| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 02/03/2005 | US20050023486 Electron beam exposure apparatus and electron beam measurement module |
| 02/03/2005 | US20050023480 Corrector for correcting first-order chromatic aberrations of the first degree |
| 02/03/2005 | US20050023254 Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod |
| 02/03/2005 | US20050023135 Vacuum treatment system and process for manufacturing workpieces |
| 02/03/2005 | US20050023130 Reactive sputtering method |
| 02/03/2005 | US20050022935 Apparatus for improved low pressure inductively coupled high density plasma reactor |
| 02/03/2005 | US20050022934 Plasma etching apparatus |
| 02/03/2005 | US20050022933 Multi-frequency plasma reactor and method of etching |
| 02/03/2005 | US20050022932 Disturbance-free, recipe-controlled plasma processing system and method |
| 02/03/2005 | US20050022736 Method for balancing return currents in plasma processing apparatus |
| 02/03/2005 | US20050022735 Delivery system for PECVD powered electrode |
| 02/03/2005 | DE10331526A1 Verfahren zum anisotropen Ätzen einer Ausnehmung in ein Siliziumsubstrat und Verwendung einer Plasmaätzanlage A method for anisotropically etching a recess in a silicon substrate using a plasma etching and |
| 02/03/2005 | DE10135119B4 Nachführbare Düse für eine Elektronenstrahl-Schweißeinrichtung Trackable nozzle for an electron beam welder |
| 02/03/2005 | CA2532471A1 Method for measuring physical parameters of at least one micrometric or nanometric dimensional phase in a composite system |
| 02/02/2005 | EP1503399A1 Specimen tip and tip holder assembly |
| 02/02/2005 | EP1503398A2 Electron beam apparatus with specimen holder |
| 02/02/2005 | EP1502490A1 Plasma-assisted joining |
| 02/02/2005 | EP1502489A1 Plasma generation and processing with multiple radiation sources |
| 02/02/2005 | EP1502488A1 Plasma-assisted decrystallization |
| 02/02/2005 | EP1502487A1 Plasma-assisted coating |
| 02/02/2005 | EP1502486A1 Plasma catalyst |
| 02/02/2005 | EP1502480A1 Plasma-assisted heat treatment |
| 02/02/2005 | EP1502287A2 Plasma-assisted processing in a manufacturing line |
| 02/02/2005 | EP1502278A1 Ion source providing ribbon beam with controllable density profile |
| 02/02/2005 | EP1502274A1 Plasma-assisted gas production |
| 02/02/2005 | EP1502012A1 Plasma-assisted engine exhaust treatment |
| 02/02/2005 | EP1501959A1 Plasma-assisted enhanced coating |
| 02/02/2005 | EP1501911A1 Plasma-assisted doping |
| 02/02/2005 | EP1501649A1 Plasma-assisted sintering |
| 02/02/2005 | EP1501632A1 Plasma-assisted carburizing |
| 02/02/2005 | EP1501631A1 Plasma-assisted formation of carbon structures |
| 02/02/2005 | EP1355341A4 Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating. |
| 02/02/2005 | EP1033068B1 Plasma processing apparatus having rotating magnets |
| 02/02/2005 | CN1575504A Wafer pedestal tilt mechanism and cooling system |
| 02/02/2005 | CN1575503A Methods and apparatus for ion implantation |
| 02/02/2005 | CN1575405A Method and apparatus for wall film monitoring |
| 02/02/2005 | CN1575089A Plasma chamber |
| 02/02/2005 | CN1574245A Terminal testing method and device |
| 02/02/2005 | CN1574244A Semiconductor manufacturing equipment |
| 02/02/2005 | CN1574243A Etch amount detection method, etching method, and etching system |
| 02/02/2005 | CN1574230A Apparatus for semiconductor device |
| 02/02/2005 | CN1574229A Showerhead assembly and apparatus for manufacturing semiconductor device having the same |
| 02/02/2005 | CN1574211A Method for replacing electrode assembly of plasma reaction chamber |
| 02/02/2005 | CN1574199A High-density plasma processing apparatus |
| 02/02/2005 | CN1573557A Method for removing shading defects of light mask and semiconductor device manufacturing method thereof |
| 02/02/2005 | CN1572900A Sputter source, sputtering device, and sputtering method |
| 02/02/2005 | CN1187786C Method and device for acquisition of voltage and current magnitude of radio frequency power wave applied to radio frequency load |
| 02/02/2005 | CN1187655C Retaining device for photo blanks |
| 02/01/2005 | US6850012 Plasma processing apparatus |
| 02/01/2005 | US6849989 Translation and rotation positioning motor |
| 02/01/2005 | US6849858 Apparatus and method for forming alignment layers |
| 02/01/2005 | US6849857 Beam processing apparatus |
| 02/01/2005 | US6849856 Electron beam duplication lithography method and apparatus |
| 02/01/2005 | US6849307 Method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 02/01/2005 | US6849306 Plasma treatment method at atmospheric pressure |
| 02/01/2005 | US6849151 Monitoring substrate processing by detecting reflectively diffracted light |
| 02/01/2005 | US6849123 Plasma processing method and method for manufacturing semiconductor device |
| 01/27/2005 | WO2005009090A1 Plasma treating apparatus and its electrode structure |
| 01/27/2005 | WO2005009089A2 Plasma processing apparatus |
| 01/27/2005 | WO2005008850A2 Spatial and temporal selective laser assisted fault localization |
| 01/27/2005 | WO2005008768A2 A system and method for determining a cross sectional feature of a structural element using a reference structural element |
| 01/27/2005 | WO2005008760A2 Method for anisotropically etching a recess in a silicon substrate and use of a plasma etching system |
| 01/27/2005 | WO2005008718A1 Continuous surface-treating apparatus for film shape of polymer and continuous surface-treating method thereof |
| 01/27/2005 | WO2005008717A2 High frequency cell for producing a plasma jet formed by magnetic fields, and method for irradiating a surface |
| 01/27/2005 | WO2005008707A2 Improved tip for nanoscanning electron microscope |
| 01/27/2005 | WO2005008681A1 Devices for guiding and manipulating electron beams |
| 01/27/2005 | WO2005008223A2 Methods for defect detection and process monitoring based on sem images |
| 01/27/2005 | WO2004097909A3 Method and apparatus for deep trench silicon etch |
| 01/27/2005 | WO2004092438B1 Segmented sputtering target and method/apparatus for using same |
| 01/27/2005 | WO2004082830A3 Sample manipulation system |
| 01/27/2005 | WO2004068148A3 Method of and apparatus for measurement and control of a gas cluster ion beam |
| 01/27/2005 | US20050020073 Method and system for electronic spatial filtering of spectral reflectometer optical signals |
| 01/27/2005 | US20050020070 Etching method and apparatus |
| 01/27/2005 | US20050020038 Atmospheric glow discharge with concurrent coating deposition |
| 01/27/2005 | US20050019961 Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring |
| 01/27/2005 | US20050018496 Electron-beam writing device and electron-beam writing method |
| 01/27/2005 | US20050018284 Two axis stage for microscope |
| 01/27/2005 | US20050018166 Stage system, exposure apparatus, and device manufacturing method |
| 01/27/2005 | US20050018165 Stage system, exposure apparatus, and device manufacturing method |
| 01/27/2005 | US20050017202 Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams |
| 01/27/2005 | US20050017201 Apparatus using hybrid coupled plasma |
| 01/27/2005 | US20050017199 Ion implantation system with an interlock function |
| 01/27/2005 | US20050017194 Charged-particle beam instrument and method of correcting aberration therein |
| 01/27/2005 | US20050017192 System and method for fast focal length alterations |
| 01/27/2005 | US20050017174 Laser stimulated atom probe characterization of semiconductor and dielectric structures |
| 01/27/2005 | US20050017162 Nanoscale standard sample and its manufacturing method |
| 01/27/2005 | US20050016947 Method and apparatus for endpoint detection using partial least squares |
| 01/27/2005 | US20050016838 Ion source apparatus and cleaning optimized method thereof |
| 01/27/2005 | US20050016684 Process kit for erosion resistance enhancement |
| 01/27/2005 | US20050016683 Plasma electron density measuring and monitoring device |
| 01/27/2005 | US20050016568 Apparatus and method for cleaning of semiconductor device manufacturing equipment |
| 01/27/2005 | US20050016471 Substrate temperature control in an ALD reactor |
| 01/27/2005 | US20050016468 Compensation frame for receiving a substrate |
| 01/27/2005 | US20050016460 Plasma reactor |
| 01/27/2005 | US20050016457 Plasma film forming system |
| 01/27/2005 | DE10329388A1 Verbesserte Ionenstrahlmessanlage für eine Ionenimplantationsvorrichtung Improved ion beam measurement system for an ion implanter |
| 01/27/2005 | DE10329383A1 Verbesserter Ionenstrahldetektor für Ionenimplantationsanlagen Improved ion beam detector for ion implanters |
| 01/27/2005 | DE10191368B4 Vorrichtung zur Prüfung einer plasmapolymerisierten Polymerschicht unter Verwendung eines UV-Spektrometers An apparatus for testing a plasma-polymerized polymer layer using a UV spectrometer |
| 01/26/2005 | EP1501115A2 Dual beam system |
| 01/26/2005 | EP1501114A2 Electron beam system and electron beam measuring and observing methods |