Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/2014
09/18/2014US20140273536 Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method
09/18/2014US20140273485 Electric pressure systems for control of plasma properties and uniformity
09/18/2014US20140272712 E-Beam Lithography with Alignment Gating
09/18/2014US20140272459 Corrosion resistant aluminum coating on plasma chamber components
09/18/2014US20140272456 Spallation-Resistant Thermal Barrier Coating
09/18/2014US20140272211 Apparatus and methods for reducing particles in semiconductor process chambers
09/18/2014US20140272193 Directing plasma distribution in plasma-enhanced chemical vapor deposition
09/18/2014US20140272178 Multi-platen ion implanter and method for implanting multiple substrates simultaneously
09/18/2014US20140265910 Digital phase controller for two-phase operation of a plasma reactor
09/18/2014US20140265862 Simplified lamp design
09/18/2014US20140265855 Electron beam plasma source with segmented suppression electrode for uniform plasma generation
09/18/2014US20140265852 Dual Control Modes
09/18/2014US20140265832 Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
09/18/2014US20140265827 Current regulation method of multiple beams
09/18/2014US20140264363 Oxygen Controlled PVD Aluminum Nitride Buffer for Gallium Nitride-Based Optoelectronic and Electronic Devices
09/18/2014US20140264086 Charged particle lithography system
09/18/2014US20140264085 Method for exposing a wafer
09/18/2014US20140264066 Deflection scan speed adjustment during charged particle exposure
09/18/2014US20140264063 High brightness electron gun, system using the same, and method of operating thereof
09/18/2014US20140264062 High throughput scan deflector and method of manufacturing thereof
09/18/2014US20140264019 Electron gun arrangement
09/18/2014US20140264018 Observation specimen for use in electron microscopy, electron microscopy, electron microscope, and device for producing observation specimen
09/18/2014US20140264017 Transmission Electron Microscope, and Method of Observing Specimen
09/18/2014US20140264016 Measurement of line-edge-roughness and line-width-roughness on pre-layered structures
09/18/2014US20140264000 Method and apparatus for control of a plasma for spectrometry
09/18/2014US20140263993 Ion Source Having Negatively Biased Extractor
09/18/2014US20140263182 Dc pulse etcher
09/18/2014US20140263179 Tuning system and method for plasma-based substrate processing systems
09/18/2014US20140263173 Methods for improving etching resistance for an amorphous carbon film
09/18/2014US20140263169 Methods for processing a substrate using multiple substrate support positions
09/18/2014US20140262769 Substrate holder apparatus and vacuum processing apparatus
09/18/2014US20140262766 Processing apparatus and shield
09/18/2014US20140262765 Deposition System With A Rotating Drum
09/18/2014US20140262755 Uv-assisted reactive ion etch for copper
09/18/2014US20140262753 Separation of function-based thin-film deposition systems and method for synthesis of complex materials
09/18/2014US20140262752 Method and apparatus for producing low-particle layers on substrates
09/18/2014US20140262751 Plasma emission monitor and process gas delivery system
09/18/2014US20140262750 Sputtering Devices and Methods
09/18/2014US20140262748 Apparatus and method for the pretreatment and/or for the coating of an article in a vacuum chamber with a hipims power source
09/18/2014US20140262157 Wafer platen thermosyphon cooling system
09/18/2014US20140262044 Mu metal shield cover
09/18/2014US20140262042 Microwave Surface-Wave Plasma Device
09/18/2014US20140262041 Microwave Surface-Wave Plasma Device
09/18/2014US20140262040 Method and system using plasma tuning rods for plasma processing
09/18/2014US20140262037 Transparent yttria coated quartz showerhead
09/18/2014US20140262034 Plasma processing apparatus
09/18/2014US20140262033 Gas sleeve for foreline plasma abatement system
09/18/2014US20140262031 Multi-mode etch chamber source assembly
09/18/2014US20140262030 Fast response fluid control system
