| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/04/2005 | US6838635 Plasma reactor with overhead RF electrode tuned to the plasma |
| 01/04/2005 | US6838405 Plasma-resistant member for semiconductor manufacturing apparatus and method for manufacturing the same |
| 01/04/2005 | US6838126 Method for forming I-carbon film |
| 01/04/2005 | US6838012 Methods for etching dielectric materials |
| 01/04/2005 | US6837975 Asymmetric rotating sidewall magnet ring for magnetron sputtering |
| 01/04/2005 | US6837974 Vertical positioning of semiconductor wafer for sputtering; replacable, reusee |
| 01/04/2005 | US6837968 Lower pedestal shield |
| 01/04/2005 | US6837967 Method and apparatus for cleaning deposited films from the edge of a wafer |
| 01/04/2005 | US6837966 Method and apparatus for an improved baffle plate in a plasma processing system |
| 01/04/2005 | US6837965 Method and apparatus for etch processing with end point detection thereof |
| 01/04/2005 | US6837937 Plasma processing apparatus |
| 12/30/2004 | US20040267547 Method and apparatus for monitoring and verifying equipment status |
| 12/30/2004 | US20040267471 Lithography tool image quality evaluating and correcting |
| 12/30/2004 | US20040265616 Method for connecting magnetic substance target to backing plate, and magnetic substance target |
| 12/30/2004 | US20040265052 Remote clamping mechanism via vacuum feedthrough |
| 12/30/2004 | US20040264764 Apparatus and method for three-dimensional coordinate measurement |
| 12/30/2004 | US20040263827 Novel methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing |
| 12/30/2004 | US20040263819 Airtight processing apparatus, airtight processing method, and electron beam processing apparatus |
| 12/30/2004 | US20040263412 Plasma production device and method and RF driver circuit with adjustable duty cycle |
| 12/30/2004 | US20040263083 System and method for inductive coupling of an expanding thermal plasma |
| 12/30/2004 | US20040263050 Electron tube control grid |
| 12/30/2004 | US20040262592 Electronic device with aperture and wide lens for small emission spot size |
| 12/30/2004 | US20040262543 Variably shaped beam EB writing system |
| 12/30/2004 | US20040262542 Electrostatic lens for ion beams |
| 12/30/2004 | US20040262539 Electron beam source and electron beam exposure apparatus employing the electron beam source |
| 12/30/2004 | US20040262533 Advanced ion beam detector for ion implantation tools |
| 12/30/2004 | US20040262532 Advanced ion beam measurement tool for an ion implantation apparatus |
| 12/30/2004 | US20040262531 Particle detector suitable for detecting ions and electrons |
| 12/30/2004 | US20040262518 Metrology process for enhancing image contrast |
| 12/30/2004 | US20040262516 Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus |
| 12/30/2004 | US20040262515 Information acquisition apparatus, cross section evaluating apparatus, and cross section evaluating method |
| 12/30/2004 | US20040262156 Dual magnetron sputtering apparatus utilizing control means for delivering balanced power |
| 12/30/2004 | US20040262155 maintaining processing pressure during physical vapor deposition on semiconductor wafers; a deposition shield protects the walls and gas flow conductance path from deposition and partially impedes gas flow to the exhaust |
| 12/30/2004 | US20040262148 For sputtering thin film coating on substrates; injects gas from the top of a chamber, where one end of the substrate is located, and pump gas from the bottom of the chamber, where the other end of the substrate is located |
| 12/30/2004 | US20040261720 High-density plasma processing apparatus |
| 12/30/2004 | US20040261719 Proximity deposition |
| 12/30/2004 | US20040261718 Plasma source coil for generating plasma and plasma chamber using the same |
| 12/30/2004 | US20040261717 Matching device and plasma processing apparatus |
| 12/30/2004 | US20040261715 Apparatus and method of fabricating display device |
| 12/30/2004 | US20040261714 Plasma processing apparatus |
| 12/30/2004 | US20040261713 Monitoring system for plasma deposition facility |
| 12/30/2004 | US20040261712 Plasma processing apparatus |
| 12/29/2004 | WO2004114358A2 Thin magnetron structures for plasma generation in ion implantation systems |
| 12/29/2004 | WO2004114356A1 High resolution separation magnet for ribbon beam ion implanters |
| 12/29/2004 | WO2004114355A2 Method and design for sputter target attachment to a backing plate |
| 12/29/2004 | WO2004114354A2 A hybrid magnetic/electrostatic deflector for ion implantation systems |
| 12/29/2004 | WO2004114348A1 Planar electron emitter with extended lifetime and system using same |
| 12/29/2004 | WO2004113890A1 Time resolution measurement device and position detection electron multiplier |
| 12/29/2004 | WO2004113888A1 Time-resolved measurement apparatus |
| 12/29/2004 | WO2004097890A3 Objective lens arrangement for use in a charged particle beam column |
