma processing apparatus including a plurality of plasma processing units having reduced variation |
| 10/19/2004 | US6806437 Inductively coupled plasma generating apparatus incorporating double-layered coil antenna |
| 10/19/2004 | US6806201 Plasma processing apparatus and method using active matching |
| 10/19/2004 | US6805952 Low contamination plasma chamber components and methods for making the same |
| 10/19/2004 | US6805916 Vapor deposition by ablating a target with a laser beam, generating a magnetic field, confining and concentrating the ionized gas, deflection to coat a superconductive thin films on wires or tapes |
| 10/19/2004 | US6805891 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production |
| 10/19/2004 | US6805807 Adaptive GCIB for smoothing surfaces |
| 10/19/2004 | US6805779 Plasma generation using multi-step ionization |
| 10/19/2004 | US6805770 Technique for improving uniformity of magnetic fields that rotate or oscillate about an axis |
| 10/19/2004 | US6805487 Holder driving unit |
| 10/14/2004 | WO2004089046A1 Microwave introducing apparatus having endless ring-like waveguide, and plasma processing equipment provided with the same |
| 10/14/2004 | WO2004088739A2 Real-time in-line testing of semiconductor wafers |
| 10/14/2004 | WO2004088711A2 Method and system for generating a plasma |
| 10/14/2004 | WO2004088710A2 Method and apparatus for gas plasma treatment with controlled extent of gas plasma, and use thereof |
| 10/14/2004 | WO2004088709A1 Apparatus and method for controlling the beam current of a charged particle beam |
| 10/14/2004 | WO2004088708A2 System and method for generating an electorn beam |
| 10/14/2004 | WO2004088416A1 Method for measuring/inspecting pattern size of photomask |