| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 11/18/2004 | WO2004077894A3 Method and system for providing impedance matching network and network assembly |
| 11/18/2004 | US20040229419 Gas processing device and method of fabricating a semiconductor device |
| 11/18/2004 | US20040227937 Test slide for microscopes and method for the production of such a slide |
| 11/18/2004 | US20040227531 Semiconductor device test method and semiconductor device tester |
| 11/18/2004 | US20040227470 Thin magnetron structures for plasma generation in ion implantation systems |
| 11/18/2004 | US20040227106 System and methods for ion beam containment using localized electrostatic fields in an ion beam passageway |
| 11/18/2004 | US20040227105 Hybrid magnetic/electrostatic deflector for ion implantation systems |
| 11/18/2004 | US20040227100 Vibration-Isolating Coupling Including An Elastomer Diaphragm For Scanning Electron Microscope And The Like |
| 11/18/2004 | US20040227099 Charged-particle optical system |
| 11/18/2004 | US20040227082 TEM sample equipped with an identifying function, focused ion beam device for processing TEM sample, and transmission electron microscope |
| 11/18/2004 | US20040227081 Electron beam apparatus |
| 11/18/2004 | US20040227080 Particle detectors |
| 11/18/2004 | US20040227079 Inspection apparatus for circuit pattern |
| 11/18/2004 | US20040227078 Defect inspection instrument and positron beam apparatus |
| 11/18/2004 | US20040227077 Electron microscopes exhibiting improved imaging of specimen having chargeable bodies |
| 11/18/2004 | US20040227074 High mass resolution magnet for ribbon beam ion implanters |
| 11/18/2004 | US20040226831 Providing a substrate, electrodes that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy toand/or electrodes to generate electrons; contacting substrate with negatively charged reducing gas to reduce metal oxides |
| 11/18/2004 | US20040226815 Plasma processing apparatus and control method thereof |
| 11/18/2004 | US20040226658 Multi-core transformer plasma source |
| 11/18/2004 | US20040226657 Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power |
| 11/18/2004 | US20040226512 Multi-core transformer plasma source |
| 11/18/2004 | US20040226511 Multi-core transformer plasma source |
| 11/18/2004 | DE10318364A1 Einrichtung zum Beschichten eines stationär angeordneten Substrats durch Puls-Magnetron-Sputtern Means for coating a stationarily arranged substrate by pulsed magnetron sputtering |
| 11/18/2004 | DE10318363A1 Process for the plasma-activated high rate vaporization of a large surface substrate in a vacuum comprises producing a magnetic field diverging in the direction of the substrate, and further processing |
| 11/18/2004 | DE10317894A1 Fokussiersystem für geladene Teilchen, Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren Focusing of charged particles, electron microscopy and electron microscopy system method |
| 11/17/2004 | EP1476891A1 Sputtering cathode and device and method for coating a substrate with several layers |
| 11/17/2004 | EP1476890A2 Phase plate for electron microscopy and electron microscopic imaging |
| 11/17/2004 | EP1476588A1 Method of cleaning the surface of a material coated with an organic substance and a generator and device for carrying out said method |
| 11/17/2004 | CN1547240A Ion implantation machine |
| 11/17/2004 | CN1176405C Emission photoetching method and device using transmitter with pattern |
| 11/17/2004 | CN1176369C Charge testing method for insulating material |
| 11/16/2004 | US6819096 Power measurement mechanism for a transformer coupled plasma source |
| 11/16/2004 | US6819052 Coaxial type impedance matching device and impedance detecting method for plasma generation |
| 11/16/2004 | US6818941 Thin film electron emitter, display device using the same and applied machine |
| 11/16/2004 | US6818911 Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method |
| 11/16/2004 | US6818910 Writing methodology to reduce write time, and system for performing same |
| 11/16/2004 | US6818909 Ion sources for ion implantation apparatus |
| 11/16/2004 | US6818906 Electron beam position reference system |
| 11/16/2004 | US6818902 Positron source |
| 11/16/2004 | US6818852 Microwave plasma processing device, plasma processing method, and microwave radiating member |
| 11/16/2004 | US6818562 Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system |
| 11/16/2004 | US6818560 Plasma processing apparatus and plasma processing method |
| 11/16/2004 | US6818364 Charged particle beam exposure apparatus and exposure method |
| 11/16/2004 | US6818140 Low ceiling temperature process for a plasma reactor with heated source of a polymer-hardening precursor material |
| 11/16/2004 | US6818097 Highly heat-resistant plasma etching electrode and dry etching device including the same |
| 11/16/2004 | US6818096 Heat conductivity; uniform cooling |
| 11/16/2004 | US6818067 Processing chamber for atomic layer deposition processes |
| 11/11/2004 | WO2004097919A1 Process gas introducng mechanism and plasma processing device |
