| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/28/2005 | US20050087686 Method of observing defects |
| 04/28/2005 | US20050087305 Plasma processing apparatus and method |
| 04/28/2005 | US20050087304 Plasma processing system |
| 04/28/2005 | US20050087302 Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes |
| 04/28/2005 | US20050087297 Plasma processing apparatus and method for stabilizing inner wall of processing chamber |
| 04/28/2005 | US20050087296 Processor |
| 04/28/2005 | US20050087139 Antenna for use in producing plasma and plasma processing apparatus comprising the same |
| 04/28/2005 | US20050086946 Specimen cooling system of focused ion beam apparatus |
| 04/27/2005 | EP1526563A1 Charged particle beam device with aperture |
| 04/27/2005 | EP1525607A1 Method and device for alternating deposition of two materials by cathodic sputtering |
| 04/27/2005 | EP1525602A2 Method for adjusting voltage on a powered faraday shield |
| 04/27/2005 | EP1525601A2 Methods and apparatus for monitoring plasma parameters in plasma doping systems |
| 04/27/2005 | EP1525600A1 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 04/27/2005 | EP1525333A2 Method and apparatus for plasma implantation without deposition of a layer of byproduct |
| 04/27/2005 | EP1474958A4 Microwave plasma source |
| 04/27/2005 | EP0888635A4 Plasma etch system |
| 04/27/2005 | CN1610766A Unitary removable shield assembly |
| 04/27/2005 | CN1610051A Cathode and counter cathode arrangement in an ion source |
| 04/27/2005 | CN1199247C Plasma etching processing device and maintaining method thereof |
| 04/27/2005 | CN1199246C Pattern film repair using a gas assisted focused particle beam system |
| 04/27/2005 | CN1199223C System and method for cleaning ion source in course of using |
| 04/27/2005 | CN1198593C Supercritical fluid-assisted nebulization and bubble drying |
| 04/26/2005 | US6885567 Class E amplifier with inductive clamp |
| 04/26/2005 | US6885445 Electron microscope and spectroscopy system |
| 04/26/2005 | US6885154 Discharge plasma processing system |
| 04/26/2005 | US6885153 Plasma processing apparatus and method |
| 04/26/2005 | US6885138 Ferroelectric emitter |
| 04/26/2005 | US6885014 Symmetric beamline and methods for generating a mass-analyzed ribbon ion beam |
| 04/26/2005 | US6885012 Convergent charged particle beam apparatus and inspection method using same |
| 04/26/2005 | US6885009 Device for influencing an electron beam |
| 04/26/2005 | US6885001 Scanning electron microscope |
| 04/26/2005 | US6885000 Method and apparatus to correct for stage motion in E-beam inspection |
| 04/26/2005 | US6884992 Imaging and/or raster-mode scanning system provided with a device for compensating the image degradations resulting from environmental factors |
| 04/26/2005 | US6884635 Control of power delivered to a multiple segment inject electrode |
| 04/26/2005 | US6884516 Internal member for plasma-treating vessel and method of producing the same |
| 04/26/2005 | US6884318 Plasma processing system and surface processing method |
| 04/21/2005 | WO2005036583A2 Detector system of secondary and backscattered electrons for a scanning electron microscope |
| 04/21/2005 | WO2005035437A2 High-precision feedback control for ion sculpting of solid state features |
| 04/21/2005 | WO2004107050A3 Charged particle beamlet exposure system |
| 04/21/2005 | WO2004095529A3 Method and apparatus for reducing substrate backside deposition during processing |
| 04/21/2005 | US20050084988 Integrated stepwise statistical process control in a plasma processing system |
| 04/21/2005 | US20050084617 Method for coating internal surface of plasma processing chamber |
| 04/21/2005 | US20050082960 Internally heated cathode |
| 04/21/2005 | US20050082498 Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams |
| 04/21/2005 | US20050082497 Ion implanter electrodes |
| 04/21/2005 | US20050082493 Floating mode ion source |
| 04/21/2005 | US20050082477 Lattice strain measuring system and method |
| 04/21/2005 | US20050082476 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 04/21/2005 | US20050082166 Cathode structure for vacuum sputtering machine |
| 04/21/2005 | US20050082007 Mask etch processing apparatus |
| 04/21/2005 | US20050082006 Plasma processing apparatus |
| 04/21/2005 | US20050082005 Plasma processing method and apparatus |
