| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/16/2005 | CN1189921C Ion implanter and ion implanting method using the same |
| 02/16/2005 | CN1189595C Reduced impedance chamber |
| 02/15/2005 | US6855945 Electrically conductive synthetic diamond apertures for electron and other particulate beam systems |
| 02/15/2005 | US6855940 Charged particle microscope |
| 02/15/2005 | US6855939 Particle beam system having a mirror corrector |
| 02/15/2005 | US6855938 Objective lens for an electron microscopy system and electron microscopy system |
| 02/15/2005 | US6855931 Scanning electron microscope and sample observation method using the same |
| 02/15/2005 | US6855929 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former |
| 02/15/2005 | US6855928 Analysis of semiconductor surfaces by secondary ion mass spectrometry and methods |
| 02/15/2005 | US6855927 Method and apparatus for observing element distribution |
| 02/15/2005 | US6855622 Method and apparatus for forming a cavity in a semiconductor substrate using a charged particle beam |
| 02/15/2005 | US6855567 Etch endpoint detection |
| 02/15/2005 | US6855481 Apparatus and a method for forming a pattern using a crystal structure of material |
| 02/15/2005 | US6855379 Method and device for surface-treating substrates |
| 02/15/2005 | US6855377 Deposited film forming apparatus and deposited film forming method |
| 02/15/2005 | US6855225 Single-tube interlaced inductively coupling plasma source |
| 02/15/2005 | US6855209 Plasma chamber cleaning |
| 02/10/2005 | WO2005013341A2 Method and system for ion beam containment using photoelectrons in an ion beam guide |
| 02/10/2005 | WO2005013310A2 Method for balancing return currents in plasma processing apparatus |
| 02/10/2005 | WO2005013309A2 Multi-mode charged particle beam device |
| 02/10/2005 | WO2005011907A2 Method and device for non-vacuum electron beam welding metallic materials |
| 02/10/2005 | WO2005006384A3 Detector system for a scanning electron microscope and scanning electron microscope with a corresponding detector system |
| 02/10/2005 | WO2004095499A3 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 02/10/2005 | WO2004077022A3 Methods and apparatus for calibration and metrology for an integrated rf generator system |
| 02/10/2005 | WO2004064113A3 Cooled deposition baffle in high density plasma semiconductor processing |
| 02/10/2005 | US20050032382 Staggered in-situ deposition and etching of a dielectric layer for HDP CVD |
| 02/10/2005 | US20050031976 Adjusting shape utilizing design and vicinity patterns |
| 02/10/2005 | US20050031797 Method and apparatus for forming hard carbon film |
| 02/10/2005 | US20050031796 Uniformity; over surface of semiconductor wafers; multizonal electrode; applying , controlling bias voltage |
| 02/10/2005 | US20050031186 Systems and methods for characterizing a three-dimensional sample |
| 02/10/2005 | US20050030553 Displacement gauge and displacement measuring method |
| 02/10/2005 | US20050030516 Photolithographic techniques for producing angled lines |
| 02/10/2005 | US20050030513 Photolithographic techniques for producing angled lines |
| 02/10/2005 | US20050030373 Multi-mode charged particle beam device |
| 02/10/2005 | US20050030003 Method and apparatus for electron density measurement and verifying process status |
| 02/10/2005 | US20050029954 Plasma processing apparatus and method |
| 02/10/2005 | US20050029473 Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 02/10/2005 | US20050029467 Modular manipulation system for manipulating a sample under study with a microscope |
| 02/10/2005 | US20050029466 Multipole lens, charged-particle beam instrument fitted with multipole lenses, and method of fabricating multipole lens |
| 02/10/2005 | US20050029452 Electron microscope |
| 02/10/2005 | US20050029451 Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device |
| 02/10/2005 | US20050029228 Etch amount detection method, etching method, and etching system |
| 02/10/2005 | US20050029227 Apparatus and method of detecting endpoint of a dielectric etch |
| 02/10/2005 | US20050029088 Sputter coating a substrate; channel for gas flow; generation plasma; forming metal oxide such as zinc oxide |
| 02/10/2005 | US20050028935 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems |
| 02/10/2005 | US20050028934 Apparatus and method for plasma etching |
| 02/10/2005 | US20050028933 Device for treating objects by plasma deposition |
| 02/10/2005 | US20050028736 Gas temperature control for a plasma process |
| 02/10/2005 | DE19610012B4 Verfahren zur Stabilisierung eines Arbeitspunkts beim reaktiven Zerstäuben in einer Sauerstoff enthaltenden Atmosphäre A method of stabilizing an operating point during reactive sputtering in an atmosphere containing oxygen |
| 02/10/2005 | DE10331137A1 Detektorsystem für ein Rasterelektronenmikroskop und Rasterelektronenmikroskop mit einem entsprechenden Detektorsystem Detector system for a scanning electron microscope and scanning electron microscope with an appropriate detector system |
