| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/14/2005 | US20050078300 Optical control interface between controller and process chamber |
| 04/14/2005 | US20050077833 Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter |
| 04/14/2005 | US20050077486 Device and method of positionally accurate implantation of individual particles in a substrate surface |
| 04/14/2005 | US20050077475 Multi-charged beam lens and charged beam exposure apparatus using the same |
| 04/14/2005 | US20050077467 Methods to improve resolution of cross sectioned features created using an ion beam |
| 04/14/2005 | US20050077010 System and method for gas distribution in a dry etch process |
| 04/14/2005 | US20050076725 Method and apparatus of vibration isolation, in particular for electron beam metrology tools |
| 04/14/2005 | DE10341239A1 ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung ECR plasma source having a linear plasma discharge opening |
| 04/14/2005 | DE102004046747A1 Photoemissions-Elektronen-Mikroskopie und Messverfahren unter Verwendung der Mikroskopie Photoemission electron microscopy and measurement method using the microscopy |
| 04/14/2005 | DE102004024893A1 Vorrichtung und Verfahren zum Ätzen eines Wafer-Rands Apparatus and method for etching a wafer edge |
| 04/13/2005 | EP1523028A2 Electron beam writing equipment and method |
| 04/13/2005 | EP1523027A2 Method and equipment for charged particle beam lithography |
| 04/13/2005 | EP1522086A2 Method and apparatus for routing harmonics in a plasma to ground within a plasma enchanced semiconductor wafer processing chamber |
| 04/13/2005 | EP1399945B1 Magnetron atomisation source |
| 04/13/2005 | CN1606795A Magnet array in conjunction with rotating magnetron for plasma sputtering |
| 04/13/2005 | CN1606794A Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
| 04/13/2005 | CN1606793A Device for treating objects by plasma deposition |
| 04/13/2005 | CN1606633A Method for connecting magnetic substance target to backing plate, and magnetic substance target |
| 04/13/2005 | CN1606130A Correction system and method of correcting deflection distortion, method for manufacturing a semiconductor device |
| 04/13/2005 | CN1606129A Electron beam writing equipment and electron beam writing method |
| 04/13/2005 | CN1605653A Sputtering apparatus |
| 04/13/2005 | CN1197131C Plasma etching device using plasma confining device |
| 04/13/2005 | CN1197130C Operation monitoring method, assessment method and anomaly detection method for treatment apparatus |
| 04/13/2005 | CN1196936C Detecting analytic system |
| 04/12/2005 | US6879870 Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber |
| 04/12/2005 | US6879109 Thin magnetron structures for plasma generation in ion implantation systems |
| 04/12/2005 | US6879103 Glow plasma discharge device |
| 04/12/2005 | US6878950 Method of reducing heat-induced distortion of photomasks during lithography |
| 04/12/2005 | US6878946 Indirectly heated button cathode for an ion source |
| 04/12/2005 | US6878945 Vaporizer for ion source |
| 04/12/2005 | US6878937 Prism array for electron beam inspection and defect review |
| 04/12/2005 | US6878936 Applications operating with beams of charged particles |
| 04/12/2005 | US6878934 Method and device for observing a specimen in a field of view of an electron |
| 04/12/2005 | US6878930 Ion and charged particle source for production of thin films |
| 04/12/2005 | US6878898 Upper and lower grid plates with gaps larger in center than in perimeter |
| 04/12/2005 | US6878509 Halation-prevention filter, image analysis device equipped with said halation-prevention filter, and diffraction pattern intensity analysis method and diffraction pattern intensity correction program that use said halation-prevention filter |
| 04/12/2005 | US6878249 High frequency sputtering device |
| 04/12/2005 | US6878248 Method of manufacturing an object in a vacuum recipient |
| 04/12/2005 | US6878242 A plurality of different layers are sputter-deposited, one after the other, using the same sputtering target as the target rotates. The thicknesses of the different layers can be controlled |
| 04/12/2005 | US6878241 Method of forming deposited film |
| 04/12/2005 | US6878234 Plasma processing device and exhaust ring |
| 04/12/2005 | US6878233 Workpiece holding mechanism |
| 04/12/2005 | US6878214 Process endpoint detection in processing chambers |
| 04/07/2005 | WO2005031844A1 Plasma rapid thermal process apparatus in which supply part of radical source is improved |
| 04/07/2005 | WO2005031839A1 Plasma processing system |
| 04/07/2005 | WO2005031838A1 Method and device for flattening surface of solid |
| 04/07/2005 | WO2005031830A1 Plasma processing device |
| 04/07/2005 | WO2005031790A1 Method and apparatus for preventing instabilities in radio-frequency plasma processing |
