| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/02/2005 | WO2005038857A3 Filtered cathodic arc plasma source |
| 06/02/2005 | WO2005022581A3 Particle optical apparatus |
| 06/02/2005 | WO2005001870A3 Stored energy arc detection and arc reduction circuit |
| 06/02/2005 | WO2004086451A3 Plasma generation using multi-step ionization |
| 06/02/2005 | US20050119864 RF metrology characterization for field installation and serviceability for the plasma processing industry |
| 06/02/2005 | US20050118737 Shower head structure for processing semiconductor |
| 06/02/2005 | US20050118516 For character-projection (CP) type of electron-beam exposure where a mask defect can be corrected or a pattern changed without making a new mask as part of or all the cells can be exchanged at the mask portion as the mask is made up of blocks of cells in polygon shape |
| 06/02/2005 | US20050118354 propelling plasma products of oxygen and metal towards the substrate;electrically biasing a control grid of a dopant source (e.g., Li or Mg)between the plasma chamber and the substrate the control grid to control a rate of depositionespecially forming a ZnO ferroelectric film |
| 06/02/2005 | US20050118065 Apparatus and method for preparing samples |
| 06/02/2005 | US20050116392 Magnet secured in a two part shell |
| 06/02/2005 | US20050116185 Exposure system and exposure method |
| 06/02/2005 | US20050116182 Method of measuring pattern dimension and method of controlling semiconductor device process |
| 06/02/2005 | US20050116180 Charged-particle beam lithographic system |
| 06/02/2005 | US20050116165 Particle beam device |
| 06/02/2005 | US20050116156 Electron flood apparatus and ion implantation system |
| 06/02/2005 | US20050115827 Multi-cathode ionized physical vapor deposition system |
| 06/02/2005 | US20050115822 Sputtering cathode and device and method for coating a substrate with several layers |
| 06/02/2005 | US20050115678 Magnet assembly for plasma containment |
| 06/02/2005 | US20050115676 Plasma processing method, plasma processing apparatus and computer storage medium |
| 06/02/2005 | DE4321639B4 Plasmaunterstützte, chemische Vakuumbeschichtungsanlage Plasma-enhanced chemical vacuum coating system |
| 06/02/2005 | DE202005001632U1 Massenspektrometer Mass spectrometer |
| 06/02/2005 | DE19754647B4 Rasterelektronenmikroskop Scanning electron microscope |
| 06/02/2005 | DE102004054092A1 Zündvorrichtung Primer |
| 06/02/2005 | DE102004032503A1 Musterschreibvorrichtung Pattern writing apparatus |
| 06/02/2005 | DE10122957B4 Teilchenstrahlapparat mit energiekorrigierter Strahlablenkung sowie Vorrichtungund Verfahren zur energiekorrigierten Ablenkung eines Teilchenstrahls Particle beam with energy-corrected beam deflection and Vorrichtungund method for energy-corrected deflection of a particle beam |
| 06/01/2005 | EP1536671A1 Plasma processing device |
| 06/01/2005 | EP1535324A1 Method of manufacturing cmos devices by the implantation of n- and p-type cluster ions and negative ions |
| 06/01/2005 | EP1535314A2 High rate deposition at low pressures in a small batch reactor |
| 06/01/2005 | EP1535303A1 Gas tube end cap for a microwave plasma generator |
| 06/01/2005 | EP1451846B1 Electron source |
| 06/01/2005 | EP0868739B1 Correction device for correcting chromatic aberration in particle-optical apparatus |
| 06/01/2005 | CN1623007A Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles |
| 06/01/2005 | CN1204399C Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
| 06/01/2005 | CN1204388C Method of preparing electron microscopic film sample of macro powder-particle material |
| 05/31/2005 | US6900894 Apparatus and method for measuring dose and energy of ion implantation by employing reflective optics |
| 05/31/2005 | US6900878 Reticle-holding pods and methods for holding thin, circular reticles, and reticle-handling systems utilizing same |
| 05/31/2005 | US6900645 Semiconductor device test method and semiconductor device tester |
| 05/31/2005 | US6900596 Capacitively coupled plasma reactor with uniform radial distribution of plasma |
| 05/31/2005 | US6900592 Method and apparatus for stabilizing of the glow plasma discharges |
| 05/31/2005 | US6900447 Focused ion beam system with coaxial scanning electron microscope |
| 05/31/2005 | US6900444 Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 05/31/2005 | US6900443 Charged particle beam device for inspecting or structuring a specimen |
| 05/31/2005 | US6900434 Method and device for separating ion mass, and ion doping device |
| 05/31/2005 | US6899817 Device and method for etching a substrate using an inductively coupled plasma |
| 05/31/2005 | US6899787 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system |
| 05/31/2005 | US6899786 Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism |
| 05/31/2005 | US6899785 Method of stabilizing oxide etch and chamber performance using seasoning |
