H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2004
11/09/2004	US6816029 RF matching unit
11/09/2004	US6815899 Remote plasma generator
11/09/2004	US6815880 Method and apparatus for simultaneously depositing and observing materials on a target
11/09/2004	US6815876 Cathode with improved work function and method for making the same
11/09/2004	US6815698 Charged particle beam exposure system
11/09/2004	US6815697 Ion beam charge neutralizer and method therefor
11/09/2004	US6815696 Beam stop for use in an ion implantation system
11/09/2004	US6815695 Simplified reticle stage removal system for an electron beam system
11/09/2004	US6815693 Charged-particle-beam microlithography apparatus and methods including proximity-effect correction
11/09/2004	US6815690 Ion beam source with coated electrode(s)
11/09/2004	US6815688 Devices for guiding and manipulating electron beams
11/09/2004	US6815681 Pyroelectric plate on which a patterned metal thin layer is formed as an electron beam source without using a high voltage
11/09/2004	US6815678 Raster electron microscope
11/09/2004	US6815677 Scanning electron microscope and method of controlling the same
11/09/2004	US6815653 Detecting material accretion and dislodging from a quartz gas distribution plate (gdp) in a plasma process chamber during semiconductor wafer processing.
11/09/2004	US6815633 Dissociating gases, high power plasma with higher operating voltages that has increased dissociation rates and that allow a wider operating pressure range, precise process control, low plasma surface erosion
11/09/2004	US6815608 High-voltage electric apparatus
11/09/2004	US6815370 Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same
11/09/2004	US6815369 Method for monitoring deposition reaction during processing the surface of a semiconductor substrate
11/09/2004	US6815365 Plasma etching apparatus and plasma etching method
11/09/2004	US6815362 End point determination of process residues in wafer-less auto clean process using optical emission spectroscopy
11/09/2004	US6815352 Silicon focus ring and method for producing the same
11/09/2004	US6815072 Method to solve particle performance of FSG layer by using UFU season film for FSG process
11/09/2004	US6814838 Induction coil generates treatment plasma in discharge chamber located in interior of coil; with slotted screen; semiconductors
11/09/2004	US6814814 Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates
11/04/2004	WO2004095626A2 Plasma production device and method and rf driver circuit with adjustable duty cycle
11/04/2004	WO2004095548A1 Stage device and exposure device
11/04/2004	WO2004095532A2 A barrier layer for a processing element and a method of forming the same
11/04/2004	WO2004095530A2 Adjoining adjacent coatings on an element
11/04/2004	WO2004095529A2 Method and apparatus for reducing substrate backside deposition during processing
11/04/2004	WO2004095502A2 Plasma processing system and method
11/04/2004	WO2004095500A2 Vacuum chamber with recessed viewing tube and imaging device situated therein
11/04/2004	WO2004095499A2 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
11/04/2004	WO2004095498A2 High-density plasma source using excited atoms
11/04/2004	WO2004095497A2 High-density plasma source
11/04/2004	WO2004095138A2 Micromachining process, system and product
11/04/2004	WO2004094686A2 Device for coating a stationary substrate by pulse magnetron sputtering
11/04/2004	WO2004075255A3 End point detection in time division multiplexed etch processes
11/04/2004	WO2004027684A3 Photolithography mask repair
11/04/2004	US20040219797 Plasma etching method and plasma etching unit
11/04/2004	US20040219789 Cleaning of native oxide with hydrogen-containing radicals
11/04/2004	US20040219737 Method and apparatus for processing a workpiece with a plasma
11/04/2004	US20040219294 DLC coating system and process and apparatus for making coating system
11/04/2004	US20040217713 Magnetron plasma source
11/04/2004	US20040217304 Method of exposing a target to a charged particle beam
11/04/2004	US20040217303 High resolution electron beam exposure machines
11/04/2004	US20040217302 Electron beam lithography system
11/04/2004	US20040217299 Deflector of a micro-column electron beam apparatus and method for fabricating the same
11/04/2004	US20040217297 Device and method for the examination of samples in a non vacuum environment using a scanning electron microscope
