| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 05/11/2005 | CN1201370C Apparatus for improving plasma distribution and performance in inductively coupled plasma |
| 05/11/2005 | CN1201141C Manufacturing method of electronic microscope fixed point test piece |
| 05/10/2005 | US6891623 Method and device for atomic interferometry nanolithography |
| 05/10/2005 | US6891610 Methods and systems for determining an implant characteristic and a presence of defects on a specimen |
| 05/10/2005 | US6891185 Electronic device with aperture and wide lens for small emission spot size |
| 05/10/2005 | US6891176 Planar electron emitter with extended lifetime and system using same |
| 05/10/2005 | US6891174 Method and system for ion beam containment using photoelectrons in an ion beam guide |
| 05/10/2005 | US6891173 Ion implantation systems and methods utilizing a downstream gas source |
| 05/10/2005 | US6891171 Method for repairing a phase shift mask and a focused ion beam apparatus for carrying out method |
| 05/10/2005 | US6891170 Modular manipulation system for manipulating a sample under study with a microscope |
| 05/10/2005 | US6891169 Electron beam array write head system and method |
| 05/10/2005 | US6891168 Particle-optical apparatus and method for operating the same |
| 05/10/2005 | US6891167 Apparatus and method for applying feedback control to a magnetic lens |
| 05/10/2005 | US6891159 Converting scanning electron microscopes |
| 05/10/2005 | US6891152 Nano-lithography using squeezed atomic and molecular states |
| 05/10/2005 | US6891123 Setting predetermined pressure, source power and bias power of chamber, flowing trifluoromethane and argon gases into chamber at predermined rate, introducing chlorine gas at predetermined flow rate, completing supply of chlorine gas, igniting plasma |
| 05/10/2005 | US6890870 Method for controlling electrical conductivity |
| 05/10/2005 | US6890771 Plasma processing method using spectroscopic processing unit |
| 05/10/2005 | US6890403 Apparatus and process for controlling the temperature of a substrate in a plasma reactor |
| 05/06/2005 | WO2005041623A2 Plasma processing apparatus, control method for plasma processing apparatus, and evaluation method for plasma processing apparatus |
| 05/06/2005 | WO2005041243A1 Electron detection system for a scanning electron microscope |
| 05/06/2005 | WO2005041242A1 Charged particle beam device with aperture |
| 05/06/2005 | WO2005041172A1 System, method and collimator for oblique deposition |
| 05/06/2005 | WO2005040454A1 Surface treatment method and device |
| 05/06/2005 | WO2005040451A1 Rectangular filtered vapor plasma source and method of controlling vapor plasma flow |
| 05/06/2005 | WO2005031789A3 Method, system and device for microscopic examination employing fib-prepared sample grasping element |
| 05/05/2005 | US20050095800 Method of calculating a pressure compensation recipe for a semiconductor wafer implanter |
| 05/05/2005 | US20050095732 Plasma processing apparatus and method and apparatus for measuring DC potential |
| 05/05/2005 | US20050093460 Helical resonator type plasma processing apparatus |
| 05/05/2005 | US20050093459 Method and apparatus for preventing instabilities in radio-frequency plasma processing |
| 05/05/2005 | US20050093012 System, method and apparatus for self-cleaning dry etch |
| 05/05/2005 | US20050092940 Method of controlling implant dosage and pressure compensation factor in-situ |
| 05/05/2005 | US20050092939 Fault detection and control methodologies for ion implantation processes, and system for performing same |
| 05/05/2005 | US20050092938 Utilization of an ion gauge in the process chamber of a semiconductor ion implanter |
| 05/05/2005 | US20050092935 Electron beam treatment apparatus |
| 05/05/2005 | US20050092933 Specimen holder, observation system, and method of rotating specimen |
| 05/05/2005 | US20050092930 Charged particle beam apparatus and automatic astigmatism adjustment method |
| 05/05/2005 | US20050092922 Ion beam apparatus and sample processing method |
| 05/05/2005 | US20050092921 Sheet beam-type inspection apparatus |
| 05/05/2005 | US20050092920 Three-dimensional surface analyzing method |
| 05/05/2005 | US20050092604 Method of manufacturing sputter targets with internal cooling channels |
| 05/05/2005 | US20050092596 Producing metal vapor by magnetron sputtering using low electrical current then ionizing resulting gas using high electrical current |
| 05/05/2005 | US20050092595 Implanting impurities into semiconductor wafers; rapid automatic switching between dopants; low cost |
| 05/05/2005 | US20050092437 Plasma processing equipment |
| 05/05/2005 | US20050092435 Processing device, electrode, electrode plate, and processing method |
| 05/05/2005 | US20050092432 Ion beam processing system and ion beam processing method |
