| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/13/2005 | US20050006232 [ionized physical vapor deposition process and apparatus thereof] |
| 01/13/2005 | US20050006231 cathodic polarization; vapor deposition; bottom-up filling of trenches/vias within sidewalls to avoid production of seams/voids; for production of integrated circuits |
| 01/13/2005 | US20050006226 System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal |
| 01/13/2005 | US20050006222 Self-ionized and inductively-coupled plasma for sputtering and resputtering |
| 01/13/2005 | US20050006220 Ionizing a gas; supplying electricity field to activation |
| 01/13/2005 | US20050006028 Magnetic enhancement for mechanical confinement of plasma |
| 01/13/2005 | US20050005860 Vacuum evaporator |
| 01/13/2005 | US20050005859 Ring mechanism, and plasma processing device using the ring mechanism |
| 01/13/2005 | US20050005854 Surface wave plasma treatment apparatus using multi-slot antenna |
| 01/13/2005 | US20050005853 Device for the coating of objects |
| 01/13/2005 | US20050005851 Roll-vortex plasma chemical vapor deposition system |
| 01/13/2005 | US20050005844 Process and apparatus for forming oxide film, and electronic device material |
| 01/12/2005 | EP1496540A2 Exposure system and exposure method |
| 01/12/2005 | EP1496136A1 Vacuum Evaporator |
| 01/12/2005 | EP1495156A2 Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 01/12/2005 | EP1495155A1 Low contamination components for semiconductor processing apparatus and methods for making components |
| 01/12/2005 | EP0995214B1 Method and apparatus for neutralising space charge in an ion beam |
| 01/12/2005 | CN1565148A Method of detecting an arc in a glow discharge device and apparatus for controlling a high-frequency arc discharge |
| 01/12/2005 | CN1565046A CVD device with cleaning mechanism using fluorine gas and method of cleaning CVD device with fluorine gas |
| 01/12/2005 | CN1565043A Extraction and deceleration of low energy beam with low beam divergence |
| 01/12/2005 | CN1565042A Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method |
| 01/12/2005 | CN1564309A Wafer self rotary device of strong stream oxygen ion injector |
| 01/11/2005 | US6842147 Method and apparatus for producing uniform processing rates |
| 01/11/2005 | US6841943 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 01/11/2005 | US6841942 Plasma source with reliable ignition |
| 01/11/2005 | US6841789 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 01/11/2005 | US6841787 Maskless photon-electron spot-grid array printer |
| 01/11/2005 | US6841777 Electron diffraction system for use in production environment and for high pressure deposition techniques |
| 01/11/2005 | US6841776 Method and apparatus for high-speed inspection and review |
| 01/11/2005 | US6841775 Electron microscope |
| 01/11/2005 | US6841402 Alignment-mark detection methods and devices for charged-particle-beam microlithography, and microelectronic-device manufacturing methods comprising same |
| 01/11/2005 | US6841202 Device and method for the vacuum plasma processing of objects |
| 01/11/2005 | US6841201 Apparatus and method for treating a workpiece using plasma generated from microwave radiation |
| 01/11/2005 | US6841051 High-power ion sputtering magnetron |
| 01/11/2005 | US6841050 Small planetary magnetron |
| 01/11/2005 | US6841032 Plasma processing apparatus for adjusting plasma processing through detecting plasma processing state within chamber |
| 01/11/2005 | US6840427 Method of manufacturing sputter targets with internal cooling channels |
| 01/06/2005 | WO2005001920A1 Method for generating plasma, method for cleaning and method for treating substrate |
| 01/06/2005 | WO2005001918A1 Traps for particle entrapment in deposition chambers |
| 01/06/2005 | WO2005001877A2 Magnetic enhancement for mechanical confinement of plasma |
| 01/06/2005 | WO2005001876A2 Electrostatic parallelizing lens for ion beams |
| 01/06/2005 | WO2005001870A2 Stored energy arc detection and arc reduction circuit |
| 01/06/2005 | WO2005001020A2 A multi-stage open ion system in various topologies |
| 01/06/2005 | WO2004095530A3 Adjoining adjacent coatings on an element |
| 01/06/2005 | WO2004061153A3 Magnetron sputtering systems including anodic gas distribution systems |
| 01/06/2005 | WO2004055855A3 Gas distribution apparatus and method for uniform etching |
| 01/06/2005 | WO2004027684B1 Photolithography mask repair |
| 01/06/2005 | WO2004000003A3 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process |
| 01/06/2005 | US20050003675 Dielectric etch chamber with expanded process window |
| 01/06/2005 | US20050003240 Wear and corrosion resistance; chemical resistance |