11/04/2004	US20040217287 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
11/04/2004	US20040217286 Ion beam milling system and method for electron microscopy specimen preparation
11/04/2004	US20040216998 Cover ring and shield supporting a wafer ring in a plasma reactor
11/04/2004	US20040216845 Non-thermal plasma generator device
11/04/2004	US20040216844 Blocker plate by-pass for remote plasma clean
11/04/2004	US20040216843 Plasm etching device
11/04/2004	US20040216676 Method for producing a semiconductor device
11/04/2004	US20040216667 Internal member of a plasma processing vessel
11/04/2004	DE19853093B4 Verfahren und Anordnung zur Belichtung eines Substrates Method and apparatus for exposing a substrate
11/04/2004	DE10339404A1 Analysis arrangement for determining the direction of electron spin polarization in an imaging electron microscope has a polarization-sensitive scatter target
11/04/2004	DE10317208A1 Plasmadepositionsverfahren Plasma deposition process
11/04/2004	CA2522603A1 Plasma production device and method and rf driver circuit with adjustable duty cycle
11/03/2004	EP1473755A2 Device and method for controlling a dose of electrons emitted from a microemitter
11/03/2004	EP1473560A1 Apparatus and method for inspecting a sample of a specimen by means of an electron beam
11/03/2004	EP1472723A1 Device for producing inductively coupled plasma and method thereof
11/03/2004	EP1472703A1 Beam delivery system
11/03/2004	CN1543671A 等离子体装置 Plasma device
11/03/2004	CN1543667A Method and system for single ion implantation
11/03/2004	CN1543662A Adjustable dual frequency voltage dividing plasma reactor
11/03/2004	CN1542889A Electron tube control grid
11/03/2004	CN1542798A Electron beam recorder and electron beam irradiation position detecting method
11/02/2004	US6813534 Monitoring chamber temperature or energized gas radiation emission, radiation reflection or reflected power level versus selected process parameter
11/02/2004	US6812647 Plasma generator useful for ion beam generation
11/02/2004	US6812646 Creates radio frequency electromagnetic field which interacts with gaseous components
11/02/2004	US6812474 Pattern generation method and apparatus using cached cells of hierarchical data
11/02/2004	US6812471 Method of surface texturizing
11/02/2004	US6812462 Dual electron beam instrument for multi-perspective
11/02/2004	US6812461 Photocathode source for e-beam inspection or review
11/02/2004	US6812460 Nano-manipulation by gyration
11/02/2004	US6812147 GCIB processing to improve interconnection vias and improved interconnection via
11/02/2004	US6812129 Reticle for creating resist-filled vias in a dual damascene process
11/02/2004	US6812044 Advanced control for plasma process
11/02/2004	US6812023 Methods of producing membrane vesicles
11/02/2004	US6811662 Sputtering apparatus and manufacturing method of metal layer/metal compound layer by using thereof
11/02/2004	US6811651 Gas temperature control for a plasma process
11/02/2004	CA2333721C Pulsed ion source for ion trap mass spectrometer
10/2004
10/28/2004	WO2004093175A1 Hydrogen plasma downflow processing method and hydrogen plasma downflow processing apparatus
10/28/2004	WO2004093165A2 A method and apparatus for process control in time division multiplexed tdm etch processes
10/28/2004	WO2004093158A2 Explosion welded design for cooling components
10/28/2004	WO2004093121A1 Sputtering chamber comprising a liner
10/28/2004	WO2004093120A2 Secondary electron detector unit for a scanning electron microscope
10/28/2004	WO2004092443A1 Microwave plasma processing method
10/28/2004	WO2004092438A1 Segmented sputtering target and method/apparatus for using same
10/28/2004	WO2004072631A3 A method for measuring and reducing angular deviations of a charged particle beam
10/28/2004	WO2004054352A3 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens
10/28/2004	WO2004032200A3 Systems and methods for improved gas delivery
10/28/2004	US20040214435 Semiconductor fabricating apparatus
10/28/2004	US20040214139 Surface modification process on metal dentures, products produced thereby, and the incorporated system thereof
10/28/2004	US20040214026 Internal member for plasma-treating vessel and method of producing the same
10/28/2004	US20040212312 High-density plasma source using excited atoms
10/28/2004	US20040212311 High-density plasma source

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