Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
03/2005
03/31/2005WO2004081910A3 Apparatus for generating a plurality of beamlets
03/31/2005WO2004077505A3 Critical dimension variation compensation across a wafer by means of local wafer temperature control
03/31/2005US20050070105 Small volume process chamber with hot inner surfaces
03/31/2005US20050070073 Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement
03/31/2005US20050069786 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method
03/31/2005US20050069651 Plasma processing system
03/31/2005US20050067934 Discharge apparatus, plasma processing method and solar cell
03/31/2005US20050067582 System and method for inspecting charged particle responsive resist
03/31/2005US20050067566 Photoemission electron microscopy and measuring method using the microscopy
03/31/2005US20050067386 Method and apparatus for determining plasma impedance
03/31/2005US20050067272 System method and collimator for oblique deposition
03/31/2005US20050067157 Heat-transfer interface device between a source of heat and a heat-receiving object
03/31/2005US20050067103 Interferometer endpoint monitoring device
03/31/2005US20050067102 Method and apparatus for detecting a plasma
03/31/2005US20050067099 Method and apparatus for producing an ion-ion plasma continuous in time
03/31/2005US20050066902 Method and apparatus for plasma processing
03/31/2005US20050066899 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
03/31/2005US20050066898 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
03/31/2005DE10339991A1 Verbesserte Technik zum Einstellen einer Eindringtiefe während der Implantation von Ionen in ein Halbleitergebiet Improved technique for adjusting a depth of penetration during the implantation of ions into a semiconductor region
03/31/2005DE102004035012A1 Thermische Kompensation in der Magnetfeldbeeinflussung eines Elektronenstrahls Thermal compensation in the magnetic influence of an electron beam
03/30/2005EP1519400A2 Method and apparatus of vibration isolation, in particular for electron beam metrology tools
03/30/2005EP1519399A2 Particle beam apparatus with cooled anti-contamination shield and/or sample holder
03/30/2005EP1519226A2 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method
03/30/2005EP1518669A2 Method for bonding substrates and method for irradiating particle beam to be utilized therefor
03/30/2005EP1518256A1 Device for production of a plasma sheet
03/30/2005EP1518255A2 Thermal sprayed yttria-containing coating for plasma reactor
03/30/2005EP1518006A1 Target support assembly
03/30/2005CN1602651A High-frequency power source and its control method, and plasma processor
03/30/2005CN1602563A Plasma production device and method and RF driver circuit
03/30/2005CN1602543A Plasma processor
03/30/2005CN1602537A System and method for fast focal length alterations
03/30/2005CN1602451A Maskless photon-electron spot-grid array printer
03/30/2005CN1602430A Spot grid array electron imaging system
03/30/2005CN1602370A Plasma chamber insert ring
03/30/2005CN1195318C Match circuit and plasma processing device
03/29/2005US6873403 Halation-prevention filter, image analysis device equipped with said halation-prevention filter, and diffraction pattern intensity analysis method and diffraction pattern intensity correction program that use said halation-prevention filter
03/29/2005US6873114 Method for toolmatching and troubleshooting a plasma processing system
03/29/2005US6873112 Method for producing a semiconductor device
03/29/2005US6872959 Thermoelectron generating source and ion beam radiating apparatus with the same
03/29/2005US6872958 Platform positioning system
03/29/2005US6872957 Sample mount for a scanning electron microscope
03/29/2005US6872956 Particle beam device with a particle source to be operated in high vacuum and cascade-type pump arrangement for such a particle beam device
03/29/2005US6872955 SEM sample holder apparatus for implementing enhanced examination of multiple samples
03/29/2005US6872953 Two dimensional stationary beam profile and angular mapping
03/29/2005US6872952 Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method
03/29/2005US6872951 Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
03/29/2005US6872950 Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method
03/29/2005US6872944 Scanning electron microscope
03/29/2005US6872943 Method for determining depression/protrusion of sample and charged particle beam apparatus therefor
03/29/2005US6872942 High-speed inspection of flat substrates with underlying visible topology
