| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/01/2005 | US6861373 Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode |
| 03/01/2005 | US6861187 Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system |
| 03/01/2005 | US6860977 Method for manufacturing a workpiece using a magnetron sputter source |
| 03/01/2005 | US6860973 Device for the regulation of a plasma impedance |
| 02/24/2005 | WO2005017949A2 Method for high-resolution processing of thin layers with electron beams |
| 02/24/2005 | WO2005017942A2 High-frequency excitation system comprising a limiting circuit |
| 02/24/2005 | WO2005017937A2 Sensor array for measuring plasma characteristics in plasma processing enviroments |
| 02/24/2005 | WO2005017511A1 Scanning electron microscope having multiple detectors and a method for multiple detector based imaging |
| 02/24/2005 | WO2005006386A3 System and method for inductive coupling of an expanding thermal plasma |
| 02/24/2005 | WO2004079771A3 Three-dimensional imaging of the chemical surface compositions of objects |
| 02/24/2005 | US20050042869 Substrate processing method and substrate processing apparatus |
| 02/24/2005 | US20050042863 Sputtering apparatus and manufacturing method of metal layer/metal compound layer by using thereof |
| 02/24/2005 | US20050042781 Method of observation by transmission electron microscopy |
| 02/24/2005 | US20050042523 Endpoint detection of plasma-assisted etch process |
| 02/24/2005 | US20050041567 Alloy memory |
| 02/24/2005 | US20050040794 Control system for a sputtering system |
| 02/24/2005 | US20050040496 Method for preparing a source material for ion implantation |
| 02/24/2005 | US20050040346 Ion beam irradiation device and operating method thereof |
| 02/24/2005 | US20050040344 Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method |
| 02/24/2005 | US20050040343 Electron beam writing equipment and electron beam writing method |
| 02/24/2005 | US20050040332 Electron beam device and method for stereoscopic measurements |
| 02/24/2005 | US20050040331 Inspection method and inspection apparatus using electron beam |
| 02/24/2005 | US20050040144 Control of plasma transitions in sputter processing systems |
| 02/24/2005 | US20050040137 Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors |
| 02/24/2005 | US20050040031 Ion beam generator has a shield positioned between the ion source and the substrate, for blocking the impurities from impinging the substrate, outside the envelope of the etching beam; spacecraft, semiconductors |
| 02/24/2005 | US20050039852 Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments |
| 02/24/2005 | US20050039773 Particle removal apparatus and method and plasma processing apparatus |
| 02/24/2005 | US20050039683 Plasma processing method |
| 02/24/2005 | US20050039682 Multiple frequency plasma etch reactor |
| 02/24/2005 | US20050039679 Particulate reduction using temperature-controlled chamber shield |
| 02/24/2005 | DE10331926A1 Hochfrequenzquelle zur Erzeugung eines durch Magnetfelder geformten Plasmastrahls und Verfahren zum Bestrahlen einer Oberfläche High-frequency source for generating a magnetic field formed by the plasma jet and process for irradiating a surface |
| 02/24/2005 | DE10138697B4 Verfahren und Vorrichtung zum Beschichten und Spritzblasen eines dreidimensionalen Körpers Method and apparatus for coating and injection blow molding of a three-dimensional body |
| 02/23/2005 | EP1508153A2 Circuit arrangement for impedance compensation |
| 02/23/2005 | EP1508152A1 Particle beam processing apparatus and materials treatable using the apparatus |
| 02/23/2005 | EP1507892A2 High-power microwave window |
| 02/23/2005 | CN1585997A Apparatus and method for improving etch rate uniformity |
| 02/23/2005 | CN1585086A Correcting method for scanning tool of semiconductor and standard correcting piece thereof |
| 02/23/2005 | CN1584544A Method for forming nano gas layer on pyrolytic graphite surface based on alcohol-water substitution |
| 02/23/2005 | CN1190821C Ion beam radiator and method for triggering plasma by using such radiator |
| 02/23/2005 | CN1190663C Platform driving method of electronic probe microanalyzer |
| 02/22/2005 | US6859741 Device and method for adapting the size of an ion beam spot in the domain of tumor irradiation |
| 02/22/2005 | US6858854 Method and apparatus for measuring inclination angle of ion beam |
| 02/22/2005 | US6858851 Apparatus for specimen fabrication and method for specimen fabrication |
| 02/22/2005 | US6858845 Scanning electron microscope |
| 02/22/2005 | US6858844 Method for detecting geometrical-optical aberrations |
| 02/22/2005 | US6858843 Immersion objective lens for e-beam inspection |
| 02/22/2005 | US6858838 Neutral particle beam processing apparatus |
| 02/22/2005 | US6858446 Plasma monitoring method and semiconductor production apparatus |
| 02/22/2005 | US6858120 Method and apparatus for the fabrication of ferroelectric films |
| 02/22/2005 | US6858118 Apparatus for enhancing the lifetime of stencil masks |
| 02/22/2005 | US6858116 Sputtering target producing few particles, backing plate or sputtering apparatus and sputtering method producing few particles |
| 02/22/2005 | US6858112 Process depending on plasma discharges sustained by inductive coupling |
| 02/22/2005 | US6857387 Multiple frequency plasma chamber with grounding capacitor at cathode |
| 02/17/2005 | WO2005015964A1 Substrate processing apparatus and substrate processing method |
| 02/17/2005 | WO2005015963A1 Plasma processing method and apparatus |
| 02/17/2005 | WO2005015628A1 Plasma processing device and ashing method |
| 02/17/2005 | WO2005015616A1 Electronic beam exposure device and exposure method |
| 02/17/2005 | WO2004086452A3 Charged particle beam device |
| 02/17/2005 | WO2003090247A3 Method and apparatus for routing harmonics in a plasma to ground within a plasma enchanced semiconductor wafer processing chamber |
| 02/17/2005 | US20050037625 Site-specific method for large area uniform thickness plan view transmission electron microscopy sample preparation |
| 02/17/2005 | US20050037621 Etching method for semiconductor device |
| 02/17/2005 | US20050037500 Method and apparatus for detecting a leak of external air into a plasma reactor |
| 02/17/2005 | US20050035308 Pattern writing equipment |
| 02/17/2005 | US20050035306 Focused charged particle beam apparatus |
| 02/17/2005 | US20050035303 Carrier and analyzing apparatus including the carrier |
| 02/17/2005 | US20050035302 Specimen tip and tip holder assembly |
| 02/17/2005 | US20050035300 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus |
| 02/17/2005 | US20050035299 Lens array with a laterally movable optical axis for corpuscular rays |
| 02/17/2005 | US20050035293 Method and device for observing a specimen in a field of view of an electron microscope |
| 02/17/2005 | US20050035292 Charged particle deflecting system |
| 02/17/2005 | US20050035291 Dual beam system |
| 02/17/2005 | US20050035290 Automatic methods for focus and astigmatism corrections in charged-particle beam instrument |
| 02/17/2005 | US20050034981 Cathodic sputtering apparatus |
| 02/17/2005 | US20050034980 Magnetron sputtering device |
| 02/17/2005 | US20050034975 Sliding anode magnetron sputtering source |
| 02/17/2005 | US20050034816 Plasma generation and control using a dual frequency RF source |
| 02/17/2005 | US20050034815 Plasma processor |
| 02/17/2005 | US20050034813 Plasma processing apparatus using active matching |
| 02/17/2005 | US20050034812 Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
| 02/17/2005 | US20050034811 Sensor array for measuring plasma characteristics in plasma processing enviroments |
| 02/17/2005 | US20050034670 Multiple elliptical ball plasma apparatus |
| 02/17/2005 | US20050034668 Multi-component substances and apparatus for preparation thereof |
| 02/17/2005 | US20050034667 Method and apparatus for forming silicon-containing insulation film having low dielectric constant |
| 02/17/2005 | US20050034666 Plasma generation using multi-step ionization |
| 02/17/2005 | DE10332877A1 Vorrichtung und Verfahren zur Rückseitenbearbeitung von Halbleiterbausteinen Apparatus and method for backworking of semiconductor devices |
| 02/16/2005 | EP1506565A1 Planetary magnetron |
| 02/16/2005 | EP1506564A2 Method and apparatus for vhf plasma processing |
| 02/16/2005 | EP1506563A1 Capacitively coupled plasma reactor with magnetic plasma control |
| 02/16/2005 | EP1506562A1 Stabilization of electronegative plasmas with feedback control of rf generator systems |
| 02/16/2005 | EP1506559A1 Indirectly heated cathode ion source |
| 02/16/2005 | EP1506325A2 System and apparatus for control of sputter deposition process |
| 02/16/2005 | EP1506324A1 Replaceable target sidewall insert with texturing |
| 02/16/2005 | CN1582488A Process system and process method |
| 02/16/2005 | CN1582487A 等离子体处理装置 Plasma processing apparatus |
| 02/16/2005 | CN1582485A Plasma processor coil |
| 02/16/2005 | CN1580955A Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 02/16/2005 | CN1580751A Support and analyzing device including same |
| 02/16/2005 | CN1580319A Cathode sputtering apparatus |
| 02/16/2005 | CN1190111C Processing system with dual ion sources |
| 02/16/2005 | CN1189931C Method and apparatus for detecting endpoint of photoresist stripping |