| 04/21/2005 | US20050082004 Plasma processing equipment |
| 04/21/2005 | US20050082003 Plasma treatment apparatus and plasma generation method |
| 04/21/2005 | US20050082001 Cleaning method and cleaning device |
| 04/21/2005 | US20050081999 Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method |
| 04/21/2005 | US20050081997 Mask and apparatus using it to prepare sample by ion milling |
| 04/21/2005 | US20050081790 Film deposition device |
| 04/20/2005 | EP1524681A2 Angular aperture shaped beam system and method |
| 04/20/2005 | EP1524329A1 Modular device for surface coating |
| 04/20/2005 | EP1523757A2 Cathode for vacuum sputtering treatment machine |
| 04/20/2005 | EP1523756A2 Plasma implantation system and method with target movement |
| 04/20/2005 | EP1523755A2 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases |
| 04/20/2005 | EP1523754A2 Heating jacket for plasma etching reactor, and etching method using same |
| 04/20/2005 | EP1523671A2 Method and apparatus for measuring critical dimensions with a particle beam |
| 04/20/2005 | EP1060501B1 Method and apparatus for predicting plasma-process surface profiles |
| 04/20/2005 | CN1608317A Vacuum plasma processor and method of operating same |
| 04/20/2005 | CN1608315A Plasma treatment apparatus |
| 04/20/2005 | CN1608306A Magnetron sputtering device |
| 04/20/2005 | CN1608305A Suspended gas distribution manifold for plasma chamber |
| 04/20/2005 | CN1607889A RF plasma reactor |
| 04/20/2005 | CN1607640A Method of charged particle beam lithography and equipment for charged particle beam lithography |
| 04/20/2005 | CN1607465A Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter |
| 04/20/2005 | CN1198294C Method for cooling inductive coil |
| 04/19/2005 | US6882615 Optical disc and apparatus for manufacturing a master disc therefor |
| 04/19/2005 | US6881969 Electron beam treatment device |
| 04/19/2005 | US6881968 Electron beam exposure apparatus, electron beam exposure method, semiconductor device manufacturing method, and electron beam shape measuring method |
| 04/19/2005 | US6881967 Accurate doping the surface of semiconductor wafers by ion implantation, shadowing on the surface, ionization and generating an ion beam, re-orient the ion beam |
| 04/19/2005 | US6881966 Hybrid magnetic/electrostatic deflector for ion implantation systems |
| 04/19/2005 | US6881955 Metrology process for enhancing image contrast |
| 04/19/2005 | US6881954 Scanning probe microscope and method of measurement |
| 04/19/2005 | US6881922 An impedance controllers for producing a stabilized plasma, using monodyne interference finding of the phase difference between the incident and excited microwave and the plasma; accurate detection |
| 04/19/2005 | US6881608 Semiconductor processing equipment having improved process drift control |
| 04/19/2005 | US6881352 Disturbance-free, recipe-controlled plasma processing method |
| 04/19/2005 | US6881311 Facing-targets-type sputtering apparatus |
| 04/19/2005 | US6881310 Cooling system for magnetron sputtering apparatus |
| 04/19/2005 | US6881276 Detecting the endpoint of a chamber cleaning |
| 04/19/2005 | US6881270 Electrode arrangement |
| 04/14/2005 | WO2005034183A2 Method and apparatus for determining plasma impedance |
| 04/14/2005 | WO2005034163A2 Apparatus and method for plasma treating a substrate |
| 04/14/2005 | WO2005033683A1 Electron spectroscope with emission induced by a monochromatic electron beam |
| 04/14/2005 | WO2005033650A2 Method for preparing a sample for electron microscope examination and a sample carrier and transport holder used therefor |
| 04/14/2005 | WO2005006385A3 Charged particle beam device with multi-source array |
| 04/14/2005 | WO2004107394A3 Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method |
| 04/14/2005 | WO2004107387A3 Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system |
| 04/14/2005 | WO2004049383A3 Large area source for uniform electron beam generation |
| 04/14/2005 | US20050079729 High density plasma oxide film deposition apparatus having a guide ring and a semiconductor device manufacturing method using the same |
| 04/14/2005 | US20050079694 Ion implantation method and method for manufacturing semiconductor device |
| 04/14/2005 | US20050079295 Apparatus and method for depositing large area coatings on planar surfaces |
| 04/14/2005 | US20050078309 Microwave plasma source |