03/29/2005US6872909 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
03/29/2005US6872908 Susceptor with built-in electrode and manufacturing method therefor
03/29/2005US6872507 Patterning microelectronics using electron beam; etching masking layer; adjustment of backscattering
03/29/2005US6872428 Apparatus and method for large area chemical vapor deposition using multiple expanding thermal plasma generators
03/29/2005US6872289 Forming plasma in space facing substrate surface; imposing pulse voltage of lower frequency than the oscillation frequency of plasma ions on substrate causing thin film to be produced on substrate
03/29/2005US6872285 System for depositing a film
03/29/2005US6872281 Chamber configuration for confining a plasma
03/29/2005US6872259 Method of and apparatus for tunable gas injection in a plasma processing system
03/24/2005WO2005027595A2 Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening
03/24/2005WO2005027180A1 Electron beam detector and electron tube
03/24/2005WO2005027175A1 Chamber with low electron stimulated desorption
03/24/2005WO2005026409A2 Replaceable plate expanded thermal plasma apparatus and method
03/24/2005WO2005026404A2 Thermography test method and apparatus for evaluating a bond interface of a sputtering target/backing plate assembly
03/24/2005WO2005001876A3 Electrostatic parallelizing lens for ion beams
03/24/2005WO2004090947A3 Ion beam incident angle detector for ion implant systems
03/24/2005WO2004070761A3 Method and apparatus for improved fastening hardware
03/24/2005WO2004070742A3 Mechanism for minimizing ion bombardment energy in a plasma chamber
03/24/2005WO2004070237A3 Vacuum seal protection in a dielectric break
03/24/2005WO2004064097A3 Charged particle beam device for inspecting or structuring a specimen
03/24/2005US20050064717 Plasma processing apparatus
03/24/2005US20050064680 Device and method for bonding wafers
03/24/2005US20050064302 Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask
03/24/2005US20050064248 Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof
03/24/2005US20050062950 Modulator circuitry
03/24/2005US20050062480 Source of liquid metal ions and a method for controlling the source
03/24/2005US20050062431 Plasma etcher
03/24/2005US20050062387 Electron source
03/24/2005US20050061997 Ion beam slit extraction with mass separation
03/24/2005US20050061989 Vaporizer for ion source
03/24/2005US20050061975 Electron microscope observation system and observation method
03/24/2005US20050061972 Electron beam system and electron beam measuring and observing methods
03/24/2005US20050061666 Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization
03/24/2005US20050061447 Plasma etching apparatus
03/24/2005US20050061446 Plasma-assisted joining
03/24/2005US20050061445 Plasma processing apparatus
03/24/2005US20050061444 Plasma cleaning device
03/24/2005US20050061443 Plasma processing apparatus and system, performance validation system and inspection method therefor
03/24/2005US20050061442 Plasma treatment apparatus and control method thereof
03/24/2005US20050061440 Gas reaction chamber system having gas supply apparatus
03/24/2005US20050061251 Apparatus and method for metal plasma immersion ion implantation and metal plasma immersion ion deposition
03/24/2005DE19837516B4 Verfahren und Vorrichtung zur Ausbildung einer dünnen Schicht Method and apparatus for forming a thin layer
03/24/2005DE10338019A1 Verfahren zum hochaufgelösten Bearbeiten dünner Schichten mit Elektronenstrahlen A method for high-resolution processing of thin films with electron
03/24/2005DE10320985B4 Vorrichtung zum Beschichten eines Substrats mit von der Vakuumkammer getrenntem Saugraum An apparatus for coating a substrate with a separate vacuum chamber from the suction chamber
03/23/2005EP1517357A2 Monitoring dimensions of features at different locations in the processing of substrates
03/23/2005EP1517356A2 Electron-beam lithography method and device
03/23/2005EP1517355A2 Apparatus and method for preparing samples
03/23/2005EP1517354A2 Double stage charged particle beam energy width reduction system for charged particle beam system
03/23/2005EP1517353A2 Charged particle beam energy width reduction system for charged particle beam system
03/23/2005EP1516350A2 Plasma processor with electrode simultaneously responsive to plural frequencies
03/23/2005EP1516349A1 Specimen holder for an electron microscope and method for reducing thermal drift in an microscope
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