| 12/29/2004 | WO2004082008A8 Cvd apparatus and method for cleaning cvd apparatus |
| 12/29/2004 | WO2004066360A3 Apparatus and methods for ionized deposition of a film or thin layer |
| 12/29/2004 | WO2004061890A3 Electron beam sensor |
| 12/29/2004 | WO2004030426A3 Improved deposition shield in a plasma processing system,and methods of manufacture of such shield |
| 12/29/2004 | WO2004017368A3 Sidewall smoothing in high aspect ratio/deep etching using a discreet gas switching method |
| 12/29/2004 | WO2004013692A3 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 12/29/2004 | EP1492154A2 Coil for plasma generating source |
| 12/29/2004 | EP1492153A2 Method and system for monitoring an etch process |
| 12/29/2004 | EP1492152A2 Electron microscope |
| 12/29/2004 | EP1492151A2 Multipole lens, charged-particle beam instrument fitted with multipole lenses, and method of fabricating multipole lens |
| 12/29/2004 | EP1491654A1 Proximity CVD deposition |
| 12/29/2004 | EP1491255A1 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
| 12/29/2004 | EP1490889A2 Technique for writing with a raster scanned beam |
| 12/29/2004 | EP1490888A1 Device for measuring the emission of x rays produced by an object exposed to an electron beam |
| 12/29/2004 | EP1490528A1 Rotating tubular cathode |
| 12/29/2004 | EP1198607B1 Vacuum treatment installation and method for producing workpieces |
| 12/29/2004 | EP0832497B1 System and method for producing superimposed static and time-varying magnetic fields |
| 12/29/2004 | CN1559077A Procedure and device for the production of a plasma |
| 12/29/2004 | CN1558424A Gold thin film substrate making method for scanning probe microscope |
| 12/29/2004 | CN1182569C Ion-beam injector with function of removing dirt at home position |
| 12/28/2004 | US6836372 Electrostatic corrector |
| 12/28/2004 | US6836319 Optical system adjusting method for energy beam apparatus |
| 12/28/2004 | US6836073 Simultaneous discharge apparatus |
| 12/28/2004 | US6835943 Electron-beam lithography |
| 12/28/2004 | US6835942 Dividing a processing pattern in a specified way; calculating a pattern area density for the first and second patterns in a unit region; and calculating a corrected dose for the processing pattern according to the pattern area density |
| 12/28/2004 | US6835937 Correcting method for correcting exposure data used for a charged particle beam exposure system |
| 12/28/2004 | US6835930 High mass resolution magnet for ribbon beam ion implanters |
| 12/28/2004 | US6835919 Uniform radial distribution of radicals emanating from a plasma source is improved; for chemical vapor deposition |
| 12/28/2004 | US6835290 System and method for controlling thin film defects |
| 12/28/2004 | US6835289 Particle implantation apparatus and particle implantation method |
| 12/28/2004 | US6835279 Plasma generation apparatus |
| 12/28/2004 | US6835278 Plasma is ignited from gases fed into a chamber that is located remotely from the processing chamber; activated species are introduced into the processing chamber via a dedicated inlet port, increasing conductance; efficiency |
| 12/28/2004 | US6835277 Ashing apparatus for semiconductor device |
| 12/28/2004 | US6835276 Window for allowing end point of etching process to be detected and etching device comprising the same |
| 12/28/2004 | US6835275 Reducing deposition of process residues on a surface in a chamber |
| 12/28/2004 | US6834613 Plasma-resistant member and plasma treatment apparatus using the same |
| 12/23/2004 | WO2004112079A1 Magnetron sputter cathode comprising a cooling plate |
| 12/23/2004 | WO2004112078A2 Ion implanter having enhanced low energy ion beam transport |
| 12/23/2004 | WO2004112077A2 Rf current return path for a large area substrate plasma reactor |
| 12/23/2004 | WO2004111604A2 High resolution atom probe |
| 12/23/2004 | WO2004111294A1 Deflection magnetic field type vacuum arc vapor deposition device |
| 12/23/2004 | WO2004098699A3 Apparatus and method providing substantially uniform irradiation of surfaces of elongated objects with a high-level of irradiance |
| 12/23/2004 | US20040259380 Plasma surface treatment system and plasma surface treatment method |
| 12/23/2004 | US20040259364 Stage base, substrate processing apparatus, and maintenance method for stage |
| 12/23/2004 | US20040259036 Magnetic etching process, especially for magnetic or magnetooptic recording |
| 12/23/2004 | US20040258206 Centroid apparatus and method for sub-pixel X-ray image resolution |
| 12/23/2004 | US20040256579 Planar electron emitter with extended lifetime and system using same |
| 12/23/2004 | US20040256578 Ion implanter and a method of implanting ions |
| 12/23/2004 | US20040256577 Focused ion beam microlathe |
| 12/23/2004 | US20040256576 Device for controlling an apparatus generating a charged particle beam |