| 11/11/2004 | WO2004097909A2 Method and apparatus for deep trench silicon etch |
| 11/11/2004 | WO2004097890A2 Objective lens arrangement for use in a charged particle beam column |
| 11/11/2004 | WO2004097881A2 Beam uniformity and angular distribution measurement system |
| 11/11/2004 | WO2004097378A1 Apparatus and method for inspecting a sample of a specimen by means of an electron beam |
| 11/11/2004 | WO2004077502A3 Ecr-plasma source and methods for treatment of semiconductor structures |
| 11/11/2004 | WO2004068559A3 Helix coupled remote plasma source |
| 11/11/2004 | WO2004051695A3 Arc evaporation device |
| 11/11/2004 | WO2001073940A3 Circuit arrangement for impedance compensation |
| 11/11/2004 | US20040224237 photomasks/photoresists; scanning electron microscopy; microelectronics |
| 11/11/2004 | US20040224128 Low contamination plasma chamber components and methods for making the same |
| 11/11/2004 | US20040223579 Antenna structure for inductively coupled plasma generator |
| 11/11/2004 | US20040222806 Semiconductor device test method and semiconductor device tester |
| 11/11/2004 | US20040222745 Generation of Uniformly-Distributed Plasma |
| 11/11/2004 | US20040222391 Device and process for switching and controlling an electron dose emitted by a micro-emitter |
| 11/11/2004 | US20040222390 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 11/11/2004 | US20040222389 Method of and apparatus for measurement and control of a gas cluster ion beam |
| 11/11/2004 | US20040222388 Surface processing apparatus |
| 11/11/2004 | US20040222386 Method for detecting and compensating for positional displacements in photolithographic mask units and apparatus for carrying out the method |
| 11/11/2004 | US20040222385 Substrate testing device and substrate testing method |
| 11/11/2004 | US20040222382 Devices incorporating soft ionization membrane |
| 11/11/2004 | US20040222377 Patterned wafer inspection method and apparatus therefor |
| 11/11/2004 | US20040222376 Charged particle beam apparatus |
| 11/11/2004 | US20040222375 Method of determining the concavity and convexity on sample surface, and charged particle beam apparatus |
| 11/11/2004 | US20040222371 Soft ionization device and applications thereof |
| 11/11/2004 | US20040222367 Beam source and beam processing apparatus |
| 11/11/2004 | US20040222189 Apparatus and method for radio frequency decoupling and bias voltage control in a plasma reactor |
| 11/11/2004 | US20040222188 Method of cleaning a deposition chamber and apparatus for depositing a metal on a substrate |
| 11/11/2004 | US20040222184 High frequency power source and its control method, and plasma processing apparatus |
| 11/11/2004 | US20040222090 Carbon fiber and copper support for physical vapor deposition target assemblies |
| 11/11/2004 | US20040222087 Magnetron executing planetary motion adjacent a sputtering target |
| 11/11/2004 | US20040222082 sputter etching of only selected portions of material deposited in and around high aspect-ratio holes; new tool at controlling the sputtering profile into challenging geometries; Ion sources may be specially designed for semiconductor processing to provide superior performance and fabricational results |
| 11/11/2004 | US20040221959 Anodized substrate support |
| 11/11/2004 | US20040221958 RF pulsing of a narrow gap capacitively coupled reactor |
| 11/11/2004 | US20040221957 Method system and computer readable medium for monitoring the status of a chamber process |
| 11/11/2004 | US20040221816 Plasma processing apparatus |
| 11/11/2004 | US20040221815 Beam source and beam processing apparatus |
| 11/11/2004 | US20040221814 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing |
| 11/11/2004 | US20040221809 Plasma processing apparatus |
| 11/11/2004 | US20040221800 Method and apparatus for plasma processing |
| 11/11/2004 | DE10317027A1 Hochfrequenz-Plasmastrahlquelle und Verfahren zum Bestrahlen einer Oberfläche High-frequency plasma jet source and method for irradiating a surface |
| 11/11/2004 | DE10141142B4 Einrichtung zur reaktiven Plasmabehandlung von Substraten und Verfahren zur Anwendung Means for reactive plasma treatment of substrates and methods of using |
| 11/10/2004 | EP1475824A1 Plasma film forming system |
| 11/10/2004 | EP1475820A1 Electrode for plasma processes and method for manufacture and use thereof |
| 11/10/2004 | EP1475460A1 Anodized substrate support |
| 11/10/2004 | EP1475458A1 Apparatus for coating a substrate. |
| 11/10/2004 | EP1475179A2 Electrode assembly for the removal of surface oxides by electron attachment |
| 11/10/2004 | EP1474958A1 Microwave plasma source |
| 11/10/2004 | EP1474264A1 A plasma processing apparatus and method |
| 11/10/2004 | CN1545722A Plasma reactor coil magnet |
| 11/10/2004 | CN1545721A Method and apparatus for improved ion bunching in an ion implantation system |
| 11/10/2004 | CN1545720A Slit double gap buncher and method for improved ion bunching in an ion implantation system |
| 11/10/2004 | CN1175477C Plasma treatment device and plasma treatment method |