| 04/07/2005 | WO2005031789A2 Method, system and device for microscopic examination employing fib-prepared sample grasping element |
| 04/07/2005 | WO2005031788A2 A source of liquid metal ions and a method for controlling the source |
| 04/07/2005 | WO2005031787A2 Ribbon-shaped ion beam with mass separation |
| 04/07/2005 | US20050074984 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 04/07/2005 | US20050074977 Method and apparatus for dry etching |
| 04/07/2005 | US20050074909 Integrated implant monitor for closed loop control |
| 04/07/2005 | US20050072941 Method of charged particle beam lithography and equipment for charged particle beam lithography |
| 04/07/2005 | US20050072939 Electron beam writing equipment and electron beam writing method |
| 04/07/2005 | US20050072933 Particle-optic electrostatic lens |
| 04/07/2005 | US20050072920 Electron microscope |
| 04/07/2005 | US20050072756 FIB milling of copper over organic dielectrics |
| 04/07/2005 | US20050072753 Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surface |
| 04/07/2005 | US20050072669 Deposition apparatus, deposition method, optical element, and optical system |
| 04/06/2005 | EP1521297A1 Plasma processing equipment |
| 04/06/2005 | EP1521289A1 Single stage charged particle beam energy width reduction system for charged particle beam system |
| 04/06/2005 | EP1521121A2 Cooling technique |
| 04/06/2005 | EP1520290A2 Device for coating substrates by physical vapour deposition, using a hollow cathode discharge method |
| 04/06/2005 | EP1520289A1 Dielectric barrier discharge apparatus and process for treating a substrate |
| 04/06/2005 | EP1520288A2 Multirate processing for metrology of plasma rf source |
| 04/06/2005 | EP1520287A1 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 04/06/2005 | EP1520260A1 Imaging apparatus and method |
| 04/06/2005 | EP1520200A1 Manipulation system for manipulating a sample under study with a microscope |
| 04/06/2005 | EP1019945B1 Method and device for surface-treating substrates |
| 04/06/2005 | CN1604270A Particle removal apparatus and method and plasma processing apparatus |
| 04/06/2005 | CN1604266A Apparatus for plasma pulse injection |
| 04/06/2005 | CN1196383C Microwave plasma processor and processing method thereof |
| 04/06/2005 | CN1196169C Means for controlling target erosion and sputtering in magnetron |
| 04/06/2005 | CN1196168C Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process |
| 04/05/2005 | US6876205 Generating current using transfromer in response to voltage variations; positive and negative terminals connected to power source; magnetic coupling inducer; pulse transformer |
| 04/05/2005 | US6876155 Plasma processor apparatus and method, and antenna |
| 04/05/2005 | US6876154 Plasma processing apparatus |
| 04/05/2005 | US6875984 Bio electron microscope and observation method of specimen |
| 04/05/2005 | US6875983 Electron microscope and means to set observation conditions |
| 04/05/2005 | US6875982 Electron microscope magnification standard providing precise calibration in the magnification range 5000X-2000,000X |
| 04/05/2005 | US6875981 Scanning atom probe and analysis method utilizing scanning atom probe |
| 04/05/2005 | US6875701 Nanotopography removing method |
| 04/05/2005 | US6875700 Using electron-free ion-ion plasmas, wherein the substrate bias waveform is synched to a pulsed RF drive where there's a delay between the drive pulse and bias pulse to let the electron count drop to zero; microstructue circuitry |
| 04/05/2005 | US6875624 Combined E-beam and optical exposure semiconductor lithography |
| 04/05/2005 | US6875477 Method for coating internal surface of plasma processing chamber |
| 04/05/2005 | US6875326 Plasma processing apparatus with real-time particle filter |
| 04/05/2005 | US6875321 Auxiliary magnet array in conjunction with magnetron sputtering |
| 04/05/2005 | US6875307 Method and apparatus for plasma processing |
| 03/31/2005 | WO2005029564A1 Member for plasma etching device and method for manufacture thereof |
| 03/31/2005 | WO2005029538A2 A plasma generating apparatus and an alignment process for liquid crystal displays using the apparatus |
| 03/31/2005 | WO2005028703A1 Film-forming apparatus and film-forming method |
| 03/31/2005 | WO2005028700A1 Apparatus for low temperature semiconductor fabrication |
| 03/31/2005 | WO2005028699A1 Apparatus for low temperature semiconductor fabrication |
| 03/31/2005 | WO2005028698A1 Apparatus and method for emitting cesium vapor |
| 03/31/2005 | WO2005028697A1 Magnetic mirror plasma source and method using same |
| 03/31/2005 | WO2005010913A3 An improved rf power control device for rf plasma applications |
| 03/31/2005 | WO2005001877A3 Magnetic enhancement for mechanical confinement of plasma |
| 03/31/2005 | WO2004114348A8 Planar electron emitter with extended lifetime and system using same |