| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/24/2005 | US6897156 Vacuum plasma processor method |
| 05/24/2005 | US6896775 High-power pulsed magnetically enhanced plasma processing |
| 05/24/2005 | US6896773 High deposition rate sputtering |
| 05/24/2005 | US6896765 Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 05/24/2005 | US6896764 Vacuum processing apparatus and control method thereof |
| 05/19/2005 | WO2005045913A1 Plasma processing apparatus |
| 05/19/2005 | WO2005045875A1 Fault detection and control methodologies for ion implantation processes, and system for performing same. |
| 05/19/2005 | WO2005045874A1 Ion source control system |
| 05/19/2005 | WO2005045873A2 Plasma processing system and plasma treatment process |
| 05/19/2005 | WO2005045091A2 Vacuum coating system for coating elongate substrates |
| 05/19/2005 | WO2005020273A3 Control of plasma transitions in sputter processing systems |
| 05/19/2005 | WO2004051710A3 Method and apparatus for reducing substrate charging damage |
| 05/19/2005 | WO2004017356A8 Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes |
| 05/19/2005 | WO2003057939A3 Cathode for vacuum arc evaporators |
| 05/19/2005 | US20050106884 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 05/19/2005 | US20050106873 Plasma chamber having multiple RF source frequencies |
| 05/19/2005 | US20050106869 Plasma processing apparatus |
| 05/19/2005 | US20050106848 System and method for stress free conductor removal |
| 05/19/2005 | US20050106474 Method for controlling linewidth in advanced lithography masks using electrochemistry |
| 05/19/2005 | US20050106331 Introducing reactive gas containing a carbon compound into reaction chamber wherein reactive gas is converted into plasma by resonance using microwaves and the magnetic field, placing substrate in reaction chamber, and depositing film having amorphous structure on the substrate |
| 05/19/2005 | US20050104017 Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples |
| 05/19/2005 | US20050104014 Ion printer |
| 05/19/2005 | US20050104013 Charged-particle multi-beam exposure apparatus |
| 05/19/2005 | US20050104012 Ion implanting apparatus |
| 05/19/2005 | US20050104006 Chromatic aberration corrector for charged particles and charged-particle optical apparatus using the corrector |
| 05/19/2005 | US20050103997 Particle beam apparatus |
| 05/19/2005 | US20050103996 Measurement device for electron microscope |
| 05/19/2005 | US20050103995 Method and apparatus for crystal analysis |
| 05/19/2005 | US20050103623 Ionized physical vapor deposition apparatus using helical self-resonant coil |
| 05/19/2005 | US20050103620 Plasma source with segmented magnetron cathode |
| 05/19/2005 | US20050103619 Rotating sputtering magnetron |
| 05/19/2005 | US20050103445 Plasma processing system with locally-efficient inductive plasma coupling |
| 05/19/2005 | US20050103444 Integrated electrostatic inductive coupling for plasma processing |
| 05/19/2005 | US20050103443 includes a processing chamber, an antenna, and a radio frequency power supply; used for generating plasma by a radio-frequency; uniform plasma distribution |
| 05/19/2005 | US20050103442 Chamber configuration for confining a plasma |
| 05/19/2005 | US20050103440 Magnetron plasma processing apparatus |
| 05/19/2005 | US20050103439 Stabilization of electronegative plasmas with feedback control of RF generator systems |
| 05/19/2005 | US20050103275 Plasma processing apparatus, ring member and plasma processing method |
| 05/19/2005 | US20050103268 Method and apparatus for an improved baffle plate in a plasma processing system |
| 05/19/2005 | US20050103267 Flat panel display manufacturing apparatus |
| 05/19/2005 | DE10344492A1 Teilchenstrahlgerät Particle beam |
| 05/18/2005 | EP1531490A1 Window type probe, plasma monitoring device, and plasma processing device |
| 05/18/2005 | EP1531487A2 Microwave-excited plasma processing apparatus |
| 05/18/2005 | CN2700340Y Evaporation and ionization source with a plurality of annular arc speckles for flat target of arbitrary shape |
| 05/18/2005 | CN1618260A 微波等离子体源 Microwave plasma source |
| 05/18/2005 | CN1617309A Flat panel display manufacturing apparatus |
| 05/18/2005 | CN1617299A 半导体制造装置 The semiconductor manufacturing apparatus |
| 05/18/2005 | CN1202545C Planar electron emitter (PEE), display using it and method for transmitting electron |