| 05/31/2005 | US6899766 Vacuum chamber for plasma treatment; imparting mechanical oscillation to the apparatus and detecting oscillation generated |
| 05/31/2005 | US6899527 Closed-drift hall effect plasma vacuum pump for process reactors |
| 05/31/2005 | US6899054 Device for hybrid plasma processing |
| 05/26/2005 | WO2005048337A1 Plasma igniting method and substrate processing method |
| 05/26/2005 | WO2005048327A1 Exposure method and exposure device |
| 05/26/2005 | WO2005048322A2 Method and apparatus for improved baffle plate |
| 05/26/2005 | WO2005048289A2 Method and apparatus comprising an improved focus ring |
| 05/26/2005 | WO2005048286A1 Ion beam source |
| 05/26/2005 | WO2005048284A2 Rotating sputtering magnetron |
| 05/26/2005 | WO2005047177A1 Device and method for patterning structures on a substrate |
| 05/26/2005 | WO2005046972A1 Unit for the continuous treatment of the surface of objects, and treatment method |
| 05/26/2005 | WO2005046851A2 Method and apparatus for rapid sample preparation in a focused ion beam microscope |
| 05/26/2005 | WO2005022623B1 High aspect ratio etch using modulation of rf powers of various frequencies |
| 05/26/2005 | WO2005008850A3 Spatial and temporal selective laser assisted fault localization |
| 05/26/2005 | WO2005008717A3 High frequency cell for producing a plasma jet formed by magnetic fields, and method for irradiating a surface |
| 05/26/2005 | WO2004112078A3 Ion implanter having enhanced low energy ion beam transport |
| 05/26/2005 | US20050112900 Method of processing wafers with resonant heating |
| 05/26/2005 | US20050112806 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 05/26/2005 | US20050112289 By heating and spraying lanthanum oxide (La2O3), lanthanum aluminate (LaAlO3), magnesium lanthanum aluminate (MgLaAl11O19), and/or a mixture of La2O3 and Al2O3; wear resistant undercoatings |
| 05/26/2005 | US20050110484 Beam current measuring device and apparatus using the same |
| 05/26/2005 | US20050109956 Precise, in-situ endpoint detection for charged particle beam processing |
| 05/26/2005 | US20050109955 Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device |
| 05/26/2005 | US20050109937 Scanning electron microscope |
| 05/26/2005 | US20050109936 Element-specific X-ray fluorescence microscope and method of operation |
| 05/26/2005 | US20050109728 End point detector for etching equipment |
| 05/26/2005 | US20050109462 Apparatus for generating inductively-coupled plasma and antenna coil structure thereof for generating inductive electric fields |
| 05/26/2005 | CA2543462A1 Method and apparatus for rapid sample preparation in a focused ion beam microscope |
| 05/25/2005 | EP1532650A1 Controlling the characteristics of ribbon-shaped implanter ion-beams |
| 05/25/2005 | EP1532649A2 A particle beam generator |
| 05/25/2005 | EP0972092B1 Multipurpose processing chamber for chemical vapor deposition processes |
| 05/25/2005 | EP0906636B1 Highly tetrahedral amorphous carbon films and methods and ion-beam source for their production |
| 05/25/2005 | CN1620712A Self-ionized and inductively-coupled plasma for sputtering and resputtering |
| 05/25/2005 | CN1620711A Apparatus and method for radio frequency decoupling and bias voltage control in a plasma reactor |
| 05/25/2005 | CN1620522A Process chamber component having electroplated yttrium containing coating |
| 05/25/2005 | CN1620219A Plasma generation and control |
| 05/25/2005 | CN1619788A Method and system for monitoring etch process |
| 05/25/2005 | CN1619767A Plasma chamber having multiple RF source frequencies |
| 05/25/2005 | CN1619011A Ionized physical vapor deposition apparatus using helical self-resonant coil |
| 05/25/2005 | CN1619008A Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 05/25/2005 | CN1203208C Power supply unit for sputtering device |
| 05/24/2005 | US6898558 Method and apparatus for monitoring a material processing system |
| 05/24/2005 | US6897616 Slow-wave induction plasma transport |
| 05/24/2005 | US6897458 Electron beam exposure system |
| 05/24/2005 | US6897457 Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus |
| 05/24/2005 | US6897454 Energy beam exposure method and exposure apparatus |
| 05/24/2005 | US6897450 Electromagnetic field superimposed lens and electron beam device using this electromagnetic field superimposed lens |
| 05/24/2005 | US6897445 Scanning electron microscope |
| 05/24/2005 | US6897444 Multi-pixel electron emission die-to-die inspection |
| 05/24/2005 | US6897443 Portable scanning electron microscope |
| 05/24/2005 | US6897442 Objective lens arrangement for use in a charged particle beam column |
| 05/24/2005 | US6897441 Reducing chromatic aberration in images formed by emmission electrons |
| 05/24/2005 | US6897403 Plasma processing method and plasma processing apparatus |
| 05/24/2005 | US6897157 Method of repairing an opaque defect on a mask with electron beam-induced chemical etching |