| 05/05/2005 | US20050092252 Plasma processing method and apparatus |
| 05/05/2005 | US20050092245 Plasma chemical vapor deposition apparatus having an improved nozzle configuration |
| 05/05/2005 | US20050092243 Processing apparatus and method |
| 05/05/2005 | US20050092013 Cooling technique |
| 05/05/2005 | US20050091815 Manipulator needle portion repairing method and needle set |
| 05/04/2005 | EP1527474A1 Symmetric beamline and methods for generating a mass-analyzed ribbon ion beam |
| 05/04/2005 | EP1527473A2 Ion source and coaxial inductive coupler for ion implantation system |
| 05/04/2005 | EP1335778B1 Device for adapting the size of an ion beam spot in the domain of tumor irradiation |
| 05/04/2005 | EP1159465A4 Processing chamber for atomic layer deposition processes |
| 05/04/2005 | EP1114805B1 Plasma-resistant member and plasma treatment apparatus using the same |
| 05/04/2005 | DE10305602B4 Verfahren und Vorrichtung zum Erzeugen eines Gasplasmas und Verfahren zur Herstellung einer Halbleitervorrichtung Method and device for generating a gas plasma, and process for producing a semiconductor device |
| 05/04/2005 | DE10218913B4 Vorrichtung und Verfahren zur Bewegung einer Elektronenquelle in einem Magnetfeld Apparatus and method for moving an electron source in a magnetic field |
| 05/04/2005 | CN1613279A Plasma process apparatus and its processor |
| 05/04/2005 | CN1613130A Uniformity control for plasma doping systems |
| 05/04/2005 | CN1613129A A method for molding a polymer surface that reduces particle generation and surface adhesion forces while maintaining a high heat transfer coefficient |
| 05/04/2005 | CN1612312A Method for monitoring ion disposing process |
| 05/04/2005 | CN1200133C Device for forming vacuum coating |
| 05/03/2005 | US6888313 Impedance matching network with termination of secondary RF frequencies |
| 05/03/2005 | US6888150 Method for defect and conductivity engineering of a conducting nanoscaled structure |
| 05/03/2005 | US6888149 Focused ion beam apparatus |
| 05/03/2005 | US6888145 Optical particle corrector |
| 05/03/2005 | US6888140 Particle detectors |
| 05/03/2005 | US6888139 Electron microscope |
| 05/03/2005 | US6888138 Absorption current image apparatus in electron microscope |
| 05/03/2005 | US6888137 Instrument and method for observing selected stored images acquired from a scanning charged-particle beam |
| 05/03/2005 | US6888136 Method of obtaining a particle-optical image of a sample in a particle-optical device |
| 05/03/2005 | US6888133 Integrated ion focusing and gating optics for ion trap mass spectrometer |
| 05/03/2005 | US6888131 Sample support for mass spectrometers |
| 05/03/2005 | US6888094 Plasma processing method and plasma processing apparatus |
| 05/03/2005 | US6888090 Electron beam welding method |
| 05/03/2005 | US6887357 Sputtering system |
| 05/03/2005 | US6887341 Plasma processing apparatus for spatial control of dissociation and ionization |
| 05/03/2005 | US6887340 Etch rate uniformity |
| 05/03/2005 | US6887337 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
| 04/28/2005 | WO2005038879A2 Boron ion delivery system |
| 04/28/2005 | WO2005038857A2 Filtered cathodic arc plasma source |
| 04/28/2005 | WO2005038856A2 Kinematic ion implanter electrode mounting |
| 04/28/2005 | WO2005038855A2 Ion implanter electrodes |
| 04/28/2005 | WO2005038849A1 Ion source with modified gas delivery |
| 04/28/2005 | WO2005038821A2 Charged particle extraction device and method of design there for |
| 04/28/2005 | WO2005038077A2 Modular device for coating surfaces |
| 04/28/2005 | WO2005024888A3 Double stage charged particle beam energy width reduction system for charged particle beam system |
| 04/28/2005 | WO2005010967A3 Device and method for machining the rear side of semiconductor chips |
| 04/28/2005 | WO2005010618A3 Modulator circuitry |
| 04/28/2005 | WO2004090931A3 Method and apparatus for treating a surface using a plasma discharge |
| 04/28/2005 | WO2004070743A3 Transformer ignition circuit for a transformer coupled plasma source |
| 04/28/2005 | WO2004027825A3 Beam plasma source |
| 04/28/2005 | US20050090118 Plasma control using dual cathode frequency mixing |
| 04/28/2005 | US20050090093 Stress free etch processing in combination with a dynamic liquid meniscus |
| 04/28/2005 | US20050088099 Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device |
| 04/28/2005 | US20050087759 System and method for surface reduction, passivation, corrosion prevention and activation of copper surface |
| 04/28/2005 | US20050087701 Pattern-definition device for maskless particle-beam exposure apparatus |
| 04/28/2005 | US20050087697 Inspection by a transmission electron microscope of a sample |
| 04/28/2005 | US20050087696 Electron beam lens for micro-column electron beam apparatus and method of fabricating the same |