| 05/17/2005 | US6894773 Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process |
| 05/17/2005 | US6894769 Monitoring erosion of system components by optical emission |
| 05/17/2005 | US6894762 Dual source lithography for direct write application |
| 05/17/2005 | US6894589 Radio frequency resonator and method for producing the same |
| 05/17/2005 | US6894474 Non-intrusive plasma probe |
| 05/17/2005 | US6894435 Method and device for rastering source redundancy |
| 05/17/2005 | US6894296 Multi-inlet PFS arc chamber for hi-current implanter |
| 05/17/2005 | US6894295 Emission collimation beams; masking patterns |
| 05/17/2005 | US6894292 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 05/17/2005 | US6894291 Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography system |
| 05/17/2005 | US6894288 Manipulator for an optical or particle-optical apparatus |
| 05/17/2005 | US6894287 Microfabrication apparatus and microfabrication method |
| 05/17/2005 | US6894278 Electron radiography |
| 05/17/2005 | US6894277 Scanning electron microscope |
| 05/17/2005 | US6894245 Radio frequency plasma; magnetic generator; for semiconductor |
| 05/17/2005 | US6893971 Dry etching method and apparatus |
| 05/17/2005 | US6893907 Fabrication of silicon-on-insulator structure using plasma immersion ion implantation |
| 05/17/2005 | US6893541 Multi-step process for depositing copper seed layer in a via |
| 05/17/2005 | US6893533 Plasma reactor having a symmetric parallel conductor coil antenna |
| 05/17/2005 | US6893532 Method and apparatus for processing fine particle dust in plasma |
| 05/12/2005 | WO2005043599A2 Electron beam treatment apparatus |
| 05/12/2005 | WO2005043579A1 Beam optical component for charged particle beams |
| 05/12/2005 | WO2005042141A2 Method and device for ion beam processing of surfaces |
| 05/12/2005 | WO2005026409A3 Replaceable plate expanded thermal plasma apparatus and method |
| 05/12/2005 | WO2005013310A3 Method for balancing return currents in plasma processing apparatus |
| 05/12/2005 | WO2004079778A3 Apparatus for attachment of semiconductor hardware |
| 05/12/2005 | WO2004057638A3 Method and apparatus for aerodynamic ion focusing |
| 05/12/2005 | US20050100487 Highly efficient compact capacitance coupled plasma reactor/generator and method |
| 05/12/2005 | US20050100205 Method for measuring three dimensional shape of a fine pattern |
| 05/12/2005 | US20050099189 Inspection method and apparatus for circuit pattern of resist material |
| 05/12/2005 | US20050099135 Method and apparatus for improved focus ring |
| 05/12/2005 | US20050099133 Inductively coupled high-density plasma source |
| 05/12/2005 | US20050099095 Translation and rotation positioning motor |
| 05/12/2005 | US20050098742 System and method for performing SIMOX implants using an ion shower |
| 05/12/2005 | US20050098724 Apparatus and method for image optimization of samples in a scanning electron microscope |
| 05/12/2005 | US20050098430 Vacuum plasma generator |
| 05/12/2005 | US20050098427 deposition chamber having coils comprised of metals and having opposite terminals, used for sputtering thin films on substrates |
| 05/12/2005 | US20050098265 Method and apparatus for improved baffle plate |
| 05/12/2005 | US20050098119 Method and device for vacuum-coating a substrate |
| 05/12/2005 | US20050098117 Segmented resonant antenna for radio frequency inductively coupled plasmas |
| 05/12/2005 | US20050098116 Matching unit for semiconductor plasma processing apparatus |
| 05/12/2005 | US20050098106 Method and apparatus for improved electrode plate |
| 05/12/2005 | US20050097730 Semiconductor manufacturing apparatus |
| 05/12/2005 | CA2543666A1 Plasma immersion ion implantation using conductive mesh |
| 05/11/2005 | EP1530230A2 Helical resonator type plasma processing apparatus |
| 05/11/2005 | EP1530229A1 Beam optical component for charged particle beams |
| 05/11/2005 | EP1529306A1 Etch chamber with dual frequency biasing sources and a single frequency plasma generating source |
| 05/11/2005 | EP1529305A2 Method and device for substrate etching with very high power inductively coupled plasma |
| 05/11/2005 | EP1415321B1 Device for the coating of objects |
| 05/11/2005 | EP0946966B1 Device for cathodic sputtering |
| 05/11/2005 | CN1614746A Helical resonator type plasma processing apparatus |
| 05/11/2005 | CN1614739A Processing apparatus and method |