| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/26/2005 | EP0934600B1 Ion gun |
| 01/26/2005 | CN1186768C Electronic beam recording apparatus and electronic beam recording method |
| 01/26/2005 | CN1186642C Reliability of vias and e-beam probing diagnosis |
| 01/26/2005 | CN1186476C Device and method for detecting and preventing arcing in RF plasma systems |
| 01/25/2005 | US6847164 Current-stabilizing illumination of photocathode electron beam source |
| 01/25/2005 | US6847043 Ion sources for ion implantation apparatus |
| 01/25/2005 | US6847042 Centroid apparatus and method for sub-pixel X-ray image resolution |
| 01/25/2005 | US6847038 Scanning electron microscope |
| 01/25/2005 | US6847036 Charged particle beam detection system |
| 01/25/2005 | US6847003 Plasma processing apparatus |
| 01/25/2005 | US6846742 Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput |
| 01/25/2005 | US6846726 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers |
| 01/25/2005 | US6846521 Apparatus and method for forming deposited film |
| 01/25/2005 | US6846514 Vapor deposition; positioning fluid flow nozzle; reducing leakage; sealing gas intake ports |
| 01/25/2005 | US6846467 Plasma-chemical reactor |
| 01/25/2005 | US6846396 Active magnetic shielding |
| 01/25/2005 | US6846363 Plasma processing apparatus and method |
| 01/25/2005 | US6845734 Deposition apparatuses configured for utilizing phased microwave radiation |
| 01/20/2005 | WO2005006545A1 Frequency regulator of electronic component and frequency regulating method of electronic component employing it |
| 01/20/2005 | WO2005006386A2 System and method for inductive coupling of an expanding thermal plasma |
| 01/20/2005 | WO2005006385A2 Charged particle beam device with multi-source array |
| 01/20/2005 | WO2005006384A2 Detector system for a scanning electron microscope and scanning electron microscope with a corresponding detector system |
| 01/20/2005 | WO2005006376A2 Electronic device with aperture and wide lens for small emission spot size |
| 01/20/2005 | WO2005005695A1 Method for the production of polymer moulded bodies |
| 01/20/2005 | WO2005005684A1 Work piece processing by pulsed electric discharges in solid-gas plasma |
| 01/20/2005 | WO2005005682A1 Rotating tubular sputter target assembly |
| 01/20/2005 | WO2004107386A3 Method and system for ion beam containment in an ion beam guide |
| 01/20/2005 | WO2004077480A3 Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor |
| 01/20/2005 | WO2003103017A3 Method and system of determining chamber seasoning condition by optical emission |
| 01/20/2005 | WO2003032359A3 Method and device for aligning a charged particle beam column |
| 01/20/2005 | US20050014382 Etching apparatus and method |
| 01/20/2005 | US20050014076 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 01/20/2005 | US20050013937 Thermal gradient enhanced CVD deposition at low pressure |
| 01/20/2005 | US20050012512 Focused ion beam endpoint detection using charge pulse detection electronics |
| 01/20/2005 | US20050012441 Channel spark source for generating a stable focussed electron beam |
| 01/20/2005 | US20050012052 Ion irradiation of a target at very high and very low kinetic ion energies |
| 01/20/2005 | US20050012050 Method and device for aligning a charged particle beam column |
| 01/20/2005 | US20050012049 Magnetic lens |
| 01/20/2005 | US20050011758 Magnetic control oscillation-scanning sputter |
| 01/20/2005 | US20050011757 Sputtering apparatus |
| 01/20/2005 | US20050011756 Sputtering system |
| 01/20/2005 | US20050011749 bonding target backing plate via resistance heating/welding to bond assembly members (mating projections and grooves); fail-safe |
| 01/20/2005 | US20050011612 Plasma etching apparatus and plasma etching method |
| 01/20/2005 | US20050011611 Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
| 01/20/2005 | US20050011455 Plasma process apparatus and its processor |
| 01/20/2005 | US20050011454 Liner for use in processing chamber |
| 01/20/2005 | US20050011453 Plasma processing method and apparatus |
| 01/20/2005 | US20050011452 Plasma processing apparatus |
| 01/20/2005 | US20050011451 Impedance matching network with termination of secondary RF frequencies |
| 01/20/2005 | US20050011450 Plasma treatment apparatus, matching box, impedance matching device, and coupler |
| 01/20/2005 | US20050011447 Method and apparatus for delivering process gas to a process chamber |
| 01/20/2005 | US20050011446 Method and apparatus for removing external components from a process chamber without compromising process vacuum |
