| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/10/2005 | US20050051268 Vacuum enclosure; adjustment confining rings; etching gas |
| 03/10/2005 | US20050051100 Variable gas conductance control for a process chamber |
| 03/10/2005 | US20050051096 Ion implantation ion source, system and method |
| 03/10/2005 | US20050051095 Plasma process device |
| 03/10/2005 | US20050051094 Replaceable plate expanded thermal plasma apparatus and method |
| 03/10/2005 | US20050051089 Plasma processing apparatus |
| 03/10/2005 | DE10196150T5 Magnetron-Sputtern Magnetron sputtering, |
| 03/09/2005 | EP1513184A1 Electronic optical lens barrel and production method therefor |
| 03/09/2005 | EP1512957A2 Mask and apparatus using it to prepare sample by ion milling |
| 03/09/2005 | EP1512956A2 Method of expetiously using a focused-beam apparatus to extract samples for analysis from workpieces |
| 03/09/2005 | EP1512772A1 Method and apparatus for production of metal film |
| 03/09/2005 | EP1512771A1 Method and apparatus for production of metal film |
| 03/09/2005 | EP1512770A1 Method and apparatus for production of metal film |
| 03/09/2005 | EP1512769A1 Method and apparatus for production of metal film |
| 03/09/2005 | EP1512174A1 Integrated stepwise statistical process control in a plasma processing system |
| 03/09/2005 | EP1512165A2 Plasma apparatus and method for processing a substrate |
| 03/09/2005 | EP1512164A1 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode |
| 03/09/2005 | EP1511994A2 Element-specific x-ray fluorescence microscope and method of operation |
| 03/09/2005 | EP1511877A1 Sputter method or device for the production of natural voltage optimized coatings |
| 03/09/2005 | EP1511876A2 Sputtering cathode adapter |
| 03/09/2005 | CN1592944A Methods and apparatus for plasma doping and ion implantation in an integrated processing system |
| 03/09/2005 | CN1591792A Plasma etcher |
| 03/09/2005 | CN1591761A Method for performing focusing in a particle-optical device with the aid of astigmatism in the particle beam |
| 03/09/2005 | CN1591190A Method and apparatus for pyroelectric lithography using patterned emitter |
| 03/09/2005 | CN1590979A Particle-optical apparatus with a permanent-magnetic lens and an electrostatic lens |
| 03/09/2005 | CN1589739A Sample carrier for carrying a sample to be irradiated with an electron beam |
| 03/08/2005 | US6864982 Gas analyzing method and gas analyzer for semiconductor treater |
| 03/08/2005 | US6864773 Variable field magnet apparatus |
| 03/08/2005 | US6864640 Plasma processing method and apparatus thereof |
| 03/08/2005 | US6864495 Device for generating an ion beam |
| 03/08/2005 | US6864494 Semiconductor processing apparatus having a moving member and a force compensator therefor |
| 03/08/2005 | US6864493 Charged particle beam alignment method and charged particle beam apparatus |
| 03/08/2005 | US6864488 Charged particle beam exposure method and apparatus |
| 03/08/2005 | US6864483 Method for increasing the measurement information available from a transmission electron microscope and a transmission electron microscopy device |
| 03/08/2005 | US6864482 Electron beam apparatus |
| 03/08/2005 | US6863942 Free-standing and aligned carbon nanotubes and synthesis thereof |
| 03/08/2005 | US6863937 Method of operating an electron beam physical vapor deposition apparatus |
| 03/08/2005 | US6863870 Plasma enhanced gas reactor |
| 03/08/2005 | US6863835 Magnetic barrier for plasma in chamber exhaust |
| 03/08/2005 | US6863789 Direct current sputtering; resonance network |
| 03/08/2005 | US6863787 Dummy copper deprocessing |
| 03/08/2005 | US6863786 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology |
| 03/08/2005 | US6863785 Sputtering apparatus and sputter film deposition method |
| 03/08/2005 | US6863784 Linear drive system for use in a plasma processing system |
| 03/08/2005 | US6863773 Linearly extended device for large-surface microwave treatment and for large surface plasma production |
| 03/08/2005 | US6863772 Dual-port end point window for plasma etcher |
| 03/08/2005 | US6863736 Shaft cooling mechanisms |
| 03/08/2005 | US6863531 Surface modification process on metal dentures, products produced thereby, and the incorporated system thereof |
| 03/08/2005 | US6863020 Segmented electrode apparatus for plasma processing |
| 03/08/2005 | US6863019 Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas |
| 03/08/2005 | US6863018 Ion plating device and ion plating method |
| 03/03/2005 | WO2005020273A2 Control of plasma transitions in sputter processing systems |
| 03/03/2005 | WO2005020268A1 Insulating film measuring device, insulating film measuring method, insulating film evaluating device, insulating film evaluating method, substrate for electric discharge display element, and plasma display panel |
| 03/03/2005 | WO2005020264A2 Multiple frequency plasma etch reactor |
