H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2004
11/30/2004	US6826489 Fault classification in a plasma process chamber
11/30/2004	US6825920 Method and system of determining chamber seasoning condition by optical emission
11/30/2004	US6825618 Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
11/30/2004	US6825597 Ion source, ion implanting device, and manufacturing method of semiconductor devices
11/30/2004	US6825482 Ion implantation system for manufacturing semiconductor device
11/30/2004	US6825480 Particle image and processing units for obtaining plurality of two-dimensional images generated by sample scanned by irradiation; computing focal offset; sharpness, accuracy
11/30/2004	US6825476 Column for a charged particle beam device
11/30/2004	US6825475 Deflection method and system for use in a charged particle beam column
11/30/2004	US6825474 Dimensionally stable ion optic component and method of manufacturing
11/30/2004	US6825468 Fine stencil structure correction device
11/30/2004	US6825050 Integrated stepwise statistical process control in a plasma processing system
11/30/2004	US6824748 Air pollution control
11/30/2004	US6824658 In a semiconductor fabrication chamber for generating a plasma and sputter depositing coil material onto a substrate can exhibit reduced rf voltages.
11/30/2004	US6824653 Compensating for aging changes in sputtering characteristics of targets; forming uniform thickness films on wafers
11/30/2004	US6824652 Sputtering target assembly and sputtering apparatus using the same
11/30/2004	US6824644 Thin-film magnetic recording head manufacture using selective imaging
11/30/2004	US6824627 Stepped upper electrode for plasma processing uniformity
11/30/2004	US6824363 Linear inductive plasma pump for process reactors
11/30/2004	US6823816 Plasma processing system
11/30/2004	US6823815 Wafer area pressure control for plasma confinement
11/30/2004	US6823589 Flexibly suspended gas distribution manifold for plasma chamber
11/25/2004	WO2004103035A1 Plasma processing apparatus and method for producing same
11/25/2004	WO2004102650A1 Plasma processing device
11/25/2004	WO2004102645A1 Exposure method, mask, semiconductor device manufacturing method, and semiconductor device
11/25/2004	WO2004102643A2 Contact opening metrology
11/25/2004	WO2004102642A2 Envelope follower end point detection in time division multiplexed processes
11/25/2004	WO2004102638A2 Rf pulsing of a narrow gap capacitively coupled reactor
11/25/2004	WO2004102610A2 Generation of uniformly-distributed plasma
11/25/2004	WO2004102307A2 Method and system for monitoring and control of a chamber process
11/25/2004	WO2004101844A1 Plasma-enhanced film deposition
11/25/2004	WO2004067800B1 Method and apparatus for cleaning a cvd chamber
11/25/2004	WO2004062341A3 Method and apparatus for layer by layer deposition of thin films
11/25/2004	WO2004038756A3 Method for magnetron sputtering
11/25/2004	US20040235310 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
11/25/2004	US20040235307 Method and apparatus for process control in time division multiplexed (TDM) etch process
11/25/2004	US20040235304 Plasma treatment apparatus
11/25/2004	US20040235303 Endpoint determination of process residues in wafer-less auto clean process using optical emission spectroscopy
11/25/2004	US20040235299 Plasma ashing apparatus and endpoint detection process
11/25/2004	US20040233608 Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system
11/25/2004	US20040233027 Apparatus for manipulating magnetic fields
11/25/2004	US20040232920 Method and apparatus for wall film monitoring
11/25/2004	US20040232415 Vacuum processing method, vacuum processing apparatus, semiconductor device manufacturing method and semiconductor device
11/25/2004	US20040232357 Electron beam lithography system having improved electron gun
11/25/2004	US20040232355 Gas-shield electron-beam gun for thin-film curing application
11/25/2004	US20040232353 Method and system for single ion implanation
11/25/2004	US20040232350 Ion implanting method and apparatus
11/25/2004	US20040232349 Apparatus for generating a plurality of beamlets
11/25/2004	US20040232332 Method of alignment for efficient defect review
11/25/2004	US20040232316 Displacement detecting method, displacement detecting device, calibrating method thereof, and recording device of information recording medium original disk
11/25/2004	US20040231980 Sputtering device
11/25/2004	US20040231973 Both magnetic field forming devices and each target are moved with respect to a substrate so that a film of homogeneous quality and thickness distribution is formed; a large area of the targets can be sputtered