| 01/20/2005 | US20050011442 Plasma processing material reclamation and reuse |
| 01/20/2005 | DE10322696B3 Plasma-assisted treatment of given substrate surface area, e.g. for structurizing or coating metal, alloy, semiconductor, insulator or dielectric, uses insulator with opening, to form discharge gap, between electrode and substrate |
| 01/19/2005 | EP1498930A1 Charged particle beam device with multi-source array |
| 01/19/2005 | EP1498929A2 Magnetic lens |
| 01/19/2005 | EP1497849A1 Silicon parts for plasma reaction chambers |
| 01/19/2005 | EP1497846A1 Device for treating surfaces of containers with plasma |
| 01/19/2005 | EP1497635A2 Specimen holding apparatus |
| 01/19/2005 | EP1299895B1 Cathode assembly for indirectly heated cathode ion source |
| 01/19/2005 | EP1010194B1 Vacuum sputtering apparatus |
| 01/19/2005 | EP0995220B1 Target cathode assembly |
| 01/19/2005 | CN2672854Y Ion injector for polysilicon film transistor |
| 01/19/2005 | CN1566918A Organic luminescent diode electronic microscope test block and making process thereof |
| 01/19/2005 | CN1185684C Method of preparing charged particle beam drawing data |
| 01/19/2005 | CN1185037C ESRF coolant degassing process |
| 01/18/2005 | US6845497 Method for fabrication of patterns and semiconductor devices |
| 01/18/2005 | US6844560 Lithography system comprising a converter plate and means for protecting the converter plate |
| 01/18/2005 | US6844559 Apparatus and method for testing substrate |
| 01/18/2005 | US6844556 Ion source, method of operating the same, and ion source system |
| 01/18/2005 | US6844551 Method of determining lattice constant, method of evaluating material by using the same and electronic microscope suitable for using the same |
| 01/18/2005 | US6844550 Multi-beam multi-column electron beam inspection system |
| 01/18/2005 | US6844549 Electron beam length-measurement apparatus and measurement method |
| 01/18/2005 | US6844548 Wien filter and electron microscope using same |
| 01/18/2005 | US6844205 Apparatus and method of detecting endpoint of a dielectric etch |
| 01/18/2005 | US6843891 Apparatus for sputter deposition |
| 01/13/2005 | WO2005004314A2 Dual magnetrong sputtering apparatus utilizing control means for delivering balanced power |
| 01/13/2005 | WO2005004189A2 Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith |
| 01/13/2005 | WO2005004188A2 Far-field imaging in electron microscopy |
| 01/13/2005 | WO2005004186A2 Particle detector suitable for detecting lons and electrons |
| 01/13/2005 | WO2005003736A1 Thin piece specimen preparing method and composite charged particle beam device |
| 01/13/2005 | WO2005003735A1 Thin piece specimen preparing method and composite charged particle beam device |
| 01/13/2005 | WO2005003731A2 Laser stimulated atom probe characterization of semiconductor and dielectric structures |
| 01/13/2005 | WO2004066331A3 Charged particle beam apparatus and method for operating the same |
| 01/13/2005 | WO2004059689A3 Method and apparatus for monitoring a plasma in a material processing system |
| 01/13/2005 | WO2003097894A3 Sputtering cathode adapter |
| 01/13/2005 | US20050009347 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 01/13/2005 | US20050008269 Hydrostatic bearing, alignment apparatus, exposure apparatus, and device manufacturing method |
| 01/13/2005 | US20050006604 Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus |
| 01/13/2005 | US20050006603 Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method |
| 01/13/2005 | US20050006602 Synchronization of laser; positioning defects; semiconductors; process control |
| 01/13/2005 | US20050006601 Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatus |
| 01/13/2005 | US20050006599 Production of nanocrystal beams |
| 01/13/2005 | US20050006598 Method and device for aligning a charged particle beam column |
| 01/13/2005 | US20050006582 Electron microscopy system, electron microscopy method and focusing system for charged particles |
| 01/13/2005 | US20050006581 Method and scanning electron microscope for measuring width of material on sample |
| 01/13/2005 | US20050006346 Method for providing uniform removal of organic material |
| 01/13/2005 | US20050006344 Method and apparatus for deciding cause of abnormality in plasma processing apparatus |
| 01/13/2005 | US20050006341 Interferometric endpoint detection in a substrate etching process |
| 01/13/2005 | US20050006233 Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation |