| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/09/2004 | WO2004107050A2 Charged particle beamlet exposure system |
| 12/09/2004 | WO2004095497A3 High-density plasma source |
| 12/09/2004 | WO2004093120A3 Secondary electron detector unit for a scanning electron microscope |
| 12/09/2004 | WO2004068529A3 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample |
| 12/09/2004 | WO2004064407A3 Tunable gas distribution plate assembly |
| 12/09/2004 | WO2004057642A3 Vacuum arc source comprising a device for generating a magnetic field |
| 12/09/2004 | WO2004027816A3 A method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 12/09/2004 | WO2004013374A3 Device and method for coating substrates |
| 12/09/2004 | WO2003102993A3 Beam stop for use in an ion implantation system |
| 12/09/2004 | WO2003058202A3 System and method of detecting, neutralizing, and containing suspected contaminated articles |
| 12/09/2004 | US20040248329 Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 12/09/2004 | US20040248044 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 12/09/2004 | US20040246465 Micro-sample pick-up apparatus and micro-sample pick-up method |
| 12/09/2004 | US20040245999 Stored energy arc detection and arc reduction circuit |
| 12/09/2004 | US20040245935 Plasma-processing apparatus |
| 12/09/2004 | US20040245480 Substrate positioning system |
| 12/09/2004 | US20040245476 Ion implantation ion source, system and method |
| 12/09/2004 | US20040245465 Electron-beam device and detector system |
| 12/09/2004 | US20040245464 Thin specimen producing method and apparatus |
| 12/09/2004 | US20040245097 Adaptable processing element for a processing system and a method of making the same |
| 12/09/2004 | US20040245089 Roughening exposure surfaces to improve adhesion; belt sanding; vapor deposition, etching |
| 12/09/2004 | US20040244949 Temperature controlled shield ring |
| 12/09/2004 | US20040244693 Electromagnetic field supply apparatus and plasma processing device |
| 12/09/2004 | US20040244692 Method to accurately and repeatably setup an ion beam for an ion implantation system in reduced setup time to increase productivity |
| 12/09/2004 | US20040244691 Slotted electrostatic shield modification for improved etch and CVD process uniformity |
| 12/09/2004 | US20040244688 Plasma processing apparatus |
| 12/09/2004 | US20040244687 Etching method and apparatus |
| 12/09/2004 | US20040244685 Pretreated gas distribution plate |
| 12/09/2004 | DE19729600B4 Mustervergleichsüberprüfungssystem und -verfahren, die ein Grauwertpunktraster verwenden Pattern matching verification system and method using a grayscale bitmap |
| 12/09/2004 | DE10320985A1 Vorrichtung zum Beschichten eines Substrats mit von der Vakuumkammer getrenntem Saugraum An apparatus for coating a substrate with a separate vacuum chamber from the suction chamber |
| 12/09/2004 | DE102004018511A1 Sputtervorrichtung Sputtering |
| 12/08/2004 | EP1484788A1 High-frequency power supply structure and plasma cvd device using the same |
| 12/08/2004 | EP1483773A2 Device for activating gases in a vacuum |
| 12/08/2004 | EP1483426A1 Apparatus and method for applying diamond-like carbon coatings |
| 12/08/2004 | EP1392882B1 Method for treating a substrate |
| 12/08/2004 | EP1090414B1 Resin molded article for chamber liner |
| 12/08/2004 | CN1554114A Plasma treatment device and plasma treatment method |
| 12/08/2004 | CN1554107A Shallow-angle interference process and apparatus for determining real-time etching rate |
| 12/08/2004 | CN1554106A Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
| 12/07/2004 | US6829559 Methods and systems for determining a presence of macro and micro defects on a specimen |
| 12/07/2004 | US6829056 Monitoring dimensions of features at different locations in the processing of substrates |
| 12/07/2004 | US6828996 Electron beam patterning with a heated electron source |
| 12/07/2004 | US6828574 Modulator driven photocathode electron beam generator |
| 12/07/2004 | US6828573 Electron beam lithography system |
| 12/07/2004 | US6828572 Ion beam incident angle detector for ion implant systems |
| 12/07/2004 | US6828570 Technique for writing with a raster scanned beam |
| 12/07/2004 | US6828566 Method and apparatus for specimen fabrication |
| 12/07/2004 | US6828565 Electron beam source, electron optical apparatus using such beam source and method of operating and electron beam source |
| 12/07/2004 | US6828555 Three-dimensional structure verification supporting apparatus, three-dimensional structure verification method, recording medium, and program therefor |