| 01/06/2005 | US20050003098 Flash evaporation-plasma coating deposition method |
| 01/06/2005 | US20050001556 Capacitively coupled plasma reactor with magnetic plasma control |
| 01/06/2005 | US20050001555 Method and device for removing harmonics in semiconductor plasma processing systems |
| 01/06/2005 | US20050001554 Elementary plasma source and plasma generation apparatus using the same |
| 01/06/2005 | US20050001527 Plasma processing apparatus |
| 01/06/2005 | US20050001490 High-frequency matching network |
| 01/06/2005 | US20050001220 Low power schottky emitter |
| 01/06/2005 | US20050001178 Multi-column charged particle optics assembly |
| 01/06/2005 | US20050001177 Apparatus and method for forming alignment layers |
| 01/06/2005 | US20050001165 Detector optics for charged particle beam inspection system |
| 01/06/2005 | US20050001164 Method and apparatus for processing a micro sample |
| 01/06/2005 | US20050000950 Radial pulsed arc discharge gun for synthesizing nanopowders |
| 01/06/2005 | US20050000805 Sputtering device |
| 01/06/2005 | US20050000655 Inductive plasma chamber having multi discharge tube bridge |
| 01/06/2005 | US20050000654 Apparatus and method for plasma processing |
| 01/06/2005 | US20050000446 Plasma processing apparatus and plasma processing method |
| 01/06/2005 | US20050000445 Plasma processing device and plasma processing method |
| 01/06/2005 | US20050000443 Apparatus for processing a substrate using plasma |
| 01/06/2005 | US20050000442 Upper electrode and plasma processing apparatus |
| 01/06/2005 | US20050000440 Plasma processing apparatus including a plurality of plasma processing units having reduced variation |
| 01/06/2005 | US20050000432 Suspended gas distribution manifold for plasma chamber |
| 01/06/2005 | US20050000430 Showerhead assembly and apparatus for manufacturing semiconductor device having the same |
| 01/06/2005 | US20050000429 Spiral gas flow plasma reactor |
| 01/06/2005 | US20050000423 Film forming device |
| 01/05/2005 | EP1494512A1 Ecr plasma source and ecr plasma device |
| 01/05/2005 | EP1493172A1 An atmospheric pressure plasma assembly |
| 01/05/2005 | EP1493171A2 A method of implanting a substrate and an ion implanter for performing the method |
| 01/05/2005 | EP1493170A2 Multi-directional scanning of movable member and ion beam monitoring arrangement therefor |
| 01/05/2005 | DE10327050A1 Separating layer system with individual layer(s) of defined material by pulse-magnetron sputtering involves applying individual layer(s) as sub-regions lying one on the other in growth direction |
| 01/05/2005 | DE102004028392A1 Centroid-Einrichtung und -Verfahren zur Sub-Pixelauflösung von Röntgenbildern Centroid device and method for sub-pixel resolution X-ray images |
| 01/05/2005 | DE102004025890A1 Substrate testing apparatus used in semiconductor device manufacture, detects reflection electron with discharge energy which is equivalent to incidence energy of primary beam radiated from substrate |
| 01/05/2005 | CN1561534A Inductively-coupled plasma processing system |
| 01/05/2005 | CN1561405A Dual-source, single-chamber method and apparatus for sputter deposition |
| 01/05/2005 | CN1560897A Target tray vertical scanning moving mechanism in ion implantation apparatus |
| 01/05/2005 | CN1560896A Target tray oblique scanning moving mechanism in ion implantaton apparatus |
| 01/05/2005 | CN1560320A Filter apparatus of plasma magnetic field |
| 01/05/2005 | CN1183584C Monitoring chip of high current ion transplant device and method to monitor charging phenomenon with the chip |
| 01/05/2005 | CN1183529C Magnetic engraving method, in particular for magnetic or magneto-optical recording |
| 01/04/2005 | US6839142 Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus |
| 01/04/2005 | US6838895 High resolution analytical probe station |
| 01/04/2005 | US6838833 Plasma processing apparatus |
| 01/04/2005 | US6838832 Apparatus and methods for improving the stability of RF power delivery to a plasma load |
| 01/04/2005 | US6838808 Stage-actuators that do not generate fluctuating magnetic fields, and stage devices comprising same |
| 01/04/2005 | US6838685 Ion beam apparatus, ion beam processing method and sample holder member |
| 01/04/2005 | US6838683 Focused ion beam microlathe |
| 01/04/2005 | US6838682 Electron beam exposure equipment and electron beam exposure method |
| 01/04/2005 | US6838677 Extraction and deceleration of low energy beam with low beam divergence |
| 01/04/2005 | US6838675 Specimen observation system for applying external magnetic field |
| 01/04/2005 | US6838668 System for imaging a cross-section of a substrate |
| 01/04/2005 | US6838667 Method and apparatus for charged particle beam microscopy |