09/18/2014US20140261181 Beam control assembly for ribbon beam of ions for ion implantation
09/18/2014US20140261179 Ion source
09/18/2014US20140261173 Adjustable mass resolving aperture
09/18/2014US20140261171 Ion beam line
09/18/2014DE112013000467T5 Verfahren zum Betrachten und Vorbehandeln von Proben Method for viewing and pre-treatment of samples
09/18/2014DE112012005189T5 Ladungsteilchenbestrahlungsvorrichtung Ladungsteilchenbestrahlungsvorrichtung
09/17/2014EP2779205A1 High throughput scan deflector and method of manufacturing thereof
09/17/2014EP2779204A1 Electron gun arrangement
09/17/2014EP2779201A1 High brightness electron gun, system using the same, and method of operating the same
09/17/2014EP2779093A2 Multiple image metrology
09/17/2014EP2778254A1 Low pressure arc plasma immersion coating vapor deposition and ion treatment
09/17/2014EP2778253A1 Cylindrical evaporation source
09/17/2014EP2777061A1 Hipims layering
09/17/2014EP2777060A1 Armored device for electronic scanning microscope
09/16/2014US8837795 Microscopy of several samples using optical microscopy and particle beam microscopy
09/16/2014US8837100 Power supply device for plasma processing
09/16/2014US8836190 Magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus
09/16/2014US8835884 Charged particle beam apparatus with cleaning photo-irradiation apparatus
09/16/2014US8835883 Charged particle radiation device and soundproof cover
09/16/2014US8835882 Real time monitoring ion beam
09/16/2014US8835881 Drift correction method and pattern writing data generation method
09/16/2014US8835880 Charged particle-beam processing using a cluster source
09/16/2014US8835879 Reduction of deposition by separation of ion beam and neutral flow
09/16/2014US8835872 Sample stage device
09/16/2014US8835871 Electron cyclotron resonance ion source device
09/16/2014US8835869 Ion sources and methods for generating an ion beam with controllable ion current density distribution
09/16/2014US8835868 Multi charged particle beam writing apparatus
09/16/2014US8835866 Method and structure for controlling magnetic field distributions in an ExB Wien filter
09/16/2014US8835847 Sample holding apparatus for electron microscope, and electron microscope apparatus
09/16/2014US8835846 Imaging a sample in a TEM equipped with a phase plate
09/16/2014US8835844 Sample electrification measurement method and charged particle beam apparatus
09/16/2014US8835843 Particle beam system and method of processing a TEM-sample
09/16/2014US8835842 Systems and methods for investigating a characteristic of a material using electron microscopy
09/16/2014US8835797 Method and device for the plasma treatment of running metal substrates
09/16/2014US8835320 Etching method and device
09/16/2014US8834732 Plasma uniformity control using biased array
09/16/2014US8834685 Sputtering apparatus and sputtering method
09/16/2014US8834674 Plasma etching apparatus
09/16/2014US8834673 Process chamber having gate slit opening and closing apparatus
09/16/2014US8833299 Divided annular rib type plasma processing apparatus
09/16/2014US8833089 Plasma processing apparatus and maintenance method therefor
09/16/2014US8832916 Methods of dechucking and system thereof
09/12/2014WO2014136381A1 Electron beam irradiation device, multi-electron beam irradiation device, adjustment method, and electron beam exposure apparatus
09/12/2014WO2014136158A1 Ion beam processing method and ion beam processing apparatus
09/12/2014WO2014136154A1 Electron beam generating apparatus, electron beam irradiation apparatus, electron beam exposure apparatus, and manufacturing method
09/11/2014US20140256122 Methods And Apparatus For Carbon Ion Source Head
09/11/2014US20140255826 Endpoint Detection for Photolithography Mask Repair
09/11/2014US20140253928 Thickness change monitor wafer for in situ film thickness monitoring
09/11/2014US20140252953 Plasma generator
09/11/2014US20140252354 Sputtering target
09/11/2014US20140252245 Electron lens and the electron beam device
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