| 02/10/2005 | DE10217507B4 Anordnung zur Abbildung des von einer Probe gepulst emittierten Teilchenensembles auf einem Detektor Arrangement for imaging the pulsed light emitted from a sample Teilchenensembles on a detector |
| 02/09/2005 | EP1505630A2 Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 02/09/2005 | EP1505629A2 Multi-charged beam lens and charged beam exposure apparatus using the same |
| 02/09/2005 | EP1505438A2 Stencil mask, charged particle irradiation apparatus and the method |
| 02/09/2005 | EP1504464A2 Plasma-assisted nitrogen surface-treatment |
| 02/09/2005 | EP0788653B1 High temperature specimen stage and detector for an environmental scanning electron microscope |
| 02/09/2005 | CN1579003A Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 02/09/2005 | CN1579000A Non-thermal plasma slit discharge apparatus |
| 02/09/2005 | CN1578583A Plasma source coil for generating plasma and plasma chamber using the same |
| 02/09/2005 | CN1577786A Interferometric endpoint detection in a substrate etching process |
| 02/09/2005 | CN1577765A Process kit for erosion resistance enhancement |
| 02/09/2005 | CN1577730A Apparatus using hybrid coupled plasma |
| 02/09/2005 | CN1577722A Image correcting method , system and program. mask, semiconductor producing method and design pattern |
| 02/09/2005 | CN1577703A Electron beam processing apparatus |
| 02/09/2005 | CN1576392A Surface wave plasma treatment apparatus using multi-slot antenna |
| 02/09/2005 | CN1576388A Vacuum evaporator |
| 02/08/2005 | US6853204 Wafer inspection method of charging wafer with a charged particle beam then measuring electric properties thereof, and inspection device based thereon |
| 02/08/2005 | US6853143 Electron beam system and method of manufacturing devices using the system |
| 02/08/2005 | US6853142 Methods and apparatus for generating high-density plasma |
| 02/08/2005 | US6853141 Capacitively coupled plasma reactor with magnetic plasma control |
| 02/08/2005 | US6852990 Electrostatic discharge depolarization using high density plasma |
| 02/08/2005 | US6852984 Advanced ion beam measurement tool for an ion implantation apparatus |
| 02/08/2005 | US6852983 Charged-particle beam apparatus equipped with aberration corrector |
| 02/08/2005 | US6852982 Magnetic lens |
| 02/08/2005 | US6852974 Electron beam device and method for stereoscopic measurements |
| 02/08/2005 | US6852973 Scanning charged particle microscope |
| 02/08/2005 | US6852243 Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surface |
| 02/08/2005 | US6852242 Cleaning of multicompositional etchant residues |
| 02/08/2005 | US6852202 Radial sputtering profile; semiconductor, integrated circuits |
| 02/08/2005 | US6852195 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment |
| 02/08/2005 | US6851939 For forming deposition film of high quality on which adhesion force between a substrate and a metal film |
| 02/08/2005 | US6851168 Collar removing clamp for HDP chamber |
| 02/03/2005 | WO2005010967A2 Device and method for machining the rear side of semiconductor chips |
| 02/03/2005 | WO2005010955A2 Method and apparatus for real-time in-situ ion implantation with closed loop control |
| 02/03/2005 | WO2005010938A2 Impedance matching network with termination of secondary rf frequencies |
| 02/03/2005 | WO2005010935A2 Method and system for electronic spatial filtering of spectral reflectometer optical signals |
| 02/03/2005 | WO2005010919A1 Sliding anode for a magnetron sputtering source |
| 02/03/2005 | WO2005010918A1 A method for manufacturing a lens assembly of microcolumn and a lens assembly of microcolumn manufactured by the same |
| 02/03/2005 | WO2005010917A1 An apparatus and method for generating uniform plasmas |
| 02/03/2005 | WO2005010913A2 An improved rf power control device for rf plasma applications |
| 02/03/2005 | WO2005010618A2 Modulator circuitry |
| 02/03/2005 | WO2005010479A2 Method for measuring physical parameters of at least one micrometric or nanometric dimensional phase in a composite system |
| 02/03/2005 | WO2005010232A1 Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces |
| 02/03/2005 | WO2005010228A2 High peak power plasma pulsed supply with arc handling |
| 02/03/2005 | WO2004097881A3 Beam uniformity and angular distribution measurement system |
| 02/03/2005 | WO2004088739A3 Real-time in-line testing of semiconductor wafers |
| 02/03/2005 | WO2004073009A3 Plasma processing installation, influenced by a magnetic field, for processing a continuous material or a workpiece |
| 02/03/2005 | US20050026436 Method for improving ash rate uniformity in photoresist ashing process equipment |
| 02/03/2005 | US20050026086 Photolithographic techniques for producing angled lines |
| 02/03/2005 | US20050023487 Method and system for ion beam containment using photoelectrons in an ion beam guide |