| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/23/2004 | US20040256573 Methods and systems for optimizing ion implantation uniformity control |
| 12/23/2004 | US20040256570 Sample carrier for carrying a sample to be irradiated with an electron beam |
| 12/23/2004 | US20040256556 Multiple electron beam device |
| 12/23/2004 | US20040256555 Method, apparatus and system for specimen fabrication by using an ion beam |
| 12/23/2004 | US20040256553 Charge amount measurement method, shift value measurement method of charged beam, charge amount measuring device and shift value measuring device of charged beam |
| 12/23/2004 | US20040256353 Method and system for deep trench silicon etch |
| 12/23/2004 | US20040256226 Method and design for sputter target attachment to a backing plate |
| 12/23/2004 | US20040256217 Coils for generating a plasma and for sputtering |
| 12/23/2004 | US20040256215 Sputtering chamber liner |
| 12/23/2004 | US20040256056 Microwave plasma generator |
| 12/23/2004 | US20040255867 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber |
| 12/23/2004 | US20040255864 ICP antenna and plasma generating apparatus using the same |
| 12/23/2004 | US20040255863 Plasma process apparatus |
| 12/23/2004 | DE10323258A1 Magnetron sputter cathode has cooling plate on vacuum side located between substrate plate and sputter target |
| 12/22/2004 | EP1489643A2 Method and apparatus for ionized physical vapor deposition |
| 12/22/2004 | EP1489642A1 Sample carrier for carrying a sample to be irradiated with an electron beam |
| 12/22/2004 | EP1489641A1 Charged particle deflecting system |
| 12/22/2004 | EP1488445A2 Tube magnetron |
| 12/22/2004 | EP1488444A1 Vacuum plasma generator |
| 12/22/2004 | EP1488443A1 Device for confinement of a plasma within a volume |
| 12/22/2004 | EP1488193A1 Device and method for maskless afm microlithography |
| 12/22/2004 | EP1114436B1 Physical vapor processing of a surface with non-uniformity compensation |
| 12/22/2004 | CN1557017A 等离子体处理装置 The plasma processing apparatus |
| 12/22/2004 | CN1557012A Method and apparatus for tuning ion implanters |
| 12/22/2004 | CN1181709C Radio frequency plasma generator |
| 12/22/2004 | CN1181220C Method for producing coated workpieces, uses and installation for the method |
| 12/21/2004 | US6833710 Probe assembly for detecting an ion in a plasma generated in an ion source |
| 12/21/2004 | US6833552 System and method for implanting a wafer with an ion beam |
| 12/21/2004 | US6833550 Electron microscope |
| 12/21/2004 | US6833546 Scanning electron microscope |
| 12/21/2004 | US6833051 Plasma processing apparatus and method |
| 12/21/2004 | US6833050 Apparatus for manufacturing semiconductor device |
| 12/21/2004 | US6833049 Apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 12/16/2004 | WO2004109793A1 Sample inspection device and method, and device manufacturing method using the sample inspection device and method |
| 12/16/2004 | WO2004109784A1 Ion doping system, ion doping method and semiconductor device |
| 12/16/2004 | WO2004108980A1 Thin film forming device and thin film forming method |
| 12/16/2004 | WO2004108979A1 Thin film forming device and thin film forming method |
| 12/16/2004 | WO2004070744A3 Reaction enhancing gas feed for injecting gas into a plasma chamber |
| 12/16/2004 | WO2004055607A3 Apparatus for processing an object with high position accurancy |
| 12/16/2004 | WO2004030012A3 Improved bellows shield in a plasma processing system,and method of manufacture of such bellows shield |
| 12/16/2004 | WO2002071031B1 Total release method for sample extraction from a charged particle instrument |
| 12/16/2004 | US20040254761 Operation monitoring method for treatment apparatus |
| 12/16/2004 | US20040253824 Arrangement for monitoring a thickness of a layer depositing on a sidewall of a processing chamber |
| 12/16/2004 | US20040253543 Multilayer lithography; focusing particle beams; imaging marking element; determination position; high density storage |
| 12/16/2004 | US20040252439 Vacuum plasma processor and method of operating same |
| 12/16/2004 | US20040251432 Ion implanter and method for controlling the same |
| 12/16/2004 | US20040251428 Charged-particle-beam mapping projection-optical systems and methods for adjusting same |
| 12/16/2004 | US20040251427 Charged particle beam application apparatus |
| 12/16/2004 | US20040251425 Rotational stage for high speed, large area scanning in focused beam systems |
| 12/16/2004 | US20040251424 Ion source apparatus and electronic energy optimized method therefor |
| 12/16/2004 | US20040251423 Method of fabricating multipole lens, multipole lens, and charged-particle beam instrument equipped therewith |
| 12/16/2004 | US20040251413 Focused ion beam system |