| 03/03/2005 | WO2005019495A2 Control system for a sputtering system |
| 03/03/2005 | WO2005019493A2 Target/backing plate constructions, and methods of forming them |
| 03/03/2005 | WO2004094686A3 Device for coating a stationary substrate by pulse magnetron sputtering |
| 03/03/2005 | WO2004053945A3 Re-crystallization of semiconductor surface film and doping of semiconductor by energetic cluster irradiation |
| 03/03/2005 | US20050048802 Biased pulse DC reactive sputtering of oxide films |
| 03/03/2005 | US20050048679 Technique for adjusting a penetration depth during the implantation of ions into a semiconductor region |
| 03/03/2005 | US20050046427 Apparatus and method for improving microwave coupling to a resonant cavity |
| 03/03/2005 | US20050046326 Cathode with improved work function and method for making the same |
| 03/03/2005 | US20050045836 Dual-mode electron beam lithography machine |
| 03/03/2005 | US20050045835 Unipolar electrostatic quadrupole lens and switching methods for charged beam transport |
| 03/03/2005 | US20050045834 Shaped sputter shields for improved ion column operation |
| 03/03/2005 | US20050045832 Non-dispersive charged particle energy analyzer |
| 03/03/2005 | US20050045831 Method for performing focusing in a particle-optical device with the aid of astigmatism in the particle beam |
| 03/03/2005 | US20050045822 Charged particle beam apparatus |
| 03/03/2005 | US20050045821 Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| 03/03/2005 | US20050045820 Absorption current image apparatus in electron microscope |
| 03/03/2005 | US20050045819 An electron microscope magnification standard providing precise calibration in the magnification range 5000x-2000,000x |
| 03/03/2005 | US20050045593 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers |
| 03/03/2005 | US20050045475 Sputtering apparatus |
| 03/03/2005 | US20050045472 Stable discharge; forming hard wear resistant overcoating |
| 03/03/2005 | US20050045470 Varied thickness corresponding to stepped portions for superior utilization; quality liquid crystal displays |
| 03/03/2005 | US20050045275 Plasma treatment apparatus and surface treatment apparatus of substrate |
| 03/03/2005 | US20050045107 Plasma processing apparatus, protecting layer therefor and installation of protecting layer |
| 03/03/2005 | DE10335718A1 Anode component for delayline detector for particle detection e.g. for use with free electron laser, with anode divided into segments |
| 03/03/2005 | DE10332921A1 Treating surface of components with low pressure plasma comprises using vacuum chamber having opening which is closed before evacuation, introduction and ionization of process gas |
| 03/03/2005 | DE102004032524A1 Elektronenstrahl-Lithographievorrichtung mit zwei Betriebsarten Electron beam lithography apparatus having two operating modes |
| 03/03/2005 | DE10044199B4 Ablenkanordnung und Projektionssystem für geladene Teilchen Deflection device and projection system for charged particles |
| 03/02/2005 | EP1511067A2 Etching method for semiconductor device |
| 03/02/2005 | EP1511066A2 Absorption current image apparatus in electron microscope |
| 03/02/2005 | EP1511065A1 Method for performing focusing in a particle-optical device with the aid of astigmatism in the particle beam |
| 03/02/2005 | EP1510002A1 Transresistance amplifier for a charged particle detector |
| 03/02/2005 | EP1509942A2 Apparatus and methods for minimizing arcing in a plasma processing chamber |
| 03/02/2005 | EP1509941A2 Low-pressure chamber for scanning electron microscopy in a wet environment |
| 03/02/2005 | EP1509816A2 Electrostatically driven lithography |
| 03/02/2005 | EP1509761A2 Methods for sem inspection of fluid containing samples |
| 03/02/2005 | EP1105908B1 Ion beam generation apparatus |
| 03/02/2005 | CN1589490A Method and device for aligning a charged particle beam column |
| 03/02/2005 | CN1191741C Plasma source and ion injector using same |
| 03/02/2005 | CN1191465C Process of transmission electron microscope specimen preparation for easy damp-affecting denaturization crystal thin film |
| 03/02/2005 | CN1191389C Method and device for coating substrates |
| 03/01/2005 | US6862075 Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby |
| 03/01/2005 | US6861657 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
| 03/01/2005 | US6861651 Electron-optical corrector for eliminating third-order aberations |
| 03/01/2005 | US6861650 Electron beam detector, scanning type electron microscope, mass spectrometer, and ion detector |
| 03/01/2005 | US6861643 Generating a highly directional and highly dense neutral particle beam from a high-density plasma by neutralizing an ion beam generated by the ion extracting portion; etching of electrical thin films; semiconductors |
| 03/01/2005 | US6861642 Neutral particle beam processing apparatus |