11/25/2004	US20040231972 Asymmetric alternating voltage between targets having a coaxial relationship to uniformly deposit material, eliminate dielectric material from the target surfaces, provide a single ignition of the targets and eliminate subsequent ignitions, and reduce the substrate temperature by using "cold" electrons
11/25/2004	US20040231799 Plasma enhanced atomic layer deposition (peald) equipment and method of forming a conducting thin film using the same thereof
11/25/2004	US20040231797 Apparatus for manufacturing semiconductor device
11/25/2004	US20040231150 Gating grid and method of making same
11/25/2004	DE10319894A1 Dielectric focus ring for wafer located in processing position on electrostatic chuck in plasma etching installation with potential difference between wafer potential and focus ring potential
11/25/2004	DE10319370A1 Verfahren zum Erfassen und Kompensieren von Lageverschiebungen bei photolithographischen Maskeneinheiten und Vorrichtung zur Durchführung des Verfahrens A method for detecting and compensating for positional shifts in photolithographic mask units, and apparatus for carrying out the method
11/25/2004	CA2524484A1 Plasma processing apparatus and method for producing same
11/25/2004	CA2509952A1 Plasma-enhanced film deposition
11/24/2004	EP1480499A1 Plasma surface treating method and apparatus therefor
11/24/2004	EP1480034A1 High resolution defect inspection with positron annihilation by simultaneous irradiation of a positron beam and an electron beam
11/24/2004	EP1479091A2 Material treating system, material treating method and corresponding gas supply
11/24/2004	EP1479090A2 Channel spark source for generating a stable, focussed electron beam
11/24/2004	EP1392879B1 Electric arc evaporator
11/24/2004	EP1218917B1 High transmission, low energy beamline apparatus for ion implanter
11/24/2004	CN1550035A Electromagnetic field supply apparatus and plasma processing device
11/24/2004	CN1550031A Shielding system for plasma chamber
11/24/2004	CN1550027A Configurable plasma volume etch chamber
11/24/2004	CN1549872A Apparatus and method for plasma processing
11/24/2004	CN1549309A Method for etching a semiconductor wafer
11/24/2004	CN1549308A Plasma etching reactor
11/24/2004	CN1549298A Corona disposal equipment
11/24/2004	CN1548574A Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation
11/23/2004	US6822396 Apparatus including vacuum chamber surrounded by electrical transformer to induce electromagnetic field, having primary winding, plasma loop in chamber coupled as secondary winding, auxiliary secondary winding coupled to ignition circuit
11/23/2004	US6822395 Devices for controlling electron emission in plasma flood system
11/23/2004	US6822250 Mobile radiant energy sterilizer
11/23/2004	US6822249 Radioactive electron emitting microchannel plate
11/23/2004	US6822248 Spatial phase locking with shaped electron beam lithography
11/23/2004	US6822247 Ion irradiation system
11/23/2004	US6822246 Ribbon electron beam for inspection system
11/23/2004	US6822245 Ion beam apparatus and sample processing method
11/23/2004	US6822241 Emitter device with focusing columns
11/23/2004	US6822233 Method and apparatus for scanning transmission electron microscopy
11/23/2004	US6822232 Electronic microscope observation system and observation method
11/23/2004	US6822185 Temperature controlled dome-coil system for high power inductively coupled plasma systems
11/23/2004	US6821685 Block mask making method, block mask and exposure apparatus
11/23/2004	US6821577 Staggered in-situ deposition and etching of a dielectric layer for HDP CVD
11/23/2004	US6821562 Method of forming an electrically insulating sealing structure for use in a semiconductor manufacturing apparatus
11/23/2004	US6821399 Cathode mounting system for cathodic arc cathodes
11/23/2004	US6821397 Target for magnetron sputtering; generating, controlling magnetism; circulating tunnel loop
11/23/2004	US6821380 Temperature adjustment apparatus
11/23/2004	US6821379 Portable apparatus and method for treating a workpiece
11/23/2004	US6821378 Pump baffle and screen to improve etch uniformity
11/23/2004	US6820508 Apparatus for rotating a sample
11/18/2004	WO2004100248A1 Substrate processing apparatus
11/18/2004	WO2004100247A1 Plasma etching chamber and plasma etching system using same
11/18/2004	WO2004100231A2 Oblique ion milling of via metallization
11/18/2004	WO2004100206A1 Electron beam device, electron beam inspection method, electron beam inspection device, pattern inspection method and exposure condition determination method
11/18/2004	WO2004099462A1 Hybrid ball-lock attachment apparatus
11/18/2004	WO2004098699A2 Apparatus and method providing substantially uniform irradiation of surfaces of elongated objects with a high-level of irradiance

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