| 12/16/2004 | US20040251240 Method and apparatus for treating a surface using a plasma discharge |
| 12/16/2004 | US20040251130 Method and apparatus for controlling darkspace gap in a chamber |
| 12/16/2004 | US20040250955 RF current return path for a large area substrate plasma reactor |
| 12/16/2004 | US20040250954 Plasma chamber |
| 12/16/2004 | US20040250776 Sample-setting moving stage, manufacturing apparatus for circuit pattern, and inspection apparatus for circuit pattern |
| 12/16/2004 | US20040250771 Microwave plasma substrate processing device |
| 12/16/2004 | US20040250770 Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level |
| 12/16/2004 | US20040250766 Hybrid ball-lock attachment apparatus |
| 12/16/2004 | US20040250763 Fountain cathode for large area plasma deposition |
| 12/15/2004 | EP1487005A1 Stencil mask for ion implantation |
| 12/15/2004 | EP1486829A2 Stage system, exposure apparatus, and device manufacturing method |
| 12/15/2004 | EP1485923A1 System and method of irradiating products being conveyed past an electron beam delivery device |
| 12/15/2004 | EP1485687A2 Method and apparatus for obtaining molecular data from a pharmaceutical specimen |
| 12/15/2004 | EP1330846A4 Electrode and electron emission applications for n-type doped nanocrystalline materials |
| 12/15/2004 | EP0988407B9 Method for producing coated workpieces, which are coated with an epitactic layer |
| 12/15/2004 | EP0786145B1 Field emission environmental scanning electron microscope |
| 12/15/2004 | CN1555568A Method and apparatus for producing uniform process rates |
| 12/15/2004 | CN1180122C Film growth method and film growth apparatus capable of forming magnesium oxide film with increased film growth speed |
| 12/14/2004 | US6831997 Mask data correction apparatus, fourier transformation apparatus, up sampling apparatus, down sampling apparatus, method of manufacturing transfer mask, and method of manufacturing device having pattern structure |
| 12/14/2004 | US6831742 Monitoring substrate processing using reflected radiation |
| 12/14/2004 | US6831284 Large area source for uniform electron beam generation |
| 12/14/2004 | US6831283 Charged particle beam drawing apparatus and pattern forming method |
| 12/14/2004 | US6831282 Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus |
| 12/14/2004 | US6831281 Methods and devices for detecting and canceling magnetic fields external to a charged-particle-beam (CPB) optical system, and CPB microlithography apparatus and methods comprising same |
| 12/14/2004 | US6831280 Methods and apparatus for precise measurement of time delay between two signals |
| 12/14/2004 | US6831278 System and method for electron beam irradiation |
| 12/14/2004 | US6831272 Gas cluster ion beam size diagnostics and workpiece processing |
| 12/14/2004 | US6831260 Electron beam exposure apparatus, reduction projection system, and device manufacturing method |
| 12/14/2004 | US6830939 System and method for determining endpoint in etch processes using partial least squares discriminant analysis in the time domain of optical emission spectra |
| 12/14/2004 | US6830873 Includes depositing a thin conductive layer over a photoresist layer only on the alignment structures, and grounding; semiconductors |
| 12/14/2004 | US6830852 Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles |
| 12/14/2004 | US6830664 Cluster tool with a hollow cathode array |
| 12/14/2004 | US6830653 Generating plasma in vacuum; controlling distribution |
| 12/14/2004 | US6830652 Microwave plasma processing apparatus |
| 12/14/2004 | US6830650 Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
| 12/14/2004 | US6830624 Blocker plate by-pass for remote plasma clean |
| 12/14/2004 | US6830622 Corrosion resistant component of semiconductor processing equipment such as a plasma chamber |
| 12/14/2004 | CA2249157C Uniform distribution monoenergetic ion implantation |
| 12/09/2004 | WO2004107825A1 Plasma source and plasma processing apparatus |
| 12/09/2004 | WO2004107463A1 Beam current meter |
| 12/09/2004 | WO2004107430A1 Plasma processing apparatus and plasma processing method |
| 12/09/2004 | WO2004107425A1 Surface treating method using ion beam and surface treating device |
| 12/09/2004 | WO2004107414A2 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith |
| 12/09/2004 | WO2004107413A2 Plasma ashing apparatus and endpoint detection process |
| 12/09/2004 | WO2004107411A2 Deposition apparatus and method |
| 12/09/2004 | WO2004107394A2 Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method |
| 12/09/2004 | WO2004107387A2 Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system |
| 12/09/2004 | WO2004107386A2 Method and system for ion beam containment in an ion beam guide |