| 12/07/2004 | US6828554 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 12/07/2004 | US6828549 Apparatus and method for moving an electron source |
| 12/07/2004 | US6828254 Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same |
| 12/07/2004 | US6828249 System and method for enhanced monitoring of an etch process |
| 12/07/2004 | US6828246 Gas delivering device |
| 12/07/2004 | US6828243 Apparatus and method for plasma treatment |
| 12/07/2004 | US6828241 Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source |
| 12/07/2004 | US6827870 Method and apparatus for etching and deposition using micro-plasmas |
| 12/02/2004 | WO2004105077A1 High-density recording scanning microscope |
| 12/02/2004 | WO2004051702A3 Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
| 12/02/2004 | WO2004030014A3 Optical window deposition shield in a plasma processing system |
| 12/02/2004 | US20040243269 Performance evaluation method for plasma processing apparatus |
| 12/02/2004 | US20040241995 Etching apparatus and etching method |
| 12/02/2004 | US20040241968 Production method and production device for semiconductor device |
| 12/02/2004 | US20040241176 Method of producing membrane vesicles |
| 12/02/2004 | US20040239347 Semiconductor device tester |
| 12/02/2004 | US20040238759 Stencil mask for ion implantation |
| 12/02/2004 | US20040238753 Particle processing apparatus and methods |
| 12/02/2004 | US20040238752 Charged particle beam device |
| 12/02/2004 | US20040238740 Scanning device and method including electric charge movement |
| 12/02/2004 | US20040238739 Portable scanning electron microscope |
| 12/02/2004 | US20040238490 Accurate etching without charging damage; controlling charge inflow to sparse and dense pattern portions; suppressing electric potential on gate oxide film |
| 12/02/2004 | US20040238489 Envelope follower end point detection in time division multiplexed processes |
| 12/02/2004 | US20040238488 Wafer edge etching apparatus and method |
| 12/02/2004 | US20040238345 Method of producing powder with composite grains and the device for carrying out said method |
| 12/02/2004 | US20040238126 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 12/02/2004 | US20040238125 Plasma processing device |
| 12/02/2004 | US20040238124 Plasma treatment apparatus |
| 12/02/2004 | US20040238123 Oxygen and nitrogen free; endpoint detection; ashing removal of photoresist material and post etch residues containing carbon and/or hydrogen low k dielectric layer |
| 12/02/2004 | US20040237897 High-Frequency electrostatically shielded toroidal plasma and radical source |
| 12/02/2004 | US20040237894 Apparatus having high gas conductance |
| 12/02/2004 | US20040237891 Lid liner for chemical vapor deposition chamber |
| 12/02/2004 | US20040237888 Optical monitoring system for plasma enhanced chemical vapor deposition |
| 12/02/2004 | US20040237670 Sample holder and auxiliary apparatus |
| 12/02/2004 | DE10320805A1 Device for processing cylindrical substrates, such as wires and cables, comprises a process chamber, and a dielectric barrier arranged between an electrode and a lead functioning as the counter electrode |
| 12/02/2004 | CA2526257A1 Device for area-based surface treatment of an article by electric dielectric barrier discharge |
| 12/01/2004 | EP1482532A1 Gradient field deflector |
| 12/01/2004 | EP1482374A2 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 12/01/2004 | EP1481413A2 Indirectly heated button cathode for an ion source |
| 12/01/2004 | EP1481110A1 Getter metal alloy coating and device and method for the production thereof |
| 12/01/2004 | EP1480685A1 Portable radiant energy sterilizer |
| 12/01/2004 | CN1552097A Ionized PVD with sequential deposition and etching |
| 12/01/2004 | CN1552087A Flat magnetron |
| 12/01/2004 | CN1551326A Anodized substrate support |
| 12/01/2004 | CN1551322A Electrode assembly for the removal of surface oxides by electron attachment |
| 12/01/2004 | CN1551305A Plasma processing apparatus and control method thereof |
| 12/01/2004 | CN1551302A Upper electrode and plasma processing device |
| 12/01/2004 | CN1550903A Surface processing apparatus |
| 12/01/2004 | CN1550901A Particle_optical device for object irradiation |
| 12/01/2004 | CN1550754A Displacement meter and displacement measuring method |
| 12/01/2004 | CN1177948C Sputtering apparatus capable of changing distance between substrate and deposition prevention plate used for film formation |